Share Email Print


Advances in Metrology for X-Ray and EUV Optics

*This item is only available on the SPIE Digital Library.

Volume Details

Volume Number: 5921
Date Published: 31 August 2005

Table of Contents
show all abstracts | hide all abstracts
Advanced metrology: an essential support for the surface finishing of high performance x-ray optics
Author(s): Frank Siewert; Heiner Lammert; Tino Noll; Thomas Schlegel; Thomas Zeschke; Thomas Hänsel; Andreas Nickel; Axel Schindler; Bernd Grubert; Carsten Schlewitt
Show Abstract
Latest metrology results with the SOLEIL synchrotron LTP
Author(s): Muriel Thomasset; Sylvain Brochet; Francois Polack
Show Abstract
Multiple functions long trace profiler (LTP-MF) for National Synchrotron Radiation Laboratory of China
Author(s): Shinan Qian; Qiuping Wang; Yilin Hong; Peter Takacs
Show Abstract
Cylinder lens alignment in the LTP
Author(s): Peter Z. Takacs
Show Abstract
Scanning form measurement for curved surfaces
Author(s): Michael Schulz; Ralf D. Geckeler
Show Abstract
A new designed ultra-high precision profiler
Author(s): Y. Higashi; Y. Takaie; K. Endo; T. Kume; K. Enami; K. Yamauchi; K. Yamamura; H. Sano; K. Ueno; Y. Mori
Show Abstract
Metrology for the development of high-energy x-ray optics
Author(s): Mikhail Gubarev; Brian Ramsey; Darell Engelhaupt; Chet Speegle; Martin Smithers
Show Abstract
X-ray beam metrology and X-ray optic alignment by Hartmann wavefront sensing
Author(s): Pascal Mercere; Samuel Bucourt; Gilles Cauchon; Denis Douillet; Guillaume Dovillaire; Kenneth A. Goldberg; Mourad Idir; Xavier Levecq; Thierry Moreno; Patrick P. Naulleau; Senajith Rekawa; Philippe Zeitoun
Show Abstract
High performance Fizeau and scanning white-light interferometers for mid-spatial frequency optical testing of free-form optics
Author(s): Leslie L. Deck; Chris Evans
Show Abstract
Comparisons between EUV at-wavelength metrological methods
Author(s): Katsumi Sugisaki; Masashi Okada; Yucong Zhu; Katsura Otaki; Zhiqiang Liu; Jun Kawakami; Mikihiko Ishii; Jun Saito; Katsuhiko Murakami; Masanobu Hasegawa; Chidane Ouchi; Seima Kato; Takayuki Hasegawa; Akiyoshi Suzuki; Hideo Yokota; Masahito Niibe; Mitsuo Takeda
Show Abstract
On the choice of a metrological instrument for synchrotron radiation optics
Author(s): G. Sostero; D. Cocco; A. Bianco
Show Abstract
New optical setup for the generation of variable spot size on third generation synchrotron beamlines
Author(s): Thierry Moreno; Rachid Belkhou; Gilles Cauchon; Mourad Idir
Show Abstract
Cross-check of different techniques for two-dimensional power spectral density measurements of x-ray optics
Author(s): Valeriy V. Yashchuk; Steve C. Irick; Eric M. Gullikson; Malcolm R. Howells; Alastair A. MacDowell; Wayne R. McKinney; Farhad Salmassi; Tony Warwick
Show Abstract
First report on a European round robin for slope measuring profilers
Author(s): Amparo Rommeveaux; Muriel Thomasset; Daniele Cocco; Frank Siewert
Show Abstract
Results of x-ray mirror round-robin metrology measurements at the APS, ESRF, and SPring-8 optical metrology laboratories
Author(s): Lahsen Assoufid; Amparo Rommeveaux; Haruhiko Ohashi; Kazuto Yamauchi; Hidekazu Mimura; Jun Qian; Olivier Hignette; Tetsuya Ishikawa; Christian Morawe; Albert Macrander; Ali Khounsary; Shunji Goto
Show Abstract
Real-time stability and profile comparison measurements between two different LTPs
Author(s): Shinan Qian; Duan Jen Wang
Show Abstract
A second optic head for the ELETTRA long trace profiler
Author(s): Daniele Cocco; Anna Bianco; Giovanni Sostero
Show Abstract
Surface figuring and measurement methods with spatial resolution close to 0.1 mm for x-ray mirror fabrication
Author(s): H. Mimura; H. Yumoto; S. Matsuyama; K. Yamamura; Y. Sano; K. Endo; Y. Mori; Y. Nishino; M. Yabashi; K. Tamasaku; T. Ishikawa; K. Yamauchi
Show Abstract
Mirror metrology and bender characterization at ESRF
Author(s): Amparo Rommeveaux; Olivier Hignette; Christian Morawe
Show Abstract

© SPIE. Terms of Use
Back to Top