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PROCEEDINGS VOLUME 8166

Photomask Technology 2011
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Volume Details

Volume Number: 8166
Date Published: 13 October 2011
Softcover: 104 papers (1094) pages
ISBN: 9780819487919

Table of Contents
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Front Matter: Volume 8166
Author(s): Proceedings of SPIE
Mask Industry Assessment: 2011
Author(s): Y. David Chan
Show Abstract
Additional evidence of EUV blank defects first seen by wafer printing
Author(s): Rik Jonckheere; Dieter Van den Heuvel; Tristan Bret; Thorsten Hofmann; John Magana; Israel Aharonson; Doron Meshulach; Eric Hendrickx; Kurt Ronse
Show Abstract
Accelerating EUV learning with synchrotron light: mask roughness challenges ahead
Author(s): Patrick P. Naulleau; Kenneth A. Goldberg; Eric Gullikson; Iacopo Mochi; Brittany McClinton; Abbas Rastegar
Show Abstract
Phase defect analysis with actinic full-field EUVL mask blank inspection
Author(s): Takeshi Yamane; Toshihiko Tanaka; Tsuneo Terasawa; Osamu Suga
Show Abstract
Printability of native blank defects and programmed defects and their stack structures
Author(s): Hyuk Joo Kwon; Jenah Harris-Jones; Ranganath Teki; Aaron Cordes; Toshio Nakajima; Iacopo Mochi; Kenneth A. Goldberg; Yuya Yamaguchi; Hiroo Kinoshita
Show Abstract
EUV mask absorber and multi-layer defect disposition techniques using computational lithography
Author(s): Vikram Tolani; Masaki Satake; Peter Hu; Danping Peng; Ying Li; David Kim; Linyong Pang
Show Abstract
Mask cycle time reduction for foundry projects
Author(s): A. Balasinski
Show Abstract
More than monitoring: advanced lithographic process tuning
Author(s): G. R. Cantrell; Jo Alvin Dumaya; Christian Bürgel; Axel Feicke; Martin Häcker; Clemens Utzny
Show Abstract
OPC modeling and correction solutions for EUV lithography
Author(s): James Word; Christian Zuniga; Michael Lam; Mohamed Habib; Kostas Adam; Michael Oliver
Show Abstract
High speed mask inspection data prep flow based on pipelining
Author(s): Dan Hung; Domingo Morales; Juan Pablo Canepa; Stephen Kim; Po Liu; Jean-Paul Sier; Patrick LoPresti
Show Abstract
QoR analysis of fractured data solutions using distributed processing
Author(s): Bhardwaj D. S. S.; Nageswara Rao; Ravi R. Pai; Nitin P. Bhat
Show Abstract
Reducing shot count through optimization-based fracture
Author(s): Timothy Lin; Emile Sahouria; Nataraj Akkiraju; Steffen Schulze
Show Abstract
Application of signal reconstruction techniques to shot count reduction in simulation driven fracturing
Author(s): Shangliang Jiang; Avideh Zakhor
Show Abstract
SMO applied to contact layers at the 32nm node and below with consideration of MEEF and MRC
Author(s): Te-Hung Wu; Robert Sinn; Bob Gleason; JongDoo Kim; Jiyoung Hong; Sejin Park; Sukjoo Lee
Show Abstract
Evaluation of the accuracy of complex illuminator designs
Author(s): Michael S. Hibbs; Jaione Tirapu-Azpiroz; Kazunori Seki; Gregory McIntyre; Shinpei Kondo
Show Abstract
Double patterning from design enablement to verification
Author(s): David Abercrombie; Pat Lacour; Omar El-Sewefy; Alex Volkov; Evgueni Levine; Kellen Arb; Chris Reid; Qiao Li; Pradiptya Ghosh
Show Abstract
Study on design rule verification procedure of semiconductor memory devices by using design based metrology (DBM)
Author(s): Jae-hoon Jeong; Sei-ryung Choi; Seung-hyun Chang; Myoung-seob Shim; Gyoyoung Jin
Show Abstract
Holistic lithography for EUV: NXE:3100 characterization of first printed wafers using an advanced scanner model and scatterometry
Author(s): Frank A. J. M. Driessen; Natalia Davydova; J. Jiang; H. Kang; V. Vaenkatesan; D. Oorschot; I. S. Kim; S. N. Kang; Y. Lee; J. Yeo; K. Gronlund; H. Y. Liu; K. van Ingen-Schenau; R. Peeters; C. Wagner; J. Zimmermann; O. Schumann
Show Abstract
Development status and infrastructure progress update of aerial imaging measurements on EUV masks
Author(s): Sascha Perlitz; Wolfgang Harnisch; Ulrich Strößner; Jan Hendrik Peters; Markus Weiss; Dirk Hellweg
Show Abstract
EUV mask preparation considering blank defects mitigation
Author(s): Yuelin Du; Hongbo Zhang; Martin D. F. Wong; Rasit O. Topaloglu
Show Abstract
Study of EUV mask e-beam inspection conditions for HVM
Author(s): Shmoolik Mangan; C. C. Lin; Greg Hughes; Ran Brikman; Alex Goldenshtein; Vladislav Kudriashov; Alon Litman; Lior Shoval; Ilan Englard
Show Abstract
A study on irregular growing defect mechanism and removal process
Author(s): Hyemi Lee; JeaYoung Jun; GooMin Jeong; SangChul Kim; SangPyo Kim; ChangReol Kim
Show Abstract
Megasonic cleaning: possible solutions for 22nm node and beyond
Author(s): Hrishi Shende; Sherjang Singh; James Baugh; Raunak Mann; Uwe Dietze; Peter Dress
Show Abstract
Extending CO2 cryogenic aerosol cleaning for advanced optical and EUV mask cleaning
Author(s): Ivin Varghese; Charles W. Bowers; Mehdi Balooch
Show Abstract
Advanced electron beam resist requirements and challenges
Author(s): Andrew Jamieson; Yong Kwan Kim; Bennett Olson; Maiying Lu; Nathan Wilcox
Show Abstract
High resolution mask process and substrate for 20nm and early 14nm node lithography
Author(s): Tom Faure; Satoshi Akutagawa; Karen Badger; Louis Kindt; Jun Kotani; Takashi Mizoguchi; Satoru Nemoto; Kazunori Seki; Tasuku Senna; Richard Wistrom; Shinich Igarashi; Yukio Inazuki; Kazuhiro Nishikawa; Hiroki Yoshikawa
Show Abstract
Phase-shifting effect of thin-absorber EUV masks
Author(s): Hiroyoshi Tanabe; Tetsunori Murachi; Sang H. Lee; Manish Chandhok; Seh-Jin Park; Guojing Zhang; Tsukasa Abe; Taichi Ogase; Naoya Hayashi
Show Abstract
The requirements for the future e-beam mask writer: statistical analysis of pattern accuracy
Author(s): Sang Hee Lee; Jin Choi; Hee Bom Kim; Byung Gook Kim; Han-Ku Cho
Show Abstract
The trouble starts with using electrons: putting charging effect correction models to the test
Author(s): Timo Wandel; Clemens Utzny; Noriaki Nakayamada
Show Abstract
EBM-8000: EB mask writer for product mask fabrication of 22nm half-pitch generation and beyond
Author(s): Shusuke Yoshitake; Takashi Kamikubo; Noriaki Nakayamada; Kiyoshi Hattori; Hiroyoshi Ando; Tomohiro Iijima; Kenji Ohtoshi; Kenichi Saito; Ryoichi Yoshikawa; Shuichi Tamamushi; Rikio Tomiyoshi; Hitoshi Higurashi; Yoshiaki Hattori; Seiichi Tsuchiya; Masayuki Katoh; Kouichi Suzuki; Yuichi Tachikawa; Munehiro Ogasawara; Victor Katsap; Steven Golladay; Rodney Kendall
Show Abstract
In-die photomask registration and overlay metrology with PROVE using 2D correlation methods
Author(s): D. Seidel; M. Arnz; D. Beyer
Show Abstract
Evaluation of KLA-Tencor LMS IPRO5 beta system for 22nm node registration and overlay applications
Author(s): M. Ferber; F. Laske; K.-D. Röth; D. Adam
Show Abstract
Repair of natural EUV reticle defects
Author(s): R. Jonckheere; T. Bret; D. Van den Heuvel; J. Magana; W. Gao; M. Waiblinger
Show Abstract
EUVL mask inspection using 193nm wavelength for 30nm node and beyond
Author(s): Jihoon Na; Wonil Cho; Tae-Geun Kim; In-Yong Kang; Byungcheol Cha; Inkyun Shin; Han-Ku Cho
Show Abstract
Printability and detection of backside defects on photomasks
Author(s): Guoxiang Ning; Christian Holfeld; Anna Tchikoulaeva; Martin Sczyrba; Angeline Ho; Karsten Bubke; Soon Yoeng Tan; Andre Holfeld; Byoung Il Choi
Show Abstract
Clean and repair of EUV photomasks
Author(s): Tod Robinson; Daniel Yi; David Brinkley; Ken Roessler; Roy White; Ron Bozak; Mike Archuletta; David Lee
Show Abstract
Challenges associated with advanced mask cleaning
Author(s): Brian J. Grenon
Show Abstract
Study on the soft defects related to dry etch process of phase shift mask
Author(s): Young-Jin An; Jong-Min Kim; Byung-Sun Kang; Dong-Heok Lee; Sang-Soo Choi
Show Abstract
Effect of SPM-based cleaning POR on EUV mask performance
Author(s): Jaehyuck Choi; Han-shin Lee; Jinsang Yoon; Takeya Shimomura; Alex Friz; Cecilia Montgomery; Andy Ma; Frank Goodwin; Daehyuk Kang; Paul Chung; Inkyun Shin; H. Cho
Show Abstract
Scanning probe microscopy study of the tolerance of patterned EUV masks to megasonic cleaning
Author(s): Takeya Shimomura; Abbas Rastegar
Show Abstract
Effect of repetitive acid-based cleaning on EUV mask lifetime and lithographic performance
Author(s): Robert J. Chen; Brittany M. McClinton; Simi A. George; Yongbae Kim; Lorie-Mae Baclea-an; Patrick P. Naulleau
Show Abstract
EUV and x-ray scattering methods for CD and roughness measurement
Author(s): Frank Scholze; Akiko Kato; Jan Wernecke; Michael Krumrey
Show Abstract
Investigation of 3D patterns on EUV masks by means of scatterometry and comparison to numerical simulations
Author(s): Sven Burger; Lin Zschiedrich; Jan Pomplun; Frank Schmidt; Akiko Kato; Christian Laubis; Frank Scholze
Show Abstract
Addressing 3D metrology challenges by using a multiple detector CDSEM
Author(s): Mitsuo Hiroyama; Tsutomu Murakawa; Masayuki Kuribara; Toshimichi Iwai; Minoru Soma; Ikuo Iko; Masahiro Seyama; Jun Matsumoto; Takayuki Nakamura; Hidemitsu Hakii; Isao Yonekura; Masashi Kawashita; Yasushi Nishiyama; Keishi Tanaka; Kenji Komoto
Show Abstract
The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-contours from wafer and mask
Author(s): Daisuke Hibino; Hiroyuki Shindo; Yutaka Hojyo; Thuy Do; Aasutosh Dave; Timothy Lin; Ir Kusnadi; John L. Sturtevant
Show Abstract
30nm full field quartz template replicated from Si master for FLASH active layer NIL
Author(s): Duhyun Lee; Byung-Kyu Lee; Woong Ko; Jae-Kwan Kim; Kiyeon Yang; Byounghoon Seung; Ilyong Jang; Mun Ja Kim; Byunggook Kim; ChangMin Park; Jeongho Yeo; Changyoul Moon
Show Abstract
Dry etching performance of advanced EUV mask blanks
Author(s): John Whang; Madhavi Chandrachood; Emily Gallagher; Tom Faure; Michael Grimbergen; Shaun Crawford; Keven Yu; T. Y .B Leung; Richard Wistrom; Amitabh Sabharwal; Jeff Chen; Banqiu Wu
Show Abstract
The impact of a thinner binary mask absorber on 22nm and beyond mask inspectability and defect sensitivity
Author(s): Karen D. Badger; Kazunori Seki
Show Abstract
Pattern placement error due to resist charging effect at 50kV e-beam writer: mechanism and its correction
Author(s): Jin Choi; Suk Jong Bae; Hee Bom Kim; B. G. Kim; Han Ku Cho
Show Abstract
Enhancement of global CD correction and data processing in EB mask writer EBM-8000
Author(s): Hiroshi Matsumoto; Yasuo Kato; Tomoo Motosugi; Jun Yashima; Takayuki Abe; Noriaki Nakayamada; Shusuke Yoshitake; Kiyoshi Hattori
Show Abstract
Efficient large volume data preparation for electron beam lithography for sub-45nm node
Author(s): Kang-Hoon Choi; Manuela Gutsch; Martin Freitag; Christoph Hohle; Luc Martin; Sebastien Bayle; Serdar Manakli; Patrick Schiavone
Show Abstract
eMET POC: realization of a proof-of-concept 50 keV electron multibeam mask exposure tool
Author(s): Elmar Platzgummer; Christof Klein; Hans Loeschner
Show Abstract
CD error budget of CP exposure
Author(s): Masaki Kurokawa; Hideaki Isobe; Masahiro Takizawa; Keita Bunya; Hideaki Komami; Akio Yamada; Kazuhiko Shiomitsu; Kazuto Oonou
Show Abstract
Mask aspects of EUVL imaging at 27nm node and below
Author(s): Natalia Davydova; Eelco van Setten; Sang-In Han; Mark van de Kerkhof; Robert de Kruif; Dorothe Oorschot; John Zimmerman; Ad Lammers; Brid Connolly; Frank Driessen; Anton van Oosten; Mircea Dusa; Youri van Dommelen; Noreen Harned; Jiong Jiang; Wei Liu; Hoyoung Kang; Hua-yu Liu
Show Abstract
Imprint lithography template technology for bit patterned media (BPM)
Author(s): J. Lille; K. Patel; R. Ruiz; T.-W. Wu; H. Gao; Lei Wan; G. Zeltzer; E. Dobisz; T. R. Albrecht
Show Abstract
Mask replication using jet and flash imprint lithography
Author(s): Kosta S. Selinidis; Chris Jones; Gary F. Doyle; Laura Brown; Joseph Imhof; Dwayne L. LaBrake; Douglas J. Resnick; S. V. Sreenivasan
Show Abstract
Exploring the impact of mask making constraints on double patterning design rules
Author(s): Thuc Dam; Robert Sinn; Paul Rissman; Bob Gleason
Show Abstract
Freeform source optimization for improving litho-performance of warm spots
Author(s): Chun-Wei Wu; Chun-Cheng Liao; Chiang-Lin Shih; Chung-Hsing Chang; Stephen Hsu; Hua-Yu Liu; Zhipan Li
Show Abstract
A new source optimization approach for 2X node logic
Author(s): Kazuya Iwase; Peter De Bisschop; Bart Laenens; Zhipan Li; Keith Gronlund; Paul van Adrichem; Stephen Hsu
Show Abstract
Si stencil masks for organic thin film transistor fabrication
Author(s): Florian Letzkus; Tarek Zaki; Frederik Ante; Harald Richter; Joachim N. Burghartz; Jörg Butschke; Hagen Klauck
Show Abstract
Bottlenecks in data preparation flow for multi-beam direct write
Author(s): Dan Hung; Otto Meijer; Alex Zepka
Show Abstract
Challenges for 1x nm-device fabrication using EUVL: scanner and mask
Author(s): William H. Arnold
Show Abstract
Simulation based mask defect printability verification and disposition. Part II
Author(s): Eric Guo; Irene Shi; Blade Gao; Nancy Fan; Guojie Cheng; Li Ling; Ke Zhou; Gary Zhang; Ye Chen; Chingyun Hsiang; Bo Su
Show Abstract
EUV multilayer defect compensation (MDC) by absorber pattern modification: from theory to wafer validation
Author(s): Linyong Pang; Peter Hu; Masaki Satake; Vikram Tolani; Danping Peng; Ying Li; Dongxue Chen
Show Abstract
Performance of EBeyeM for EUV mask inspection
Author(s): Shinji Yamaguchi; Masato Naka; Takashi Hirano; Masamitsu Itoh; Motoki Kadowaki; Tooru Koike; Yuichiro Yamazaki; Kenji Terao; Masahiro Hatakeyama; Kenji Watanabe; Hiroshi Sobukawa; Takeshi Murakami; Tsutomu Karimata; Kiwamu Tsukamoto; Takehide Hayashi; Ryo Tajima; Norio Kimura; Naoya Hayashi
Show Abstract
Enabling virtual wafer CD (WCD) using inverse pattern rendering (IPR) of mask CD-SEM images
Author(s): Thuc Dam; Dongxue Chen; Hsien-Min Chang; Noel Corcoran; Paul Yu; Linyong Pang; Chia-Wei Chang; Rick Lai; Peter Chang; Laurent Tuo
Show Abstract
PPF-Explorer: pointwise proximity function calibration using a new radial symmetric calibration structure
Author(s): R. Galler; M. Krueger; D. Melzer; L. E. Ramos; M. Suelzle; U. Weidenmueller
Show Abstract
Reticle process monitoring and qualification based on reticle CDU and wafer CDU correlation
Author(s): Guoxiang Ning; Byoung Il Choi; Christian Holfeld; Yee Ta Ngow; Sia Kim Tan; Anna Tchikoulaeva; Fang Hong Gn
Show Abstract
Effects of cleaning on NIL templates: surface roughness, CD, and pattern integrity
Author(s): Sherjang Singh; Kenji Onuki; Naoshi Kawamata; Takaharu Nagai; Masaaki Kurihara; Tatsuya Tomita; Naoya Hayashi; Peter Dress; Uwe Dietze
Show Abstract
Study on EUV photomask resist stripping and cleaning
Author(s): Tsutomu Kikuchi; Yuji Nagashima; Haruka Nakano; Takahiko Wakatsuki; Kensuke Demura; Yoshiaki Kurokawa; Mikio Nonaka
Show Abstract
Investigating the intrinsic cleanliness of automated handling designed for EUV mask pod-in-pod systems
Author(s): O. Brux; P. van der Walle; J. C. J. van der Donck; P. Dress
Show Abstract
Optimized qualification protocol on particle cleanliness for EUV mask infrastructure
Author(s): J. C. J. van der Donck; J. K. Stortelder; G. B. Derksen
Show Abstract
EQ-10 electrodeless Z-pinch EUV source for metrology applications
Author(s): Deborah Gustafson; Stephen F. Horne; Matthew J. Partlow; Matthew M. Besen; Donald K. Smith; Paul A. Blackborow
Show Abstract
Improve the efficiency of the inspection process via a thorough control of the scanning focus
Author(s): Ernesto Villa; Luca Sartelli; Hiroyuki Miyashita
Show Abstract
Efficiency and throughput improvement on defect disposition through automated defect classification
Author(s): Lin He; Noel Corcoran; Danping Peng; Vikram Tolani; Hsien-Min Chang; Paul Yu; Kechang Wang; C. J. Chen; T. H. Yen; Rick Lai; B. H. Ong; Laurent C. C. Tuo
Show Abstract
Electron beam EUV patterned mask inspection system
Author(s): Keizo Yamada; Yasunobu Kitayama; Peter Fiekowsky
Show Abstract
Productivity of femtosecond DUV laser photomask repair in a real world mask house
Author(s): Jin-Hong Lin; C. Y. Chen; F. G. Tsai; Tod Robinson; Daniel Yi; Jeff LeClaire; Roy White; Ron Bozak; Mike Archuletta
Show Abstract
Nanomachining repair for the latest reticle enhancement technologies
Author(s): Tod Robinson; Daniel Yi; David Brinkley; Ken Roessler; Roy White; Ron Bozak; Mike Archuletta; Bernie Arruza
Show Abstract
Parallelized automatic false defect detection using GPUs during mask inspection
Author(s): Mark Pereira; Manabendra Maji; Budde Gangadhar; Ravi R. Pai; Ila Nigam; Anil Parchuri
Show Abstract
Study of EUV mask e-beam inspection conditions for HVM
Author(s): Shmoolik Mangan; C. C. Lin; Greg Hughes; Ran Brikman; Alex Goldenshtein; Vlad Kudriashov; Alon Litman; Lior Shoval; Ilan Englard
Show Abstract
Optimization of mask shot count using MB-MDP and lithography simulation
Author(s): Gek Soon Chua; Wei Long Wang; Byoung IL Choi; Yi Zou; Cyrus Tabery; Ingo Bork; Tam Nguyen; Aki Fujimura
Show Abstract
In-die mask registration measurement with existing inspection tools
Author(s): Shuichi Tamamushi; Takanao Touya
Show Abstract
The influence and improvement of through pellicle image placement
Author(s): Wei Cyuan Lo; Yung Feng Cheng; Ming Jui Chen; Katsuhiro Takushima; Shinichiroh Tashiro
Show Abstract
Fabrication of 20-nm half-pitch quartz template by nano-imprinting
Author(s): Naotoshi Sato; Tadashi Oomatsu; Satoshi Wakamatsu; Katsuhiro Nishimaki; Toshihiro Usa; Kunihiko Kodama; Kazuyuki Usuki
Show Abstract
Releasing material screening and continuous nano-imprinting in mold replication for nano-imprint lithography
Author(s): Kouta Suzuki; Hideo Kobayashi; Takashi Sato; Hiroshi Yamashita; Tsuyoshi Watanabe
Show Abstract
Layout decomposition and mask synthesis for double and triple exposure with image reversal in a single photoresist layer
Author(s): Coumba Ndoye; Marius Orlowski
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Hot spot detection for indecomposable self-aligned double patterning layout
Author(s): Hongbo Zhang; Yuelin Du; Martin D. F. Wong; Rasit O. Topaloglu
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Determination of CD variance factors of 28nm 1x-metal layer hotspots using experimental and simulated CD contours
Author(s): Francois Weisbuch; Jessy Schramm
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Yield optimization through MLR techniques
Author(s): Philippe Morey-Chaisemartin; Eric Beisser
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Dynamic feedback controller for optical proximity correction
Author(s): Ahmed Omran; Jochen Schacht; Jully Pan; Junjiang Lei; Le Hong; Mohamed Al-Imam; Nick Cobb; Regina Shen; Ryan Chou
Show Abstract
Anticipation of dimensional issues caused by topography during photo lithography
Author(s): Lionel Ravel; Christophe Brault; Chloé Hegaret; Antonio Di Giacomo; Romain Lallement; Jérôme Azémar; Marie Hellion
Show Abstract
Total source mask optimization: high-capacity, resist modeling, and production-ready mask solution
Author(s): Moutaz Fakhry; Yuri Granik; Kostas Adam; Kafai Lai
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Performance and variability driven guidelines for BEOL layout decomposition with LELE double patterning
Author(s): Tuck Boon Chan; Kwangok Jeong; Andrew B. Kahng
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Integrated advanced hotspot analysis techniques in the post-OPC verification flow
Author(s): Makoto Miyagi; Peter Brooker; Chander Sawh; Travis Brist; Kunal Taravade
Show Abstract
Double patterning for 56 nm pitch test designs using inverse lithography
Author(s): Thuc Dam; Robert Gleason; Paul Rissman; Robert Sinn
Show Abstract
Using custom features to check OPC model performance
Author(s): Amr Abdo; Ramya Viswanathan
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Development status of EUVL mask blank and substrate
Author(s): Yusuke Hirabayashi
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Attenuated phase-shift mask with high tolerance for 193nm radiation damage
Author(s): Taichi Yamazaki; Ryohei Gorai; Yosuke Kojima; Takashi Haraguchi; Tsuyoshi Tanaka; Ryuji Koitabashi; Yukio Inazuki; Hiroki Yoshikawa
Show Abstract
The trade-offs between thin and thick absorbers for EUV photomasks
Author(s): Gregory McIntyre; Christian Zuniga; Emily Gallagher; John Whang; Louis Kindt
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A study of closed-loop application: WLCD-CDC for 32nm and beyond reticles
Author(s): Arosha Goonesekera; Ute Buttgereit; Thomas Thaler; Erez Graitzer
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Dry etching technologies for the advanced binary film
Author(s): Yoshinori Iino; Makoto Karyu; Hirotsugu Ita; Tomoaki Yoshimori; Hidehito Azumano; Makoto Muto; Mikio Nonaka
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Towards the prediction of pattern collapse hotspots for full-chip layouts
Author(s): John L. Sturtevant; Aasutosh Dave; Uwe Hollerbach
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Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes
Author(s): Oliver H. Rudolph; Peter Evanschitzky; Andreas Erdmann; Eberhard Bär; Jürgen Lorenz
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Accurate prediction of 3D mask topography induced best focus variation in full-chip photolithography applications
Author(s): Peng Liu
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Improving the accuracy of the bimetallic grayscale photomasks using a feedback controlled flat-top beam
Author(s): Reza Qarehbaghi; Glenn H. Chapman; Waris Boonyasiriwat
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Assessment and comparison of different approaches for mask write time reduction
Author(s): A. Elayat; T. Lin; E. Sahouria; S. F. Schulze
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