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Proceedings of SPIE Volume 6283

Photomask and Next-Generation Lithography Mask Technology XIII
Editor(s): Morihisa Hoga
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Volume Details

Volume Number: 6283
Date Published: 3 May 2006
Softcover: 107 papers (1006) pages
ISBN: 9780819463586

Table of Contents
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Design for manufacturability production management activity report
Author(s): Norihiko Miyazaki; T. Sato; M. Honma; N. Yoshioka; K. Hosono; T. Onodera; H. Itoh; H. Suzuki; T. Uga; K. Kadota; N. Iriki
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Photomask automation improvement to eliminate manufacturing errors
Author(s): Andrew Watts; Chet Huang; Yiyang Wang; Cuc Huynh; Craig Benson; Adam Smith
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Sigma7500: an improved DUV laser pattern generator addressing sub-100-nm photomask accuracy and productivity requirements
Author(s): Henrik Sjöberg; Tord Karlin; Mats Rosling; Thomas Öström; Jonas Måhlén; Tom Newman
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EBM-5000: electron-beam mask writer for 45 nm node
Author(s): Hitoshi Sunaoshi; Yuichi Tachikawa; Hitoshi Higurashi; Tomohiro Iijima; Junichi Suzuki; Takashi Kamikubo; Kenji Ohtoshi; Hirohito Anze; Takehiko Katsumata; Noriaki Nakayamada; Shigehiro Hara; Shuichi Tamamushi; Yoji Ogawa
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Electron beam lithography time dependent dose correction for reticle CD uniformity enhancement
Author(s): Nathan Wilcox; Matt Vernon; Andrew Jamieson
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Study of higher electron beam energy for the mask production for 30 nm node technology
Author(s): Sanghee Lee; Sungho Park; Byunggook Kim; Seongwoon Choi; Woosung Han
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Real time analysis of the haze environment trapped between the pellicle film and the mask surface
Author(s): Jaehyuck Choi; Seungyeon Lee; Yongjin Cho; Sunghun Ji; Byung Cheol Cha; Sung Woon Choi; Woo Sung Han
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Sulfate-free photomask cleaning technology
Author(s): Shingo Anzai; Noriaki Takagi; Tomoaki Kamiyama; Naotoshi Kawaguchi; Mikio Ishijima; Toshimitsu Watanabe; Hiroaki Morimoto; Tsuneaki Kuwajima; Makito Nakatsu; Shin-ichi Hasegawa
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Advanced process control of mask dry-etching using RF sensor
Author(s): Hitoshi Handa; Satoshi Yamauchi; Koji Hosono; Hiroshi Maruyama; Daisuke Nakamura; Toshifumi Yokoyama; Akihiko Naito
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Irradiation resistance of intravolume shading elements embedded in photomasks used for CD uniformity control by local intra-field transmission attenuation
Author(s): Eitan Zait; Guy Ben-Zvi; Vladimir Dmitriev; Sergey Oshemkov; Rainer Pforr; Mario Hennig
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Pattern fidelity enhancement with OPC pattern generation on laser lithography
Author(s): Gaston Lee; Yi-Sheng Chung; Wei-Tsung Yang; Wen-Hwa Cheng; Ren-Jang Lin; Tsung Si Wang; Yuan-Cheng Cheng; Wei-Jen Chou
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Reducing process contributions to CD error range using the Sigma7500 pattern generator and ProcessEqualizer
Author(s): Jonas Hellgren; Hans Fosshaug; Anders Österberg; Lars Ivansen
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Mask fabrication results using new laser writing system: Sigma7300
Author(s): Ho-June Lee; Dong-Suk Nam; Sang-Hee Lee; Hyun-Soo Kim; Jung-Hoon Lee; Hak-Seung Han; Byung-Gook Kim; Seong-Woon Choi; Woo-Sung Han
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A study for effect of rounded contact hole pattern by laser mask writing machine onto wafer process margin
Author(s): Se-Jin Park; Kyung-Hee Yoon; Jae-Hyun Kang; Jae-Young Choi; Yong-Suk Lee; Keeho Kim
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Higher current density operation with EB reticle writer EBM-5000
Author(s): Masato Saito; Kunihiro Ugajin; Tomotaka Higaki; Hideaki Nishino; Hidehiro Watanabe
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Experimental characterization of constituent errors in electron-beam lithography
Author(s): Russell Cinque; Peter Buck; Kyungsoo S. Yeo; Tadashi Komagata; Yasutoshi Nakagawa
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The design and qualification of the TEL CLEAN TRACK ACT M photomask coating tool at Intel
Author(s): Andrew Jamieson; Thuc Dam; Ki-Ho Baik; Ken Duerksen; Elie Eidson; Keiji Akai; Kazuya Hisano; Norifumi Kohama; Shinichi Machidori
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EBL resist heating error and its correction
Author(s): Sergey Babin; Igor Kuzmin
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Simulation of dry etch profile dynamics and CD variation due to microloading
Author(s): S. Babin; K. Bay; S. Okulovsky
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Advanced hybrid mask process development
Author(s): Orson Lin; Jomarch Chou; K. K. Fu; Booky Lee; Richard Lu; Jerry Lu; Chiang-Lin Shi
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Photomask dry-etching techniques for hard mask
Author(s): Sung-Won Kwon; Young-Ju Park; Sung-Yoon Kim; Han-shin Lee; Hyuk-Joo Kwon; Seung-Woon Choi; Woo-Sung Han
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Binary Cr etch process control directed at the 45nm node
Author(s): J. Plumhoff; R. Westerman; C. Constantine
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Chrome etch challenges for 45 nm and beyond
Author(s): Madhavi Chandrachood; Michael Grimbergen; Ibrahim M. Ibrahim; Sheeba Panayil; Ajay Kumar
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Mask etcher data strategy for 45 nm and beyond
Author(s): Richard Lewington; Ibrahim M. Ibrahim; Sheeba Panayil; Ajay Kumar; John Yamartino
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Quartz etch challenges for 45 nm phase-shift masks
Author(s): Scott A. Anderson; Madhavi Chandrachood; Michael Grimbergen; Toi Yue Becky Leung; Ibrahim M. Ibrahim; Sheeba Panayil; Ajay Kumar
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In-field CD uniformity control by altering transmission distribution of the photomask using ultra-fast pulsed laser technology
Author(s): Yasutaka Morikawa; Takanori Sutou; Yuichi Inazuki; Takashi Adachi; Yuuichi Yoshida; Kouichirou Kojima; Shiho Sasaki; Hiroshi Mohri; Naoya Hayashi; Vladimir Dmitriev; Sergey Oshemkov; Eitan Zait; Guy Ben-Zvi
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Dissolution behavior of chemically amplified resist for advanced mask- and NIL mold-making as studied by dissolution rate monitor
Author(s): Kazumasa Takeshi; Kazuto Oono; Yoshiyuki Negishi; Daisuke Inokuchi; Keishi Tanaka; Akira Tamura
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Verification of the modified model of the drying process of a polymer liquid film on a flat substrate by experiment (2): through more accurate experiment
Author(s): Hiroyuki Kagami
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Evaluating films for high transmission attenuated phase shift masks
Author(s): Satoru Nemoto; Toru Komizo; Yasutaka Kikuchi; Emily Gallagher; Jason Benz; Michael Hibbs; Takashi Haraguchi
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Megasonic cleaning, cavitation, and substrate damage: an atomistic approach
Author(s): Vivek Kapila; Pierre A. Deymier; Hrishikesh Shende; Viraj Pandit; Srini Raghavan; Florence O. Eschbach
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Mask cleaning strategies: a continuous ion removal concept
Author(s): Steve Osborne; Hidekazu Takahashi; Eric Woster
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Influence of the pellicle on final photomask flatness
Author(s): Richard Wistrom; Dennis Hayden; Kenneth Racette; Monica Barrett; Andrew Watts
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A technique to determine a capability to detect adjacent defects during an automatic inspection of reticle patterns
Author(s): Syarhei Avakaw; Aliaksandr Korneliuk; Alena Tsitko
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Femtopulse laser-based mask repair in the DUV wavelength regime
Author(s): Firoz Ghadiali; Vikram Tolani; Rajesh Nagpal; Tod Robinson; Jeff LeClaire; Ron Bozak; David A. Lee; Roy White
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Automated evaluation of AIMS images: an approach to minimize evaluation variability
Author(s): Arndt C. Dürr; Martin Arndt; Jan Fiebig; Samuel Weiss
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Application of photolithographic simulation and a mask repair system in a production environment
Author(s): Tod Robinson; John Lewellen; Ron Bozak; David A. Lee; Peter Brooker
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Fine pixel SEM image for mask pattern quality assurance based on lithography simulation
Author(s): Eiji Yamanaka; Mitsuyo Kariya; Shinji Yamaguchi; Satoshi Tanaka; Kohji Hashimoto; Masamitsu Itoh; Hideaki Kobayashi; Tsukasa Kawashima; Shogo Narukawa
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The CD measuring repeatability enhancement by intensity gradient
Author(s): Yongkyoo Choi; Sangpyo Kim; Munsik Kim; Oscar Han
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Metrology limits of mask process development
Author(s): Pavel Nesladek; Andreas Wiswesser; Björn Sass; Jan Richter
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The characterization of line-width in mask using spectrophotometry
Author(s): Kyoung-Yoon Bang; Yo-Han Choi; Han-June Yoon; Hae-Young Jeong; Yong-Hoon Kim; Seung-Woon Choi; Hee-Sun Yoon; Woo-Sung Han
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The art of reticle management
Author(s): Jochen Gruhn; Tobias Ferber; Wolfgang Keller
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Hot spot-based judgment methodology for high-end photomask availability for any exposure tools
Author(s): Satoshi Usui; Shigeru Hasebe; Shigeki Nojima; Kohji Hashimoto
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FPGA based high-speed system solutions for innovative maskless lithography systems
Author(s): Sven-Hendrik Voss; Maati Talmi
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New proximity effect correction for under 100 nm patterns
Author(s): Masahiro Shoji; Nobuyasu Horiuchi; Tomoyuki Chikanaga; Takashi Niinuma; Dai Tsunoda
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Shot number estimation for EB direct writing for logic LSI utilizing character-build standard-cell layout technique
Author(s): Yoshihiko Kajiya; Akihiro Nakamura; Masaya Yoshikawa; Takeshi Fujino
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Reduction of MDP time through the improvement of verification method
Author(s): Young-Hwa Noh; Sung-Hoon Jang; Won-Tai Ki; Ji-Hyeon Choi; Seong-Woon Choi; Woo-Sung Han
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Evaluation of OASIS.VSB (SEMI P44) for practical use
Author(s): Koki Kuriyama; Toshio Suzuki; Shogo Narukawa; Hiroshi Mohri; Morihisa Hoga; Naoya Hayashi
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From GDSII to OASIS: practical support tools for data processing flow transition
Author(s): Masakazu Endo; Kuninori Nishizawa; Kokoro Kato
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Fracture friendly optical proximity correction for non-Manhattan features
Author(s): John Nogatch; Robert Lugg; Mike Miller; Frank Amoroso
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Fast yield-driven fracture for variable shaped beam mask writing
Author(s): Andrew B. Kahng; Xu Xu; Alex Zelikovsky
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Simultaneous layout, process, and model optimization within an integrated design-for-yield environment
Author(s): Dmitri Lapanik; Lynn Cai; Chung-Shin Kang; Bob Naber; Jason Sweis; Wolf Staud
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Etch analysis of patterns to comprehend manufacturability
Author(s): Daniel F. Beale; Lawrence S. Melvin
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Optimization of source distribution for half-wavelength DOE
Author(s): Ryuji Horiguchi; Nobuhito Toyama; Kimio Itoh; Kouji Yoshida; Masaaki Kurihara
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Manufacturing implementation of IML technology for 45 nm node contact masks
Author(s): Douglas Van Den Broeke; Michael Hsu; J. Fung Chen; Stephen Hsu; Uwe Hollerbach; Tom Laidig
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Unifying the RET design flow with portable modeling information
Author(s): Jason Sweis; Wolf Staud; Bob Naber; Tom Laidig; Doug Van Denbroeke
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Lithographic performance comparison with various RET for 45-nm node with hyper NA
Author(s): Takashi Adachi; Yuichi Inazuki; Takanori Sutou; Yasuhisa Kitahata; Yasutaka Morikawa; Nobuhito Toyama; Hiroshi Mohri; Naoya Hayashi
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Lithography process margin enhancement using illumination based assist pattern
Author(s): James Moon; Dong-Jin Lee; Gui-Hwang Sim; Jae-Doo Eum; Byung-Ho Nam; Dong Gyu Yim
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Model-based insertion of assist features using pixel inversion method: implementation in 65 nm node
Author(s): Chi-Yuan Hung; Qingwei Liu; Kyohei Sakajiri; Shumay D. Shang; Yuri Granik
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A methodology to weight OPC modeling data points
Author(s): Chi-Yuan Hung; Ching-Heng Wang; Qingwei Liu; Cliff Ma; KeChih Wu; Gary Zhang
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Model based SRAF insertion check with OPC verify tools
Author(s): Chi-Yuan Hung; Zexi Deng; Gensheng Gao; Liguo Zhang; Qingwei Liu
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Robust OPC technique using aerial image parameter
Author(s): Mikio Oka; Shinichiro Suzuki; Kazuyoshi Kawahara; Kensuke Tsuchiya; Kazuhisa Ogawa; Hidetoshi Ohnuma
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Resist and etch modeling for the 45nm node
Author(s): Martin Drapeau; Dan Beale
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The study of contact hole for 65nm node with KrF
Author(s): Tae-Jun You; Sung-Woo Ko; James Moon; Yeong-Bae Ahn; Byung-Ho Nam; Dong-Gyu Yim
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Mask specifications for 45-nm node: the impact of immersion lithography and polarized light imaging
Author(s): Kazuya Iwase; Ken Ozawa; Fumikatsu Uesawa
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Global pattern density control by resizing fill patterns for CD skew compensation
Author(s): Jae-pil Shin; Jin-sook Choi; Sung-gyu Park; Jong-bae Lee; Moon-hyun Yoo; Jeong-taek Kong
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Approximate method of mask flatness factor in focus deviation
Author(s): Shinroku Maejima; Seiichiro Shirai; Akira Imai; Shuji Nakao; Koji Tange; Akira Chiba; Kunihiro Hosono; Koichiro Narimatsu
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Nanoparticle removal from EUV photomasks using laser induced plasma shockwaves
Author(s): John Kadaksham; Dong Zhou; M. D. Murthy Peri; Ivin Varghese; Florence Eschbach; Cetin Cetinkaya
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TaN-based EUV mask absorber etch study
Author(s): Yan Du; Chang Ju Choi; Guojing Zhang; Seh-Jin Park; Pei-Yang Yan; Ki-Ho Baik
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Simulation and experiments for inspection properties of EUV mask defects
Author(s): Jinhong Park; Seong-Sue Kim; SukJoo Lee; Sang-Gyun Woo; Han-Ku Cho; Joo-Tae Moon
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Dry etch technology development for NIL template
Author(s): Yuuichi Yoshida; Tsuyoshi Amano; Shiho Sasaki; Kimio Itoh; Nobuhito Toyama; Hiroshi Mohri; Naoya Hayashi
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Fabrication of nanoimprint stamp and its application
Author(s): Yung-Chiang Ting; Shyi-Long Shy
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Pore size control of alumina membrane mask
Author(s): Yung-Chiang Ting; Shyi-Long Shy
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A CP mask development methodology for MCC systems
Author(s): Makoto Sugihara; Taiga Takata; Kenta Nakamura; Yusuke Matsunaga; Kazuaki Murakami
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EUV mask process development and integration
Author(s): Guojing Zhang; Pei-Yang Yan; Ted Liang; Yan Du; Peter Sanchez; Seh-jin Park; Eric J. Lanzendorf; Chang Ju Choi; Emily Y. Shu; Alan R. Stivers; Jeff Farnsworth; Kangmin Hsia; Manish Chandhok; Michael J. Leeson; Gilroy Vandentop
Show Abstract
EUV mask development status at ASET and DNP
Author(s): Tsukasa Abe; Akiko Fujii; Hiroshi Mohri; Naoya Hayashi; Yuusuke Tanaka; Iwao Nishiyama
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A study of damage mechanisms during EUV mask substrate cleaning
Author(s): Abbas Rastegar; Sean Eichenalub; Kurt Goncher; Pat Marmillion
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Optimization of TaSix absorber stack for EUV mask
Author(s): Shinpei Tamura; Koichiro Kanayama; Yasushi Nishiyama; Tadashi Matsuo; Akira Tamura
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EUV mask pattern defect printability
Author(s): Ted Liang; Guojing Zhang; Patrick Naulleau; Alan Myers; Seh-Jin Park; Alan Stivers; Gilroy Vandentop
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Mask pattern correction to compensate for the effect of off-axis incidence in EUV lithography
Author(s): Minoru Sugawara; Iwao Nishiyama
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Clean mask shipping module development and demonstration for EUVL masks and blanks
Author(s): Pei-Yang Yan; Long He; Andy Ma; Kevin Orvek
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Advanced mask rule check (MRC) tool
Author(s): Kokoro Kato; Kuninori Nishizawa; Tadao Inoue; Koki Kuriyama; Toshio Suzuki; Shogo Narukawa; Naoya Hayashi
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Optimization of layout design and OPC by using estimation of transistor properties
Author(s): Kaoru Koike; Kohichi Nakayama; Kazuhisa Ogawa; Hidetoshi Ohnuma
Show Abstract
Lithography process window enhancement using integrated design defect detection and fix
Author(s): Bo Su; Melody Ma; Abhishek Vikram; William Volk; Hong Du; Gaurav Verma; Richard Morse; Chih-wei Chu; Becky Tsao; Char Lin; Jacky Chou; Sidney Tsai
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Automated hot-spot fixing system applied for metal layers of 65 nm logic devices
Author(s): Sachiko Kobayashi; Suigen Kyoh; Toshiya Kotani; Satoshi Tanaka; Soichi Inoue
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Automatic pitch decomposition for improved process window when printing dense features at k<sub>1</sub>eff<0.20
Author(s): Judy Huckabay; Wolf Staud; Robert Naber; Mircea Dusa; Donis Flagello; Robert Socha
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Dark field double dipole lithography (DDL) for 45 nm node and beyond
Author(s): Stephen Hsu; Martin Burkhardt; Jungchul Park; Douglas Van Den Broeke; J. Fung Chen
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Highly accurate modeling by using 2-dimensional calibration data set for model-based OPC verification
Author(s): Cheol-kyun Kim; Jae-Seung Choi; Byung-Ho Nam; DongGyu Yim
Show Abstract
A focus exposure matrix model for full chip lithography manufacturability check and optical proximity correction
Author(s): Youping Zhang; Mu Feng; Hua-yu Liu
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Inverse lithography technology (ILT): What is the impact to the photomask industry?
Author(s): Linyong Pang; Yong Liu; Dan Abrams
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Novel mask inspection flow for better defect review and analysis
Author(s): Kwon Lim; Jin Hyung Park; Dong Hoon Chung; Seong Woon Choi; Woo Sung Han; Hideo Takizawa; Kouji Miyazaki
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Advanced photomask repair technology for 65-nm lithography
Author(s): Fumio Aramaki; Tomokazu Kozakai; Yasuhiko Sugiyama; Masashi Muramatsu; Yoshihiro Koyama; Osamu Matsuda; Katsumi Suzuki; Mamoru Okabe; Ryoji Hagiwara; Anto Yasaka; Tatsuya Adachi; Yoshiyuki Tanaka; Osamu Suga; Naoki Nishida; Youichi Usui
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Mask repair technique assessment and development for the 45nm lithographic node
Author(s): H. Marchman; D. Taylor; S. Hadisutjipto; S. Mackay; R. Cottle; J. Maltabes; J. Brown
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First results for hyper NA scanner emulation from AIMS 45-193i
Author(s): Axel Zibold; Ulrich Strössner; Norbert Rosenkranz; Andrew Ridley; Rigo Richter; Wolfgang Harnisch; Alvina Williams
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Scatterometry based CD and profile metrology of chrome-less masks using optical digital profilometry
Author(s): Kyung-man Lee; Sanjay Yedur; Wen-hao Cheng; Malahat Tavassoli; Kiho Baik
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Assurance of CD for 45-nm half-pitch with immersion microscope
Author(s): Takeshi Yamane; Rikiya Taniguchi; Takashi Hirano
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Measurement tool influence on CD results on photolithographic masks
Author(s): Jan Richter; Roman Liebe; Frank Laske; Jens Rudolf; Torben Heins
Show Abstract
RET masks for patterning 45nm node contact hole using ArF immersion lithography
Author(s): Michael Hsu; J. Fung Chen; Doug Van Den Broeke; Shih En Tszng; Jason Shieh; Stephen Hsu; Xuelong Shi
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Pellicle-induced aberrations and apodization in hyper-NA optical lithography
Author(s): Karsten Bubke; Benjamin Alles; Eric Cotte; Martin Sczyrba; Christophe Pierrat
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Rigorous mask modeling using waveguide and FDTD methods: an assessment for typical hyper-NA imaging problems
Author(s): Andreas Erdmann; Peter Evanschitzky; Giuseppe Citarella; Tim Fühner; Peter De Bisschop
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A single-exposure approach for patterning 45nm flash/DRAM contact hole mask
Author(s): Ting Chen; Doug Van Den Broeke; Edita Tejnil; Stephen Hsu; Sangbong Park; Gabriel Berger; Tamer Coskun; Joep De Vocht; Noel Corcoran; J. Fung Chen; Eddy van der Heijden; Jo Finders; Andre Engelen; Robert Socha
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Assessment of wafer pattern prediction accuracy by introducing effectively equivalent mask patterns
Author(s): M. Satake; A. Mimotogi; S. Tanaka; S. Mimotogi; K. Hashimoto; S. Inoue
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Extended process window using variable transmission PSM materials for 65 nm and 45 nm node
Author(s): Corinna Koepernik; Hans Becker; Robert Birkner; Ute Buttgereit; Mathias Irmscher; Lorenz Nedelmann; Axel Zibold
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Study of mask induced polarization effects on att.PSM in immersion lithography
Author(s): Takashi Mizoguchi; Yousuke Kojima; Mikio Takagi; Tadashi Saga; Takashi Haraguchi; Toshio Konishi; Yuuichi Fukushima; Tsuyoshi Tanaka; Yoshimitsu Okuda
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Hp45 lithography in consideration of the mask 3D effect
Author(s): Kazuya Sato; Masamitsu Itoh; Takashi Sato
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Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography
Author(s): Masaki Yoshizawa; Vicky Philipsen; Leonardus H. A. Leunissen; Eric Hendrickx; Rik Jonckheere; Geert Vandenberghe; Ute Buttgereit; Hans Becker; Corinna Koepernik; Mathias Irmscher
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Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond
Author(s): Nobutaka Kikuiri; Shingo Murakami; Hideo Tsuchiya; Motonari Tateno; Kenichi Takahara; Shinichi Imai; Ryoichi Hirano; Ikunao Isomura; Yoshitake Tsuji; Yukio Tamura; Kenichi Matsumura; Kinya Usuda; Masao Otaki; Osamu Suga; Katsumi Ohira
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Photomask etch challenges for future technology nodes
Author(s): Madhavi Chandrachood; Michael Grimbergen; Toi Yue B. Leung; Keven Yu; Renee Koch; Jeff Chen; Ibrahim M. Ibrahim; Sheeba Panayil; Ajay Kumar
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