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Proceedings of SPIE Volume 5533

Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
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Volume Details

Volume Number: 5533
Date Published: 18 October 2004
Softcover: 22 papers (204) pages
ISBN: 9780819454713

Table of Contents
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Fabrication of aspherical mirrors for EUV projection optics set-3 of HiNA
Author(s): Tetsuya Oshino; Shin-ichi Takahashi; Takahiro Yamamoto; Tatsuro Miyoshi; Masayuki Shiraishi; Takaharu Komiya; Noriaki Kandaka; Hiroyuki Kondo; Kiyoto Mashima; Kazushi Nomura; Katsuhiko Murakami; Hiroaki Oizumi; Iwao Nishiyama; Shinji Okazaki
EUV microlithography: a challenge for optical metrology
Author(s): Gunther Seitz; Stefan Schulte; Udo Dinger; Oliver Hocky; Bernhard Fellner; Markus Rupp
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Design and development of an optical system for EUV-microscopy
Author(s): Thomas Foltyn; Klaus Bergmann; Stefan Braun; Peter Gawlitza; Andreas Leson; Willy Neff; Konstantin Walter
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A reflectance measurement system for investigating radiation damage to EUVL mirrors in NewSUBARU
Author(s): Yukinobu Kakutani; Masahito Niibe; Kazuya Kakiuchi; Hiromitsu Takase; Shigeru Terashima; Hiroyuki Kondo; Shuichi Matsunari; Takashi Aoki; Yoshio Gomei; Yasuaki Fukuda
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Investigations of large x-ray optics for free electron lasers
Author(s): Michael Stormer; Audrey Liard-Cloup; Frank Felten; Sandra Jacobi; Barbara Steeg; Josef Feldhaus; Rudiger Bormann
Smoothing of substrate roughness by carbon-based layers prepared by pulsed laser deposition (PLD)
Author(s): Stefan Braun; Beatrice Bendjus; Thomas Foltyn; Maik Menzel; Jurgen Schreiber; Andreas Leson
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Fabrication and testing of Wolter type-I mirrors for soft x-ray microscopes
Author(s): Masato Hoshino; Sadao Aoki; Norio Watanabe; Shinichiro Hirai
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Advances in the use of plasma spraying for the fabrication of lightweight x-ray optics
Author(s): Melville P. Ulmer; Michael Edward Graham; Semyon Vaynman; Matvey Farber; Jonathan I. Echt; Steve J. Varlese; Gary Emerson; Dean Baker
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Magnetorheological finishing of large and lightweight optics
Author(s): Aric B. Shorey; William Kordonski; Marc Tricard
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System wavefront correction using a complex aspheric mirror
Author(s): Robert Kestner; Chris Witebsky; Richard G. Lyon; Robert Woodruff
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Fabrication technology of ultraprecise mirror optics to realize hard x-ray nanobeam
Author(s): Kazuto Yamauchi; Kazuya Yamamura; Hidekazu Mimura; Yasuhisa Sano; Satoshi Matsuyama; Hirokatsu Yumoto; Kazumasa Ueno; Masafumi Shibahara; Katsuyoshi Endo; Makina Yabashi; Kenji Tamasaku; Yoshinori Nishino; Tetsuya Ishikawa; Yuzo Mori
Effect of silicon anisotropy on mirror substrate design
Author(s): Yaming Li; Ali M. Khounsary
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Moiré interferometry formulas for hard x-ray wavefront sensing
Author(s): Timm Weitkamp; A. Diaz; Bernd Nohammer; Franz Pfeiffer; Marco Stampanoni; Eric Ziegler; Christian David
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How and why side cooling of high-heat-load optics works
Author(s): Yaming Li; Ali M. Khounsary; Sudhakar Nair
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New multilayer coating for 30.4-nm radiation
Author(s): Ichiro Yoshikawa; Tetsunori Murachi
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Microstitching interferometry for nanofocusing mirror optics
Author(s): Hidekazu Mimura; Hirokatsu Yumoto; Satoshi Matsuyama; Kazuya Yamamura; Yasuhisa Sano; Kazumasa Ueno; Katsuyoshi Endo; Yuzo Mori; Makina Yabashi; Kenji Tamasaku; Yoshinori Nishino; Tetsuya Ishikawa; Kazuto Yamauchi

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