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Proceedings of SPIE Volume 7545

26th European Mask and Lithography Conference
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Volume Details

Volume Number: 7545
Date Published: 14 May 2010
Softcover: 26 papers (314) pages
ISBN: 9780819479419

Table of Contents
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Front Matter: Volume 7545
Author(s): Proceedings of SPIE
Update on next generation metrology tool for DPL reticles
Author(s): Klaus-Dieter Roeth; Jochen Bender; Frank Laske; Dieter Adam; Karl-Heinrich Schmidt
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Efficient simulation of three-dimensional EUV masks for rigorous source mask optimization and mask induced imaging artifact analysis
Author(s): P. Evanschitzky; T. Fühner; F. Shao; A. Erdmann
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Projection mask-less lithography and nanopatterning with electron and ion multi-beams
Author(s): Christof Klein; Elmar Platzgummer; Hans Loeschner
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Low voltage resist processes developed for MAPPER tool first exposures
Author(s): D. Rio; C. Constancias; J. van Nieuwstadt; J. Vijverberg; S. Derrough; B. Icard; L. Pain
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Mask phase and transmission variation effects on wafer critical dimensions for nodes 65nm and 45nm
Author(s): F. Dufaye; S. Gough; F. Sundermann; V. Farys; H. Miyashita; L. Sartelli; F. Perissinotti; U. Buttgereit; S. Perlitz; R. Birkner
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193nm resist deprotection study from outgassing measurements by TD-GCMS/FID
Author(s): Raluca Tiron; Samir Derrough; Hervé Fontaine; Sylviane Cetre; Damien Perret; James W. Thackeray; Patrick Paniez
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Template masters for substrate conformal imprint lithography generated by charged particle nanopatterning techniques
Author(s): Falco van Delft; Robert van de Laar; Marc Verschuuren; Elmar Platzgummer; Hans Loeschner
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Positive or negative tone resist for a T-NIL/UVL hybrid process
Author(s): Saskia Möllenbeck; Niocolas Bogdanski; Andre Mayer; Hella-Christin Scheer
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Modified dose correction strategy for better pattern contrast
Author(s): R. Galler; D. Melzer; M. Boettcher; M. Krueger; M. Suelzle; C. Wagner
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Deep-UV KrF lithography for the fabrication of Bragg gratings on SOI rib waveguides
Author(s): J. Bauer; D. Stolarek; L. Zimmermann; I. Giuntoni; U. Haak; H. Richter; S. Marschmeyer; A. Gajda; J. Bruns; K. Petermann; B. Tillack
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e-beam induced EUV photomask repair: a perfect match
Author(s): M. Waiblinger; K. Kornilov; T. Hofmann; K. Edinger
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Overview of IP error compensation techniques for EUVL
Author(s): Pradeep Vukkadala; Deepak Patil; Roxann L. Engelstad
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Study of real defects on EUV blanks and a strategy for EUV mask inspection
Author(s): Sungmin Huh; Abbas Rastegar; Stefan Wurm; Kenneth Goldberg; Iacopo Mochi; Toshio Nakajima; Masahiro Kishimoto; Mitsuhiko Komakine
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Rigorous EMF simulation of absorber shape variations and their impact on lithographic processes
Author(s): Z. Rahimi; A. Erdmann; P. Evanschitzky; C. Pflaum
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A 193nm microscope for CD metrology for the 32nm node and beyond
Author(s): Bernd Bodermann; Zhi Li; Frank Pilarski; Detlef Bergmann
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Proximity effect correction sensitivity analysis
Author(s): Alex Zepka; Rainer Zimmermann
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Defect inspection with an EUV microscope
Author(s): Stefan Herbert; Aleksey Maryasov; Larissa Juschkin; Rainer Lebert; Klaus Bergmann
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Increasing mask yield through repair yield enhancement utilizing the MeRiT
Author(s): Anthony Garetto; Jens Oster; Markus Waiblinger; Klaus Edinger
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Study of the molecular contaminants deposition on Cr, MoSi and SiO[sub]2[/sub] surfaces representative of photomasks layers
Author(s): Hervé Fontaine; Sylviane Cetre; Gaël Demenet; Fabien Piallat
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Deployment of OASIS in the semiconductor industry: status, dependencies, and outlook
Author(s): Joseph C Davis; Steffen Schulze; Sai Fu; Yijun Tong
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Multi-shaped beam data preparation
Author(s): U. Weidenmueller; H.-J. Doering; R. Jaritz; D. Melzer; A. Stoeckel
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Impact of mask absorber on EUV imaging performance
Author(s): Eelco van Setten; Cheuk Wah Man; Rogelio Murillo; Sjoerd Lok; Koen van Ingen Schenau; Kees Feenstra; Christian Wagner
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Checkerboard pattern for PSF parameter determination in electron beam lithography
Author(s): Manuela Gutsch; Kang-Hoon Choi; Martin Freitag; Marc Hauptmann; Christoph Hohle; Philipp Jaschinsky; Katja Keil
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Mask cleaning process evaluation and modeling
Author(s): Pavel Nesladek; Steve Osborne
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CD forecasting in resist by means of scatterometry
Author(s): Jan Richter
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Mask industry assessment trend analysis: 2010
Author(s): Greg Hughes; Henry Yun
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Antisticking layers on antireflective chromium for hybrid (CNP) nanoimprint molds
Author(s): R. Kirchner; B. Adolphi; R. Landgraf; W.-J. Fischer
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Contributions to EUV mask metrology infrastructure
Author(s): Azadeh Farahzadi; Rainer Lebert; Markus Benk; Larissa Juschkin; Stefan Herbert; Aleksey Maryasov
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Mask lithography for display manufacturing
Author(s): T. Sandstrom; P. Ekberg
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