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Proceedings of SPIE Volume 6617

Modeling Aspects in Optical Metrology
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Volume Details

Volume Number: 6617
Date Published: 18 June 2007
Softcover: 41 papers (424) pages
ISBN: 9780819467591

Table of Contents
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Front Matter: Volume 6617
Author(s): Proceedings of SPIE
Simulation of the detectors response of an autocollimator
Author(s): Gerald Fütterer
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Capabilities and limitations of paraxial operator approach for modeling of nano-scale feature evaluation
Author(s): Alexander Normatov; Boris Spektor; Joseph Shamir
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Modeling image formation on pixelated devices for vision systems using wave-front coding
Author(s): Salvador Bosch; Francesc Gómez-Morales; Guillem Carles; Josep Ferré-Borrull
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Lateral shear and digital holographic microscopy to check dynamic behaviour of biological cell
Author(s): Lisa Miccio; Simonetta Grilli; Sergio De Nicola; Andrea Finizio; Pietro Ferraro
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Multiple multipole program analysis of metallic optical waveguides
Author(s): Christian Hafner; Xudong Cui; Andre Bertolace; Rüdiger Vahldieck
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Sharp trench waveguide bend with photonic crystals: simulation, fabrication and characterisation
Author(s): Xudong Cui; Christian Hafner; Franck Robin; Daniel Erni; Kakhaber Tavzarashvili; Ruediger Vahldieck
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Frequency-domain simulations of optical antenna structures
Author(s): Christian Hafner; Xudong Cui; Andre Bertolace; Rüdiger Vahldieck
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Effect of broadband illumination on reconstruction error of phase retrieval in optical metrology
Author(s): Gregory R. Brady; James R. Fienup
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Phase retrieval using a random amplitude mask for wavefront sensing
Author(s): Arun Anand; Giancarlo Pedrini; Wolfgang Osten; Percival Almoro
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The optical vortex interferometer with a wavefront division
Author(s): Jan Masajada; Agnieszka Popiołek-Masajada; Monika Leniec
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Practical implementation of the complex wavefront modulation model for optical alignment
Author(s): Hanshin Lee; Gavin B. Dalton; Ian A. J. Tosh; Sug-Whan Kim
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Robust Shack-Hartmann wavefront sensing with ultraflat microaxicons
Author(s): R. Grunwald; M. Bock; S. Huferath
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Fresnel wavefront propagation model for shearography shape measurement
Author(s): Arun Anand; Roger M. Groves; Xavier Schwab; Giancarlo Pedrini; Wolfgang Osten
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Single fringe pattern demodulation using local adaptable quadrature filters
Author(s): J. C. Estrada; M. Servin
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Adaptive MBPE algorithm for speeding up the computation
Author(s): K. Tavzarashvili; Ch. Hafner; D. Karkashadze; Xudong Cui; R. Vahldieck
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Enhancements to FDTD modeling for optical metrology applications
Author(s): Bartlomiej Salski; Malgorzata Celuch; Wojciech Gwarek
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3D simulations of electromagnetic fields in nanostructures using the time-harmonic finite-element method
Author(s): Sven Burger; Lin Zschiedrich; Frank Schmidt; Roderick Köhle; Thomas Henkel; Bernd Küchler; Christoph Nölscher
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Model-based analysis of the limits of optical metrology with experimental comparisons
Author(s): R. M. Silver; R. Attota; E. Marx
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In-chip overlay metrology for 45nm processes
Author(s): Y. S. Ku; H. L. Pang; N. P. Smith; L. Binns
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Comparison of rigorous modelling of different structure profiles on photomasks for quantitative linewidth measurements by means of UV- or DUV-optical microscopy
Author(s): Gerd Ehret; Bernd Bodermann; Martin Woehler
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In-line etching process control using dynamic scatterometry
Author(s): Sébastien Soulan; Maxime Besacier; Tanguy Leveder; Patrick Schiavone
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Optical scatterometry with analytic approaches applied to periodic nano-arrays including anisotropic layers
Author(s): I. Abdulhalim
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Scatterometry from crossed grating structures in different configurations
Author(s): Thomas Schuster; Stephan Rafler; Wolfgang Osten; Peter Reinig; Thomas Hingst
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Numerical analysis of DUV scatterometry on EUV masks
Author(s): Matthias Wurm; Bernd Bodermann; Regine Model; Hermann Groß
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Structure modeling for scatterometric characterization of photoinduced surface relief gratings
Author(s): Petre C. Logofatu; Ileana Apostol; Marie-Claude Castex; Victor Damian; Iuliana Iordache; Mihaela Bojan; Dan Apostol
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Finite element analysis of EUV lithography
Author(s): Jan Pomplun; Sven Burger; Frank Schmidt; Frank Scholze; Christian Laubis; Uwe Dersch
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A rigorous solution for electromagnetic scattering from any kind of asperities of multilayer 1-D structures in the X-ray–VUV ranges
Author(s): Leonid I. Goray
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Influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks
Author(s): Frank Scholze; Christian Laubis; Uwe Dersch; Jan Pomplun; Sven Burger; Frank Schmidt
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Optimal sets of measurement data for profile reconstruction in scatterometry
Author(s): H. Gross; A. Rathsfeld; F. Scholze; M. Bär; U. Dersch
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MTF assessment of dual waveband diffractive lenses
Author(s): Jose M. Infante Herrero; Marta C. de la Fuente
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The influence of target distance to lens distortion variation
Author(s): Christian Bräuer-Burchardt
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Numerical simulation tool for synthetic speckle pattern images and their intensity-based integration under variable conditions for metrology applications
Author(s): Falko Riechert; Georg Bastian; Uli Lemmer
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Modeling of image formation of a low-cost white-light bench microscope with a linear CMOS image sensor: its application in metrology
Author(s): Milton P. Macedo; António J. Barata; Ana G. Fernandes; Carlos M. Correia
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Modeling of propagation of ultrashort light pulses in optical systems
Author(s): Antonin Miks; Jiri Novak; Pavel Novak
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Apodised fibre Bragg grating design for gain flattening of EDFA
Author(s): Anubhuti Khare; Arun Khare
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Scattering at silver-enhanced gold particles inside subwavelength-apertured metallic layers
Author(s): Tilman Glaser
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Applications of optical vortex birefringence compensator
Author(s): Monika Borwińska; Piotr Kurzynowski; Agnieszka Popiołek-Masajada
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Opportunities and limits for interferometry in production control
Author(s): Thomas Blümel; Ralf Neubert; Ricarda Kafka; Wilfried Boeck; Christian Zellweger
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An approach to validation of rigorous modeling in optical CD microscopy by comparison of measurement results with independent methods
Author(s): B. Bodermann; H. Bosse
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Computer and experimental modeling of light scattering at random and fractal surfaces
Author(s): Oleg V. Angelsky; Alexander P. Maksimyak; Peter P. Maksimyak
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Optical characterization procedure for large thin films
Author(s): Juan F. Trigo; José Herrero; Leonardo Soriano; María Teresa Gutiérrez
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