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Proceedings of SPIE Volume 7042

Instrumentation, Metrology, and Standards for Nanomanufacturing II
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Volume Details

Volume Number: 7042
Date Published: 28 August 2008
Softcover: 17 papers (200) pages
ISBN: 9780819472625

Table of Contents
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Front Matter: Volume 7042
Author(s): Proceedings of SPIE
Metrology at the nanoscale: what are the grand challenges?
Author(s): Kevin W. Lyons; Michael T. Postek
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Ultra low capacitance high frequency IC probe
Author(s): M. E. Jacob; D. A. Miller; L. Forbes
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High-speed AFM probe with micromachined membrane tip
Author(s): Byungki Kim; Byung Hyung Kwak; Faize Jamil
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Improved performance of an ultrastable measurement platform using a field-programmable gate array for real-time deterministic control
Author(s): Allison B. Churnside; Gavin M. King; Ashley R. Carter; Thomas T. Perkins
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Self-calibration of a dual-actuated single-axis nanopositioner using measurement transitivity with extensions to calibration of two-axis systems
Author(s): Young Hun Jeong; Jingyan Dong; Placid P. Ferreira
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Measurement of optical near field of a nanoscale aperture
Author(s): Rui Guo; Wenhao Huang; Edward C. Kinzel; Arvind Raman; Xianfan Xu
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Test objects with right-angled and trapezoidal profiles of the relief elements
Author(s): Yu. A. Novikov; V. P. Gavrilenko; A. V. Rakov; P. A. Todua
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Check of the quality of fabrication of test objects with a trapezoidal profile
Author(s): P. A. Todua; V. P. Gavrilenko; Yu. A. Novikov; A. V. Rakov
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Accuracy considerations for critical dimension semiconductor metrology
Author(s): N. G. Orji; R. G. Dixson; B. D. Bunday; J. A. Allgair
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Extraction of trench geometry and linewidth of nanoscale grating targets in (110)-oriented silicon using angle-resolved scatterometry
Author(s): Heather J. Patrick; Thomas A. Germer; Michael W. Cresswell; Bin Li; Huai Huang; Paul S. Ho
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Measurement of the parameters of the electron beam of a scanning electron microscope
Author(s): V. P. Gavrilenko; Yu. A. Novikov; A. V. Rakov; P. A. Todua
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Cellulose nanocrystals the next big nano-thing?
Author(s): Michael T. Postek; Andras Vladar; John Dagata; Natalia Farkas; Bin Ming; Ronald Sabo; Theodore H. Wegner; James Beecher
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Measurement of oxide barrier-film thickness of Al alloy by electrochemical impedance spectroscopy at the nanometre scale
Author(s): K. Habib
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Toward in situ x-ray diffraction imaging at the nanometer scale
Author(s): Nadia A. Zatsepin; Ruben A. Dilanian; Andrei Y. Nikulin; Brian M. Gable; Barry C. Muddle; Osami Sakata
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Laser diagnostics for flame synthesis of nanostructured materials: instrumentation, metrology, and process control (retraction notice)
Author(s): Xiaofei Liu
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Three-dimensional x-ray diffraction nanoscopy
Author(s): Andrei Y. Nikulin; Ruben A. Dilanian; Nadia A. Zatsepin; Barry C. Muddle
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Silica nanoparticle inline size measurement using refractive index gradient in a microfluidic cell
Author(s): Yi Qiao; Dave Hofeldt; Brian Graebel; John Ramthun; Michael Dolezal
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