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Proceedings of SPIE Volume 8081

Photomask and Next-Generation Lithography Mask Technology XVIII
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Volume Details

Volume Number: 8081
Date Published: 22 April 2011
Softcover: 24 papers (240) pages
ISBN: 9780819486738

Table of Contents
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Front Matter: Volume 8081
Author(s): Proceedings of SPIE
The coherent EUV scatterometry microscope for actinic mask inspection and metrology
Author(s): Tetsuo Harada; Masato Nakasuji; Teruhiko Kimura; Yutaka Nagata; Takeo Watanabe; Hiroo Kinoshita
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MRC optimization for EUV high NA imaging for the 32-nm HP technology node
Author(s): Shih-En Tseng; Alek Chen
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EB resolution capability with CP exposure
Author(s): Masaki Kurokawa; Hideaki Isobe; Kenji Abe; Yoshihisa Oae; Akio Yamada; Shogo Narukawa; Mikio Ishikawa; Hiroshi Fujita; Morihisa Hoga; Naoya Hayashi
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Elimination of lithographic hotspots which have been waived by means of pattern matching
Author(s): Aditya Chaudhary; Pierre Bouchard; Kalpesh Dave; Tamer Desouky; Karim Moamen; Mark Simmons
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Evaluation of process variations on OPC model predictions
Author(s): James Oberschmidt; Samit Barai; Tamer Desouky; Om Prakash Jaiswal; Aditya Padmawar; Ramana Murthy Pusuluri
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Growth mechanism and inhibition technologies of a contamination on the surface of photomask for longtime LCD-TFT lithography process
Author(s): Makoto Murai; Masayoshi Tsuchiya; Hiroyuki Shinchi; Terumasa Hirano; Shintaro Kitajima; Yasushi Kaneko; Takahisa Kimoto; Shigeki Takayama
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Improvement of polymer type EB resist sensitivity and line edge roughness
Author(s): Makoto Otani; Hironori Asada; Hosei Tsunoda; Masashi Kunitake; Takehiko Ishizaki; Ryuji Miyagawa
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Model-based mask data preparation (MB-MDP) for ArF and EUV mask process correction
Author(s): Kazuyuki Hagiwara; Ingo Bork; Aki Fujimura
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Binary 193nm photomasks aging phenomenon study
Author(s): Félix Dufaye; Luca Sartelli; Carlo Pogliani; Stuart Gough; Frank Sundermann; Hiroyuki Miyashita; Yoshioka Hidenori; Nathalie Charras; Christophe Brochard; Nicolas Thivolle
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193-nm radiation durability study of MoSi binary mask and resulting lithographic performance
Author(s): Isabelle Servin; Jérôme Belledent; Laurent Pain; Brid Connolly; Martin Sczyrba; Matt Lamantia
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New yield-aware mask strategies
Author(s): Kwangok Jeong; Andrew B. Kahng; Christopher J. Progler
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New CD-SEM metrology method for the side wall angle measurement using multiple detectors
Author(s): Hiroshi Fukaya; Tsutomu Murakawa; Soichi Shida; Masayuki Kuribara; Toshimichi Iwai; Jun Matsumoto; Takayuki Nakamura; Hidemitsu Hakii; Isao Yonekura; Masashi Kawashita; Yasushi Nishiyama; Keishi Tanaka; Yasutaka Kikuchi
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Collaborative research on emerging technologies and design
Author(s): Andrew R. Neureuther; Juliet Rubinstein; Marshal Miller; Kenji Yamazoe; Eric Chin; Cooper Levy; Lynn Wang; Nuo Xu; Costas Spanos; Kun Qian; Kameshwar Poolla; Justin Ghan; Anand Subramanian; Tsu-Jae King Liu; Xin Sun; Kwangok Jeong; Puneet Gupta; Abde Kaqalwalla; Rani Ghaida; Tuck Boon Chan
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Practical mask inspection system with printability and pattern priority verification
Author(s): Hideo Tsuchiya; Fumio Ozaki; Kenichi Takahara; Takafumi Inoue; Nobutaka Kikuiri
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Mask data processing technique using GPU for reducing computer cost
Author(s): Ryo Tsujimura; Kozo Ogino; Hiromi Hoshino; Shigeo Satoh; Kazumasa Morishita; Satoshi Yoshikawa; Hiroki Futatsuya; Tatsuo Chijimatsu; Satoru Asai; Satoshi Yamauchi; Tomoyuki Okada; Naoyuki Ishiwata; Motoshu Miyajima
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In-die job automation for PROVE
Author(s): Ronald J. Lesnick; Stephen Kim; Matthias Waechter; Dirk Seidel; Andreas Mueller; Dirk Beyer
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Defect printability of advanced binary film photomask
Author(s): Masato Naka; Shinji Yamaguchi; Keiko Morishita; Shingo Kanamitsu; Ryoji Yoshikawa; Hiromitsu Mashita; Takashi Hirano
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Efficient method for SRAF rule determination
Author(s): Ramana Murthy V. M. Pusuluri; Pavan Y. Bashaboina; James M. Oberschmidt
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Role of ellipsometry in DPT process characterization and impact of performance for contact holes
Author(s): Itaru Kamohara; Vitaliy Domnenko; Alexander Philippou
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RegC: a new registration control process for photomasks after pattern generation
Author(s): Erez Graitzer; Guy Ben-Zvi; Avi Cohen; Dmitriev Vladimir; Dan Avizemer
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Advancing the charging effect correction with time-dependent discharging model
Author(s): Noriaki Nakayamada; Takashi Kamikubo; Hirohito Anze; Shuichi Tamamushi
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Particle free pellicle mounting inside of the large size photomask inspection system
Author(s): Makoto Yonezawa; Seiki Matsumoto; Dongsheng Zhang; Kohei Hashimoto
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Mask blank material optimization impact on leading-edge ArF lithography
Author(s): Kei Mesuda; Hiroshi Watanabe; Katsuya Hayano; Eiji Tsujimoto; Hideyoshi Takamizawa; Toshio Ohhashi; Naruo Sakasai; Shintaro Kudo; Tomoyuki Matsuyama
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22nm node ArF lithography performance improvement by utilizing mask 3D topography: controlled sidewall angle
Author(s): Hiroshi Watanabe; Kei Mesuda; Katsuya Hayano; Eiji Tsujimoto; Hideyoshi Takamizawa; Toshio Ohhashi; Naruo Sakasai; Shintaro Kudo; Tomoyuki Matsuyama
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