Share Email Print
cover

Proceedings of SPIE Volume 7767

Instrumentation, Metrology, and Standards for Nanomanufacturing IV
Editor(s): Michael T. Postek
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.


Volume Details

Volume Number: 7767
Date Published: 26 August 2010
Softcover: 19 papers (178) pages
ISBN: 9780819482631

Table of Contents
show all abstracts | hide all abstracts
Front Matter: Volume 7767
Author(s): Proceedings of SPIE
Fabrication of 3D nanostructures with lithographically patterned surfaces by self-folding
Author(s): Jeong-Hyun Cho; Teena James; D. H. Gracias
Show Abstract
Development of a high-speed profilometer for manufacturing inspection
Author(s): Dean M. Ljubicic; Brian Anthony
Show Abstract
Using chromatic confocal apparatus for in situ rolling thickness measurement in hot embossing process
Author(s): Yi-Chang Chen; Shu-Ping Dong; Chun-Chieh Wang; Shih Hsuan Kuo; Wei Cheng Wang; Hung-Ming Tai
Show Abstract
Nanometer-level alignment using interferometric-spatial-phase-imaging (ISPI) during silicon nanowire growth
Author(s): Pornsak Srisungsitthisunti; Euclid E. Moon; Chookiat Tansarawiput; Huaichen Zhang; Minghao Qi; Xianfan Xu
Show Abstract
Assessment of the mechanical integrity of silicon and diamond-like-carbon coated silicon atomic force microscope probes
Author(s): Jingjing Liu; David S. Grierson; Kumar Sridharan; Robert W. Carpick; Kevin T. Turner
Show Abstract
Reference metrology for nanotechnology: significance, challenges and solutions
Author(s): Vladimir Ukraintsev; Bill Banke
Show Abstract
Multipurpose instrument calibration standard for particle beam, scanned probe and optical microscopy: NIST reference material (RM) 8820
Author(s): Michael T. Postek; András E. Vladar; William Keery; Michael Bishop; Benjamin Bunday; John Allgair
Show Abstract
Conductive carbon nanotubes for semiconductor metrology
Author(s): Victor Vartanian; Paul McClure; Vladimir Mancevski; Joseph J. Kopanski; Philp D. Rack; Ilona Sitnitsky; Matthew D. Bresin; Vince LaBella; Kathleen Dunn
Show Abstract
Step height measurement by using heterodyne central fringe identification technique
Author(s): W. T. Wu; H. C. Hsieh; Y. L. Chen; W. Y. Chang; D. C. Su
Show Abstract
Readjusting image sharpness by numerical parametric lenses in Forbes-representation and Halton sampling for selective refocusing in digital holographic microscopy
Author(s): S. Stuerwald; R. Schmitt
Show Abstract
Limits of IR-spectrometers based on linear variable filters and detector arrays
Author(s): Benjamin R. Wiesent; Daniel G. Dorigo; Alexander W. Koch
Show Abstract
Spectral response of photopic instruments with traceability to lamps
Author(s): J. G. Suarez-Romero; R. Salas-Zuñiga; J. B. Hurtado-Ramos
Show Abstract
Applications of Mueller polarimetry in the Fourier space for overlay characterization in microelectronics
Author(s): Clement Fallet; Sandeep Manhas; Antonello de Martino; Tatiana Novikova
Show Abstract
3D metrology system with internal calibration
Author(s): D. Härter; C. Müller; H. Reinecke
Show Abstract
Magnetic measurement of pulsed laser-induced nanomagnetic arrays using Surface Magneto-Optic Kerr Effect
Author(s): N. Shirato; H. Krishna; A. K. Gangopadhyay; R. Kalyanaraman
Show Abstract
A proposal to solve the problem of lack of concordance in the measurement of temperature when using different radiators
Author(s): J. C. Solorio-Leyva; J. G. Suárez-Romero; J. B. Hurtado-Ramos
Show Abstract
An overlapping technique to measure the parallelism of surface elements in a large area based on comparison goniometer
Author(s): Zhi-shan Wang; Yue-jin Zhao; Zhuo Li; Liquan Dong; Xuhong Chu
Show Abstract
Linewidth control for optical heterodyne beat of 850-nm vertical cavity surface emitting lasers
Author(s): Akifumi Konishi; Takao Ohara; Wakao Sasaki
Show Abstract
Investigation of the metrological properties of a 3-D microprobe with optical detection system
Author(s): F. G. Balzer; N. Hofmann; N. Dorozhovets; T. Hausotte; E. Manske; G. Jäger
Show Abstract
Readjusting image sharpness by numerical parametric lenses in Forbes-representation and Halton sampling for selective refocusing in digital holographic microscopy - Errata
Author(s): S. Stuerwald; R. Schmitt
Show Abstract

© SPIE. Terms of Use
Back to Top