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Proceedings of SPIE Volume 6921

Emerging Lithographic Technologies XII
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Volume Details

Volume Number: 6921
Date Published: 29 April 2008
Softcover: 117 papers (1144) pages
ISBN: 9780819471062

Table of Contents
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Front Matter: Volume 6921
Author(s): Proceedings of SPIE
Selete's EUV program: progress and challenges
Author(s): Ichiro Mori; Osamu Suga; Hiroyuki Tanaka; Iwao Nishiyama; Tsuneo Terasawa; Hiroyuki Shigemura; Takao Taguchi; Toshihiko Tanaka; Toshiro Itani
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Breaking the limits: combination of electron beam lithography and nanoimprint lithography for production of next-generation magnetic media and optical media
Author(s): Babak Heidari; Marc Beck
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Study of nanoimprint lithography for applications toward 22nm node CMOS devices
Author(s): Ikuo Yoneda; Shinji Mikami; Takumi Ota; Takeshi Koshiba; Masamitsu Ito; Tetsuro Nakasugi; Tatsuhiko Higashiki
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Fabrication and test of nano crossbar switches/MOSFET hybrid circuits by imprinting lithography
Author(s): Zhiyong Li; Xuema Li; Douglas A. A. Ohlberg; Joseph Straznicky; Wei Wu; Zhaoning Yu; Julien Borghetti; William Tong; Duncan Stewart; R. Stanley Williams
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Full-field imprinting of sub-40 nm patterns
Author(s): Jeongho Yeo; Hoyeon Kim; Ben Eynon
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Minimizing linewidth roughness for 22-nm node patterning with step-and-flash imprint lithography
Author(s): Gerard M. Schmid; Niyaz Khusnatdinov; Cynthia B. Brooks; Dwayne LaBrake; Ecron Thompson; Douglas J. Resnick
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Chemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions
Author(s): Frances A. Houle; Ann Fornof; Dolores C. Miller; Simone Raoux; Hoa Truong; Eva Simonyi; Christopher Jahnes; Stephen Rossnagel
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Dual damascene BEOL processing using multilevel step and flash imprint lithography
Author(s): Brook H. Chao; Frank Palmieri; Wei-Lun Jen; D. Hale McMichael; C. Grant Willson; Jordan Owens; Rich Berger; Ken Sotoodeh; Bruce Wilks; Joseph Pham; Ronald Carpio; Ed LaBelle; Jeff Wetzel
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Sub-wavelength optical diffraction and photoacoustic metrologies for the characterisation of nanoimprinted structures
Author(s): T. Kehoe; J. Bryner; V. Reboud; N. Kehagias; S. Landis; C. Gourgon; J. Vollmann; J. Dual; C. M. Sotomayor Torres
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Interfacial adhesion studies for step and flash imprint lithography
Author(s): Michael W. Lin; Daniel J. Hellebusch; Kai Wu; Eui Kyoon Kim; Kuan Lu; Li Tao; Kenneth M. Liechti; John G. Ekerdt; Paul S. Ho; Walter Hu; C. Grant Willson
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Etching of 42 nm and 32 nm half-pitch features patterned using step and Flash imprint lithography
Author(s): Cynthia B. Brooks; Dwayne L. LaBrake; Niyaz Khusnatdinov
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EBDW technology for EB shuttle at 65nm node and beyond
Author(s): T. Maruyama; M. Takakuwa; Y. Kojima; Y. Takahashi; K. Yamada; J. Kon; M. Miyajima; A. Shimizu; Y. Machida; H. Hoshino; H. Takita; S. Sugatani; H. Tsuchikawa
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Gate edge roughness in electron beam direct write and its influence to device characteristics
Author(s): Kang-Hoon Choi; Rok Dittrich; Matthias Goldbach; Christoph Hohle; Katja Keil; Thomas Marschner; Mark Tesauro; Frank Thrum; Roy Zimmermann; Johannes Kretz
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Patterning fidelity on low-energy multiple-electron-beam direct write lithography
Author(s): S. M. Chang; S. J. Lin; C. A. Lin; J. H. Chen; T. S. Gau; Burn J. Lin; P. Veltman; R. Hanfoug; E. Slot; M. J. Wieland; B. J. Kampherbeek
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High throughput maskless lithography: low voltage versus high voltage
Author(s): S. W. H. K. Steenbrink; B. J. Kampherbeek; M. J. Wieland; J. H. Chen; S. M. Chang; M. Pas; J. Kretz; C. Hohle; D. van Steenwinckel; S. Manakli; J. Le-Denmat; L. Pain
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Performance of the full field EUV systems
Author(s): Hans Meiling; Edwin Boon; Nico Buzing; Kevin Cummings; Olav Frijns; Judy Galloway; Mieke Goethals; Noreen Harned; Bas Hultermans; Roel de Jonge; Bart Kessels; Peter Kürz; Sjoerd Lok; Martin Lowisch; Joerg Mallman; Bill Pierson; Kurt Ronse; James Ryan; Emil Smitt-Weaver; Michael Tittnich; Christian Wagner; Andre van Dijk; John Zimmerman
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Nikon EUVL development progress update
Author(s): Takaharu Miura; Katsuhiko Murakami; Kazuaki Suzuki; Yoshiaki Kohama; Kenji Morita; Kazunari Hada; Yukiharu Ohkubo; Hidemi Kawai
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Canon's development status of EUVL technologies
Author(s): Shigeyuki Uzawa; Hiroyoshi Kubo; Yoshinori Miwa; Toshihiko Tsuji; Hideki Morishima; Kazuhiko Kajiyama; Takayuki Hasegawa
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Imaging performance of the EUV alpha semo tool at IMEC
Author(s): G. F. Lorusso; J. Hermans; A. M. Goethals; B. Baudemprez; F. Van Roey; A. M. Myers; I. Kim; B. S. Kim; R. M. Jonckheere; A. Niroomand; S. Lok; A. Van Dijk; J.-F. de Marneffe; S. Demuynck; D. Goossens; K. Ronse
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The use of EUV lithography to produce demonstration devices
Author(s): Bruno LaFontaine; Yunfei Deng; Ryoung-Han Kim; Harry J. Levinson; Sarah McGowan; Uzodinma Okoroanyanwu; Rolf Seltmann; Cyrus Tabery; Anna Tchikoulaeva; Tom Wallow; Obert Wood; John Arnold; Don Canaperi; Matthew Colburn; Kurt Kimmel; Chiew-Seng Koay; Erin Mclellan; Dave Medeiros; Satyavolu Papa Rao; Karen Petrillo; Yunpeng Yin; Hiroyuki Mizuno; Sander Bouten; Michael Crouse; Andre van Dijk; Youri van Dommelen; Judy Galloway; Sang-In Han; Bart Kessels; Brian Lee; Sjoerd Lok; Brian Niekrewicz; Bill Pierson; Robert Routh; Emil Schmit-Weaver; Kevin Cummings; James Word
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Development status of projection optics and illumination optics for EUV1
Author(s): Katsuhiko Murakami; Tetsuya Oshino; Hiroyuki Kondo; Hiroshi Chiba; Hideki Komatsuda; Kazushi Nomura; Hiromitsu Iwata
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Smoothing properties of single and multilayer coatings: a method to smoothen substrates
Author(s): A. J. R. van den Boogaard; E. Louis; E. Zoethout; S. Alonso van der Westen; F. Bijkerk; S. Müllender
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CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography
Author(s): Akira Endo; Hideo Hoshino; Takashi Suganuma; Krzysztof Nowak; Tatsuya Yanagida; Takayuki Yabu; Takeshi Asayama; Yoshifumi Ueno; Masato Moriya; Masaki Nakano; Hiroshi Someya; Toshihiro Nishisaka; Tamotsu Abe; Georg Soumagne; Hiroshi Komori; Hakaru Mizoguchi; Akira Sumitani; Koichi Toyoda
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Progress on Xe-DPP source development for alpha phase
Author(s): Masaki Yoshioka; Denis Bolshukhin; Guido Hergenhan; Jürgen Kleinschmidt; Vladimir Korobochko; Guido Schriever; Max C. Schürmann; Chinh Duc Tran; Christian Ziener
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Sn DPP source-collector modules: status of alpha resources, beta developments, and the scalability to HVM
Author(s): Marc Corthout; Rolf Apetz; Jesko Brudermann; Marcel Damen; Günther Derra; Oliver Franken; Jeroen Jonkers; Jürgen Klein; Felix Küpper; Arnaud Mader; Willi Neff; Hans Scheuermann; Guido Schriever; Max Schürmann; Guido Seimons; Rob Snijkers; Dominik Vaudrevange; Erik Wagenaars; Peiter van de Wel; Masaki Yoshioka; Peter Zink; Oliver Zitzen
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Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions
Author(s): K. Nishihara; A. Sunahara; A. Sasaki; S. Fujioka; Y. Shimada; M. Nunami; H. Tanuma; M. Murakami; T. Aota; K. Fujima; H. Furukawa; T. Nishikawa; F. Koike; R. More; T. Kato; V. Zhakhovskii; K. Gamata; H. Ueda; H. Nishimura; Y. Yuba; K. Nagai; N. Miyanaga; Y. Izawa; K. Mima
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Characteristics of a minimum-debris optimum conversion efficiency tin-based LPP source
Author(s): Bob Rollinger; Davide Bleiner; Ndaona Chokani; Reza S. Abhari
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Thermal and optical characterization of collectors integrated in a Sn-DPP based SoCoMo
Author(s): Giovanni Bianucci; Adam Brunton; Gian Luca Cassol; Giorgio Pirovano; Fabio Zocchi; Arnaud Mader; Oliver Franken; Klaus Bergmann; Hans Scheuermann; Peter Zink
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Multidimensional simulation and optimization of hybrid laser and discharge plasma devices for EUV lithography
Author(s): A. Hassanein; V. Sizyuk; T. Sizyuk
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Radiation-induced defect formation and reactivity of model TiO2 capping layers with MMA: a comparison with Ru
Author(s): B. V. Yakshinskiy; M. N. Hedhili; S. Zalkind; M. Chandhok; Theodore E. Madey
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Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials
Author(s): Sungmin Huh; Hoon Kim; Gisung Yoon; Jaehyuck Choi; Han-Shin Lee; Dong Gun Lee; Byungsup Ahn; Hwan-Seok Seo; Dongwan Kim; Seoung Sue Kim; Han Ku Cho; Takeo Watanabe; Hiroo Kinoshita
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Carbon contamination of EUV mask: film characterization, impact on lithographic performance, and cleaning
Author(s): Yasushi Nishiyama; Toshihisa Anazawa; Hiroaki Oizumi; Iwao Nishiyama; Osamu Suga; Kazuki Abe; Satoru Kagata; Akira Izumi
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Accelerated lifetime metrology of EUV multilayer mirrors in hydrocarbon environments
Author(s): S. B. Hill; N. S. Faradzhev; C. Tarrio; T. B. Lucatorto; T. E. Madey; B. V. Yakshinskiy; E. Loginova; S. Yulin
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Mo/Si multilayers with enhanced TiO2- and RuO2-capping layers
Author(s): Sergiy Yulin; Nicolas Benoit; Torsten Feigl; Norbert Kaiser; Ming Fang; Manish Chandhok
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Smoothing based fast model for images of isolated buried EUV multilayer defects
Author(s): Chris H. Clifford; Andrew R. Neureuther
Show Abstract
Aberration budget in extreme ultraviolet lithography
Author(s): Yumi Nakajima; Takashi Sato; Ryoichi Inanami; Tetsuro Nakasugi; Tatsuhiko Higashiki
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EUV pattern shift compensation strategies
Author(s): T. Schmoeller; T. Klimpel; I. Kim; G. F. Lorusso; A. Myers; R. Jonckheere; A. M. Goethals; K. Ronse
Show Abstract
Study of system performance in SFET
Author(s): Naosuke Nishimura; Gaku Takahashi; Toshihiko Tsuji; Hideki Morishima; Kazuhiko Kajiyama; Shigeyuki Uzawa
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MAGIC: a European program to push the insertion of maskless lithography
Author(s): L. Pain; B. Icard; S. Tedesco; B. Kampherbeek; G. Gross; C. Klein; H. Loeschner; E. Platzgummer; R. Morgan; S. Manakli; J. Kretz; C. Holhe; K.-H. Choi; F. Thrum; E. Kassel; W. Pilz; K. Keil; J. Butschke; M. Irmscher; F. Letzkus; P. Hudek; A. Paraskevopoulos; P. Ramm; J. Weber
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Shot minimization for throughput improvement of character projection electron beam direct writing
Author(s): Hai Pham Dinh Minh; Tetsuya Iizuka; Makoto Ikeda; Kunihiro Asada
Show Abstract
Shaped beam technique using a novel 3rd-order imaging approach
Author(s): Tadashi Kotsugi; Takashi Fuse; Hidetoshi Kinoshita; N. William Parker
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Proton beam writing: a platform technology for nano-integration
Author(s): J. A. van Kan; F. Zhang; A. A. Bettiol; F. Watt
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Resolution, LER, and sensitivity limitations of photoresists
Author(s): Gregg M. Gallatin; Patrick Naulleau; Dimitra Niakoula; Robert Brainard; Elsayed Hassanein; Richard Matyi; Jim Thackeray; Kathleen Spear; Kim Dean
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Evaluation of EUV resist materials for use at the 32 nm half-pitch node
Author(s): Thomas Wallow; Craig Higgins; Robert Brainard; Karen Petrillo; Warren Montgomery; Chiew-Seng Koay; Greg Denbeaux; Obert Wood; Yayi Wei
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Extreme ultraviolet resist outgassing and its effect on nearby optics
Author(s): Gregory Denbeaux; Rashi Garg; Chimaobi Mbanaso; Justin Waterman; Leonid Yankulin; Alin Antohe; Yu-Jen Fan; Warren Montgomery; Kim Dean; Kevin Orvek; Andrea Wüest; Yayi Wei; Frank Goodwin; Obert Wood; Chiew-Seng Koay; Eric Gullikson; Andy Aquila; Charles Tarrio; Steven Grantham; Saša Bajt
Show Abstract
Quantitative measurement of outgas products from EUV photoresists
Author(s): C. Tarrio; B. A. Benner; R. E. Vest; S. Grantham; S. B. Hill; T. B. Lucatorto; J. H. Hendricks; P. Abbott; G. Denbeaux; C. Mbanaso; A. Antohe; K. Orvek; K.-W. Choi
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Film quantum yields of EUV and ultra-high PAG photoresists
Author(s): Elsayed Hassanein; Craig Higgins; Patrick Naulleau; Richard Matyi; Gregg Gallatin; Gregory Denbeaux; Alin Antohe; Jim Thackeray; Kathleen Spear; Charles Szmanda; Christopher N. Anderson; Dimitra Niakoula; Matthew Malloy; Anwar Khurshid; Cecilia Montgomery; Emil C. Piscani; Andrew Rudack; Jeff Byers; Andy Ma; Kim Dean; Robert Brainard
Show Abstract
Dependence of EUV mask printing performance on blank architecture
Author(s): Rik Jonckheere; Yoonsuk Hyun; Fumio Iwamoto; Bart Baudemprez; Jan Hermans; Gian Francesco Lorusso; Ivan Pollentier; Anne-Marie Goethals; Kurt Ronse
Show Abstract
Ion beam deposition for defect-free EUVL mask blanks
Author(s): Patrick Kearney; C. C. Lin; Takashi Sugiyama; Chan-Uk Jeon; Rajul Randive; Ira Reiss; Renga Rajan; Paul Mirkarimi; Eberhard Spiller
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Determining the critical size of EUV mask substrate defects
Author(s): Hakseung Han; Wonil Cho; Kenneth A. Goldberg; Eric M. Gullikson; Chan-Uk Jeon; Stefan Wurm
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Status of EUV reticle handling solution in meeting 32 nm HP EUV lithography
Author(s): Long He; Stefan Wurm; Phil Seidel; Kevin Orvek; Ernie Betancourt; Jon Underwood
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Sub 50 nm cleaning-induced damage in EUV mask blanks
Author(s): Abbas Rastegar; Sean Eichenlaub; Vivek Kapila; Arun John Kadaksham; Pat Marmillion
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EUV source development at Energetiq
Author(s): Paul A. Blackborow; Matthew J. Partlow; Stephen F. Horne; Matthew M. Besen; Donald K. Smith; Deborah S. Gustafson
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EUV mask inspection tool using high NA DUV inspection tool
Author(s): Yongkyoo Choi; Sunghyun Oh; Munsik Kim; Yongdae Kim; Changreol Kim
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NIL mold manufacturing using self-organized diblock copolymer as patterning template
Author(s): Naoko Kihara; Hiroyuki Hieda; Katsuyuki Naito
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Integration of polymer self-assembly for lithographic application
Author(s): Joy Y. Cheng; Daniel P. Sanders; Ho-Cheol Kim; Linda K. Sundberg
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Rapid directed self-assembly of Lamellar microdomains from a block copolymer containing hybrid
Author(s): Ho-Cheol Kim; Joy Cheng; Oun-Ho Park; Sang-Min Park; Ricardo Ruiz; Charles T. Black; Jed Pitera; Charles Rettner; Myron Flickner
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Device-oriented directed self-assembly of Lamellar microdomains from a block copolymer containing hybrid
Author(s): Ho-Cheol Kim; Joy Cheng; Oun-Ho Park; Sang-Min Park; Charles Rettner
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Nano patterning with a single high-transmission nano-metal aperture system
Author(s): Yongwoo Kim; Sinjeung Park; Eungman Lee; Jae W. Hahn
Show Abstract
Etch-less UV-NIL process for patterning photonic crystal structure onto OLED substrate
Author(s): Jun-ho Jeong; Sohee Jeon; Jongyoup Shim; Jae Ryoun Youn; Hyung-Dol Park; Jae-Wook Kang; Jang-Joo Kim; Ki-don Kim; Dae-geun Choi; Junhyuk Choi; Dong-Il Lee; Ali Ozhan Altun; Soon-won Lee; Eung-sug Lee; Se-Heon Kim; Yong-Hee Lee
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A photolithographic process for grossly nonplanar substrates
Author(s): Gavin L. Williams; Richard P. McWilliam; Jesus Toriz-Garcia; Richard Curry; Andrew Maiden; N. Luke Seed; Alan Purvis; Peter A. Ivey
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Submicron patterning on flexible substrates by reduction optical lithography
Author(s): Wim J. M. de Laat; Mária Péter; François Furthner; Peter T. M. Giesen; Cheng-Qun Gui; Erwin R. Meinders
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High resolution nanoimprint templates for dual damascene: fabrication and imprint results
Author(s): Mathias Irmscher; Joerg Butschke; Ron Carpio; Brook Chao; Wei-Lun Jen; Corinna Koepernik; Lorenz Nedelmann; Jordan Owens; Frank Palmieri; Marcus Pritschow; Christian Reuter; Holger Sailer; Ken Satoodeh; Jeff Wetzel; Bruce Wilks; Grant Willson
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Porosity characteristics of ultra-low dielectric insulator films directly patterned by nano-imprint lithography
Author(s): Hyun Wook Ro; Ronald L. Jones; Huagen Peng; Hae-Jeong Lee; Eric K. Lin; Alamgir Karim; Do Y. Yoon; David W. Gidley; Christopher L. Soles
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High resolution defect inspection of step and flash imprint lithography for 32 nm half-pitch patterning
Author(s): I. McMackin; J. Perez; K. Selinidis; J. Maltabes; D. Resnick; S. V. Sreenivassan
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A method for fabricating below 22nm feature patterns in quartz mold
Author(s): Atsunori Terasaki; Junichi Seki; Haruhito Ono
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E-beam direct write alignment strategies for the next generation node
Author(s): H. Alves; P. Hahmann; K.-H. Kliem; U. Weidenmueller; S. Jahr; C. G. Frase; D. Gnieser; H. Bosse; R. Zimmermann; C. Arndt
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MAPPER: high throughput maskless lithography
Author(s): E. Slot; M. J. Wieland; G. de Boer; P. Kruit; G. F. ten Berge; A. M. C. Houkes; R. Jager; T. van de Peut; J. J. M. Peijster; S. W. H. K. Steenbrink; T. F. Teepen; A. H. V. van Veen; B. J. Kampherbeek
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Projection maskless lithography (PML2): proof-of-concept setup and first experimental results
Author(s): C. Klein; E. Platzgummer; H. Loeschner; G. Gross; P. Dolezel; M. Tmej; V. Kolarik; W. Klingler; F. Letzkus; J. Butschke; M. Irmscher; M. Witt; W. Pilz
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Simulation of robustness of a new e-beam column with the 3rd-order imaging technique
Author(s): K. Takeya; T. Fuse; H. Kinoshita; N. William Parker
Show Abstract
Applying photolithography-friendly design to e-beam direct writing in 65-nm node and beyond
Author(s): Hiromi Hoshino; Kozo Ogino; Yasuhide Machida; Masaaki Miyajima; Takashi Maruyama; Yoshinori Kojima; Shinji Sugatani
Show Abstract
Diblock copolymer directed self-assembly for CMOS device fabrication
Author(s): Li-Wen Chang; Marissa A. Caldwell; H.-S. Philip Wong
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An ultra-narrow FinFET poly-Si gate structure fabricated with 193nm photolithography and in-situ PR/BARC and TEOS hard mask etching
Author(s): Wen-Shiang Liao; Cheng-Han Wu; Mao-Chyuan Tang; Sheng-Yi Huang; Tommy Shih; Yue-Gie Liaw; Kun-Ming Chen; Tung-Hung Chen; Huan-Chiu Tsen; Lee Chung
Show Abstract
Diffraction feature of microlens array with a small aperture size
Author(s): Seungryong Park; Jinho Park; Hakyu Choi; Young-Je Yun; Kwangseon Choi; Jeahee Kim
Show Abstract
Scattering of EUV optics: substrate, coating, and degradation effects
Author(s): Sven Schröder; Nicolas Benoit; Torsten Feigl; Angela Duparré; Andreas Tünnermann
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Progress in extreme ultraviolet interferometric lithography at the University of Wisconsin
Author(s): Artak Isoyan; Yang-Chun Cheng; Fan Jiang; John Wallace; Mikhail Efremov; Paul Nealey; Franco Cerrina
Show Abstract
Advanced diffuser technology helps reduce vent-up times while maintaining wafer integrity on vacuum tools loadlock chambers
Author(s): Chris Vroman; Chris Quartaro; Marshall Randolph
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Characterization of extreme ultraviolet emission from tin-droplets irradiated with Nd:YAG laser plasmas
Author(s): Tatsuya Aota; Yuki Nakai; Shinsuke Fujioka; Etsuo Fujiwara; Masashi Shimomura; Hiroaki Nishimura; Nobukatsu Nishihara; Noriaki Miyanaga; Yasukazu Izawa; Kunioki Mima
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EUV wavefront measurement of six-mirror optics using EWMS
Author(s): K. Sugisaki; M. Okada; K. Otaki; Y. Zhu; J. Kawakami; K. Murakami; C. Ouchi; M. Hasegawa; S. Kato; T. Hasegawa; H. Yokota; T. Honda; M. Niibe
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Evaluation result of Selete's exposure tool: impact of the source performance
Author(s): Kazuo Tawarayama; Shunko Magoshi; Hajime Aoyama; Yuusuke Tanaka; Seiichiro Shirai; Hiroyuki Tanaka
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Parametric tradeoffs in laser plasma sources for EUV lithography: debris versus radiators
Author(s): Davide Bleiner; Bob Rollinger; Reza S. Abhari
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Low density targets for laser-produced-plasma (LPP) extreme ultraviolet light source with high-CE and toward high-repletion supply
Author(s): Keiji Nagai; Liqin Ge; Pejun Cai; Cao Pan; ZhongZe Gu; Takayoshi Norimatsu; Hiroaki Nishimura; Katsunobu Nishihara; Noriaki Miyanaga; Yasukazu Izawa; Kinioki Mima
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EUV and debris characteristics of a laser-plasma tin dioxide nano-particle colloidal jet target
Author(s): Masanori Kaku; Sumihiro Suetake; Yusuke Senba; Masahito Katto; Shoichi Kubodera
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Magnetic debris mitigation of a CO2 laser-produced Sn plasma
Author(s): Yoshifumi Ueno; Georg Soumagne; Masato Moriya; Takashi Suganuma; Tamotsu Abe; Hiroshi Komori; Akira Endo; Akira Sumitani
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Sn droplet target development for laser produced plasma EUV light source
Author(s): Masaki Nakano; Takayuki Yabu; Hiroshi Someya; Tamotsu Abe; Georg Soumagne; Akira Endo; Akira Sumitani
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LPP EUV light source employing high power C02 laser
Author(s): Hideo Hoshino; Takashi Suganuma; Takeshi Asayama; Krzysztof Nowak; Masato Moriya; Tamotsu Abe; Akira Endo; Akira Sumitani
Show Abstract
Plasma Sn cleaning integrated in EUV source system
Author(s): H. Shin; R. Raju; D. N. Ruzic
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Modeling of EUV emission and conversion efficiency from laser-produced tin plasmas for nanolithography
Author(s): S. S. Harilal; J. J. MacFarlane; I. E. Golovkin; P. R. Woodruff; P. Wang
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EUV optics contamination studies in presence of selected hydrocarbons
Author(s): R. Garg; A. Wüest; E. Gullikson; S. Bajt; G. Denbeaux
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Ionic debris assessment of various EUVL systems
Author(s): C. H. Castano; D. N. Ruzic; S. N. Srivastava; K. C. Thompson; J. Sporre
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NEG (non evaporable getter) pumps for organic compounds and water removal in EUVL tools
Author(s): A. Conte; P. Manini; S. Raimondi
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Performance and lifetime of EUV source collectors measured with a full size EUV collector reflectometer
Author(s): Ulf Hinze; Boris N. Chichkov; Torsten Feigl; Uwe D. Zeitner; Christoph Damm; Denis Bolshukhin; Jürgen Kleinschmidt; Guido Schriever; Max-Christian Schürmann
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Phenomenological analysis of carbon deposition rate on the multilayer mirror
Author(s): Takahiro Nakayama; Hiromitsu Takase; Shigeru Terashima; Takashi Sudo; Yutaka Watanabe; Yasuaki Fukuda; Katsuhiko Murakami; Shintaro Kawata; Takashi Aoki; Shuichi Matsunari; Yukinobu Kakutani; Masahito Niibe
Show Abstract
Protection from surface oxidation of Ru capping layers for EUVL projection optics mirrors by introducing hydrocarbon gas
Author(s): Keigo Koida; Masahito Niibe; Yukinobu Kakutani; Shuichi Matsunari; Takashi Aoki; Shigeru Terashima; Takahiro Nakayama; Hiromitsu Takase; Yasuaki Fukuda
Show Abstract
Lithium debris removal by sputtering and evaporation for EUV optics and applications
Author(s): M. J. Neumann; M. J. Cruce; D. N. Ruzic
Show Abstract
Surface phenomena related to degradation of EUV mirrors: interaction of ethyl alcohol with ruthenium surfaces
Author(s): B. V. Yakshinskiy; Iwao Nishiyama; Andrea Wüest; Theodore E. Madey
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Particle-contamination analysis for reticles in carrier inner pods
Author(s): John R. Torczynski; Michael A. Gallis; Daniel J. Rader
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Flare evaluation for 32-nm half pitch using SFET
Author(s): Hajime Aoyama; Yuusuke Tanaka; Takashi Kamo; Nobuyuki Iriki; Yukiyasu Arisawa; Toshihiko Tanaka
Show Abstract
EUV simulation extension study for mask shadowing effect and its correction
Author(s): Hoyoung Kang; Steve Hansen; Jan van Schoot; Koen van Ingen Schenau
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Model-based pupil-fill optimization for the SEMATECH Berkeley EUV microfield exposure tool
Author(s): Jonathan S. Nation; Patrick P. Naulleau
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Effects of aberration and flare on lithographic performance of SFET
Author(s): Yuusuke Tanaka; Hajime Aoyama; Kazuo Tawarayama; Shunko Magoshi; Seiichiro Shirai; Hiroyuki Tanaka
Show Abstract
Vacuum induced photoresist outgassing
Author(s): Justin Waterman; Chimaobi Mbanaso; Gregory Denbeaux
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Investigation of sensitivity of extreme ultraviolet resists to out-of-band radiation
Author(s): Chimaobi Mbanaso; Gregory Denbeaux; Kim Dean; Robert Brainard; Seth Kruger; Elsayed Hassanein
Show Abstract
Proximity printing using extreme ultraviolet radiation
Author(s): R. Garg; P. Naulleau; R. Brainard; G. Denbeaux
Show Abstract
Advanced extreme ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool
Author(s): Patrick P. Naulleau; Christopher N. Anderson; Jerrin Chiu; Kim Dean; Paul Denham; Kenneth A. Goldberg; Brian Hoef; Sungmin Huh; Gideon Jones; Bruno M. LaFontaine; Andy Ma; Dimitra Niakoula; Joo-on Park; Tom Wallow
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Benchmarking of commercial EUVL resists at SEMATECH
Author(s): Andy Ma; Joo-on Park; Kim Dean; Stefan Wurm; Patrick Naulleau
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Evaluation of TiO2-SiO2 ultra-low-expansion glass fabricated by the soot method using the line-focus-beam ultrasonic material characterization system
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