Share Email Print


Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V
Editor(s): Michael T. Postek
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a black-and-white photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.

Volume Details

Volume Number: 8105
Date Published: 19 September 2011
Softcover: 16 papers (132) pages
ISBN: 9780819487155

Table of Contents
show all abstracts | hide all abstracts
Front Matter: Volume 8105
Author(s): Proceedings of SPIE
Challenges and opportunities in nanomanufacturing
Author(s): Khershed P. Cooper; Ralph F. Wachter
Show Abstract
Nanoparticles and metrology: a comparison of methods for the determination of particle size distributions
Author(s): Victoria A. Coleman; Åsa K. Jämting; Heather J. Catchpoole; Maitreyee Roy; Jan Herrmann
Show Abstract
Strategies for nanoscale contour metrology using critical dimension atomic force microscopy
Author(s): Ndubuisi G. Orji; Ronald G. Dixson; András E. Vládar; Michael T. Postek
Show Abstract
Sidewall slope sensitivity of CD-AFM
Author(s): Aaron Cordes; Benjamin Bunday; Eric Cottrell
Show Abstract
High precision surface-profile metrology by scanning the repetition rate of femtosecond pulses
Author(s): Woo-Deok Joo; Young-Jin Kim; Yunseok Kim; Jiyong Park; Seung-Woo Kim
Show Abstract
Verification of scatterometer design
Author(s): Wenjing Zhao; Cornelius Hahlweg; Hendrik Rothe
Show Abstract
IR nanoscale spectroscopy and imaging
Author(s): Eamonn Kennedy; Fiona Yarrow; James H. Rice
Show Abstract
Linear variable filter based oil condition monitoring systems for offshore windturbines
Author(s): Benjamin R. Wiesent; Daniel G. Dorigo; Özlem Şimşek; Alexander W. Koch
Show Abstract
Two-photon fluorescence near-field pH measurement for mitochondria activity
Author(s): Y. Kanazashi; Y. Li; T. Onojima; K. Iwami; Y. Ohta; N. Umeda
Show Abstract
Light confinement by structured metal tips for antenna-based scanning near-field optical microscopy
Author(s): Joachim D. Jambreck; Miriam Böhmler; Mathias Rommel; Achim Hartschuh; Anton J. Bauer; Lothar Frey
Show Abstract
See-through-silicon inspection application studies based on traditional silicon imager
Author(s): Wei Zhou; Darcy Hart; Noah Bock; Rolf Shervey
Show Abstract
Common-path laser encoder system for nanopositioning
Author(s): Chyan-Chyi Wu; Cheng-Chih Hsu; Ju-Yi Lee; Chun-Yao Cheng
Show Abstract
Laser based imaging of time depending microscopic scenes with strong light emission
Author(s): Cornelius Hahlweg; Eugen Wilhelm; Hendrik Rothe
Show Abstract
Development of cavity ring-down ellipsometry with spectral and submicrosecond time resolution
Author(s): Vassilis Papadakis; Michael A. Everest; Katerina Stamataki; Stelios Tzortzakis; Benoit Loppinet; T. Peter Rakitzis
Show Abstract
Whole field curvature and residual stress determination of silicon wafers by reflectometry
Author(s): Chi Seng Ng; Anand K. Asundi
Show Abstract
Rapid defect detections of bonded wafer using near infrared polariscope
Author(s): Chi Seng Ng; Anand K. Asundi
Show Abstract

© SPIE. Terms of Use
Back to Top