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Proceedings of SPIE Volume 7748

Photomask and Next-Generation Lithography Mask Technology XVII
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Volume Details

Volume Number: 7748
Date Published: 24 May 2010
Softcover: 74 papers (696) pages
ISBN: 9780819482389

Table of Contents
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Front Matter: Volume 7748
Author(s): Proceedings of SPIE
Short-range electron backscattering from EUV masks
Author(s): Hiroyoshi Tanabe; Tsukasa Abe; Yuichi Inazuki; Naoya Hayashi
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Increased productivity of repair verification by offline analysis of aerial images
Author(s): Ernesto Villa; Luca Sartelli; Hiroyuki Miyashita; Thomas Scheruebl; Rigo Richter; Thomas Thaler
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Fabrication of ridge-and-groove servo pattern consisting of self-assembled dots for high-density bit patterned media
Author(s): Yoshiyuki Kamata; Akira Kikitsu; Naoko Kihara; Seiji Morita; Kaori Kimura; Haruhiko Izumi
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Aberration-aware robust mask design with level-set-based inverse lithography
Author(s): Yijiang Shen; Ngai Wong; Edmund Y. Lam
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Monitor technology of outer circumstances for mask EB writing system
Author(s): H. Hoshi; N. Samoto; H. Manabe; O. Wakimoto; S. Iida; M. Yamabe
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Evaluation of mask manufacturing efficiency using mask data rank information
Author(s): Kokoro Kato; Masakazu Endo; Tadao Inoue; Masaki Yamabe; Shigetoshi Nakatake
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Perspectives of CMOS technology and future requirements
Author(s): Tohru Mogami
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EUV mask inspection with 193 nm inspector for 32 and 22 nm HP
Author(s): Daniel Wack; Qiang Q. Zhang; Gregg Inderhees; Dan Lopez
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Future application of e-beam repair tool beyond 3X generation
Author(s): Shingo Kanamitsu; Takashi Hirano
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CMP dummy pattern based on VSB writer load
Author(s): Wakahiko Sakata; Isaku Osawa; Shogo Narukawa; Tadahiko Takikawa; Hiroshi Mohri
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New critical dimension uniformity measurement concept based reticle inspection tool
Author(s): Kangjoon Seo; MunSik Kim; Sang Chul Kim; JaeCheon Shin; ChangYeol Kim; John Miller; Aditya Dayal; Trent Hutchinson; KiHun Park
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Haze risk reduced mask manufacturing process
Author(s): Pavel Nesladek; Valentine Baudiquez; Eugen Foca; Björn Sass
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Machine specific fracture optimization for JEOL e-beam mask writer
Author(s): Johnny Yeap; Raghava Kondepudy; Parikshit Kulkarni; Yuichi Kawase; Russell Cinque
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Large scale flash memory system (LSFMS) for photomask defect inspection machine
Author(s): Satoshi Yamamoto; Ravi Pai; Manish Ranade; Soumen Mondal; Sundeep Prabhu; Gen Kurosaki
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Extraction and utilization of the repeating patterns for CP writing in mask making
Author(s): Masahiro Shoji; Tadao Inoue; Masaki Yamabe
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Evaluation of throughput improvement and character projection in multi-column-cell E-beam exposure system
Author(s): Akio Yamada; Yoshihisa Oae; Tatsuro Okawa; Masahiro Takizawa; Masaki Yamabe
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Mask inspection system with variable sensitivity and printability verification function
Author(s): Takafumi Inoue; Kenichi Takahara; Hideo Tsuchiya; Masakazu Tokita; Tadao Inoue; Masaki Yamabe
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New type of haze formation on masks fabricated with Mo-Si blanks
Author(s): E. Foca; A. Tchikoulaeva; B. Sass; C. West; P. Nesladek; R. Horn
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The relationship between mounting pressure and time on final photomask flatness
Author(s): Takashi Mizoguchi; Monica Barrett; Satoshi Akutagawa; Michael Caterer; Robert Nolan; Dennis Plouffe; Nancy Zhou
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Evaluation of easily removable pellicle adhesive
Author(s): Nancy Zhou; Monica Barrett; Robert Nolan; Dennis Plouffe; Jason Ritter; Alfred Wagner; Michael Caterer; Takashi Mizoguchi; Satoshi Akutagawa; Kevin Duong; Corbin Imai; C. B. Wang
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Through-pellicle defect repair for advanced photomasks
Author(s): Tod Robinson; Roy White; Ron Bozak; Jeff LeClaire; Mike Archuletta; David Lee
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Nanomachining of non-orthogonal mask patterns
Author(s): Tod Robinson; Daniel Yi; Roy White; Ron Bozak; Mike Archuletta; David Lee
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W-CMOS blanking device for projection multibeam lithography
Author(s): Michael Jurisch; Mathias Irmscher; Florian Letzkus; Stefan Eder-Kapl; Christof Klein; Hans Loeschner; Walter Piller; Elmar Platzgummer
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Point-source approach of source-mask optimization
Author(s): Weimin Gao; Satyendra Sethi; Vitaliy Domnenko; Wolfgang Hoppe; Wolfgang Demmerle; Kevin Lucas
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Inspecting EUV mask blanks with a 193-nm system
Author(s): Joshua Glasser; Stan Stokowski; Gregg Inderhees
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Design compliant source mask optimization (SMO)
Author(s): Robert Socha; Tejas Jhaveri; Mircea Dusa; Xiaofeng Liu; Luoqi Chen; Stephen Hsu; Zhipan Li; Andrzej J. Strojwas
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Preserving the mask integrity for the lithography process
Author(s): Sherjang Singh; Peter Dress; Uwe Dietze
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Efficient OASIS.MASK reader
Author(s): Domingo Morales; Juan Pablo Canepa; Daniel Cohen
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The large contour data generation from divided image of photomask pattern of 32 nm and beyond
Author(s): Tsutomu Murakawa; Yoshiaki Ogiso; Toshimichi Iwai; Jun Matsumoto; Takayuki Nakamura
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A novel pattern error detecting algorithm for SEM images of mask monitoring patterns
Author(s): Yoonna Oh; Jae-Pil Shin; Jin Choi; Jong-Bae Lee; Moon-Hyun Yoo
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eMET: development of a 50 keV electron projection multibeam mask exposure tool for the 16nm hp technology node and below
Author(s): Elmar Platzgummer; Stefan Cernusca; Christof Klein; Samuel Kvasnica; Bernd Sonalkar; Hans Loeschner
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Contact mask LER impact on lithographic performance
Author(s): Tatsuya Nagatomo; Mitsuharu Yamana; Katsuhisa Morinaga; Masaru Higuchi; Shunsuke Sato; Tsuyoshi Tanaka
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Efficiently writing circular contacts on production reticle
Author(s): Aki Fujimura; Christophe Pierrat; Taiichi Kiuchi; Tadashi Komagata; Yasutoshi Nakagawa
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Best depth of focus on 22-nm logic wafers with less shot count
Author(s): Aki Fujimura; David Kim; Tadashi Komagata; Yasutoshi Nakagawa; Vikram Tolani; Tom Cecil
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Study of etching process for LER and resolution
Author(s): Tomohiro Imoto; Yosuke Kojima; Norihito Fukugami; Takashi Haraguchi; Tsuyoshi Tanaka
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Fast and highly accurate simulation of the printing behavior of EUV multilayer defects based on different models
Author(s): Feng Shao; Peter Evanschitzky; Kristian Motzek; Andreas Erdmann
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Assessing equipment and process related electrostatic risks to reticles with E-Reticle system
Author(s): Richard Tu; Thomas Sebald
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Practical resist model calibration for e-beam direct write processes
Author(s): Martin Schulz; Hans-Jürgen Stock; Ulrich Klostermann; Wolfgang Hoppe; Lars Bomholt; Philipp Jaschinsky; Kang-Hoon Choi; Manuela Gutsch; Holger Sailer; Stephan Martens
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Evaluation of a next generation EB mask writer for hp 32nm lithography
Author(s): Tadashi Komagata; Takahisa Hasegawa; Kazuya Goto; Kenji Kono; Ryuuji Yamamoto; Naoki Nishida; Yasutoshi Nakagawa
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Extension of optical lithography by mask-litho integration with computational lithography
Author(s): T. Takigawa; K. Gronlund; J. Wiley
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The fusion of metrology and inspection: challenges and solutions
Author(s): Masaru Higuchi
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Defect reduction of patterned media templates and disks
Author(s): Kang Luo; Steven Ha; John Fretwell; Rick Ramos; Zhengmao Ye; Gerard Schmid; Dwayne LaBrake; Douglas J. Resnick; S. V. Sreenivasan
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Writing wavy metal 1 shapes on 22-nm logic wafers with less shot count
Author(s): Harold R. Zable; Aki Fujimura; Tadashi Komagata; Yasutoshi Nakagawa; John S. Petersen
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Evaluation of transfer of particles from dual-pod base plate to EUV mask
Author(s): Masami Yonekawa; Kazuya Ota; Takao Taguchi; Osamu Suga
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Evaluation of metrology capabilities of mask inspection equipment
Author(s): T. Touya; S. Tamamushi; N. Takamatsu
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FIB-CVD technology for EUV mask repair
Author(s): Tsuyoshi Amano; Noriaki Takagi; Hiroyuki Shigemura; Tsuneo Terasawa; Osamu Suga; Kensuke Shiina; Fumio Aramaki; Tomokazu Kozakai; Osamu Matsuda; Anto Yasaka
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Advanced mask-to-mask overlay analysis for next generation technology node reticles
Author(s): Klaus-Dieter Roeth; Frank Laske; Karl-Heinrich Schmidt; Dieter Adam; Oliver Ache; David Ilsen
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Defect inspection and repair performance comparisons between EUV and conventional masks
Author(s): Kazunori Seki; Masafumi Shibita; Takashi Yoshii; Tsukasa Fujimoto; Yo Sakata; Shinji Akima
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Thin absorber EUV mask with light-shield border of etched multilayer and its lithographic performance
Author(s): Takashi Kamo; Hajime Aoyama; Yukiyasu Arisawa; Kazuo Tawarayama; Toshihiko Tanaka; Osamu Suga
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Characterization of line-width roughness about 22-32nm node EUV mask
Author(s): Yuichi Inazuki; Tsukasa Abe; Tadahiko Takikawa; Hiroshi Mohri; Naoya Hayashi
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Challenges in flare correction in EUVL lithography for half pitch 22-nm generation
Author(s): Taiga Uno; Yukiyasu Arisawa; Hajime Aoyama; Toshihiko Tanaka
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PROVE, the next generation registration metrology tool: status report
Author(s): Dirk Beyer; Patricia Gabella; Greg Hughes; Gerd Klose; Norbert Rosenkranz
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Study on counting error in particle inspection
Author(s): Mitsuaki Amemiya; Kazuya Ota; Takao Taguchi; Osamu Suga
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Pinhole defect study and process optimization
Author(s): Won-Hee Chae; Guen-Ho Hwang; Soon-Kyu Seo; Dae-Han Kim; Dong-Heok Lee; Moon-Hwan Choi; Sang-Soo Choi; Dong-Gun Kim; Doo-Hoon Geum; Gi-Su Nam
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Performance and stability of mask process correction for EBM-7000
Author(s): Yasuko Saito; George Chen; Jen-Shiang Wang; Shufeng Bai; Rafael Howell; Jiangwei Li; Jun Tao; Doug VanDenBroeke; Jim Wiley; Tadahiro Takigawa; Takayuki Ohnishi; Takashi Kamikubo; Shigehiro Hara; Hirohito Anze; Yoshiaki Hattori; Shuichi Tamamushi
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Actinic EUVL mask blank inspection capability with time delay integration mode
Author(s): Takeshi Yamane; Toshihiko Tanaka; Tsuneo Terasawa; Osamu Suga
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Two-fluid cleaning technology for advanced photomask
Author(s): Yuji Nagashima; Koichi Higuchi; Tsutomu Kikuchi; Yoshiaki Kurokawa; Harumichi Hirose; Mikio Nonaka
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Productivity improvement of high resolution inspection mode on TeraScan 597XR
Author(s): Hidemichi Imai; Takeshi Kosuge; Kei Mesuda; Eiji Tsujimoto; Hideyoshi Takamizawa
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E-beam writing time improvement for inverse lithography technology mask for full-chip
Author(s): Guangming Xiao; Dong Hwan Son; Tom Cecil; Dave Irby; David Kim; Ki-Ho Baik; Byung-Gook Kim; SungGon Jung; Sung Soo Suh; HanKu Cho
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Computational inspection applied to a mask inspection system with advanced aerial imaging capability
Author(s): Amir Sagiv; Aviram Tam; Wolf Staud; Linyong Pang; Danping Peng; Lin He; Dongxue Chen; Thuc Dam; Vikram Tolani
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Evaluation of novel EUV mask inspection technologies
Author(s): Shmoolik Mangan; Aya Kantor; Nir Shoshani; Asaf Jaffe; Dror Kasimov; Vladislav Kudriashov; Ran Brikman; Lior Shoval; Anoop Sreenath
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Evolution of etch profile and CD variation in maskmaking and SPT: simulations using TRAVIT software
Author(s): Sergey Babin; Konstantin Bay
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Requirements of e-beam size and position accuracy for photomask of sub-32 nm HP device
Author(s): Jin Choi; Sang Hee Lee; Hee Bom Kim; Byung Gook Kim; Sang-Gyun Woo; Han Ku Cho
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Mask writing time explosion and its effect on CD control in e-beam lithography
Author(s): Sang Hee Lee; Jin Choi; Seong Jun Min; Hee Bom Kim; Byung Gook Kim; Sang-Gyun Woo; Han-Ku Cho
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Effect of EUV exposure upon surface residual chemicals on EUV mask surface
Author(s): Han-Shin Lee; Jaehyuck Choi; DonGun Lee; Hyungho Ko; SeongSu Kim; Chan-Uk Jeon; HanKu Cho
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The optical CD metrology for EUV mask
Author(s): Jin-Back Park; Kyoung-Yoon Bang; Dong-Gun Lee; Hae-Young Jeong; Seung-Soo Kim; Han-Ku Cho
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Results from a new 193nm die-to-database reticle inspection platform
Author(s): William H. Broadbent; David S Alles; Michael T. Giusti; Damon F. Kvamme; Rui-fang Shi; Weston L. Sousa; Robert Walsh; Yalin Xiong
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Improvement of KrF contact layer by inverse lithography technology with assist feature
Author(s): Sungho Jun; Yeon-Ah Shim; Jaeyoung Choi; Kwangsun Choi; Jae-won Han; Kechang Wang; John McCarthy; Guangming Xiao; Grace Dai; DongHwan Son; Xin Zhou; Tom Cecil; David Kim; KiHo Baik
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Effective-exposure-dose monitoring technique in EUV lithography
Author(s): Yumi Nakajima; Kentaro Kasa; Takashi Sato; Masafumi Asano; Suigen Kyoh; Hiroyuki Mizuno
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Development of computational spacer patterning technology
Author(s): Hiromitsu Mashita; Takafumi Taguchi; Fumiharu Nakajima; Katsumi Iyanagi; Toshiya Kotani; Shoji Mimotogi; Soichi Inoue
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Compensating for image placement errors for the HP 3X nm node
Author(s): Eui Sang Park; Sang Pyo Kim; Tae Joong Ha; Chang Reol Kim
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Fine pixel SEM image for EUV mask pattern 3D quality assurance based on lithography simulation
Author(s): Eiji Yamanaka; Masamitsu Itoh; Masaya Kato; Kusuo Ueno; Kyouhei Hayashi; Akira Higuchi; Naoya Hayashi
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Challenges for quality 15nm groove patterning with ZEP520A for a master fabrication for track pitch 50nm full-surface DTR-Media
Author(s): Hiromasa Iyama; Kazuhiro Hamamoto; Shuji Kishimoto; Masasuke Nakano; Takeshi Kagatsume; Takashi Sato; Hideo Kobayashi; Tsuyoshi Watanabe
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Photomask defect detection and inspection: aerial imaging and high resolution inspection strategies
Author(s): Sunghyun Oh; DaeHo Hwang; Inpyo Kim; Changreol Kim; Aviram Tam; Michael Ben Yishai; Yulian Wolff
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