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PROCEEDINGS VOLUME 6151

Emerging Lithographic Technologies X
Editor(s): Michael J. Lercel
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Volume Details

Volume Number: 6151
Date Published: 10 March 2006
Softcover: 124 papers (1208) pages
ISBN: 9780819461940

Table of Contents
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A year in the life of immersion lithography at Albany Nanotech
Author(s): Michael Tittnich; John G. Hartley; Greg Denbeaux; Uzo Okoroanyanwu; Harry Levinson; Karen E. Petrillo; Chris Robinson; Dario Gil; Dan Corliss; David Back; Stefan Brandl; Christian Schwarz; Frank Goodwin; Yayi Wei; Brian Martinick; Richard Housley; Peter Benson; Kevin Cummings
Show Abstract
EUV pellicle development for mask defect control
Author(s): Yashesh A. Shroff; Michael Goldstein; Bryan Rice; Sang H. Lee; K. V. Ravi; Daniel Tanzil
Show Abstract
Nikon EUVL development progress summary
Author(s): Takaharu Miura; Katsuhiko Murakami; Kazuaki Suzuki; Yoshiaki Kohama; Yukiharu Ohkubo; Takeshi Asami
Show Abstract
Schwarzschild-objective-based EUV micro-exposure tool
Author(s): Uwe Detlef Zeitner; Torsten Feigl; Tino Benkenstein; Christoph Damm; Thomas Peschel; Norbert Kaiser; Andreas Tünnermann
Show Abstract
Evaluation of resolution and LER in the resist patterns replicated by EUV microexposure tools
Author(s): Yukiko Kikuchi; Yuusuke Tanaka; Hiroaki Oizumi; Fumiaki Kumasaka; DooHoon Goo; Iwao Nishiyama
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First performance results of the ASML alpha demo tool
Author(s): Hans Meiling; Henk Meijer; Vadim Banine; Roel Moors; Rogier Groeneveld; Harm-Jan Voorma; Uwe Mickan; Bas Wolschrijn; Bas Mertens; Gregor van Baars; Peter Kürz; Noreen Harned
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EUVL mask blanks: Recent results on substrates, multilayers and the dry-etch process of TaN-absorbers
Author(s): Holger Seitz; Markus Renno; Thomas Leutbecher; Nathalie Olschewski; Torsten Reichardt; Ronny Walter; Helmut Popp; Günter Hess; Florian Letzkus; Jörg Butschke; Mathias Irmscher
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Demonstration of phase-shift masks for extreme-ultraviolet lithography
Author(s): Bruno La Fontaine; Adam R. Pawloski; Obert Wood; Yunfei Deng; Harry J. Levinson; Patrick Naulleau; Paul E. Denham; Eric Gullikson; Brian Hoef; Christian Holfeld; Christian Chovino; Florian Letzkus
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RIM-13: A high-resolution imaging tool for aerial image monitoring of patterned and blank EUV reticles
Author(s): M. Booth; A. Brunton; J. Cashmore; P. Elbourn; G. Elliner; M. Gower; J. Greuters; J. Hirsch; L. Kling; N. McEntee; P. Richards; V. Truffert; I. Wallhead; M. Whitfield
Show Abstract
EUV mask and chuck analysis: simulation and experimentation
Author(s): Madhura Nataraju; Jaewoong Sohn; Andrew R. Mikkelson; Kevin T. Turner; Roxann L. Engelstad; Chris K. Van Peski
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Modeling methodologies and defect printability maps for buried defects in EUV mask blanks
Author(s): Michael C. Lam; Andrew R. Neureuther
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Visible light point-diffraction interferometer for testing of EUVL optics
Author(s): Seiji Takeuchi; Osamu Kakuchi; Kenji Yamazoe; Yoshio Gomei; Todd A. Decker; Michael A. Johnson; Donald W. Phillion; John S. Taylor
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EUV testing of multilayer mirrors: critical issues
Author(s): S. B. Hill; I. Ermanoski; S. Grantham; C. Tarrio; T. B. Lucatorto; T. E. Madey; S. Bajt; M. Chandhok; P. Yan; O. Wood; S. Wurm; N. V. Edwards
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Model of Ru surface oxidation for the lifetime scaling of EUVL projection optics mirror
Author(s): Iwao Nishiyama
Show Abstract
Effect of residual gas atmosphere on lifetime of Ru-capped EUVL projection optics mirror
Author(s): Yukinobu Kakutani; Masahito Niibe; Yoshio Gomei; Hiromitsu Takase; Shigeru Terashima; Shuichi Matsunari; Takashi Aoki; Katsuhiko Murakami; Yasuaki Fukuda
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Characterization of large off-axis EUV mirrors with high accuracy reflectometry at PTB
Author(s): Christian Laubis; Christian Buchholz; Andreas Fischer; Sven Plöger; Frank Scholz; Heike Wagner; Frank Scholze; Gerhard Ulm; Hartmut Enkisch; Stephan Müllender; Marco Wedowski; Eric Louis; Erwin Zoethout
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Multi-level step and flash imprint lithography for direct patterning of dielectrics
Author(s): Frank Palmieri; Michael D. Stewart; Jeff Wetzel; Jianjun Hao; Yukio Nishimura; Kane Jen; Colm Flannery; Bin Li; Huang-Lin Chao; Soo Young; Woon Chun Kim; Paul S. Ho; C. Grant Willson
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Photonic crystals from step and flash imprint lithography
Author(s): J. Christopher Taylor; Tim Hostetler; Pavel Kornilovich; Ken Kramer
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Defect inspection for imprint lithography using a die to database electron beam verification system
Author(s): L. Jeff Myron; Ecron Thompson; Ian McMackin; Douglas J. Resnick; Tadashi Kitamura; Toshiaki Hasebe; Shinichi Nakazawa; Toshifumi Tokumoto; Eric Ainley; Kevin Nordquist; William J. Dauksher
Show Abstract
Characterizing nanoimprint pattern cross-section and fidelity from x-ray reflectivity
Author(s): Hae-Jeong Lee; Christopher L. Soles; Hyun Wook Ro; D. R. Hines; Ronald L. Jones; Eric K. Lin; Alamgir Karim; Wen-li Wu
Show Abstract
Development status of EUV sources for use in Beta-tools and high-volume chip manufacturing tools
Author(s): U. Stamm; J. Kleinschmidt; Denis Bolshukhin; J. Brudermann; G. Hergenhan; V. Korobotchko; B. Nikolaus; M. C. Schürmann; G. Schriever; C. Ziener; V. M. Borisov
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Application of a high-brightness electrodeless Z-pinch EUV source for metrology, inspection, and resist development
Author(s): Stephen F. Horne; Matthew M. Besen; Donald K. Smith; Paul A. Blackborow; Robert D'Agostino
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EUV sources for the alpha-tools
Author(s): Joseph Pankert; Rolf Apetz; Klaus Bergmann; Marcel Damen; Günther Derra; Oliver Franken; Maurice Janssen; Jeroen Jonkers; Jürgen Klein; Helmar Kraus; Thomas Krücken; Andreas List; Micheal Loeken; Arnaud Mader; Christof Metzmacher; Willi Neff; Sven Probst; Ralph Prümmer; Oliver Rosier; Stefan Schwabe; Stefan Seiwert; Guido Siemons; Dominik Vaudrevange; Dirk Wagemann; Achim Weber; Oliver Zitzen
Show Abstract
LPP EUV source development for HVM
Author(s): Björn A. M. Hansson; Igor V. Fomenkov; Norbert R. Böwering; Alex I. Ershov; William N. Partlo; David W. Myers; Oleh V. Khodykin; Alexander N. Bykanov; Curtis L. Rettig; Jerzy R. Hoffman; Ernesto Vargas; Rod D. Simmons; Juan A. Chavez; William F. Marx; David C. Brandt
Show Abstract
Development of CO2 laser produced Xe plasma EUV light source for microlithography
Author(s): Hakaru Mizoguchi; Akira Endo; Tatsuya Ariga; Taisuke Miura; Hideo Hoshino; Yoshifumi Ueno; Masaki Nakano; Hiroshi Komori; Akira Sumitani; Tamotsu Abe; Takashi Suganuma; Georg Soumagne; Hiroshi Someya; Yuichi Takabayashi; Koichi Toyoda
Show Abstract
Design and optimization of collectors for extreme ultraviolet lithography
Author(s): Fabio E. Zocchi; Enrico Buratti; Valentino Rigato
Show Abstract
Defect printability study using EUV lithography
Author(s): Christian Holfeld; Karsten Bubke; Falk Lehmann; Bruno La Fontaine; Adam R. Pawloski; Siegfried Schwarzl; Frank-Michael Kamm; Thomas Graf; Andreas Erdmann
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EUV lithography simulation for the 32nm node
Author(s): Eun Jin Kim; Wook Chang; Jin Back Park; Sung Jin Kim; Jong Sun Kim; Hye-Keun Oh
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Simulation analysis of printability of scratch and bump defects in EUV lithography
Author(s): Minoru Sugawara; Iwao Nishiyama
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EUV imaging with a 13nm tabletop laser reaches sub-38 nm spatial resolution
Author(s): Georgiy Vaschenko; Fernando Brizuela; Courtney Brewer; Miguel A. Larotonda; Yong Wang; Bradley M. Luther; Mario C. Marconi; Jorge J. Rocca; Carmen S. Menoni; Weilun Chao; Erik H. Anderson; Yanwei Liu; David T. Attwood
Show Abstract
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
Author(s): Patrick P. Naulleau; Clemens Rammeloo; Jason P. Cain; Kim Dean; Paul Denham; Kenneth A. Goldberg; Brian Hoef; Bruno La Fontaine; Adam R. Pawloski; Carl Larson; Greg Wallraff
Show Abstract
Technology mapping technique for throughput enhancement of character projection equipment
Author(s): Makoto Sugihara; Taiga Takata; Kenta Nakamura; Ryoichi Inanami; Hiroaki Hayashi; Katsumi Kishimoto; Tetsuya Hasebe; Yukihiro Kawano; Yusuke Matsunaga; Kazuaki Murakami; Katsuya Okumura
Show Abstract
High-sensitivity interferometric schemes for ML2 micromirror calibrations
Author(s): Jen-Shiang Wang; Olav Solgaard; Andrew R. Neureuther
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Multi-scale modeling of nano-imprint lithography
Author(s): David A. Mendels
Show Abstract
Increasing effective resolution through surface conditioners for 1x imprint templates and photo mask applications beyond 65nm
Author(s): Kosta S. Selinidis; John G. Maltabes; Madhukar B. Rao; Peng Zhang
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NIL template manufacturing using a variable shaped e-beam writer and a new pCAR
Author(s): Mathias Irmscher; Joerg Butschke; Guenter Hess; Corinna Koepernik; Florian Letzkus; Markus Renno; Holger Sailer; Hubert Schulz; Anatol Schwersenz; Ecron Thompson
Show Abstract
The role of stress in nanoimprint lithography
Author(s): Hyun Wook Ro; Yifu Ding; Hae-Jeong Lee; Daniel R. Hines; Ronald L. Jones; Eric K. Lin; Alamgir Karim; Wen-li Wu; Christopher L. Soles
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Vapor deposited release layers for nanoimprint lithography
Author(s): Tong Zhang; Boris Kobrin; Mike Wanebo; Romek Nowak; Richard Yi; Jeff Chinn; Markus Bender; Andreas Fuchs; Martin Otto
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Phase defect observation using an EUV microscope
Author(s): Kazuhiro Hamamoto; Yuzuru Tanaka; Takahiro Yoshizumi; Yasuyuki Fukushima; Hideaki Shiotani; Noriyuki Sakaya; Morio Hosoya; Tsutomu Shoki; Takeo Watanabe; Hiroo Kinoshita
Show Abstract
Novel low thermal expansion material for EUV application
Author(s): Mitsuhiro Kawata; Akira Takada; Hideaki Hayashi; Naoki Sugimoto; Shinya Kikugawa
Show Abstract
Plasma-assisted cleaning by electrostatics (PACE)
Author(s): W. M. Lytle; M. J. Neumann; D. N. Ruzic
Show Abstract
Defect inspection of EUV mask blank using confocal microscopy: simulation and experiment
Author(s): Seong-Sue Kim; Jinhong Park; Roman Chalykh; Jiehun Kang; SukJoo Lee; Sang-Gyun Woo; Han-Ku Cho; Joo-Tae Moon
Show Abstract
Evaluation of FIB and e-beam repairs for implementation on step and flash imprint lithography templates
Author(s): S. R. Young; W. J. Dauksher; K. J. Nordquist; E. S. Ainley; K. A. Gehoski; A. A. Graupera; M. H. Moriarty
Show Abstract
Building 1x NIL templates: challenges and requirements
Author(s): Tony DiBiase; John Maltabes; Bryan Reese; Mohsen Ahmadian
Show Abstract
Resolution improvement of EPL stencil mask using thin membrane
Author(s): Hiroshi Sugimura; Hideyuki Eguchi; Masashi Norimoto; Yoshiyuki Negishi; Isao Yonekura; Kojiro Ito; Akira Tamura; Fumihiro Koba; Hiroshi Arimoto
Show Abstract
Advanced Image Placement Performance for the Current EPL Masks
Author(s): Hideyuki Eguchi; Hiroshi Sugimura; Kaoru Koike; Hiroshi Sakaue; Hiroshi Arimoto; Kentaro Ogawa; Takashi Susa; Shinji Kunitani; Toshiaki Kurosu; Takashi Yoshii; Kojiro Itoh; Akira Tamura
Show Abstract
Assessment of electron projection lithography mask membrane image placement accuracy due to fabrication processes
Author(s): Michael J. Boruszewski; Roxann L. Engelstad; Gerald A. Dicks; Hiroshi Sakaue; Hiroshi Arimoto
Show Abstract
Micro/nano lithography realized by chemical printing
Author(s): Peng Yao; Garrett J. Schneider; Janusz Murakowski; Maciej Murakowski; Dennis W. Prather
Show Abstract
EUV generation using a droplet of a suspension including tin as a target of a high-efficiency LPP source for high volume production
Author(s): Toshihisa Tomie; - Sarjono; H. Yashiro; H. Moriwaki; I. Matsushima
Show Abstract
Progress in LPP EUV source development at Osaka University
Author(s): Noriaki Miyanaga; Hiroaki Nishimura; Shinsuke Fujioka; Tatsuya Aota; Shigeaki Uchida; Michiteru Yamaura; Yoshinori Shimada; Kazuhisa Hashimoto; Keiji Nagai; Takayoshi Norimatsu; Katsunobu Nishihara; Masakatsu Murakami; Vasilli Zhakhovskii; Young Gwang Kang; Atsushi Sunahara; Hiroyuki Furukawa; Akira Sasaki; Takeshi Nishikawa; Massahiro Nakatsuka; Hisanori Fujita; Koji Tsubakimoto; Hidetsugu Yoshida; Yasukazu Izawa; Kunioki Mima
Show Abstract
Compact source and beam delivery system for EUV radiation
Author(s): Klaus Mann; Frank Barkusky; Armin Bayer; Christian Peth; Holger Töttger
Show Abstract
Characterization of CCD sensor for actinic mask blank inspection
Author(s): Yoshihiro Tezuka; Toshihiko Tanaka; Tsuneo Terasawa; Toshihisa Tomie
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Performance and quality analysis of Mo-Si multilayers deposited by ion beam sputtering and magnetron sputtering
Author(s): Kenji Hiruma; Shinji Miyagaki; Hiromasa Yamanashi; Yuusuke Tanaka; Jerry Cullins; Iwao Nishiyama
Show Abstract
Phase-shift mask for EUV lithography
Author(s): C. Constancias; M. Richard; D. Joyeux; J. Chiaroni; R. Blanc; J. Y. Robic; E. Quesnel; V. Muffato
Show Abstract
Impact of multi-layer deposition method on defects for EUVL photomask blanks
Author(s): Jerry Cullins; Kumi Motai; Iwao Nisiyama
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Combined absorber stack for optimization of the EUVL mask
Author(s): Seung Yoon Lee; Tae Geun Kim; Chung Yong Kim; In-Yong Kang; Yong-Chae Chung; Jinho Ahn
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High-precision (<1ppb/°C) optical heterodyne interferometric dilatometer for determining absolute CTE of EUVL materials
Author(s): Yoshimasa Takeichi; Iwao Nishiyama; Naofumi Yamada
Show Abstract
Actinic EUVL mask blank defect inspection by EUV photoelectron microscopy
Author(s): Ulf Kleineberg; Jingquan Lin; Ulrich Neuhaeusler; Jawad Slieh; Ulrich Heinzmann; Nils Weber; Matthias Escher; Michael Merkel; Andreas Oelsner; Dima Valsaitsev; Gerd Schoenhense
Show Abstract
Numerical modeling of absorber characteristics for EUVL
Author(s): In-Yong Kang; Jinho Ahn; Hye-Keun Oh; Yong-Chae Chung
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Characterization of striae in ULE for EUVL optics and masks
Author(s): William Rosch; Lorrie Beall; John Maxon; Robert Sabia; Robert Sell
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Striae evaluation of TiO2-SiO2 ultra-low expansion glasses using the line-focus-beam ultrasonic material characterization system
Author(s): Mototaka Arakawa; Jun-ichi Kushibiki; Yuji Ohashi
Show Abstract
Three-dimensional rigorous simulation of EUV defective masks using modal method by Fourier expansion
Author(s): Rafik Smaali; Maxime Besacier; Patrick Schiavone
Show Abstract
Data conversion system for character projection-type low-energy electron beam direct writing system
Author(s): Ryoichi Inanami; Katsumi Kishimoto; Kazuhiro Nakai; Yoshikazu Ichioka; Kiyoshi Kitamura; Ryo Yamada; Shunko Magoshi
Show Abstract
Tri-layer resists process for fabricating 45-nm L&S patterns by EPL
Author(s): Fumihiro Koba; Kazuyuki Matsumaro; Eiichi Soda; Tadayoshi Watanabe; Yoshihisa Matsubara; Hiroshi Arimoto; Tasuku Matsumiya; Daisuke Kawana; Naoki Yamashita; Yasushi Fujii; Katsumi Ohmori; Mitsuru Sato; Takahiro Kozawa; Seiichi Tagawa
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New proximity effect correction for under 100nm patterns
Author(s): Masahiro Shoji; Nobuyasu Horiuchi; Tomoyuki Chikanaga; Takashi Niinuma; Dai Tsunoda
Show Abstract
Model-based lithography verification system for multilayer structure in electron-beam direct writing
Author(s): Kozo Ogino; Hiromi Hoshino; Yasuhide Machida
Show Abstract
A character projection low energy electron beam direct writing system for device of small production lot with a variety of design
Author(s): Fumihiko Nakamura; Katsuhide Watanabe; Hidetoshi Kinoshita; Hiroyuki Shinozaki; Yasushi Kojima; Satoshi Morita; Kouhei Noguchi; Norihiro Yamaguchi; Hisashi Isokawa; Kazuhiko Kushitani; Takayuki Satoh; Takeshi Koshiba; Takumi Oota; Tetsuro Nakasugi; Hiroyuki Mizuno
Show Abstract
Reduced complexity compression algorithms for direct-write maskless lithography systems
Author(s): Hsin-I Liu; Vito Dai; Avideh Zakhor; Borivoje Nikolic
Show Abstract
Effects of low-voltage electron beam lithography
Author(s): Mehdi Bolorizadeh; David C. Joy
Show Abstract
The effects of wafer-scan induced image blur on CD control, image slope, and process window in maskless lithography
Author(s): Yijian Chen; Yashesh Shroff
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Achieving mask-based imaging with optical maskless lithography
Author(s): Elizabeth M. Stone; Jason D. Hintersteiner; Wenceslao A. Cebuhar; Ronald Albright; Nicholas K. Eib; Azat Latypov; Nabila Baba-Ali; Sherman K. Poultney; Ebo H. Croffie
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Organic-inorganic hybrid materials for nanoimprint lithography
Author(s): Junko Katayama; Shigeru Yamaki; Masahiro Mitsuyama; Makoto Hanabata
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Planarization for Reverse-Tone Step and Flash Imprint Lithography
Author(s): Michael W. Lin; Huang-Lin Chao; Jianjun Hao; Eui Kyoon Kim; Frank Palmieri; Woon Chun Kim; Michael Dickey; Paul S. Ho; C. Grant Willson
Show Abstract
Study of nano-imprint for sub-100nm patterning by using SU-8 3000NIL resist
Author(s): Atsushi Sekiguchi; Yoshiyuki Kono; Satoshi Mori; Nao Honda; Yoshihiko Hirai
Show Abstract
Thermal stress kinetics in the microresist–silicon system
Author(s): S. Tamulevicius; V. Grigaliunas; D. Jucius; V. Ostasevicius; A. Palevicius; G. Janusas
Show Abstract
UV-nanoimprint lithography using a diamond-like carbon stamp
Author(s): Jun-ho Jeong; Ki-don Kim; Young-suk Sim; Dae-geun Choi; Eung-sug Lee; Sang-hu Park; Tae-woo Lim; Dong-yol Yang
Show Abstract
Imprint technology: A potential low-cost solution for sub-45nm device applications
Author(s): Ngoc V. Le; William J. Dauksher; Kathy A. Gehoski; Kevin J. Nordquist; Eric Ainley; Pawitter Mangat
Show Abstract
Nano-imprint of sub-100nm dots and lines feature on 8-inch wafer: influence of layout design
Author(s): S. Landis; Tanguy Leveder; N. Chaix; C. Perret; Cécile Gourgon
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Residual layer-free detachment-based nanolithography
Author(s): Jae Kwan Kim; Jee Won Park; Hongjoo Yang; Mansoo Choi; Joon Ho Choi; Kahp Yang Suh
Show Abstract
A simple lithographic method for fabricating micro/nano multiscale structures
Author(s): Hoon Eui Jeong; Sung Hoon Lee; Pilnam Kim; Jae Kwan Kim; Kahp Y. Suh
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Ultimate fine-pitch resist patterning using the ASET-HINA
Author(s): H. Oizumi; Y. Tanaka; F. Kumasaka; I. Nishiyama
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Sub-32nm patterning using EUVL at ASET
Author(s): Doohoon Goo; Yuusuke Tanaka; Yukiko Kikuchi; Hiroaki Oizumi; Iwao Nishiyama
Show Abstract
Printability of contact-hole patterns in EUVL using 0.3-NA HiNA optics
Author(s): Yuusuke Tanaka; Hiroaki Oizumi; Yukiko Kikuchi; DooHoon Goo; Fumiaki Kumasaka; Iwao Nishiyama
Show Abstract
Aerial-image modeling for the extreme ultraviolet microfield exposure tool at SEMATECH North
Author(s): Patrick Naulleau; Kim Dean; Klaus Lowack
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The EUV resist test center at Sematech-North
Author(s): Klaus Lowack; Andy Rudack; Kim Dean; Matt Malloy; Mike Lercel
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Process window study with various partial coherences on EUV MET (Micro Exposure Tool) optics
Author(s): Sang Hun Lee; Courtney Brewer; Manish Chandhok
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Advanced at-wavelength reflectometry with the EUV tube
Author(s): André Egbert; Stefan Becker
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Lithographic characterization of low-order aberrations in a 0.3-NA EUV microfield exposure tool
Author(s): Patrick Naulleau; Jason Cain; Kim Dean; Kenneth A. Goldberg
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EUV optical system for the reticle imaging microscope (RIM)
Author(s): H. Glatzel; J. Daniel; K. Khajehnouri; U. Mueller; T. Roff; J. Rosenbohm; S. Sporer
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Effect of charged-particle bombardment on collector mirror reflectivity in EUV lithography devices
Author(s): J. P. Allain; M. Nieto; A. Hassanein; V. Titov; P. Plotkin; M. Hendricks; E. Hinson; C. Chrobak; M. H. L. van der Velden; B. Rice
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Active cleaning for lithium-coated optics for HVM EUV systems
Author(s): M. J. Neumann; E. Ritz; R. A. Defrees; M. Cruce; H. Qiu; D. N. Ruzic; R. Bristol; A. Ershov; O. Khodykin
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Halide etching for tin EUV optics cleaning
Author(s): Hyung Joo Shin; Brian E. Jurczyk; D. N. Ruzic; Robert Bristol
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New contamination experimental equipment in the NewSUBARU and evaluation of Si-capped multilayer mirrors using it
Author(s): Masahito Niibe; Yukinobu Kakutani; Shigeru Terashima; Hiromitsu Takase; Yoshio Gomei; Shuichi Matsunari; Takashi Aoki; Katsuhiko Murakami; Yasuaki Fukuda
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Study of ruthenium-capped multilayer mirror for EUV irradiation durability
Author(s): Hiromitsu Takase; Shigeru Terashima; Yoshio Gomei; Masayuki Tanabe; Yutaka Watanabe; Takashi Aoki; Katsuhiko Murakami; Shuichi Matsunari; Masahito Niibe; Yukinobu Kakutani
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Table-top EUV reflectometer
Author(s): U. Hinze; B. Chichkov
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Polarization dependence of multilayer reflectance in the EUV spectral range
Author(s): Frank Scholze; Christian Laubis; Christian Buchholz; Andreas Fischer; Sven Plöger; Frank Scholz; Gerhard Ulm
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Multilayer optics with spectral purity layers for the EUV wavelength range
Author(s): E. Louis; R. W .E. van de Kruijs; A. E. Yakshin; S. Alonso van der Westen; F. Bijkerk; M. M. J. W. van Herpen; D. J. W. Klunder; L. Bakker; H. Enkisch; S. Müllender; M. Richter; V. Banine
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Sub-100nm trackwidth development by e-beam lithography for advanced magnetic recording heads
Author(s): Jei-Wei Chang; Chao-Peng Chen
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Fabrication of organic nanoparticles by PRINT: Master generation using lithographic and RIE techniques
Author(s): Ashish A. Pandya; Benjamin W. Maynor; Stephanie E. A. Gratton; David G. Vellenga; D. Ginger Yu; Carlton M. Osburn; Joseph M. DeSimone
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Proximity lithography membrane mask aeroelasticity
Author(s): Dryver Huston; Dylan Burns; Brent Boerger; Robert Selzer
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Electron beam lithography for high aspect-ratio trench patterning in thick resist: Experimental and simulation results
Author(s): Jianyun Zhou; Shuaigang Xiao; Werner Scholz; XiaoMin Yang
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Soft lithography using perfluorinated polyether molds and PRINT technology for fabrication of 3D arrays on glass substrates
Author(s): Kenton B. Wiles; Natasha S. Wiles; Kevin P. Herlihy; Benjamin W. Maynor; Jason P. Rolland; Joseph M. DeSimone
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Photocurable Pillar Arrays Formed via AC- and Ultrasound-Induced Electrohydrodynamic Instabilities
Author(s): Pavlos C. Tsiartas; Michael D. Dickey; Keris E. Allrich; C. Grant Willson
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Micro-stereo-lithography system
Author(s): T. Yoshimoto; I. Miyaki; H. Yaze; Y. Maruka; N. Ri; T. Teramoto; K. Morohoshi; Y. Koyagi
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Integrated simulation of line-edge roughness (LER) effects on sub-65nm transistor operation: From lithography simulation, to LER metrology, to device operation
Author(s): G. P. Patsis; V. Constantoudis; E. Gogolides
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Using phase-mask algorithms to direct self assembly
Author(s): F. M. Schellenberg; J. A. R, Torres
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High-power pulsed CO2 laser for EUV lithography
Author(s): Tatsuya Ariga; Hideo Hoshino; Taisuke Miura; Akira Endo
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Investigation of a novel discharge EUV source for microlithography
Author(s): Bruno S. Bauer; Volodymyr Makhin; Stephan Fuelling; Irvin R. Lindemuth
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Optical exposure characterization and comparisons for Sn EUV systems
Author(s): Huatan Qiu; Keith C. Thompson; Shailendra N. Srivastava; Erik L. Antonsen; Darren A. Alman; Brian E. Jurczyk; David N. Ruzic
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Debris characterization and mitigation from tin DPP EUV sources
Author(s): Keith C. Thompson; Shailendra N. Srivastava; Erik L. Antonsen; David N. Ruzic; Robert L. Bristol
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EUV source collector
Author(s): Norbert R. Böwering; Alex I. Ershov; William F. Marx; Oleh V. Khodykin; Björn A. M. Hansson; Ernesto Vargas L.; Juan A Chavez; Igor V. Fomenkov; David W. Myers; David C. Brandt
Show Abstract
EUV source developments on laser-produced plasmas using cryogenic Xe and Lithium new scheme target
Author(s): Shuji Miyamoto; Sho Amano; Takahiro Inoue; Petru-Edward Nica; Atsushi Shimoura; Kakyo Kaku; Tsuguhisa Sekioka; Takayasu Mochizuki
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KrF laser driven xenon plasma light source of a small-field exposure tool
Author(s): Tamotsu Abe; Masato Moriya; Hiroshi Someya; Georg Soumagne; Takashi Suganuma; Takayuki Watanabe; Akira Sumitani; Hakaru Mizoguchi
Show Abstract
Studies on cryogenic Xe capillary jet target for laser-produced plasma EUV-light source
Author(s): T. Inoue; P. E. Nica; K. Kaku; A. Shimoura; S. Amano; S. Miyamoto; T. Mochizuki
Show Abstract
Energy spectra and charge state of debris emitted from laser-produced minimum mass tin plasmas
Author(s): Shinsuke Fujioka; Hiroaki Nishimura; Tsuyoshi Ando; Nobuyoshi Ueda; Shinichi Namba; Tatsuya Aota; Masakatsu Murakami; Katsunobu Nishihara; Young-G. Kang; Atsushi Sunahara; Hiroyuki Furukawa; Yoshinori Shimada; Kazuhisa Hashimoto; Michiteru Yamaura; Yuzuri Yasuda; Keiji Nagai; Takayoshi Norimatsu; Noriaki Miyanaga; Yasukazu Izawa; Kunioki Mima
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Analysis of the emission spectrum of Xe and Sn
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Debris mitigation for EUV sources using directional gas flows
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