Share Email Print

Proceedings of SPIE Volume 8249

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.

Volume Details

Volume Number: 8249
Date Published: 21 March 2012
Softcover: 39 papers (346) pages
ISBN: 9780819488923

Table of Contents
show all abstracts | hide all abstracts
Front Matter: Volume 8249
Author(s): Proceedings of SPIE
Elucidating the kinetics and mechanism of RAPID lithography
Author(s): Michael P. Stocker; John T. Fourkas
Show Abstract
Materials development for photo-inhibited super-resolution (PINSR) lithography
Author(s): Darren L. Forman; Gerrit L. Heuvelman; Robert R. McLeod
Show Abstract
Synthesis of super-dense phase of aluminum under extreme pressure and temperature conditions created by femtosecond laser pulses in sapphire
Author(s): Vygantas Mizeikis; Arturas Vailionis; Eugene G. Gamaly; Wenge Yang; Andrei V. Rode; Saulius Juodkazis
Show Abstract
Effect of configuration of the microchannels fabricated by femtosecond laser micromachining on topological defects in confined liquid crystals
Author(s): Krishna Chaitanya Vishnubhatla; Roberto Osellame; Giulio Cerullo; Francesca Serra; Roberto Cerbino; Marco Buscaglia; Tommaso Bellini
Show Abstract
High precision fabrication of polarization insensitive resonant grating filters
Author(s): R. R. Boye; D. W. Peters; J. R. Wendt; S. Samora; J. Stevens; R. J. Shul; J. Hunker; R. A. Kellogg; S. A. Kemme
Show Abstract
Monolithic fabrication and performance control of multilayered, polarization sensitive, guided-mode resonance filters
Author(s): Menelaos K. Poutous; Indumathi Raghu Srimathi; Eric G. Johnson
Show Abstract
Ultrafast diffractive optical micro-trap arrays for neutral atom quantum computing
Author(s): S. A. Kemme; G. R. Brady; A. R. Ellis; J. R. Wendt; D. W. Peters; G. W. Biedermann; T. R. Carter; S. Samora; J. A. Isaacs; V. V. Ivanov; M. Saffman
Show Abstract
Fabrication of optically monolithic, low-index guided mode resonance filters
Author(s): Aaron J. Pung; Menelaos K Poutous; Raymond C. Rumpf; Zachary A. Roth; Eric G. Johnson
Show Abstract
HSQ resist for replication stamp in polymers
Author(s): M. R. Saleem; P. A. Stenberg; M. B. Khan; Z. M. Khan; S. Honkanen; J. Turunen
Show Abstract
Spatially and spectrally varying guided mode resonant filter by modifying the waveguide layer
Author(s): Zachary A. Roth; Menelaos K. Poutous; Eric G. Johnson
Show Abstract
Thermal and optical properties of sol-gel and SU-8 resists
Author(s): Toshiyuki Suzuki; Junko Morikawa; Toshimasa Hashimoto; Ričardas Buividas; Gediminas Gervinskas; Domas Paipulas; Mangirdas Malinauskas; Vygantas Mizeikis; Saulius Juodkazis
Show Abstract
3D microstructures fabricated by prism-assisted inclined UV lithography
Author(s): Guomin Jiang; Sarfaraz Baig; Michael R. Wang
Show Abstract
Active and adaptive optical methods for rapid fabrication of 3D photonic structures
Author(s): Patrick Salter; Richard Simmonds; Martin J. Booth
Show Abstract
Material processing with 12 femtosecond picojoule laser pulses
Author(s): Karsten König; Martin Licht; Martin Straub; Aisada Uchugonova
Show Abstract
Rolling mask nanolithography: the pathway to large area and low cost nanofabrication
Author(s): Boris Kobrin; Edward S. Barnard; Mark L. Brongersma; Moon Kyu Kwak; L. Jay Guo
Show Abstract
Fabrication of eight-channel array single-mode waveguides via vacuum assisted microfluidics
Author(s): Sarfaraz Baig; Guomin Jiang; Qunhui Sun; Michael R. Wang
Show Abstract
Submicrometer pattern generation by diffractive mask-aligner lithography
Author(s): Uwe D. Zeitner; Lorenz Stuerzebecher; Torsten Harzendorf; Frank Fuchs; Dirk Michaelis
Show Abstract
Wafer scale fabrication of submicron chessboard gratings using phase masks in proximity lithography
Author(s): Lorenz Stuerzebecher; Torsten Harzendorf; Frank Fuchs; Uwe D. Zeitner
Show Abstract
Tuning of random rough surface statistics for optoelectronics
Author(s): Vincent Brissonneau; Ludovic Escoubas; François Flory; Gérard Berginc; Jean-Jacques Simon
Show Abstract
High precision geometrical characterization and alignment of miniaturized optics
Author(s): Patrik Langehanenberg; Josef Heinisch; Eugen Dumitrescu
Show Abstract
Monitoring of the formation of a photosensitive device by electric breakdown of an impurity containing oxide in a MOS capacitor
Author(s): Raffaele Di Giacomo; Giovanni Landi; Christian Boit; Heinz C. Neitzert
Show Abstract
Programmed resist sidewall profiles using subresolution binary grayscale masks for Si-photonics applications
Author(s): Ofir Gan; Paul Allen; Assia Barkai; Peter Buck; Brid Connolly; Harel Frish; Massimiliano Pindo
Show Abstract
Hybrid optics for three-dimensional microstructuring of polymers via direct laser writing
Author(s): Frank Burmeister; Uwe D. Zeitner; Stefan Nolte; Andreas Tünnermann
Show Abstract
Generating high DOF light by using tapered hollow tube in a lithography system
Author(s): Chun-Yen Chen; Yu-Hsun Lee; Chih-Jen Chien; Yuh-Yan Yu; Chih-Kung Lee
Show Abstract
Magnetostatic response of 3D metallic traces created using dynamic membrane projection lithography
Author(s): D. Bruce Burckel
Show Abstract
Fabrication of large arrays of plasmonic nanostructures via double casting
Author(s): Joanne C. Lo; David A. Horsley; Jack L. Skinner
Show Abstract
Radio frequency plasma pre-treatment for selective electroless Ag coating of three-dimensional SU-8 microstructures
Author(s): Andrew A. Bettiol; Yuanjun Yan; Ee Jin Teo; Hendrix Tanoto; Jinghua Teng
Show Abstract
Exposure controlled projection lithography for microlens fabrication
Author(s): Amit S. Jariwala; Robert E. Schwerzel; Harold A. Nikoue; David W. Rosen
Show Abstract
Optical microcavities fabricated using direct proton beam writing
Author(s): Sudheer Kumar Vanga; Shuvan Prashant Turaga; Ee Jin Teo; Andrew Bettiol
Show Abstract
Use of ALD thin film Bragg mirror stacks in tuneable visible light MEMS Fabry-Perot interferometers
Author(s): Anna Rissanen; Riikka L. Puurunen
Show Abstract
Optical characterization of subwavelength-scale solid immersion lenses
Author(s): Myun-Sik Kim; Toralf Scharf; Mohammad Tahdiul Haq; Wataru Nakagawa; Hans Peter Herzig
Show Abstract
Performance evaluation of direct laser lithography system for rotationally symmetric diffractive optical elements
Author(s): Dong-Ik Kim; Hyug-Gyo Rhee; Geon Hee Kim
Show Abstract
Energy-dependent temperature dynamics in femtosecond laser microprocessing clarified by Raman temperature measurement
Author(s): Tomoki Yoshino; Masato Matsumoto; Yasuyuki Ozeki; Kazuyoshi Itoh
Show Abstract
Effect of reactive monomer on PS-b-P2VP film with UV irradiation
Author(s): H. J. Kim; D. M. Shin
Show Abstract
Effects of electric fields on the photonic crystal formation from block copolymers
Author(s): Taekun Lee; Jin-wook Ju; Won Ryoo
Show Abstract
Plasmon-enhanced optical photodiodes based on MEH-PPV polymer and fullerene blend on ITO
Author(s): Fred Semendy; Priyalal Wijewarnasuriya; Greg Meissner
Show Abstract
Using a dwell-time increase to compensate for SLM pixelation-limited diffraction efficiency in DMHL
Author(s): Daniel R. McAdams; Daniel G. Cole
Show Abstract
Photoresist roughness characterization in additive lithography processes for the fabrication of phase-only optical vortices
Author(s): Zahra Hosseinimakarem; Menelaos K. Poutous; Eric G. Johnson
Show Abstract
Gallium-nitride-based logpile photonic crystals for visible lighting
Author(s): G. Subramania; Q. Li; Y.-J. Lee; J. J. Figiel; C. A. Sanchez; G. T. Wang; A. J. Fischer; R. Biswas
Show Abstract

© SPIE. Terms of Use
Back to Top