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Proceedings of SPIE Volume 8171

Physical Optics
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Volume Details

Volume Number: 8171
Date Published: 19 September 2011
Softcover: 21 papers (202) pages
ISBN: 9780819487971

Table of Contents
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Front Matter: Volume 8171
Author(s): Proceedings of SPIE
Temporal and spectral degrees of polarization of light
Author(s): Philippe Réfrégier; Tero Setälä; Ari T. Friberg
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Random media confer high polarization degree to unpolarized light
Author(s): J. Sorrentini; M. Zerrad; G. Soriano; C. Amra
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Evolution of vortex density in a non-diffracting speckle field with its continuous phase removed
Author(s): Mingzhou Chen; Chris Dainty
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Electromagnetic Hanbury Brown-Twiss phenomenon
Author(s): Timo Hassinen; Jani Tervo; Tero Setälä; Ari T. Friberg
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Further discussion of Huygens-Fresnel principle
Author(s): Zhiqiang Liu; Kiyoshi Uchikawa
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Physical property of structural color in butterflies
Author(s): Mei-Ling Lo; Cheng-Chung Lee
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About the nature of the coherence of light waves
Author(s): Petro O. Demianenko; Kostiantyn P. Demianenko; Fedir P. Demianenko; Yuri F. Zinkovskiy
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Polarization modeling in square ring resonators with the consideration of output mirror's stress effect
Author(s): Jie Yuan; Xingwu Long; Pengfei Zhang; Yu Wang; Meixiong Chen; Haodong Yang; Zhenglong Kang
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The Minimum Spanning Tree method applied to the study of optical speckle fields: spatial characterization of a Gaussian transition and its phase singularities
Author(s): Olivier Vasseur; Isabelle Bergoënd; Debajyoti Upadhyay; Xavier Orlik
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Multiscale spatial depolarization of light: electromagnetism and statistical optics
Author(s): M. Zerrad; J. Sorrentini; G. Soriano; C. Amra
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Tests for assessing beam propagation algorithms
Author(s): Bryan D. Stone
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Efficient use of grating theories with partially coherent illumination
Author(s): Jani Tervo; Heikki J. Hyvärinen; Toni Saastamoinen; Ismo Vartiainen; Jari Turunen
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Gaussian beam mode analysis of optical pulses
Author(s): Ronan J. Mahon; J. Anthony Murphy
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Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing
Author(s): Kristian Motzek; Stefan Partel; Uwe Vogler; Andreas Erdmann
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Illumination pupilgram prediction and control method in advanced optical lithography
Author(s): Tomoyuki Matsuyama; Naonori Kita; Daniel G. Smith
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Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects
Author(s): Andreas Erdmann; Peter Evanschitzky; Feng Shao; Tim Fühner; Gian F. Lorusso; Eric Hendrickx; Mieke Goethals; Rik Jonckheere; Tristan Bret; Thorsten Hofmann
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Analytical model for EUV mask diffraction field calculation
Author(s): Yuting Cao; Xiangzhao Wang; Andreas Erdmann; Peng Bu; Yang Bu
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Influence of geometry variations and defects on the near-field optical properties of pulsed compression gratings
Author(s): Jianpeng Wang; Andreas Erdmann; Shijie Liu; Jianda Shao; Yunxia Jin; Hongbo He; Kui Yi
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Higher-order ghost imaging with partially polarized classical light
Author(s): H. Kellock; T. Setälä; T. Shirai; A. T. Friberg
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Corrected coupled-wave theory for non-slanted reflection gratings
Author(s): L. Alberto Estepa; Cristian Neipp; Jorge Francés; Andrés Márquez; Sergio Bleda; Manuel Pérez-Molina; Manuel Ortuño; Sergi Gallego
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Self-disappearance of the frequency doubling of light in germanium-silicate patterns
Author(s): V. A. Smirnov; L. I. Vostrikova
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