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Proceedings of SPIE Volume 8323

Alternative Lithographic Technologies IV
Editor(s): William M. Tong
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Volume Details

Volume Number: 8323
Date Published: 18 April 2012
Softcover: 65 papers (600) pages
ISBN: 9780819489791

Table of Contents
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Front Matter: Volume 8323
Author(s): Proceedings of SPIE
Future of multiple-e-beam direct-write systems
Author(s): Burn J. Lin
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Block copolymer directed self-assembly enables sublithographic patterning for device fabrication
Author(s): H.-S. Philip Wong; Chris Bencher; He Yi; Xin-Yu Bao; Li-Wen Chang
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Design considerations for UV-NIL resists
Author(s): Kazuyuki Usuki; Satoshi Wakamatsu; Tadashi Oomatsu; Akiko Hattori; Shinji Tarutani; Kunihiko Kodama; Hideto Tanabe; Kouji Shitabatake
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Selective transfer of nanostructured assemblies onto an arbitrary substrate by nanoimprinting
Author(s): Steven J. Barcelo; Min Hu; Ansoon Kim; Wei Wu; Zhiyong Li
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Pattern scaling with directed self assembly through lithography and etch process integration
Author(s): Benjamen Rathsack; Mark Somervell; Josh Hooge; Makoto Muramatsu; Keiji Tanouchi; Takahiro Kitano; Eiichi Nishimura; Koichi Yatsuda; Seiji Nagahara; Iwaki Hiroyuki; Keiji Akai; Takashi Hayakawa
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All track directed self-assembly of block copolymers: process flow and origin of defects
Author(s): Paulina A. Rincon Delgadillo; Roel Gronheid; Christopher J. Thode; Hengpeng Wu; Yi Cao; Mark Somervell; Kathleen Nafus; Paul F. Nealey
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Synthesis and characterization of self-assembling block copolymers containing fluorine groups
Author(s): Rina Maeda; Michelle Chavis; Nam-Ho You; Christopher K. Ober
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Sub-20nm hybrid lithography using optical, pitch-division, and e-beam
Author(s): J. Belledent; M. Smayling; J. Pradelles; P. Pimenta-Barros; S. Barnola; L. Mage; B. Icard; C. Lapeyre; S. Soulan; L. Pain
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50 keV electron multibeam mask writer for the 11nm HP node: first results of the proof of concept tool (eMET POC)
Author(s): Christof Klein; Hans Loeschner; Elmar Platzgummer
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Reflective electron-beam lithography: progress toward high-throughput production capability
Author(s): Regina Freed; Thomas Gubiotti; Jeff Sun; Francoise Kidwingira; Jason Yang; Upendra Ummethala; Layton C. Hale; John J. Hench; Shinichi Kojima; Walter D. Mieher; Chris F. Bevis; Shy-Jay Lin; Wen-Chuan Wang
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Influence of thermal load on 450 mm Si-wafer IPD during lithographic patterning
Author(s): Thomas Peschel; Gerhard Kalkowski; Ramona Eberhardt
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Self-consistent field theory of directed self-assembly in laterally confined lamellae-forming diblock copolymers
Author(s): Nabil Laachi; Hassei Takahashi; Kris T. Delaney; Su-Mi Hur; David Shykind; Corey J. Weinheimer; Glenn H. Fredrickson
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Directed self-assembly defectivity assessment. Part II
Author(s): Chris Bencher; He Yi; Jessica Zhou; Manping Cai; Jeffrey Smith; Liyan Miao; Ofir Montal; Shiran Blitshtein; Alon Lavi; Kfir Dotan; Huixiong Dai; Joy Y. Cheng; Daniel P. Sanders; Melia Tjio; Steven Holmes
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Pattern density multiplication by direct self assembly of block copolymers: toward 300mm CMOS requirements
Author(s): R. Tiron; X. Chevalier; S. Gaugiran; J. Pradelles; H. Fontaine; C. Couderc; L. Pain; C. Navarro; T. Chevolleau; G. Cunge; M. Delalande; G. Fleury; G. Hadziioannou
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Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns
Author(s): Gregory S. Doerk; Chi-Chun Liu; Joy Y. Cheng; Charles T. Rettner; Jed W. Pitera; Leslie Krupp; Teya Topuria; Noel Arellano; Daniel P. Sanders
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Evaluation of ordering of directed self-assembly of block copolymers with pre-patterned guides for bit patterned media
Author(s): Takeshi Okino; Takuya Shimada; Akiko Yuzawa; Ryosuke Yamamoto; Naoko Kihara; Yoshiyuki Kamata; Akira Kikitsu; Takashi Akahane; You Yin; Sumio Hosaka
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Line-frequency doubling of directed self-assembly patterns for single-digit bit pattern media lithography
Author(s): K. C. Patel; R. Ruiz; J. Lille; L. Wan; E. Dobiz; H. Gao; N. Robertson; T. R. Albrecht
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Imprint process performance for patterned media at densities greater than 1Tb/in2
Author(s): Zhengmao Ye; Scott Carden; Paul Hellebrekers; Dwayne LaBrake; Douglas J. Resnick; M. Melliar-Smith; S. V. Sreenivasan
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Contact-hole patterning for random logic circuits using block copolymer directed self-assembly
Author(s): He Yi; Xin-Yu Bao; Jie Zhang; Richard Tiberio; James Conway; Li-Wen Chang; Subhasish Mitra; H.-S. Philip Wong
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Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy
Author(s): Chi-Chun Liu; Jed Pitera; Neal Lafferty; Kafai Lai; Charles Rettner; Melia Tjio; Noel Arellano; Joy Cheng
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Contact hole shrink process using directed self-assembly
Author(s): Yuriko Seino; Hiroki Yonemitsu; Hironobu Sato; Masahiro Kanno; Hikazu Kato; Katsutoshi Kobayashi; Ayako Kawanishi; Tsukasa Azuma; Makoto Muramatsu; Seiji Nagahara; Takahiro Kitano; Takayuki Toshima
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Investigation of high x block copolymers for directed self-asssembly: synthesis and characterization of PS-b-PHOST
Author(s): Nathan D. Jarnagin; Jing Cheng; Andrew Peters; Wei-Ming Yeh; Richard A. Lawson; Laren M. Tolbert; Clifford L. Henderson
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REBL: design progress toward 16 nm half-pitch maskless projection electron beam lithography
Author(s): Mark A. McCord; Paul Petric; Upendra Ummethala; Allen Carroll; Shinichi Kojima; Luca Grella; Sameet Shriyan; Charles T. Rettner; Chris F. Bevis
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Active-matrix nc-Si electron emitter array for massively parallel direct-write electron-beam system
Author(s): N. Ikegami; T. Yoshida; A. Kojima; H. Ohyi; N. Koshida; M. Esashi
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Complementary patterning demonstration with e-beam direct writer and spacer DP process of 11nm node
Author(s): Hideaki Komami; Kenji Abe; Keita Bunya; Hideaki Isobe; Masahiro Takizawa; Masaki Kurokawa; Akio Yamada; Hietami Yaegashi; Kenichi Oyama; Shohei Yamauchi
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CP element based design for 14nm node EBDW high volume manufacturing
Author(s): Takashi Maruyama; Yasuhide Machida; Shinji Sugatani; Hiroshi Takita; Hiromi Hoshino; Toshio Hino; Masaru Ito; Akio Yamada; Tetsuya Iizuka; Satoshi Komatsu; Makoto Ikeda; Kunihiro Asada
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Controlling template erosion with advanced cleaning methods
Author(s): SherJang Singh; Zhaoning Yu; Tobias Wähler; Nobuo Kurataka; Gene Gauzner; Hongying Wang; Henry Yang; Yautzong Hsu; Kim Lee; David Kuo; Peter Dress
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Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography
Author(s): Lei Wan; Ricardo Ruiz; He Gao; Kanaiyalal C. Patel; Jeffery Lille; Gabriel Zeltzer; Elizabeth A. Dobisz; Alexei Bogdanov; Paul F. Nealey; Thomas R. Albrecht
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Deformations of soft imprint templates in the nanoimprint lithography
Author(s): Jian He; S. Howitz; S. Killge; K. Richter; J. W. Bartha
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Zone plate focused soft x-ray lithography for fabrication of nanofluidic devices
Author(s): Adam F. G. Leontowich; Adam P. Hitchcock
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Multi-step Scanning Probe Lithography (SPL) on calixarene with overlay alignment
Author(s): M. Kaestner; I. W. Rangelow
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Roll-to-roll manufacturing of electronic devices
Author(s): N. A. Morrison; T. Stolley; U. Hermanns; U. Kroemer; A. Reus; A. Lopp; M. Campo; H. Landgraf
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Sub-100 nm pattern formation by roll-to-roll nanoimprint
Author(s): Ryoichi Inanami; Tomoko Ojima; Kazuto Matsuki; Takuya Kono; Tetsuro Nakasugi
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Planarization coating for polyimide substrates used in roll-to-roll fabrication of active matrix backplanes for flexible displays
Author(s): A. Marcia Almanza-Workman; Albert Jeans; Steve Braymen; Richard E. Elder; Robert A. Garcia; Alejandro de la Fuente Vornbrock; Jason Hauschildt; Edward Holland; Warren Jackson; Mehrban Jam; Frank Jeffrey; Kelly Junge; Han-Jun Kim; Ohseung Kwon; Don Larson; Hao Luo; John Maltabes; Ping Mei; Craig Perlov; Mark Smith; Dan Stieler; Carl P. Taussig; Steve Trovinger; Lihua Zhao
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Roll-to-roll nanopatterning using jet and flash imprint lithography
Author(s): Sean Ahn; Maha Ganapathisubramanian; Mike Miller; Jack Yang; Jin Choi; Frank Xu; Douglas J. Resnick; S. V. Sreenivasan
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Designing new materials and processes for directed self-assembly applications
Author(s): Shih-Wei Chang; Erin E. Vogel; Valeriy V. Ginzburg; Daniel J. Murray; John W. Kramer; Jeffrey D. Weinhold; Vivian P. W. Chuang; Rahul Sharma; Jessica P. Evans; Brian Landes; Shouren Ge; Peter Trefonas; Phillip D. Hustad
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Directed self-assembly of laterally confined lamellae-forming diblock copolymers: polydispersity and substrate interaction effects
Author(s): Hassei Takahashi; Nabil Laachi; Su-Mi Hur; Corey J. Weinheimer; David Shykind; Glenn H. Fredrickson
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EUVL compatible LER solutions using functional block copolymers
Author(s): Han-Hao Cheng; Imelda Keen; Anguang Yu; Ya-Mi Chuang; Idriss Blakey; Kevin S. Jack; Michael J. Leeson; Todd R. Younkin; Andrew K. Whittaker
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Maskless EUV lithography: an already difficult technology made even more complicated?
Author(s): Yijian Chen
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A phase segregating polymer blend for 2xnm feature applications
Author(s): Jin Li; Tatsuro Nagahara; Munirathna Padmanaban; John Sagan
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Detailed mesoscale dynamic simulation of block copolymer directed self-assembly processes: application of protracted colored noise dynamics
Author(s): Andrew J. Peters; Richard A. Lawson; Peter J. Ludovice; Clifford L. Henderson
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25nm pitch master and replica mold fabrication for nanoimprinting lithography for 1Tbit/inch2 bit patterned media
Author(s): Hideo Kobayashi; Shuji Kishimoto; Kouta Suzuki; Hiromasa Iyama; Sakae Nakatsuka; Kazutake Taniguchi; Takashi Sato; Tsuyoshi Watanabe
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Combined dose and geometry correction (DMG) for low energy multi electron beam lithography (5kV): application to the 16nm node
Author(s): Luc Martin; Serdar Manakli; Sebastien Bayle; Jérôme Belledent; Sebastien Soulan; Pablo Wiedemann; Abdi Farah; Patrick Schiavone
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Analysis of multibeam's scalable column for complementary e-beam lithography (CEBL)
Author(s): Enden D. Liu; Cong Tran; Ted Prescop; David K. Lam
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Multiple columns for high-throughput complementary e-beam lithography (CEBL)
Author(s): Enden D. Liu; Cong Tran; Ted Prescop; David K. Lam
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Addressing LER through atomistic self-assembly
Author(s): Victor Moroz; Lars Bomholt
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Plasmonic lithography modeling and measurement of near-field distribution of plasmonic nano-aperture
Author(s): Yongwoo Kim; Seok Kim; Howon Jung; Jinhee Jang; Jae Yong Lee; Jae Won Hahn
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Design of a high positioning contact probe for plasmonic lithography
Author(s): Jinhee Jang; Yongwoo Kim; Seok Kim; Howon Jung; Jae Won Hahn
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Optimization of chemically amplified resist for high-volume manufacturing by electron-beam direct writing toward 14nm node and beyond
Author(s): Jun-ichi Kon; Takashi Maruyama; Yoshinori Kojima; Yasushi Takahashi; Shinji Sugatani; Kozo Ogino; Hiromi Hoshino; Hideaki Isobe; Masaki Kurokawa; Akio Yamada
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Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond
Author(s): Yoshinori Kojima; Yasushi Takahashi; Masaki Takakuwa; Shuzo Ohshio; Shinji Sugatani; Ryo Tujimura; Hiroshi Takita; Kozo Ogino; Hiromi Hoshino; Yoshio Ito; Masaaki Miyajima; Jun-ichi Kon
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Block co-polymer guided self-assembly by surface chemical modification: optimization of multiple patterning process and pattern transfer
Author(s): Lorea Oria; Alaitz Ruiz de Luzuriaga; Juan A. Alduncín; Francesc Pérez-Murano
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Proximity effect correction using multilevel area density maps for character projection based electron beam direct writing toward 14 nm node and beyond
Author(s): Kozo Ogino; Hiromi Hoshino; Takashi Maruyama; Yasuhide Machida; Shinji Sugatani
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Feasibility study of character projection-based electron-beam direct writing for logic LSI wiring including automatically routed area with 14nm node technology case
Author(s): Shinji Sugatani; Takashi Maruyama; Yoshinori Kojima; Yasushi Takahashi; Masaki Takakuwa; Shuzo Ohshio; Masaru Ito
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High-resolution laser direct writing with a plasmonic contact probe
Author(s): Howon Jung; Yongwoo Kim; Seok Kim; Jinhee Jang; Jae Won Hahn
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Feasibility study of optical/e-beam complementary lithography
Author(s): Christoph Hohle; Kang-Hoon Choi; Martin Freitag; Manuela Gutsch; Philipp Jaschinsky; Frank Kahlenberg; Christof Klein; Jan Klikovits; Jan Paul; Matthias Rudolph; Xaver Thrun
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Optimization of MSB for future technology nodes
Author(s): Hans-Joachim Doering; Thomas Elster; Matthias Klein; Joachim Heinitz; Marc Schneider; Ulf Weidenmüller; Matthias Slodowski; Ines A. Stolberg; Wolfgang Dorl
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Integrated lithography to prepare arrays of rounded nano-objects
Author(s): Áron Sipos; Anikó Szalai; Mária Csete
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Improved electron backscattering representation using a new class of distribution: application to EUV masks
Author(s): T. Figueiro; M. Saib; N. Jedidi; P. Schiavone
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Fabrication nanopillars pattern on PDMS using anodic aluminum oxide film as template
Author(s): Yung-Chiang Ting; Shyi-Long Shy
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Nanosphere lithography based technique for fabrication of large area well ordered metal particle arrays
Author(s): Steven J. Barcelo; Si-Ty Lam; Gary A. Gibson; Xia Sheng; Dick Henze
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Ultimate lithographic performances of advanced resists CAR or non-CAR resist?
Author(s): Jan Frederik Van Steenbergen; Noboru Ootsuka; Xavier Buch; Béatrice Icard; Claire Sourd; Christophe Constancias; Bernard Dalzotto; Laurent Pain
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Hardware implementation of Corner2 lossless compression algorithm for maskless lithography systems
Author(s): Jeehong Yang; Xiaohui Li; Serap A. Savari
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Scalable simulations for directed self-assembly patterning with the use of GPU parallel computing
Author(s): Kenji Yoshimoto; Brandon L. Peters; Gurdaman S. Khaira; Juan J. de Pablo
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Modeling line-edge roughness in lamellar block copolymer systems
Author(s): Paul N. Patrone; Gregg M. Gallatin
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Directed self-assembly of poly(styrene)-block-poly(acrylic acid) copolymers for sub-20nm pitch patterning
Author(s): Jing Cheng; Richard A. Lawson; Wei-Ming Yeh; Nathan D. Jarnagin; Andrew Peters; Laren M. Tolbert; Clifford L. Henderson
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