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Proceedings of SPIE Volume 6517

Emerging Lithographic Technologies XI
Editor(s): Michael J. Lercel
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Volume Details

Volume Number: 6517
Date Published: 13 March 2007
Softcover: 115 papers (1124) pages
ISBN: 9780819466365

Table of Contents
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Front Matter: Volume 6517
Author(s): Proceedings of SPIE
SEMATECH’s EUV program: a key enabler for EUVL introduction
Author(s): Stefan Wurm; Chan-Uk Jeon; Michael Lercel
Show Abstract
EUV lithography with the Alpha Demo Tools: status and challenges
Author(s): Noreen Harned; Mieke Goethals; Rogier Groeneveld; Peter Kuerz; Martin Lowisch; Henk Meijer; Hans Meiling; Kurt Ronse; James Ryan; Michael Tittnich; Harm-Jan Voorma; John Zimmerman; Uwe Mickan; Sjoerd Lok
Show Abstract
Nikon EUVL development progress update
Author(s): Takaharu Miura; Katsuhiko Murakami; Kazuaki Suzuki; Yoshiaki Kohama; Kenji Morita; Kazunari Hada; Yukiharu Ohkubo
Show Abstract
Path to the HVM in EUVL through the development and evaluation of the SFET
Author(s): Shigeyuki Uzawa; Hiroyoshi Kubo; Yoshinori Miwa; Toshihiko Tsuji; Hideki Morishima
Show Abstract
EUV lithography program at IMEC
Author(s): Anne Marie Goethals; Rik Jonckheere; Gian Francesco Lorusso; Jan Hermans; Frieda Van Roey; Alan Myers; Manish Chandhok; Insung Kim; Ardavan Niroomand; Fumio Iwamoto; Nikolay Stepanenko; Roel Gronheid; Bart Baudemprez; Kurt Ronse
Show Abstract
Fast simulation of buried EUV mask defect interaction with absorber features
Author(s): Chris H. Clifford; Andrew R. Neureuther
Show Abstract
EUV MET printing and actinic imaging analysis on the effects of phase defects on wafer CDs
Author(s): Hakseung Han; Kenneth A. Goldberg; Anton Barty; Eric M. Gullikson; Yoshiaki Ikuta; Toshiyuki Uno; Obert R. Wood; Stefan Wurm
Show Abstract
EUV and non-EUV inspection of reticle defect repair sites
Author(s): Kenneth A. Goldberg; Anton Barty; Phillip Seidel; Klaus Edinger; Rainer Fettig; Patrick Kearney; Hakseung Han; Obert R. Wood
Show Abstract
Inspection with the Lasertec M7360 at the SEMATECH Mask Blank Development Center
Author(s): Wonil Cho; Patrick A. Kearney; Eric M. Gullikson; Anwei Jia; Tomoya Tamura; Atsushi Tajima; Hal Kusunose; Chan-Uk Jeon
Show Abstract
EUVL mask substrate defect print study
Author(s): Jerry Cullins; Yoshihiro Tezuka; Iwao Nishiyama; Takeo Hashimoto; Tsutomu Shoki
Show Abstract
Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror
Author(s): Kumi Motai; Hiroaki Oizumi; Shinji Miyagaki; I. Nishiyama; Akira Izumi; Tomoya Ueno; Yasuo Miyazaki; Akira Namiki
Show Abstract
Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors
Author(s): S. B. Hill; I. Ermanoski; C. Tarrio; T. B. Lucatorto; T. E. Madey; S. Bajt; M. Fang; M. Chandhok
Show Abstract
Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition
Author(s): A. E. Yakshin; R. W. E. van de Kruijs; I. Nedelcu; E. Zoethout; E. Louis; F. Bijkerk; H. Enkisch; S. Müllender
Show Abstract
Development of optics for EUV lithography tools
Author(s): Katsuhiko Murakami; Tetsuya Oshino; Hiroyuki Kondo; Hiroshi Chiba; Hideki Komatsuda; Kazushi Nomura; Hiromitsu Iwata
Show Abstract
Multilevel step and flash imprint lithography for direct patterning of dielectrics
Author(s): Wei-Lun Jen; Frank Palmieri; Brook Chao; Michael Lin; Jianjun Hao; Jordan Owens; Ken Sotoodeh; Robin Cheung; C. Grant Willson
Show Abstract
A study of imprint-specific defects in the step and flash imprint lithography process
Author(s): J. Perez; K. Selinidis; S. Johnson; B. Fletcher; F. Xu; J. Maltabes; I. McMackin; D. Resnick; S. V. Sreenivasan
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Critical issues study of nano-imprint tool for semiconductor volume production
Author(s): Hideki Ina; Kazuyuki Kasumi; Eigo Kawakami; Kouji Uda
Show Abstract
Demolding strategy to improve the hot embossing throughput
Author(s): Tanguy Leveder; Stefan Landis; Laurent Davoust; Sebastien Soulan; Nicolas Chaix
Show Abstract
Laser-produced EUV light source development for HVM
Author(s): Akira Endo; Hideo Hoshino; Takashi Suganuma; Masato Moriya; Tatsuya Ariga; Yoshifumi Ueno; Masaki Nakano; Takeshi Asayama; Tamotsu Abe; Hiroshi Komori; Georg Soumagne; Hakaru Mizoguchi; Akira Sumitani; Koichi Toyoda
Show Abstract
EUV source development for high-volume chip manufacturing tools
Author(s): Uwe Stamm; Masaki Yoshioka; Jürgen Kleinschmidt; Christian Ziener; Guido Schriever; Max C. Schürmann; Guido Hergenhan; Vladimir M. Borisov
Show Abstract
LPP EUV source development for HVM
Author(s): David C. Brandt; Igor V. Fomenkov; Alex I. Ershov; William N. Partlo; David W. Myers; Norbert R. Böwering; Alexander N. Bykanov; Georgiy O. Vaschenko; Oleh V. Khodykin; Jerzy R. Hoffman; Ernesto Vargas L.; Rodney D. Simmons; Juan A. Chavez; Christopher P. Chrobak
Show Abstract
Tin inventory for HVM EUVL sources
Author(s): Martin C. Richardson; Kazutoshi Takenoshita; Tobias Schmid
Show Abstract
Microdischarge EUV source array and illuminator design for a prototype lithography tool
Author(s): B. E. Jurczyk; R. A. Stubbers; D. A. Alman; R. Hudyma; M. Thomas
Show Abstract
Initial experience establishing an EUV baseline lithography process for manufacturability assessment
Author(s): O. R. Wood; D. Back; R. Brainard; G. Denbeaux; D. Goldfarb; F. Goodwin; J. Hartley; K. Kimmel; C. Koay; B. La Fontaine; J. Mackey; B. Martinick; W. Montgomery; P. Naulleau; U. Okoroanyanwu; K. Petrillo; B. Pierson; M. Tittnich; S. Trogisch; T. Wallow; Y. Wei
Show Abstract
Recent results from the Berkeley 0.3-NA EUV microfield exposure tool
Author(s): Patrick P. Naulleau; Chris N. Anderson; Kim Dean; Paul Denham; Kenneth A. Goldberg; Brian Hoef; Bruno La Fontaine; Tom Wallow
Show Abstract
EUVL mask dual pods to be used for mask shipping and handling in exposure tools
Author(s): Yoshio Gomei; Kazuya Ota; John Lystad; Dave Halbmair; Long He
Show Abstract
Assessment of pattern position shift for defocusing in EUV lithography
Author(s): Minoru Sugawara
Show Abstract
Electrostatic chucking of EUVL reticles
Author(s): Madhura Nataraju; Jaewoong Sohn; Andrew R. Mikkelson; Roxann L. Engelstad; Kevin T. Turner; Chris K. Van Peski; Kevin J. Orvek
Show Abstract
Technology mapping technique for enhancing throughput of multi-column-cell systems
Author(s): Makoto Sugihara; Yusuke Matsunaga; Kazuaki Murakami
Show Abstract
Stage position measurement for e-beam lithography tool
Author(s): Paul G. Harris; William Lee; Andrew W. McClelland; John M. Tingay
Show Abstract
Defect inspection of positive and negative sub-60nm resist pattern printed with variable shaped e-beam direct write lithography
Author(s): C. Arndt; C. Hohle; J. Kretz; T. Lutz; M. Richter; K. Keil; M. Lapidot; D. Zemach; M. Kindler
Show Abstract
A study of voltage contrast image using Monte Carlo simulation
Author(s): T. Ota; T. Koshiba; T. Nakasugi
Show Abstract
Alignment method of low-energy electron-beam direct writing system EBIS using voltage contrast image
Author(s): Takeshi Koshiba; Takumi Ota; Tetsuro Nakasugi; Fumihiko Nakamura; Katsuhide Watanabe; Kazuyoshi Sugihara
Show Abstract
An electrical defectivity characterization of wafers imprinted with step and flash imprint lithography
Author(s): W. J. Dauksher; N. V. Le; K. A. Gehoski; E. S. Ainley; K. J. Nordquist; N. Joshi
Show Abstract
Nanoimprint lithography for the direct patterning of nanoporous interlayer dielectric insulator materials
Author(s): Hyun Wook Ro; Hae-Jeong Lee; Eric K. Lin; Alamgir Karim; Daniel R. Hines; Do Y. Yoon
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Ultra-violet nanoimprint lithography applicable to thin-film transistor liquid-crystal display
Author(s): Jun-ho Jeong; Ki-don Kim; Dae-geun Choi; Junhyuk Choi; Eung-sug Lee
Show Abstract
Toward 22 nm for unit process development using step and flash imprint lithography
Author(s): Gerard M. Schmid; Ecron Thompson; Nick Stacey; Douglas J. Resnick; Deirdre L. Olynick; Erik H. Anderson
Show Abstract
Soft UV-based nanoimprint lithography for large-area imprinting applications
Author(s): T. Glinsner; U. Plachetka; T. Matthias; M. Wimplinger; P. Lindner
Show Abstract
Chemically amplified resists resolving 25 nm 1:1 line: space features with EUV lithography
Author(s): James W. Thackeray; Roger A. Nassar; Robert Brainard; Dario Goldfarb; Thomas Wallow; Yayi Wei; Jeff Mackey; Patrick Naulleau; Bill Pierson; Harun H. Solak
Show Abstract
New requirements for the cleaning of EUV mask blanks
Author(s): Abbas Rastegar; Sean Eichenlaub; Vivek Kapila; Arun John Kadaksham; Pat Marmillion
Show Abstract
Experimental and simulation investigations of acoustic cavitation in megasonic cleaning
Author(s): Krishna Muralidharan; Manish Keswani; Hrishikesh Shende; Pierre Deymier; Srini Raghavan; Florence Eschbach; Archita Sengupta
Show Abstract
Photonic band-gap masks to enhance resolution and depth of focus
Author(s): John Nistler; Koby Duckworth; Jiri Chaloupka; Matt Brock
Show Abstract
Properties of EUVL masks as a function of capping layer and absorber stack structures
Author(s): Hwan-Seok Seo; Jinhong Park; Seung-Yoon Lee; Joo-On Park; Hun Kim; Seong-Sue Kim; Han-Ku Cho
Show Abstract
Molecular-ruler nanolithography
Author(s): Charan Srinivasan; J. Nathan Hohman; Mary E. Anderson; Pengpeng Zhang; Paul S. Weiss; Mark W. Horn
Show Abstract
Scissionable bile acid nanostructures for lithography
Author(s): Robert P. Meagley; Geeta Sharma; Ankur Guptab
Show Abstract
Stretched polymer nanohairs by nanodrawing
Author(s): Hoon Eui Jeong; Sung Hoon Lee; Pilnam Kim; Kahp Y. Suh
Show Abstract
Direct three-dimensional nanoscale thermal lithography at high speeds using heated atomic-force microscope cantilevers
Author(s): Yueming Hua; Shubham Saxena; Jung Chul Lee; William P. King; Clifford L. Henderson
Show Abstract
Focused ion beam nano patterning for fabrications of III-nitride light emitting diodes
Author(s): M. Y. Kim; Y. C. Park; S. S. Hong; B. K. Kim; D. W. Kim; D. Y. Lee
Show Abstract
Rigorous model for registration error due to EUV reticle non-flatness and a proposed disposition and compensation technique
Author(s): Barry Lieberman
Show Abstract
Status and path to a final EUVL reticle-handling solution
Author(s): Long He; Kevin Orvek; Phil Seidel; Stefan Wurm; Jon Underwood; Ernie Betancourt
Show Abstract
Performance estimation of EUV exposure optics for below 32-nm node in consideration of Mo/Si multilayer coating
Author(s): Takahiro Sasaki; Kazuhiko Kajiyama; Hideki Morishima; Toshihiko Tsuji; Masayuki Suzuki; Masaharu Suzuki; Hideo Yokota
Show Abstract
Thermal management design and verification of collector optics into high-power EUV source systems
Author(s): Giovanni Bianucci; Fabio E. Zocchi; Giorgio Pirovano; Gian Luca Cassol; Fabio Marioni; Pietro Binda; Luca Porreca; Imtiaz Ahmad; Denis Bolshukhin; Max C. Schürmann
Show Abstract
Low-cost EUV collector development: design, process, and fabrication
Author(s): Ranju D. Venables; Michael Goldstein; Darell Engelhaupt; Sang H. Lee; Eric M. Panning
Show Abstract
Energetic and thermal Sn interactions and their effect on EUVL source collector mirror lifetime at high temperatures
Author(s): J. P. Allain; M. Nieto; M. Hendricks; A. Hassanein; C. Tarrio; S. Grantham; V. Bakshi
Show Abstract
Application of the Energetiq EQ-10 electrodeless Z-Pinch EUV light source in outgassing and exposure of EUV photoresist
Author(s): Paul A. Blackborow; Deborah S. Gustafson; Donald K. Smith; Matthew M. Besen; Stephen F. Horne; Robert J. D'Agostino; Youichi Minami; Gregory Denbeaux
Show Abstract
Optimization of EUV laser and discharge devices for high-volume manufacturing
Author(s): A. Hassanein; V. Sizyuk; T. Sizyuk; V. Morozov
Show Abstract
Detection signal analysis of actinic inspection of EUV mask blanks using dark-field imaging
Author(s): Toshihiko Tanaka; Tsuneo Terasawa; Nobuyuki Iriki; Hajime Aoyama; Toshihisa Tomie
Show Abstract
Development of EUV mask handling technology at MIRAI-Selete
Author(s): Kazuya Ota; Mitsuaki Amemiya; Takao Taguchi; Takashi Kamono; Hiroyoshi Kubo; Tadahiko Takikawa; Yoichi Usui; Osamu Suga
Show Abstract
Impact of interface treatment with assisted ion beam on Mo-Si multilayer formation for EUVL mask blanks
Author(s): Kenji Hiruma; Yuusuke Tanaka; Shinji Miyagaki; Jerry Cullins; Iwao Nishiyama
Show Abstract
Spectrally investigated optimization for high optical transmission of the C-shaped nano apertures
Author(s): Eungman Lee; Kyoungsik Kim; Jae W. Hahn
Show Abstract
Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography
Author(s): Yunmi Lee; Sinjeung Park; Eungman Lee; Kyoungsik Kim; Jae W. Hahn
Show Abstract
The effect of localized mask density variations on image quality in EUV lithography
Author(s): Jinhong Park; Hwanseok Seo; Seong-Sue Kim; HanKu Cho; Joo-Tae Moon
Show Abstract
Corning ULE glass can meet P-37 specifications
Author(s): William Rosch; Lorrie Beall; John Maxon; Robert Sabia; Robert Sell
Show Abstract
Evaluation and selection of EUVL-grade TiO2-SiO2 ultra-low-expansion glasses using the line-focus-beam ultrasonic material characterization system
Author(s): Mototaka Arakawa; Yuji Ohashi; Jun-ichi Kushibiki
Show Abstract
Defect mitigation and reduction in EUVL mask blanks
Author(s): Rajul Randive; Andy Ma; Ira Reiss; Paul Mirkarimi; Eberhard Spiller; Bernd Beier; Toshiyuki Uno; Patrick Kearney; Chan-Uk Jeon
Show Abstract
Low-viscosity and fast-curing polymer system for UV-based nanoimprint lithography and its processing
Author(s): Marko Vogler; Markus Bender; Ulrich Plachetka; Andreas Fuchs; Sabine Wiedenberg; Freimut Reuther; Gabi Grützner; Heinrich Kurz
Show Abstract
Photocurable silicon-based materials for imprinting lithography
Author(s): Jianjun Hao; Michael W. Lin; Frank Palmieri; Yukio Nishimura; Huang-Lin Chao; Michael D. Stewart; Austin Collins; Kane Jen; C. Grant Willson
Show Abstract
Nanoimprinting with SU-8 epoxy resists
Author(s): Donald W. Johnson; Harris Miller; Mike Kubenz; Freimut Reuther; Gabi Gruetzner
Show Abstract
mr-NIL 6000: new epoxy-based curing resist for efficient processing in combined thermal and UV nanoimprint lithography
Author(s): Christine Schuster; Mike Kubenz; Freimut Reuther; Marion Fink; Gabi Gruetzner
Show Abstract
Structure and stability characterization of anti-adhesion self-assembled monolayers formed by vapor deposition for NIL use
Author(s): Sophie Garidel; Marc Zelsmann; Pauline Voisin; Nevine Rochat; Philippe Michallon
Show Abstract
Template flatness issue for UV curing nanoimprint lithography
Author(s): P. Voisin; A. Jouve; M. Zelsmann; C. Gourgon; J. Boussey
Show Abstract
Imprint solutions, costs, and returns of patterning LED’s
Author(s): M. P. C. Watts
Show Abstract
Whole wafer imprint patterning using step and flash imprint lithography: a manufacturing solution for sub-100-nm patterning
Author(s): David Lentz; Gary Doyle; Mike Miller; Gerald Schmidt; Maha Ganapathisuramanian; Xiaoming Lu; Doug Resnick; Dwayne L. LaBrake
Show Abstract
Exposure characteristics of character projection-type low-energy electron-beam direct writing system
Author(s): Takayuki Satoh; Ryoichi Inanami; Katsumi Kishimoto; Keizo Hirose; Tetsuro Nakasugi; Takeshi Koshiba; Takumi Ota
Show Abstract
Data processing system in electron beam direct writing to obtain photolithography friendly resist patterns
Author(s): Hiromi Hoshino; Yasuhide Machida
Show Abstract
Recent progress of a character projection-type low-energy electron-beam direct writing system
Author(s): Kouhei Noguchi; Katsuhide Watanabe; Hidetoshi Kinoshita; Hiroyuki Shinozaki; Yasushi Kojima; Satoshi Morita; Fumihiko Nakamura; Norihiro Yamaguchi; Kazuhiko Kushitani; Tetsuro Nakasugi; Takeshi Koshiba; Takumi Oota
Show Abstract
Shot noise effect on LER and throughput in LEEPL system
Author(s): Takao Utsumi
Show Abstract
CD budget analysis on hole pattern in EUVL
Author(s): Nobuyuki Iriki; Hajime Aoyama; Toshihiko Tanaka
Show Abstract
Fidelity of rectangular patterns printed with 0.3-NA MET optics
Author(s): Yuusuke Tanaka; Yukiko Kikuchi; DooHoon Goo; Iwao Nishiyama
Show Abstract
EUV exposure experiment using programmed multilayer defects for refining printability simulation
Author(s): Yoshihiro Tezuka; Jerry Cullins; Yuusuke Tanaka; Takeo Hashimoto; Iwao Nishiyama; Tsutomu Shoki
Show Abstract
Lithographic metrics for the determination of intrinsic resolution limits in EUV resists
Author(s): Patrick P. Naulleau; Christopher N. Anderson; Bruno La Fontaine; Ryoung-han Kim; Tom Wallow
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Absorption of extreme ultraviolet radiation in photoresists
Author(s): Rashi Garg; Alin Antohe; Gregory Denbeaux
Show Abstract
Process window study with various illuminations for EUV lithography applications
Author(s): Sang Hun Lee; Zhiyu Zhang
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Characterization of low-order aberrations in the SEMATECH Albany MET tool
Author(s): Patrick Naulleau; Justin Waterman; Kim Dean
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Characteristics and prevention of pattern collapse in EUV lithography
Author(s): Wook Chang; Eun-Jin Kim; Young-Min Kang; Seung-Wook Park; Chang-Moon Lim; Ki-Tak Won; Jai-Soon Kim; Hye-Keun Oh
Show Abstract
Extreme ultraviolet interference lithography with incoherent light
Author(s): Patrick P. Naulleau; Christopher N. Anderson; Stephen F Horne
Show Abstract
A short-pulsed laser cleaning system for EUVL tool
Author(s): Masami Yonekawa; Hisashi Namba; Tatsuya Hayashi; Yutaka Watanabe
Show Abstract
Polarization dependence of multilayer reflectance in the EUV spectral range
Author(s): Frank Scholze; Christian Laubis; Christian Buchholz; Andreas Fischer; Annett Kampe; Sven Plöger; Frank Scholz; Gerhard Ulm
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Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation
Author(s): S. Matsunari; T. Aoki; K. Murakami; Y. Gomei; S. Terashima; H. Takase; M. Tanabe; Y. Watanabe; Y. Kakutani; M. Niibe; Y. Fukuda
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Effect of deposition, sputtering, and evaporation of lithium debris buildup on EUV optics
Author(s): M. J. Neumann; M. Cruce; P. Brown; S. N. Srivasta; D. N. Ruzic; O. Khodykin
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Carbon accumulation and mitigation processes, and secondary electron yields of ruthenium surfaces
Author(s): B. V. Yakshinskiy; R. Wasielewski; E. Loginova; Theodore E. Madey
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Substrate recovery layers for EUVL optics: effects on multilayer reflectivity and surface roughness
Author(s): I. Nedelcu; R. W. E. van de Kruijs; A. E. Yakshin; E. Louis; F. Bijkerk; S. Mullender
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Long-term durability of a Ru capping layer for EUVL projection optics by introducing ethanol
Author(s): Yukinobu Kakutani; Masahito Niibe; Yoshio Gomei; Hiromitsu Takase; Shigeru Terashima; Shuichi Matsunari; Takashi Aoki; Yasuaki Fukuda
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High-accuracy EUV reflectometer
Author(s): U. Hinze; M. Fokoua; B. Chichkov
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Development of optical component for EUV phase-shift microscopes
Author(s): Yoshio Mizuta; Masafumi Osugi; Jyunki Kishimoto; Noriyuki Sakaya; Kazuhiro Hamamoto; Takeo Watanabe; Hiroo Kinoshita
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Fabrication of fine pitch gratings by holography, electron-beam lithography, and nano-imprint lithography
Author(s): Darren Goodchild; Alexei Bogdanov; Simon Wingar; Bill Benyon; Nak Kim; Frank Shepherd
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Three-dimensional X-ray lithography using a silicon mask with inclined absorbers
Author(s): Harutaka Mekaru; Takayuki Takano; Koichi Awazu; Masaharu Takahashi; Ryutaro Maeda
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Photon sieve array x-ray maskless nanolithography
Author(s): Guanxiao Cheng; Tingwen Xing; Wumei Lin; Jinmei Zhou; Chuankai Qiu; Zhijie Liao; Yong Yang; Lei Hong; Jianling Ma
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Magneto-polymer composite particles fabricated utilizing patterned perfluoropolyether elastomer molds
Author(s): Kevin P. Herlihy; Joseph M. DeSimone
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Simulating droplet dynamics during evaporation-driven self-assembly
Author(s): John J. Dyreby; Kevin T. Turner; Gregory F. Nellis
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Microfocus EUV tube for at-wavelength reflectometry
Author(s): André Egbert; Stefan Becker
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Characterization of various Sn targets with respect to debris and fast ion generation
Author(s): Yoshifumi Ueno; Hideo Hoshino; Tatsuya Ariga; Taisuke Miura; Masaki Nakano; Hiroshi Komori; Georg Soumagne; Akira Endo; Hakaru Mizoguchi; Akira Sumitani; Koichi Toyoda
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Small field exposure tool (SFET) light source
Author(s): Tamotsu Abe; Takashi Suganuma; Masato Moriya; Takayuki Yabu; Takeshi Asayama; Hiroshi Someya; Yoshifumi Ueno; Georg Soumagne; Akira Sumitani; Hakaru Mizoguchi
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Debris characteristics from a colloidal microjet target containing tin dioxide nano-particles
Author(s): Takeshi Higashiguchi; Sumihiro Suetake; Yusuke Senba; Yusuke Sato; Akira Hosotani; Yukari Takahashi; Shoichi Kubodera
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A report on the modeling efforts in the development of a distributed EUV source for next-generation lithography tools
Author(s): J. B. Spencer; D. A. Alman; B. E. Jurczyk; D. N. Ruzic
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Experimental results for an addressable xenon microdischarge EUV-source array for HVM lithography
Author(s): Brian Jurczyk; Robert Stubbers; Darren A. Alman; Josh L. Rovey; Matthew D. Coventry
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High repetition rate LPP source facility for EUVL
Author(s): T. Schmid; S. A. George; J. Cunado; S. Teerawattanasook; R. Bernath; C. Brown; K. Takenoshita; C.-S. Koay; M. Richardson
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Laser-produced plasma source system development
Author(s): Igor V. Fomenkov; David C. Brandt; Alexander N. Bykanov; Alexander I. Ershov; William N. Partlo; David W. Myers; Norbert R. Böwering; Georgiy O. Vaschenko; Oleh V. Khodykin; Jerzy R. Hoffman; Ernesto Vargas L.; Rodney D. Simmons; Juan A. Chavez; Christopher P. Chrobak
Show Abstract
Gibbsian segregating alloys: a potential solution to minimize collector degradation
Author(s): H. Qiu; S. N. Srivastava; J. C. Anderson; D. N. Ruzic
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Debris mitigation techniques for a Sn- and Xe-fueled EUV-light source
Author(s): Keith C. Thompson; Shailendra N. Srivastava; Erik L. Antonsen; David N. Ruzic
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Comparison of optical performances of alternative grazing incidence collector designs for EUV lithography
Author(s): Fabio E. Zocchi; Enrico Benedetti
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Simulation of EUV spectral emission from laser-produced tin-doped water plasmas
Author(s): Pamela R. Woodruff; Joseph J. MacFarlane; Igor E. Golovkin; Ping Wang
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Characterization of the tin-doped droplet laser plasma EUVL sources for HVM
Author(s): Kazutoshi Takenoshita; Simi A. George; Tobias Schmid; Chiew-Seng Koay; Jose Cunado; Robert Bernath; Christopher Brown; Moza M. Al-Rabban; William T. Silfvast; Martin C. Richardson
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A mass-limited Sn target irradiated by dual laser pulses for an EUVL source
Author(s): Y. Tao; M. S. Tillack; K. L. Sequoia; F. Najimabadi
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Development of Sn-fueled high-power DPP EUV source for enabling HVM
Author(s): Yusuke Teramoto; Zenzo Narihiro; Daiki Yamatani; Takuma Yokoyama; Kazunori Bessho; Yuki Joshima; Takahiro Shirai; Shinsuke Mouri; Takahiro Inoue; Hiroshi Mizokoshi; Gohta Niimi; Tomonao Hosokai; Hironobu Yabuta; Kohkan C. Paul; Tetsu Takemura; Toshio Yokota; Kiyoyuki Kabuki; Koji Miyauchi; Kazuaki Hotta; Hiroto Sato
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