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Proceedings of SPIE Volume 7973

Optical Microlithography XXIV
Editor(s): Mircea V. Dusa
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Volume Details

Volume Number: 7973
Date Published: 22 March 2011
Softcover: 94 papers (1020) pages
ISBN: 9780819485328

Table of Contents
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Front Matter: Volume 7973
Author(s): Proceedings of SPIE
Freeform and SMO
Author(s): Robert Socha
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Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator
Author(s): Gregory McIntyre; Daniel Corliss; Remco Groenendijk; Rene Carpaij; Ton van Niftrik; Guillaume Landie; Takao Tamura; Thomas Pepin; James Waddell; Jerry Woods; Chris Robinson; Kehan Tian; Richard Johnson; Scott Halle; Ryoung-Han Kim; Erin Mclellan; Hirokazu Kato; Anthony Scaduto; Carl Maier; Matt Colburn
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Design specific joint optimization of masks and sources on a very large scale
Author(s): K. Lai; M. Gabrani; D. Demaris; N. Casati; A. Torres; S. Sarkar; P. Strenski; S. Bagheri; D. Scarpazza; A. E. Rosenbluth; D. O. Melville; A. Wächter; J. Lee; V. Austel; M. Szeto-Millstone; K. Tian; F. Barahona; T. Inoue; M. Sakamoto
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Illuminator predictor for effective SMO solutions
Author(s): Daniel G. Smith; Naonori Kita; Nobumichi Kanayamaya; Ryota Matsui; Shane R. Palmer; Tomoyuki Matsuyama; Donis G. Flagello
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Full-chip source and mask optimization
Author(s): Min-Chun Tsai; Stephen Hsu; Luoqi Chen; Yen-Wen Lu; Jiangwei Li; Frank Chen; Hong Chen; Jun Tao; Been-Der Chen; Hanying Feng; William Wong; Wei Yuan; Xiaoyang Li; Zhipan Li; Liang Li; Russell Dover; Hua-yu Liu; Jim Koonmen
Show Abstract
Joint optimization of layout and litho for SRAM and logic towards the 20nm node using 193i
Author(s): Peter De Bisschop; Bart Laenens; Kazuya Iwase; Teruyoshi Yao; Mircea Dusa; Michael C. Smayling
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Applicability of global source mask optimization to 22/20nm node and beyond
Author(s): Kehan Tian; Moutaz Fakhry; Aasutosh Dave; Alexander Tritchkov; Jaione Tirapu-Azpiroz; Alan E. Rosenbluth; David Melville; Masaharu Sakamoto; Tadanobu Inoue; Scott Mansfield; Alexander Wei; Young Kim; Bruce Durgan; Kostas Adam; Gabriel Berger; Gandharv Bhatara; Jason Meiring; Henning Haffner; Byung-Sung Kim
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Supreme lithographic performance by simple mask layout based on lithography and layout co-optimization
Author(s): Koichiro Tsujita; Tadashi Arai; Hiroyuki Ishii; Yuichi Gyoda; Kazuhiro Takahashi; Valery Axelrad; Michael C. Smayling
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Simultaneous OPC and decomposition for double exposure lithography
Author(s): Shayak Banerjee; Kanak B. Agarwal; Michael Orshansky
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Towards manufacturing of advanced logic devices by double-patterning
Author(s): Chiew-seng Koay; Scott Halle; Steven Holmes; Karen Petrillo; Matthew Colburn; Youri van Dommelen; Aiqin Jiang; Michael Crouse; Shannon Dunn; David Hetzer; Shinichiro Kawakami; Jason Cantone; Lior Huli; Martin Rodgers; Brian Martinick
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Innovative self-aligned triple patterning for 1x half pitch using single "spacer deposition-spacer etch" step
Author(s): Bencherki Mebarki; Hao D. Chen; Yongmei Chen; Aunchan Wang; Jingmei Liang; Kedar Sapre; Tushar Mandrekar; Xiaolin Chen; Ping Xu; Pokhui Blanko; Christopher Ngai; Chris Bencher; Mehul Naik
Show Abstract
DPT restricted design rules for advanced logic applications
Author(s): Yunfei Deng; Yuangsheng Ma; Hidekazu Yoshida; Jongwook Kye; Harry J. Levinson; Jason Sweis; Tamer H. Coskun; Vishnu Kamat
Show Abstract
Scanner alignment performance for double patterning
Author(s): L. Lattard; M. McCallum; R. Morton; C. Lapeyre; K. Makino; A. Tokui; N. Takahashi; T. Fujiwara
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Effective decomposition algorithm for self-aligned double patterning lithography
Author(s): Hongbo Zhang; Yuelin Du; Martin D. F. Wong; Rasit Topaloglu; Will Conley
Show Abstract
Mandrel-based patterning: density multiplication techniques for 15nm nodes
Author(s): Chris Bencher; Huixiong Dai; Liyan Miao; Yongmei Chen; Ping Xu; Yijian Chen; Shiany Oemardani; Jason Sweis; Vincent Wiaux; Jan Hermans; Li-Wen Chang; Xinyu Bao; He Yi; H.-S. Philip Wong
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Characterization of a 'thermal freeze' litho-litho-etch (LLE) process for predictive simulation
Author(s): Stewart A. Robertson; Patrick Wong; John J. Biafore; Mark D. Smith; Nadia Vandenbroeck; Vincent Wiaux
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Improving double patterning flow by analyzing the diffractive orders in the pupil plane
Author(s): N. Zeggaoui; V. Farys; M. Besacier; Q. Li; E. Yesilada; Y. Trouiller
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Spacer-defined double patterning for 20nm and beyond logic BEOL technology
Author(s): Ryoung-Han Kim; Chiew-seng Koay; Sean D. Burns; Yunpeng Yin; John C. Arnold; Christopher Waskiewicz; Sanjay Mehta; Martin Burkhardt; Matthew E. Colburn; Harry J. Levinson
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Accuracy and performance of 3D mask models in optical projection lithography
Author(s): Viviana Agudelo; Peter Evanschitzky; Andreas Erdmann; Tim Fühner; Feng Shao; Steffen Limmer; Dietmar Fey
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Accounting for mask topography effects in source-mask optimization for advanced nodes
Author(s): Tamer H. Coskun; Huixiong Dai; Hsu-Ting Huang; Vishnu Kamat; Chris Ngai
Show Abstract
Improved fab CDU with FlexRay and LithoTuner
Author(s): Robert Socha; Wenjin Shao; Xu Xie; Youri van Dommelen; Dorothe Oorschot; Henry Megens; Venu Vellanki
Show Abstract
Optical proximity stability control of ArF immersion clusters
Author(s): Lieve Van Look; Joost Bekaert; Koen D'havé; Bart Laenens; Geert Vandenberghe; Shaunee Cheng; Koen Schreel; Jan-Willem Gemmink
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Scanner matching using pupil intensity control between scanners in 30nm DRAM device
Author(s): Jongwon Jang; Daejin Park; Jeaseung Choi; Areum Jung; Gyun Yoo; Jungchan Kim; Cheol-kyun Kim; Donggyu Yim; Junwei Lu; Seunghoon Park; Zongchang Yu; Venu Vellanki; Wenkin Shao; Chris Park
Show Abstract
Solutions for 22-nm node patterning using ArFi technology
Author(s): Jo Finders; Mircea Dusa; Jan Mulkens; Yu Cao; Maryana Escalante
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Characterization and control of dynamic lens heating effects under high volume manufacturing conditions
Author(s): J. Bekaert; L. Van Look; G. Vandenberghe; P. van Adrichem; M. J. Maslow; J.-W. Gemmink; H. Cao; S. Hunsche; J. T. Neumann; A. Wolf
Show Abstract
An aberration control of projection optics for multi-patterning lithography
Author(s): Yasuhiro Ohmura; Taro Ogata; Toru Hirayama; Hisashi Nishinaga; Takeshi Shiota; Satoshi Ishiyama; Susumu Isago; Hidetaka Kawahara; Tomoyuki Matsuyama
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Fine calibration of physical resist models: the importance of Jones pupil, laser bandwidth, mask error and CD metrology for accurate modeling at advanced lithographic nodes
Author(s): Seongho Moon; Seunghune Yang; Artem Shamsuarov; Eunju Kim; Junghoon Ser; Youngchang Kim; Seongwoon Choi; Changjin Kang; Ulrich Klostermann; Bernd Küchler; John Lewellen; Thomas Schmöller; Sooryong Lee
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Stability and calibration of overlay and focus control for a double patterning immersion scanner
Author(s): Masahiko Yasuda; Shinji Wakamoto; Hiroto Imagawa; Shinya Takubo; Yuuji Shiba; Takahisa Kikuchi; Yosuke Shirata; Yuuki Ishii
Show Abstract
Advanced CDU improvement for 22nm and below
Author(s): Tomoharu Fujiwara; Tsuyoshi Toki; Daishi Tanaka; Junichi Kosugi; Tomohiko Susa; Naruo Sakasai; Akira Tokui
Show Abstract
Combined overlay, focus and CD metrology for leading edge lithography
Author(s): Martin Ebert; Hugo Cramer; Wim Tel; Michael Kubis; Henry Megens
Show Abstract
Correcting image placement errors using registration control (RegC) technology
Author(s): Erez Graitzer; Gunter Antesberger; Guy Ben-Zvi; Avi Cohen; Vladimir Dmitriev; Stephanie Winkelmeier
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Optical lithography applied to 20-nm CMOS Logic and SRAM
Author(s): V. Axelrad; M. C. Smayling; K. Tsujita; K. Takahashi
Show Abstract
3D lithography modeling for ground rule development
Author(s): Chandra Sarma; Todd Bailey; Adam Lyons; Dongbing Shao
Show Abstract
Mask enhancer technology with source mask optimization (SMO) for 2Xnm-node logic layout gate fabrication
Author(s): Takashi Matsuda; Shigeo Irie; Tadami Shimizu; Takashi Yuito; Yasuko Tabata; Yuuji Nonami; Akio Misaka; Taichi Koizumi; Masaru Sasago
Show Abstract
Evaluation of a new model of mask topography effects
Author(s): Christophe Pierrat
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High-performance intensity slope correction method for global process variability band improvement and printability enhancement in RET applications
Author(s): Sergiy M. Komirenko
Show Abstract
Contact patterning strategies for 32nm and 28nm technology
Author(s): Bradley Morgenfeld; Ian Stobert; Ju j An; Hideki Kanai; Norman Chen; Massud Aminpur; Colin Brodsky; Alan Thomas
Show Abstract
Polarization holograms for source-mask optimization
Author(s): T. D. Milster; H. Noble; E. Ford; W. Dallas; R. A. Chipman; I. Matsubara; Y. Unno; S. McClain; P. Khulbe; W. S. T. Lam; D. Hansen
Show Abstract
Extending SMO into the lens pupil domain
Author(s): Monica Kempsell Sears; Germain Fenger; Julien Mailfert; Bruce Smith
Show Abstract
Enhancing fullchip ILT mask synthesis capability for IC manufacturability
Author(s): Thomas Cecil; Chris Ashton; David Irby; Lan Luan; D. H. Son; Guangming Xiao; Xin Zhou; David Kim; Bob Gleason; H. J. Lee; W. J. Sim; M. J. Hong; S. G. Jung; S. S. Suh; S. W. Lee
Show Abstract
A study of source mask optimization for logic device through experiment and simulations
Author(s): Hyo-chan Kim; Jeong-Hoon Lee; Jong-Chan Shin; Yong-Kug Bae; Siyoung Choi; Ho-Kyu Kang
Show Abstract
Practical performance and enabling technologies in immersion scanners for the double patterning generation
Author(s): Jun Ishikawa; Hirotaka Kohno; Shinji Sato; Junichi Kosugi; Yuichi Shibazaki
Show Abstract
Advanced wavefront engineering for improved imaging and overlay applications on a 1.35 NA immersion scanner
Author(s): Frank Staals; Alena Andryzhyieuskaya; Hans Bakker; Marcel Beems; Jo Finders; Thijs Hollink; Jan Mulkens; Angelique Nachtwein; Rob Willekers; Peter Engblom; Toralf Gruner; Youping Zhang
Show Abstract
Pupilgram adjusting scheme using intelligent illuminator for ArF immersion exposure tool
Author(s): Tomoyuki Matsuyama; Naonori Kita; Yasushi Mizuno
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Scanner matching for standard and freeform illumination shapes using FlexRay
Author(s): J. Bekaert; L. Van Look; K. D'havé; B. Laenens; G. Vandenberghe; P. van Adrichem; W. Shao; J. Ghan; K. Schreel; J. T. Neumann
Show Abstract
Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography
Author(s): Hiroshi Umeda; Hiroaki Tsushima; Hidenori Watanabe; Satoshi Tanaka; Masaya Yoshino; Shinich Matsumoto; Hiroshi Tanaka; Akihiko Kurosu; Yasufumi Kawasuji; Takashi Matsunaga; Junichi Fujimoto; Hakaru Mizoguchi
Show Abstract
Hotspot fixing using ILT
Author(s): Woojoo Sim; Sunggon Jung; Hyun-Jong Lee; Sungsoo Suh; Jung-Hoon Ser; Seong-Woon Choi; Chang-Jin Kang; Thomas Cecil; Christopher Ashton; David Irby; Xin Zhou; D.H. Son; Guangming Xiao; David Kim
Show Abstract
Fast algorithm for quadratic aberration model based on cross triple correlation
Author(s): Wei Liu; Tingting Zhou; Shiyuan Liu
Show Abstract
Choosing objective functions for inverse lithography patterning
Author(s): Jue-Chin Yu; Peichen Yu
Show Abstract
Physical conversion of Stokes parameters which are multiplied by a general Mueller matrix into Jones vectors applicable to the lithographic calculation
Author(s): Hiroshi Nomura; Masanori Takahashi; Suigen Kyoh
Show Abstract
Self-aligned triple patterning for continuous IC scaling to half-pitch 15nm
Author(s): Yijian Chen; Ping Xu; Liyan Miao; Yongmei Chen; Xumou Xu; Daxin Mao; Pokhui Blanco; Chris Bencher; Raymond Hung; Chris S. Ngai
Show Abstract
Sidewall spacer quadruple patterning for 15nm half-pitch
Author(s): Ping Xu; Yongmei Chen; Yijian Chen; Liyan Miao; Shiyu Sun; Sung-Woo Kim; Ami Berger; Daxin Mao; Christ Bencher; Raymond Hung; Chris Ngai
Show Abstract
Spacer defined double patterning for (sub-)20nm half pitch single damascene structures
Author(s): Janko Versluijs; Yong Kong Siew; Eddy Kunnen; Diziana Vangoidsenhoven; Steven Demuynck; Vincent Wiaux; Harold Dekkers; Gerald Beyer
Show Abstract
Recessive self-aligned double patterning with gap-fill technology
Author(s): Yijian Chen; Xumou Xu; Yongmei Chen; Liyan Miao; Hao Chen; Pokhui Blanco; Chris S. Ngai
Show Abstract
Spatial frequency multiplication techniques towards half-pitch 10nm patterning
Author(s): Yijian Chen; Yongmei Chen; Liyan Miao; Ping Xu; Xumou Xu; Hao Chen; Pokhui Blanco; Raymond Hung; Chris S. Ngai
Show Abstract
Influence of the illumination source on model-based SRAF placement
Author(s): Rachit Gupta; Aasutosh Dave; Edita Tejnil; Srividya Jayaram; Pat LaCour
Show Abstract
Comparison of clear-field and dark-field images with optimized masks
Author(s): Robert Sinn; Thuc Dam; Bob Gleason
Show Abstract
Custom source and mask optimization for 20nm SRAM and logic
Author(s): Michael C. Smayling; Tamer H. Coskun; Vishnu Kamat
Show Abstract
Enabling 22-nm logic node with advanced RET solutions
Author(s): V. Farys; L. Depre; J. Finders; V. Arnoux; Y. Trouiller; H. Y. Liu; E. Yesilada; N. Zeggaoui; C. Alleaume
Show Abstract
Improvement of lithography process by using a FlexRay illuminator for memory applications
Author(s): Thomas Huang; Chun-Yen Huang; Tsann-Bim Chiou; Michael Hsu; Chiang-Lin Shih; Alek Chen; Ming-Kang Wei
Show Abstract
Quantification of the difference between two sources by Zernike polynomial decomposition
Author(s): C. Alleaume; E. Yesilada; V. Farys; Y. Trouiller
Show Abstract
A simple method of source optimization for advanced NAND FLASH process
Author(s): Yi-Shiang Chang; Satoshi Ogasawara; Koichi Fujii; Shigeru Hirukawa; Motokatsu Imai; Wan-Lin Kuo; Chia-Chi Lin
Show Abstract
Gradient-based fast source mask optimization (SMO)
Author(s): Jue-Chin Yu; Peichen Yu
Show Abstract
Beam shaping: top hat and customized intensity distributions for semiconductor manufacturing and inspection
Author(s): Ansgar Teipel; Lutz Aschke
Show Abstract
Source and mask optimization applications in manufacturing
Author(s): ChinTeong Lim; Vlad Temchenko; Ulrich Klostermann; Vitaliy Domnenko; Jens Schneider; Daniel Sarlette; Ingo Meusel; Dieter Kaiser; Ralf Ploss
Show Abstract
Hierarchical kernel generation for SMO application
Author(s): Jason Hsih-Chie Chang; Charlie Chung-Ping Chen; Lawrence S. Melvin
Show Abstract
High-range laser light bandwidth measurement and tuning
Author(s): Kevin O'Brien; Rui Jiang; Nora Han; Efrain Figueroa; Raj Rao; Robert J. Rafac
Show Abstract
DUV light source availability improvement via further enhancement of gas management technologies
Author(s): Daniel J. Riggs; Kevin O'Brien; Daniel J. W. Brown
Show Abstract
Focus drilling for increased process latitude in high-NA immersion lithography
Author(s): Ivan Lalovic; Jason Lee; Nakgeuon Seong; Nigel Farrar; Michiel Kupers; Hans van der Laan; Tom van der Hoeff; Carsten Kohler
Show Abstract
Compensation of mask induced aberrations by projector wavefront control
Author(s): Peter Evanschitzky; Feng Shao; Tim Fühner; Andreas Erdmann
Show Abstract
Advanced scanner matching using freeform source and lens manipulators
Author(s): Jong-Ho Lim; Kyung Kang; Sung-Man Kim; Wenjin Shao; Fei Du; Zhengfan Zhang; Zongchang Yu; John Barbuto; Venu Vellanki; Yu Cao; Ronald Goossens; Seung-Hoon Park; Chris K. Park; Stefan Hunsche; Junwei Lu
Show Abstract
Measurement of wavefront distortions in DUV optics due to lens heating
Author(s): K. Mann; A. Bayer; U. Leinhos; M. Schöneck; B. Schäfer
Show Abstract
Improved immersion scanning speed using superhydrophobic surfaces
Author(s): Arun Kumar Gnanappa; Evangelos Gogolides; Emilien Feuillet; Fabrizio Evangelista; Nina Dziomkina; Michel Riepen
Show Abstract
New 0.75 NA ArF scanning lithographic tool
Author(s): Lifeng Duan; Jianrui Cheng; Gang Sun; Yonghui Chen
Show Abstract
Investigating the performance of directional boundary layer model through staged modeling method
Author(s): Moon-Gyu Jeong; Won-Chan Lee; Seung-Hune Yang; Sung-Hoon Jang; Seong-Bo Shim; Young-Chang Kim; Chun-Suk Suh; Seong-Woon Choi; Young-Hee Kim
Show Abstract
Large scale model of wafer topography effects
Author(s): Nikolay Voznesenskiy; Hans-Jürgen Stock; Bernd Küchler; Hua Song; James Shiely; Lars Bomholt
Show Abstract
Study of model-assisted rule base SRAF for random contact
Author(s): James Moon; Byoung-Sub Nam; Cheol-Kyun Kim; Hyong-Sun Yun; Ji-Young Lee; Donggyu Yim; Sung-Ki Park
Show Abstract
Physical simulation for verification and OPC on full chip level
Author(s): Seongbo Shim; Seongho Moon; Youngchang Kim; Seongwoon Choi; Younghee Kim; Bernd Küchler; Ulrich Klostermann; Munhoe Do; Sooryoung Lee
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Mask data correction methodology in the context of model-based fracturing and advanced mask models
Author(s): Christophe Pierrat; Larry Chau; Ingo Bork
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Optimizing OPC data sampling based on "orthogonal vector space"
Author(s): Yuyang Sun; Yee Mei Foong; Yingfang Wang; Jacky Cheng; Dongqing Zhang; Shaowen Gao; Nanshu Chen; Byoung Il Choi; Antoine J. Bruguier; Mu Feng; Jianhong Qiu; Stefan Hunsche; Liang Liu; Wenjin Shao
Show Abstract
Tolerance-based OPC and solution to MRC-constrained OPC
Author(s): Yang Ping; Xiaohai Li; Stephen Jang; Denny Kwa; Yunqiang Zhang; Robert Lugg
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Study of various RET for process margin improvement in 3Xnm DRAM contact
Author(s): Hak-Yong Sim; Hyoung-Soon Yune; Yeong-Bae Ahn; James Moon; Byoung-Sub Nam; Donggyu Yim; Sung-Ki Park
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A cost-driven fracture heuristics to minimize external sliver length
Author(s): Xu Ma; Shangliang Jiang; Avideh Zakhor
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A recursive cost-based approach to fracturing
Author(s): Shangliang Jiang; Xu Ma; Avideh Zakhor
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Full-chip OPC and verification with a fast mask 3D model
Author(s): Hsu-Ting Huang; Ali Mokhberi; Huixiong Dai; Chris Ngai
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Overcome the process limitation by using inverse lithography technology with assist feature
Author(s): Yeon-Ah Shim; Sungho Jun; Jaeyoung Choi; Kwangseon Choi; Jae-won Han; Kechang Wang; John McCarthy; Guangming Xiao; Grace Dai; DongHwan Son; Xin Zhou; Tom Cecil; David Kim; Ki-Ho Baik
Show Abstract
Improvement on post-OPC verification efficiency for contact/via coverage check by final CD biasing of metal lines and considering their location on the metal layout
Author(s): Youngmi Kim; Jae-Young Choi; Kwangseon Choi; Jung-Hoe Choi; Sooryong Lee
Show Abstract
Performance of a bilinear photoresist model
Author(s): Anatoly Burov; Min Shi; Jiang Yan; Wenfeng Sun
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Application of an inverse Mack model for negative tone development simulation
Author(s): Weimin Gao; Ulrich Klostermann; Thomas Mülders; Thomas Schmoeller; Wolfgang Demmerle; Peter De Bisschop; Joost Bekaert
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A study of quantum lithography for diffraction limit
Author(s): Sang-Kon Kim
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Evaluating the performance of DP and EUVL by using analytical equations for resolution of optical lithography with considering required DOF
Author(s): Masato Shibuya; Kouhei Nogami; Akira Takada; Suezou Nakadate
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Lithography process control using focus and dose optimisation technique
Author(s): Nicolas Spaziani; René-Louis Inglebert; Jean Massin
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Feasibility study on the mask compensation of gate CD non-uniformity caused by etching process
Author(s): Wan Ho Kim; Ek Jen Yet; Siew Ing Yet; Boon Chun Lee
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Simulation-based scanner tuning using FlexRay capability and scatterometry
Author(s): Karsten Bubke; Matthias Ruhm; Rafael Aldana; Martin Niehoff; Xu Xie; Justin Ghan; Paul van Adrichem; Holger Bald; Paul Luehrmann; Stefan Roling; Rolf Seltmann
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