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PROCEEDINGS VOLUME 7379

Photomask and Next-Generation Lithography Mask Technology XVI
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Volume Details

Volume Number: 7379
Date Published: 8 May 2009
Softcover: 89 papers (858) pages
ISBN: 9780819476562

Table of Contents
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Front Matter: Volume 7379
Author(s): Proceedings of SPIE
Litho/mask strategies for 32-nm half-pitch and beyond: using established and adventurous tools/technologies to improve cost and imaging performance
Author(s): Burn J. Lin
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The novel plasma etching process for defect reduction in photomask fabrication
Author(s): Ji-Hyun Lee; Il-Yong Jang; Yu Suk Jeong; Byounghoon Seung; Seong-Yong Moon; Sang-Gyun Woo; Han Ku Cho
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Etch characterization of binary mask dependence on mask material and resist thickness for 22nm mask fabrication
Author(s): Satoru Nemoto; Thomas Faure; Richard Wistrom; Shaun Crawford; Gary Reid; Peter Bartlau; Toru Komizo; Amy E. Zweber
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Effect of pellicle frame and adhesive material on final photomask flatness
Author(s): Nancy Zhou; Ken Racette; David Hasselbeck; Monica Barrett; Robert Nolan; Michael Caterer; Takashi Mizoguchi; Satoshi Akutagawa; Glenn Dickey; Toru Shirasaki
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Adhesion control between resist patterns and photomask blank surfaces
Author(s): Masaaki Kurihara; Sho Hatakeyama; Kouji Yoshida; Takaharu Nagai; Daisuke Totsukawa; Masaharu Fukuda; Yasutaka Morikawa; Hiroshi Mohri; Morihisa Hoga; Naoya Hayashi; Hiroyuki Ohtani; Masamichi Fujihira
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Investigation of the development process for high-precision patterning
Author(s): Junichi Watanabe; Tsukasa Yamazaki; Masahito Tanabe; Toru Komizo; Amy E. Zweber; Adam C. Smith
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Study on surface integrity in photomask resist strip and final cleaning processes
Author(s): Sherjang Singh; Stefan Helbig; Peter Dress; Uwe Dietze
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Haze growth on reticles: What's the RigHT thing to do?
Author(s): Steven M. McDonald; Daniel V. Chalom; Michael J. Green; Jeffrey A. McMurran; Michael B. Garrett; David W. Dlouhy
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SEMATECH EUVL mask program status
Author(s): Henry Yun; Frank Goodwin; Sungmin Huh; Kevin Orvek; Brian Cha; Abbas Rastegar; Patrick Kearney
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Actinic EUVL mask blank inspection and phase defect characterization
Author(s): Takeshi Yamane; Teruo Iwasaki; Toshihiko Tanaka; Tsuneo Terasawa; Osamu Suga; Toshihisa Tomie
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Improvement of EUVL mask blank inspection capability at Intel
Author(s): Andy Ma; Ted Liang; Seh-Jin Park; Guojing Zhang; Tomoya Tamura; Kazunori Omata; Yuta Sato; Hal Kusunose
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Thorough characterization of an EUV mask
Author(s): Hiroyuki Mizuno; Gregory McIntyre; Chiew-seng Koay; Martin Burkhardt; Long He; John Hartley; Corbet Johnson; Sudharshanan Raghunathan; Kenneth Goldberg; Iacopo Mochi; Bruno La Fontaine; Obert Wood
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Nano-pattern design and technology for patterned media magnetic recording
Author(s): Hiroyuki Kataoka; Yoshiyuki Hirayama; Thomas R. Albrecht; Masahito Kobayashi
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Si-mold fabrication for patterned media using high-resolution chemically amplified resist
Author(s): Masaharu Fukuda; Tsuyoshi Chiba; Mikio Ishikawa; Kimio Itoh; Masaaki Kurihara; Morihisa Hoga
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Inspection and repair for imprint lithography at 32 nm and below
Author(s): Kosta Selinidis; Ecron Thompson; S. V. Sreenivasan; Douglas J. Resnick; Marcus Pritschow; Joerg Butschke; Mathias Irmscher; Holger Sailer; Harald Dobberstein
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Implications of image plane line-edge roughness requirements on extreme ultraviolet mask specifications
Author(s): Patrick P. Naulleau; Simi A. George
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Mask-induced aberration in EUV lithography
Author(s): Yumi Nakajima; Takashi Sato; Ryoichi Inanami; Tetsuro Nakasugi; Tatsuhiko Higashiki
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Evaluation of an e-beam correction strategy for compensation of EUVL mask non-flatness
Author(s): Kevin Orvek; Jaewoong Sohn; Jin Choi; Roxann Engelstad; Sudharshanan Raghunathan; John Zimmerman; Thomas Laursen; Yoshitake Shusuke; Tsutomu Shoki
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Investigation of EUV mask defectivity via full-field printing and inspection on wafer
Author(s): Rik Jonckheere; Dieter Van Den Heuvel; Fumio Iwamoto; Nickolay Stepanenko; Alan Myers; Matt Lamantia; Anne-Marie Goethals; Eric Hendrickx; Kurt Ronse
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Smart way to determine and guarantee mask specifications: tradeoff between cost and quality
Author(s): Fumiaki Shigemitsu
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Economics of automation for the design-to-mask interface
Author(s): Wesley Erck
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Novel mask qualification methodology with die-to-database wafer inspection system
Author(s): Yoshinori Hagio; Ichirota Nagahama; Yasuo Matsuoka; Hidefumi Mukai; Koji Hashimoto
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European MEDEA+ CRYSTAL project: DFM photomasks inputs for EDA workflow task force
Author(s): Eric Beisser; Michel Tissier; David Au; Stéphane Bonniol; Patrick Garcia; Philippe Morey-Chaisemartin; Dominique Sadran; Isabelle Servin; Michel Tabusse
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Reduction of MRC error review time through the simplified and classified MRC result
Author(s): Casper W. Lee; Jason C. Lin; Frank F. Chen
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Multi-core advantages for mask data preparation
Author(s): Johnny Yeap; John Nogatch
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GPU-accelerated inverse lithography technique
Author(s): Jinyu Zhang; Yangdong Deng; Wei Xiong; Yao Peng; Zhiping Yu
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Effect of scanner illumination and lens transmittance signatures on OPC accuracy
Author(s): Hsu-Ting Huang; Apo Sezginer; Jacek K. Tyminski
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Lithography compliance check considering neighboring cell structures for robust cell design
Author(s): Masahiro Miyairi; Shigeki Nojima; Shimon Maeda; Katsuyoshi Kodera; Ryuji Ogawa; Satoshi Tanaka
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The imaging performance of flash memory masks characterized with AIMS
Author(s): Eelco van Setten; Onno Wismans; Kees Grim; Jo Finders; Mircea Dusa; Robert Birkner; Rigo Richter; Thomas Scherübl
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An evaluation of a new side-wall-angle measurement technique for mask patterns by CD-SEM
Author(s): Hidemitsu Hakii; Isao Yonekura; Masashi Kawashita; Yosuke Kojima; Yoshifumi Sakamoto; Keishi Tanaka
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Calibration strategies for precision stages in state-of-the-art registration metrology
Author(s): Alexander Huebel; Uwe Schellhorn; Michael Arnz; Gerd Klose; Dirk Beyer
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In-die mask registration metrology for 32nm node DPT lithography
Author(s): Klaus-Dieter Roeth; Frank Laske; Michael Heiden; Dieter Adam; Artur Boesser; Klaus Rinn; André Schepp; Jochen Bender
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Phase behavior through pitch and duty cycle and its impact on process window
Author(s): Ute Buttgereit; Robert Birkner; Dirk Seidel; Sascha Perlitz; Vicky Philipsen; Peter De Bisschop
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E-beam shot count estimation at 32 nm HP and beyond
Author(s): Jin Choi; Sang Hee Lee; Dongseok Nam; Byung Gook Kim; Sang-Gyun Woo; Han Ku Cho
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Present status of multi-column cell exposure system for mask writing
Author(s): Hiroshi Yasuda; Akio Yamada; Masaki Yamabe
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Mask and wafer evaluation of Sigma7500 pattern generator applied to 65nm logic metal and via layers
Author(s): Frank Liu; Irene Shi; Qingwei Liu; Likeit Zhu; Shirley Zhao; Eric Guo
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Reduction of resist charging effect by EB reticle writer EBM-7000
Author(s): Masato Saito; Kunihiro Ugajin; Osamu Ikenaga
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Mask-LMC: lithographic simulation and defect detection from high-resolution mask images
Author(s): George Chen; James N. Wiley; Jen-Shiang Wang; Rafael C. Howell; Shufeng Bai; Yi-Fan Chen; Frank Chen; Yu Cao; Tadahiro Takigawa; Terunobu Kurosawa; Hideo Tsuchiya; Kinya Usuda; Masakazu Tokita; Fumio Ozaki; Nobutaka Kikuiri; Yoshitake Tsuji
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Implementation strategy of wafer-plane and aerial-plane inspection for advanced mask manufacture
Author(s): Won-Sun Kim; Dong-Hoon Chung; Chan-Uk Jeon; HanKu Cho; William Huang; John Miller; Gregg Inderhees; Becky Pinto; Jiuk Hur; Kihun Park; Jay Han
Show Abstract
Mask defect auto disposition based on aerial image in mask production
Author(s): C. Y. Chen; Laurent Tuo; C. S. Yoo; Linyong Pang; Danping Peng; Jin Sun
Show Abstract
Airborne molecular contamination detection method for photomasks and ultra purging decontamination
Author(s): Hisanori Kambara; Arnaud Favre; Magali Davenet; Dan Rodier
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A new approach to reticle haze defect management in the fab
Author(s): Yeu-Dong Gau; Kevin Hsiao; Wen-Hao Hsu; Yu-Min Lu; Chun-Chieh Chen; Chen Min Liu; Mike Van Riet; Noah Gaspar; Chien-Chun Yu; Phillip Chan
Show Abstract
Advances in post AFM repair cleaning of photomask with CO2 cryogenic aerosol technology
Author(s): Charles Bowers; Ivin Varghese; Mehdi Balooch; Werner Brandt
Show Abstract
Selective removal of persistent particles with no photomask damage
Author(s): Tod Robinson; Ron Bozak; Roy White; Mike Archuletta; David Lee
Show Abstract
Comparison of lithographic performance between MoSi binary mask and MoSi attenuated PSM
Author(s): Mitsuharu Yamana; Matthew Lamantia; Vicky Philipsen; Shingo Wada; Tatsuya Nagatomo; Yoji Tonooka
Show Abstract
Trade-off between inverse lithography mask complexity and lithographic performance
Author(s): Byung-Gook Kim; Sung Soo Suh; Byung-Sung Kim; Sang-Gyun Woo; Han-Ku Cho; Vikram Tolani; Grace Dai; Dave Irby; Kechang Wang; Guangming Xiao; David Kim; Ki-Ho Baik; Bob Gleason
Show Abstract
Double patterning addressing imaging challenges for near- and sub-k1=0.25 node layouts
Author(s): Beom-Seok Seo; Dae-Kwon Kang; Myung-Soo Noh; Sung-Ho Lee; Christopher Cork; Gerald LukPat; Alexander Miloslavsky; Xiaohai Li; Kevin Lucas; Sooryong Lee
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Novel OPC and DfM methodology for 3D memory device
Author(s): Takafumi Taguchi; Toshiya Kotani; Hidefumi Mukai; Hiromitsu Mashita; Katsumi Iyanagi; Koji Hashimoto; Soichi Inoue
Show Abstract
High sensitivity electric field monitoring system for control of field-induced CD degradation in reticles (EFM)
Author(s): Thomas Sebald; Gavin Rider
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Evaluation of the flatness effects of mask backing and orientation during photomask pellicle mount
Author(s): Takashi Mizoguchi; Satoshi Akutagawa; Monica Barrett; Michael Caterer; Robert Nolan; Kenneth Racette; Dennis Plouffe; Nancy Zhou
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Evaluation for EAPSM life time by ArF pellicle characteristic
Author(s): Kang Joon Seo; Ji Sun Ryu; Goo Min Jeong; Shin Cheol Kang; Yong Dae Kim; Sang Chul Kim; Chang Yeol Kim
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In situ selectivity monitor for dry etch of photomasks
Author(s): Tiecheng Zhou; Jeff Chen; Michael Grimbergen; Madhavi Chandrachood; Ibrahim Ibrahim; Ajay Kumar
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Plasma optical emission analysis for chamber condition monitor
Author(s): Zhigang Mao; Tiecheng Zhou; Michael Grimbergen; Darin Bivens; David Knick; Renee Koch; Madhavi Chandrachood; Jeff Chen; Ibrahim Ibrahim; Ajay Kumar
Show Abstract
Fine pattern fabrication property of binary mask and attenuated phase shift mask
Author(s): Taichi Yamazaki; Yosuke Kojima; Mitsuharu Yamana; Takashi Haraguchi; Tsuyoshi Tanaka
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Applied analytics on EAPSM Cr plasma etch optimization utilizing design of experiment
Author(s): Ming Jing Tian; Eugene Wang; Zhen Hua Zhu
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Study of electric-field-induced-development method
Author(s): Masatoshi Terayama; Hideaki Sakurai; Mari Sakai; Masamitsu Ito; Osamu Ikenaga; Hideo Funakoshi; Takahiro Shiozawa; Syoutarou Miyazaki; Yoshihiko Saito; Naoya Hayashi
Show Abstract
Improvement of data transfer speed and development of an EB data verification system in a VSB mask writer
Author(s): Osamu Wakimoto; Hironobu Manabe; Hiromichi Hoshi; Norihiko Samoto; Tadashi Komagata; Yasutoshi Nakagawa; Masaki Yamabe
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Quantification of electron-beam proximity effects using a virtual direct write environment
Author(s): Martin Schulz; Peter Brooker; Alex Zepka; Gary Meyers
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A new optical measurement method for verifying the exact change of thin films on the QZ blanks with ellipsometer
Author(s): Songbae Moon; Seong-Yoon Kim; Gyung-Yoon Bang; Byung-Gook Kim; Sang-Gyun Woo; Han-ku Cho
Show Abstract
CD performance evaluation according to advanced marking parameter
Author(s): Suk-Ky Yoon; Seung-Yun Kim; Kyoeong-Mee Yeon; Chan Lim; Sung-Jin Choi; Ja-Hwa Kim; Lee-Ju Kim; Young-Rok Cho; Hong-Seok Kim
Show Abstract
Phase-shift/transmittance measurements in a micro pattern using MPM193EX
Author(s): Hiroto Nozawa; Takayuki Ishida; Satoru Kato; Osamu Sato; Koji Miyazaki; Kiwamu Takehisa; Naoki Awamura; Hideo Takizawa; Hal Kusunose
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Reticle inspection-based critical dimension uniformity
Author(s): Venu Vellanki; Carl Hess; Gang Pan; Chunlin Chen; Gregg Inderhees; Daniel Lopez
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An open-architecture approach to defect analysis software for mask inspection systems
Author(s): Mark Pereira; Ravi R. Pai; Murali Mohan Reddy; Ravi M. Krishna
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The study of defect detection method for 32nm technology node and beyond
Author(s): Kazunori Seki; Masafumi Shibita; Shinji Akima
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Variable sensitivity detection (VSD) technology for screening SRAF nuisance defects
Author(s): Kyoji Yamashita; Nobuyuki Harabe; Masatoshi Hirono; Yukio Tamura; Ikunao Isomura; Yoshitake Tsuji; Eiji Matsumoto
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A study of mask inspection method with pattern priority and printability check
Author(s): Masakazu Tokita; Hideo Tsuchiya; Takafumi Inoue; Tadao Inoue; Masaki Yamabe
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TeraScanXR: a high sensitivity and throughput photomask inspection system
Author(s): Bo Mu; Aditya Dayal; Arosha Goonesekera; Phillip Lim; Chunlin Chen; Po Liu; Kevin Yeung; Becky Pinto; Bill Broadbent; Gregg Inderhees
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A noble evaluation method for repaired area utilizing SEM images
Author(s): Keiko Morishita; Shingo Kanamitsu; Takashi Hirano
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Semi-automated repair verification of aerial images
Author(s): Eric Poortinga; Thomas Schereubl; Rigo Richter
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Novel absorber materials for EUV lithography mask
Author(s): Tadashi Matsuo; Koichiro Kanayama; Yasuhiro Okumoto
Show Abstract
The impact of mask design on EUV imaging
Author(s): Thomas Schmoeller; Jacek K. Tyminski; John Lewellen; Wolfgang Demmerle
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Study of CD variation at EUV mask fabrication occurred by electric conduction from top to back side
Author(s): Kosuke Takai; Koji Murano; Kazuki Hagihara; Masamitsu Itoh; Tsukasa Abe; Takashi Adachi; Hideo Akizuki; Tadahiko Takikawa; Hiroshi Mohri; Naoya Hayashi
Show Abstract
Actinic mask inspection using an extreme ultraviolet microscope
Author(s): Kei Takase; Yoshito Kamaji; Takafumi Iguchi; Takashi Sugiyama; Toshiyuki Uno; Tetsuo Harada; Takeo Watanabe; Hiroo Kinoshita
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Evaluation of EUVL mask pattern defect inspection using 199nm inspection tool with super-resolution method
Author(s): Hiroyuki Shigemura; Tsuyoshi Amano; Yasushi Nishiyama; Osamu Suga; Yukiyasu Arisawa; Hideaki Hashimoto; Kenichi Takahara; Kinya Usuda; Nobutaka Kikuiri; Ryoichi Hirano
Show Abstract
FIB mask repair technology for EUV mask
Author(s): Tsuyoshi Amano; Yasushi Nishiyama; Hiroyuki Shigemura; Tsuneo Terasawa; Osamu Suga; Kensuke Shiina; Fumio Aramaki; Anto Yasaka; Tsukasa Abe; Hiroshi Mohri
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Go proton: investigation on mask patterning for the 22nm hp node using a ML2 multibeam system
Author(s): Joerg Butschke; Mathias Irmscher; Holger Sailer; Hans Loeschner; Elmar Platzgummer
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Developing quartz wafer mold manufacturing process for patterned media
Author(s): Tsuyoshi Chiba; Masaharu Fukuda; Mikio Ishikawa; Kimio Itoh; Masaaki Kurihara; Morihisa Hoga
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Progress of UV-NIL template making
Author(s): Takaaki Hiraka; Jun Mizuochi; Yuko Nakanishi; Satoshi Yusa; Shiho Sasaki; Yasutaka Morikawa; Hiroshi Mohri; Naoya Hayashi
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Model-based assist feature insertion for sub-40nm memory device
Author(s): Sungsoo Suh; Suk-joo Lee; Seong-woon Choi; Sung-Woo Lee; Chan-hoon Park
Show Abstract
Optimizing computing resources for optimal throughput in a mask data preparation flow
Author(s): Weidong Zhang; Ron Bennett; Pradiptya Ghosh; Steffen Schulze; Amanda Bowhill
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Model-based assist features
Author(s): Bayram Yenikaya; Oleg Alexandrov; Steven Chen; Anwei Liu; Ali Mokhberi; Apo Sezginer
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Evaluation of mask data format standard OASIS.MASK developed for mask tools
Author(s): Toshio Suzuki; Yoshinori Nagaoka; Yumiko Maenaka; Venu Vellanki; Wayne Ruch; Masayoshi Mori; Keiko Hattori; Kunihiro Hosono; Shogo Narukawa; Morihisa Hoga; Hiroshi Mohri
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Utilization of design intent information for mask manufacturing (II)
Author(s): Kokoro Kato; Masakazu Endo; Tadao Inoue; Masaki Yamabe
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Study of the pattern categorization method in verification of OPC pattern
Author(s): Mitsufumi Naoe; Toru Miyauchi; Seiji Makino; Koichi Suzuki; Masakazu Oseki; Tomoyuki Okada
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Organized DFM
Author(s): Takashi Sato; Michio Honma; Hiroyuki Itoh; Nobuyuki Iriki; Sachiko Kobayashi; Norihiko Miyazaki; Toshio Onodera; Hiroyuki Suzuki; Nobuyuki Yoshioka; Sumika Arima; Kazuya Kadota
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Automated reticle inspection data analysis for wafer fabs
Author(s): Derek Summers; Gong Chen; Bryan Reese; Trent Hutchinson; Marcus Liesching; Hai Ying; Russell Dover
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The art of photomask materials for low-k1-193nm lithography
Author(s): Masahiro Hashimoto; Hiroyuki Iwashita; Hideaki Mitsui
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Two-fluid cleaning technology for advanced photomask
Author(s): Tsutomu Kikuchi; Nobuo Kobayashi; Yoshiaki Kurokawa; Harumichi Hirose; Mikio Nonaka
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Improvement of simulation accuracy using a non Gaussian kernel
Author(s): Hiroki Futatsuya; Tomohiko Yamamoto; Satoshi Yoshikawa; Tatsuo Chijimatsu; Satoru Asai
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