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PROCEEDINGS VOLUME 5374

Emerging Lithographic Technologies VIII
Editor(s): R. Scott Mackay
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Volume Details

Volume Number: 5374
Date Published: 20 May 2004
Softcover: 119 papers (1170) pages
ISBN: 9780819452870

Table of Contents
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The new, new limits of optical lithography
Author(s): Chris A. Mack
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In the end it's the bottom line that counts
Author(s): Karen H. Brown
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Electron-beam and emerging lithography for the magnetic recording industry
Author(s): Alexander A.G. Driskill-Smith
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Progress in the ASML EUV program
Author(s): Hans Meiling; Vadim Banine; Peter Kuerz; Noreen Harned
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Process latitude measurements and their implications for CD control in EUV lithography
Author(s): Jonathan Cobb; Richard Peters; Sergei Postnikov; Scott D. Hector; Bing Lu; Eric Weisbrod; James R. Wasson; Pawitter Mangat; Donna O'Connell
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EUV imaging: an aerial image study
Author(s): Martin Lowisch; Udo Dinger; Uwe Mickan; Tilmann Heil
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EUV interferometric testing and alignment of the 0.3-NA MET optic
Author(s): Kenneth A. Goldberg; Patrick Naulleau; Paul Denham; Senajith B. Rekawa; Keith Jackson; James Alexander Liddle; Erik H. Anderson
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Shot noise, LER, and quantum efficiency of EUV photoresists
Author(s): Robert L. Brainard; Peter Trefonas; Jeroen H. Lammers; Charlotte A. Cutler; Joseph F. Mackevich; Alexander Trefonas; Stewart A. Robertson
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Determination of the flare specification and methods to meet the CD control requirements for the 32-nm node using EUVL
Author(s): Manish Chandhok; Sang H. Lee; Christof Krautschik; Bryan J. Rice; Eric Panning; Michael Goldstein; Melissa Shell
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Optimized glass-ceramic substrate materials for EUVL applications
Author(s): Ina Mitra; Jochen Alkemper; Rolf Mueller; Uwe Nolte; Axel Engel; Hrabanus Hack; Heiko Kohlmann; Volker Wittmer; Wolfgang Pannhorst; Mark J. Davis; Lutz Aschke; Konrad Knapp
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Low-stress and high-reflectivity molybdenum/silicon multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography
Author(s): Masayuki Shiraishi; Noriaki Kandaka; Katsuhiko Murakami
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Radiation-induced synergistic effects of athermal and thermal mechanisms on erosion and surface evolution of advanced electrode and condenser optics materials
Author(s): Jean Paul Allain; Ahmed Hassanein; Tatiana Burtseva; Abdellatif Yacout; Zinetulla Insepov; Sarfraz Taj; Bryan J. Rice
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Experimental investigation of materials damage induced by hot Xe plasma in EUV lithography devices
Author(s): Ahmed Hassanein; Tatiana Burtseva; Jean Paul Allain; Bryan J. Rice; Vivek Bakshi; Valery Safronov
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EUV source power and lifetime: the most critical issues for EUV lithography
Author(s): Uwe Stamm; Juergen Kleinschmidt; Kai Gaebel; Henry Birner; Imtiaz Ahmad; Denis Bolshukhin; Jesko Brudermann; Tran Duc Chinh; Frank Flohrer; Sven Goetze; Guido Hergenhan; Diethard Kloepfel; Vladimir Korobotchko; Bjorn Mader; Rainer Mueller; Jens Ringling; Guido Schriever; Christian Ziener
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High-power short-pulse laser modules for laser-produced-plasma EUV source
Author(s): Samir Ellwi; Andrew Comley; N. Hay; Michael Brownell
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Status of Philips' extreme UV source
Author(s): Joseph Pankert; Klaus Bergmann; Juergen Klein; Willi Neff; Oliver Rosier; Stefan Seiwert; Christopher Smith; Sven Probst; Dominik Vaudrevange; Guido Siemons; Rolf Apetz; Jeroen Jonkers; Michael Loeken; Guenther Derra; Thomas Kruecken; Peter Zink
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Performance of a 10-kHz laser-produced-plasma light source for EUV lithography
Author(s): Tamotsu Abe; Takashi Suganuma; Yousuke Imai; Hiroshi Someya; Hideo Hoshino; Masaki Nakano; Georg Soumagne; Hiroshi Komori; Yuichi Takabayashi; Hakaru Mizoguchi; Akira Endo; Koichi Toyoda; Yasuhiro Horiike
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Performance and scaling of a dense plasma focus light source for EUV lithography
Author(s): Igor V. Fomenkov; Richard M. Ness; Ian Roger Oliver; Stephan T. Melnychuk; Oleh V. Khodykin; Norbert R. Boewering; Curtis L. Rettig; Jerzy R. Hoffman
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Fabrication process of molecular memory circuits by nanoimprint lithography
Author(s): Gun-Young Jung; S. Ganapathiappan; Xuema Li; Dougleas A. A. Ohlberg; Deidre L. Olynick; Yong Chen; Wei Wu; Shih-Yuan Wang; William M. Tong; R. Stanley Williams
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Nanostructuring of polymers by hot embossing lithography
Author(s): Hella-Christin Scheer; Thomas Glinsner; Matthias Wissen; Rainer Pelzer
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Four-inch photocurable nanoimprint lithography using NX-2000 nanoimprinter
Author(s): Mingtao Li; Hua Tan; Linshu Kong; Larry Koecher
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Current status of Nanonex nanoimprint solutions
Author(s): Hua Tan; Linshu Kong; Mingtao Li; Colby Steere; Larry Koecher
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Step and Repeat UV nanoimprint lithography tools and processes
Author(s): Ian McMackin; Jin Choi; Philip Schumaker; Van Nguyen; Frank Xu; Ecron Thompson; Daniel Babbs; S. V. Sreenivasan; Mike Watts; Norman Schumaker
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Development of imprint materials for the Step and Flash Imprint Lithography process
Author(s): Frank Xu; Nicholas A. Stacey; Mike Watts; Van Truskett; Ian McMackin; Jin Choi; Philip Schumaker; Ecron Thompson; Daniel Babbs; S. V. Sreenivasan; C. Grant Willson; Norman Schumaker
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Production of low-thermal-expansion EUVL mask blanks with low-defect multilayer, buffer, and absorber
Author(s): Frank Sobel; Lutz Aschke; Frauke Rueggeberg; Holger Seitz; Nathalie Olschewski; Torsten Reichhardt; Hans Becker; Markus Renno; Steffen Kirchner; Thomas Leutbecher; Guenter Hess; Konrad Knapp
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EUVL ML blank fiducial mark generation via local heating
Author(s): Pei-Yang Yan; Cameron Wagner
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Development of phase shift masks for extreme ultraviolet lithography and optical evaluation of phase shift materials
Author(s): Sang-In Han; Eric Weisbrod; James R. Wasson; Rich Gregory; Qianghua Xie; Pawitter J. S. Mangat; Scott D. Hector; William J. Dauksher; Kristine M. Rosfjord
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Actinic detection of multilayer defects on EUV mask blanks using LPP light source and dark-field imaging
Author(s): Yoshihiro Tezuka; Masaaki Ito; Tsuneo Terasawa; Toshihisa Tomie
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Effect of absorber material and mask pattern correction on pattern fidelity in EUV lithography
Author(s): Minoru Sugawara; Takeo Hashimoto; Iwao Nishiyama
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Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors
Author(s): Bruno La Fontaine; Adam R. Pawloski; Yunfei Deng; Christian Chovino; Laurent Dieu; Obert R. Wood; Harry J. Levinson
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Modeling for sub-50-nm x-ray application with phase masks
Author(s): James W. Taylor; Daniel H. Malueg; Franco Cerrina; Mumit Khan; Don Thielman
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Nanofabrication with water-dissolvable polymer masks of polyvinyl alcohol (PVA): MxL
Author(s): Charles D. Schaper
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Combined nanoimprint and photolithography technique with a hybrid mold
Author(s): Xing Cheng; Meng-Han Chang; L. Jay Guo
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Mesoscale modeling for SFIL simulating polymerization kinetics and densification
Author(s): Ryan L. Burns; Stephen C. Johnson; Gerard M. Schmid; Eui K. Kim; Michael D. Dickey; Jason Meiring; Sean D. Burns; Nicholas A. Stacey; C. Grant Willson; Diana Convey; Yi Wei; Peter Fejes; Kathleen A. Gehoski; David P. Mancini; Kevin J. Nordquist; William J. Dauksher; Douglas J. Resnick
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Microsystems manufacturing via embossing of photodefinable thermally sacrificial materials
Author(s): Celesta E. White; Travis Anderson; Clifford L. Henderson; Harry D. Rowland; William P. King
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Sub-80-nm contact hole patterning using Step and Flash Imprint Lithography
Author(s): David P. Mancini; Ngoc Le; Kathleen A. Gehoski; Steven Young; William J. Dauksher; Kevin J. Nordquist; Douglas J. Resnick
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Particle-cluster tin target for a high-conversion efficiency LPP source for EUVL
Author(s): Toshihisa Tomie; Tatsuya Aota; Jing Quan Lin; Yoshifumi Ueno; Hidehiko Yashiro; Noriaki Kandaka; Hiroki Moriwaki; Gohta Niimi; Isao Matsushima; Kentaro Nishigori
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Development of magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography
Author(s): Bruno S. Bauer; Roberto C. Mancini; Volodymyr Makhin; Ioana Paraschiv; Andrey Esaulov; Radu Presura; Irvin R. Lindemuth; Peter T. Sheehey; Bryan J. Rice
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Theoretical simulation of extreme UV radiation source for lithography
Author(s): Kazumi Fujima; Katsunobu Nishihara; Toru Kawamura; Hiroyuki Furukawa; Takashi Kagawa; Fumihiro Koike; Richard More; Masakatsu Murakami; Takeshi Nishikawa; Akira Sasaki; Atsushi Sunahara; Vasillii Zhakhovskii; Takashi Fujimoto; Hajime Tanuma
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Simulation and optimization of DPP hydrodynamics and radiation transport for EUV lithography devices
Author(s): Ahmed Hassanein; Valeryi Sizyuk; Vladimir Tolkach; Vitali Morozov; T. Sizyuk; Bryan J. Rice; Vivek Bakshi
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Compact laser-induced EUV source for metrology
Author(s): Klaus Mann; F. Barkusky; Stefan Doering; Sebastian Kranzusch; A. Meyer; Christian Peth
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Debris-free low-cost commercial EUV source for at-wavelength metrology
Author(s): Andre Egbert; Boris Tkachenko; Stefan Becker; Boris N. Chichkov
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EUV resist imaging below 50 nm using coherent spatial filtering techniques
Author(s): Michael D. Shumway; Eric L. Snow; Kenneth A. Goldberg; Patrick Naulleau; Heidi Cao; Manish Chandhok; James Alexander Liddle; Erik H. Anderson; Jeffrey Bokor
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Total performance of Nikon EB stepper R&D tool
Author(s): Tomoharu Fujiwara; Noriyuki Hirayanagi; Jin Udagawa; Junji Ikeda; Sumito Shimizu; Hidekazu Takekoshi; Kazuaki Suzuki
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Preliminary results of EB stepper in the application of 65-nm process
Author(s): Hiroshi Takenaka; Kaoru Koike; Takahiro Tsuchida; Fumihiro Koba; Hiroshi Sakaue; Masaki Yamabe
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Performance and stability of electron projection lithography tool
Author(s): Hiroshi Sakaue; Kaoru Koike; Hiroshi Takenaka; Takahiro Tsuchida; Fumihiro Koba; Masaki Yamabe
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Design rule of hole-layer for electron projection lithography
Author(s): Kaoru Koike; Hiroshi Sakaue; Hiroshi Takenaka; Fumihiro Koba; Takahiro Tsuchida; Masaki Yamabe
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LEEPL production tool: EBPrinter LEEPL-3000
Author(s): Norihiko Samoto; Hideaki Takano; Akihiro Endo; Akira Yoshida; Toyoji Fukui
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Evaporated resist for the fabrication and replication of LEEPL mask
Author(s): Melanie Cloutier; Yousef Awad; Eric Lavallee; David Turcotte; Jacques Beauvais; Dominique Drouin; Lau Kien Mun; Pan Yang; Pierre Lafrance; Ron Legario; Akira Yoshida; Hiroshi Nozue
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LEEPL (low-energy electron beam proximity-projection lithography) over-lay status
Author(s): Norifumi S. Nakajima; Takuji Atarashi; Hiroyuki Sakai; Toyoji Fukui; Hideaki Takano; Daizo Amano
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First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results
Author(s): Tetsuya Kitagawa; Masaki Yoshizawa; Kazuya Iwase; Shinji Omori; Shoji Nohama; Hiroyuki Nakano; Shigeru Moriya; Hiroichi Kawahira
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Near-field x-ray lithography to 15 nm
Author(s): Antony J. Bourdillon; Gwyn P. Williams; Yuli Vladimirsky; Chris B. Boothroyd
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Shrink assist film for enhanced resolution (SAFIER) process for printing of 20-nm trench with high aspect ratio
Author(s): XiaoMin Yang; Harold Gentile
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Validation of lithography based on the controlled movement of light-emitting particles
Author(s): Benjamin Yong Park; Rabih Zaouk; Marc Madou
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Collimated laser-plasma lithography (CPL) for 90-nm and smaller contacts and vias
Author(s): Richard Forber; Celestino Gaeta; Heinz Siegert; Scott McLeod; Brent Edward Boerger
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Manufacturing concerns for advanced CMOS circuit realization EBDW alternative solution for cost and cycle time reductions
Author(s): Laurent Pain; M. Jurdit; Yves T. LaPlanche; J. Todeschini; Serdar Manakli; G. Bervin; Ramiro Palla; A. Beverina; R. Faure; X. Bossy; H. Leininger; S. Tourniol; M. Broekaart; F. Judong; K. Brosselin; P. Gouraud; Veronique De Jonghe; Daniel Henry; M. Woo; Peter Stolk; B. Tavel; F. Arnaud
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Projection maskless lithography
Author(s): Christoph Brandstatter; Hans Loeschner; Gerhard Stengl; Gertraud Lammer; Herbert Buschbeck; Elmar Platzgummer; Hans-Joachim Doring; Thomas Elster; Olaf Fortagne
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Advanced low-complexity compression for maskless lithography data
Author(s): Vito Dai; Avideh Zakhor
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Mixed-signal data interface for maskless lithography
Author(s): Benjamin Warlick; Borivoje Nikolic
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Maskless lithography using drop-on-demand inkjet printing method
Author(s): Yan Wang; Jeffrey Bokor; Arthur Lee
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ESH assessment of advanced lithography materials and processes
Author(s): Walter F. Worth; Ram Mallela
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Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources
Author(s): Ernesto Vargas Lopez; Brian E. Jurczyk; Michael A. Jaworski; Martin J. Neumann; David N. Ruzic
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Scaling studies of capping layer oxidation by water exposure with EUV radiation and electrons
Author(s): W. Miles Clift; Leonard Elliott Klebanoff; Charles Tarrio; Steven Grantham; Obert R. Wood; Stefan Wurm; Nora V. Edwards
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Modeling carbon contamination of extreme ultraviolet (EUV) optics
Author(s): Jeromy Todd Hollenshead; Leonard Elliott Klebanoff
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Image optimization for maskless lithography
Author(s): Yashesh A. Shroff; Yijian Chen; William G. Oldham
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Evaluation of resist outgassing by EUV irradiation
Author(s): Hideo Hada; Takeo Watanabe; Kazuhiko Hamamoto; Hiroo Kinoshita; Hiroshi Komano
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Resist outgassing in electron projection lithography
Author(s): Tasuku Matsumiya; Tomoyuki Ando; Masaaki Yoshida; Kiyoshi Ishikawa; Sumito Shimizu
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Illinois Debris-Mitigation EUV Applications Laboratory (IDEAL)
Author(s): Brian E. Jurczyk; Ernesto Vargas Lopez; Martin J. Neumann; David N. Ruzic
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Evaluation of contamination deposition on pinholes used in EUV at-wavelength PDI
Author(s): Katsumi Sugisaki; Masanobu Hasegawa; Seima Kato; Chidane Ouchi; Jun Saito; Masahito Niibe; Akiyoshi Suzuki; Katsuhiko Murakami
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The erosion of materials exposed to a laser-pulsed-plasma (LPP) extreme ultraviolet (EUV) illumination source
Author(s): Richard J. Anderson; Dean A. Buchenauer; Leonard Elliott Klebanoff; Obert R. Wood; Nora V. Edwards
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EPL data conversion system
Author(s): Masahiro Shoji; Nobuyasu Horiuchi
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200-mm EPL stencil mask fabrication and metrology at DNP: IP and CD accuracy within subfield
Author(s): Tadahiko Takikawa; Mikio Ishikawa; Satoshi Yusa; Yoshinori Kinase; Hiroshi Fujita; Morihisa Hoga; Naoya Hayashi; Hisatake Sano
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Lithographic characterization of EUVL mask blank defects
Author(s): Takeo Hashimoto; Hiromasa Yamanashi; Minoru Sugawara; Iwao Nishiyama
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Aerial image characterization for the defects in the extreme ultraviolet mask
Author(s): Myoung-Sul Yoo; Seung-Wook Park; Jong-Hoi Kim; Yeong-Keun Kwon; Hye-Keun Oh
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EUV absorbance and dry-etching characteristics of TaGeN films for EUVL mask absorber
Author(s): Yuusuke Tanaka; Dongwan Kim; Hiromasa Yamanashi; Iwao Nishiyama
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Simulation of fine structures and defects in EUV etched multilayer masks
Author(s): Yunfei Deng; Bruno La Fontaine; Adam R. Pawloski; Andrew R. Neureuther
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Enhanced model for the efficient 2D and 3D simulation of defective EUV masks
Author(s): Peter Evanschitzky; Andreas Erdmann
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Membrane mask aeroelastic and thermoelastic control
Author(s): Dryver R. Huston; James O. Plumpton; Brian Esser; Sonja Hoelzl; Xiaoguang Wang; Gerald A. Sullivan
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Predicting image placement accuracy of x-ray masks
Author(s): Gerald A. Dicks; Roxann L. Engelstad; Edward G. Lovell; Brent Edward Boerger; Daniel J. Fleming; Karen H. Brown
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EUV wavefront metrology system in EUVA
Author(s): Takayuki Hasegawa; Chidane Ouchi; Masanobu Hasegawa; Seima Kato; Akiyoshi Suzuki; Katsumi Sugisaki; Katsuhiko Murakami; Jun Saito; Masahito Niibe
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High-throughput EUV reflectometer for EUV mask blanks
Author(s): Rainer Lebert; Christian Wies; Larissa Juschkin; Bernhard Jaegle; Manfred Meisen; Lutz Aschke; Frank Sobel; Holger Seitz; Frank Scholze; Gerhard Ulm; Konstantin Walter; Willi Neff; Klaus Bergmann; Wolfgang Biel
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Anisotropic EUV flare measured in the engineering test stand (ETS)
Author(s): Sang Hun Lee; Manish Chandhok; Christof Krautschik; Michael Goldstein
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Lateral shearing interferometer for EUVL: theoretical analysis and experiment
Author(s): Yucong Zhu; Katsumi Sugisaki; Chidane Ouchi; Masanobu Hasegawa; Masahito Niibe; Akiyoshi Suzuki; Katsuhiko Murakami
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Compensation for imaging errors in EUV lithography
Author(s): Paul Harris; Martin McCallum
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Ion damage analysis on EUV collector mirrors
Author(s): Hiroshi Komori; Georg Soumagne; Hideo Hoshino; Tamotsu Abe; Takashi Suganuma; Yousuke Imai; Akira Endo; Koichi Toyoda
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Measuring thermal expansion variations in ULE glass with interferometry
Author(s): Brian L. Harper; Kenneth E. Hrdina; W. David Navan; Joseph Ellison; Andrew Fanning
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Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems
Author(s): Manish Chandhok; Sang H. Lee; Christof G. Krautschik; Guojing Zhang; Bryan J. Rice; Michael Goldstein; Eric Panning; Robert Bristol; Alan R. Stivers; Melissa Shell
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Techniques for directly measuring the absorbance of photoresists at EUV wavelengths
Author(s): Manish Chandhok; Heidi Cao; Wang Yueh; Eric M. Gullikson; Robert L. Brainard; Stewart A. Robertson
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EUV generation using water droplet target
Author(s): Jing Quan Lin; Hidehiko Yashiro; Tatsuya Aota; Toshihisa Tomie
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Properties of EUV emissions from laserproduced tin plasmas
Author(s): Yoshinori Shimada; Hiroaki Nishimura; Kazuhisa Hashimoto; Michiteru Yamaura; Keisuke Shigemori; Mitsuo Nakai; Shinsuke Fujioka; Shigeaki Uchida; Tomoharu Okuno; Takahiro Hibino; Nobuyoshi Ueda; Ryoji Matsui; Yezheng Tao; Keiji Nagai; Takayoshi Norimatsu; Toru Kawamura; Atsushi Sunahara; Katsunobu Nishihara; Noriaki Miyanaga; Masahiro Nakatsuka; Yasukazu Izawa; Chihiro Yamanaka
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Estimation of emission efficiency for laser-produced EUV plasmas
Author(s): Toru Kawamura; Atsushi Sunahara; Kouhei Gamada; Kazumi Fujima; Fumihiro Koike; Hiroyuki Furukawa; Takeshi Nishikawa; Akira Sasaki; Takashi Kagawa; Richard More; Takako Kato; Masakatsu Murakami; Vasillii Zhakhovskii; Hajime Tanuma; Takashi Fujimoto; Yoshinori Shimada; Michiteru Yamaura; Kazuhisa Hashimoto; Shigeaki Uchida; Chiyoe Yamanaka; Tomoharu Okuno; Takahiro Hibino; Nobuyoshi Ueda; Ryoji Matsui; Yezheng Tao; Mitsuo Nakai; Keisuke Shigemori; Shinsuke Fujioka; Keiji Nagai; Takayoshi Norimatsu; Hiroaki Nishimura; Katsunobu Nishihara; Noriaki Miyanaga; Yasukazu Izawa
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Linearity of silicon photodiodes for EUV radiation
Author(s): Frank Scholze; Roman Markus Klein; Ralph Mueller
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High-repetition-rate MPC generator-driven capillary Z-pinch EUV source
Author(s): Yusuke Teramoto; Hiroto Sato; Kazunori Bessho; Takahiro Shirai; Daiki Yamatani; Tetsu Takemura; Toshio Yokota; Kohkan C. Paul; Kiyoyuki Kabuki; Koji Miyauchi; Mitsuru Ikeuchi; Keisuke Okubo; Kazuaki Hotta; Masaki Yoshioka; Koichi Toyoda
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Status of EUV-lamp development and demonstration of applications
Author(s): Rainer Lebert; Christian Wies; Bernhard Jaegle; Larissa Juschkin; Ulrich Bieberle; Manfred Meisen; Willi Neff; Klaus Bergmann; Konstantin Walter; Oliver Rosier; Max Christian Schuermann; Thomas Missalla
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Debris studies for the tin-based droplet laser-plasma EUV source
Author(s): Kazutoshi Takenoshita; Chiew-seng Koay; Somsak Teerawattanasook; Martin C. Richardson
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Spectroscopic studies of the Sn-based droplet laser plasma EUV source
Author(s): Chiew-Seng Koay; Kazutoshi Takenoshita; Etsuo Fujiwara; Moza M. Al-Rabban; Martin C. Richardson
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Laser plasma EUVL sources: progress and challenges
Author(s): Martin C. Richardson; Chiew-Seng Koay; Kazutoshi Takenoshita; C. Keyser; S. George; Somsak Teerawattansook; Moza M. Al-Rabban; H. Scott
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Experimental study on basic properties of laser-produced EUV plasmas on GEKKO-XII laser facility
Author(s): Keisuke Shigemori; Mitsuo Nakai; Yoshinori Shimada; Michiteru Yamaura; Kazuhisa Hashimoto; Shinsuke Fujioka; Hiroaki Nishimura; Shigeaki Uchida; Atsushi Sunahara; Katsunobu Nishihara; Noriaki Miyanaga; Yasukazu Izawa
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Silanized polymeric working stamps for hot embossing lithography
Author(s): Matthias Wissen; N. Bogdanski; R. Jerzy; Z. E. Berrada; Marion Fink; Freimut Reuther; Thomas Glinsner; Hella-Christin Scheer
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Evaluation of the Imprio 100 Step and Flash Imprint Lithography tool
Author(s): Kathleen A. Gehoski; David P. Mancini; Douglas J. Resnick
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Plasticizer-assisted polymer imprint and transfer
Author(s): Li Tan; Yen Peng Kong; Stella W. Pang; Albert F. Yee
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Controlling template response during imprint lithography
Author(s): Scott D. Schuetter; Gerald A. Dicks; Greg F. Nellis; Roxann L. Engelstad; Edward G. Lovell; Brad F. Schulteis
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LEEPL data conversion system
Author(s): Masahiro Shoji; Nobuyasu Horiuchi
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Recent progress of LEEPL mask technology
Author(s): Hiroshi Nozue; Akira Yoshida; Akihiro Endo
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Analysis of critical dimension uniformity for LEEPL
Author(s): Masaki Yoshizawa; Kazuya Iwase; Hiizu Ohtorii; Kumiko Oguni; Hiroki Hane; Keiko Amai; Shigeru Moriya; Hiroyuki Nakano; Tetsuya Kitagawa
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Way for LEEPL technology to succeed in memory device application
Author(s): In-Sung Kim; Sang-Gyun Woo; Han-Ku Cho; Woo-Sung Han; Joo-Tae Moon
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Modeling LEEPL mask fabrication processes
Author(s): Xabier Azkorra; Andrew R. Mikkelson; Roxann L. Engelstad; Edward G. Lovell; Jaehyuk Chang; Jaewoong Sohn; Madhura Nataraju; Hideyuki Eguchi
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System considerations for maskless lithography
Author(s): Thomas Karnowski; David Joy; Larry Allard; Lloyd Clonts
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Layout decompression chip for maskless lithography
Author(s): Borivoje Nikolic; Ben Wild; Vito Dai; Yashesh A. Shroff; Benjamin Warlick; Avideh Zakhor; William G. Oldham
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Exposure simulation of electron beam microcolumn lithography
Author(s): Sang-Kon Kim; Hye-Keun Oh
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Resist formulation effects on contrast and top-loss as measured by 3D-SEM metrology
Author(s): Andrew R. Eckert; Carl Seiler; Robert L. Brainard
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High-resolution EUV microstepper tool for resist testing and technology evaluation
Author(s): Adam Brunton; Julian Cashmore; Peter Elbourn; Graeme Elliner; Malcolm C. Gower; Philipp Grunewald; M. Harman; S. Hough; N. McEntee; S. Mundair; D. Rees; P. Richards; V. Truffert; Ian Wallhead; Mike Whitfield
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Metrology tools for EUV-source characterization and optimization
Author(s): Thomas Missalla; Max Christian Schuermann; Rainer Lebert; Christian Wies; Larissa Juschkin; Roman Markus Klein; Frank Scholze; Gerhard Ulm; Andre Egbert; Boris Tkachenko; Boris N. Chichkov
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Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic
Author(s): Patrick Naulleau; Kenneth A. Goldberg; Erik H. Anderson; Kevin Bradley; Rene Delano; Paul Denham; Bob Gunion; Bruce Harteneck; Brian Hoef; Hanjing Huang; Keith Jackson; Gideon Jones; Drew Kemp; James Alexander Liddle; Ron Oort; Al Rawlins; Senajith Rekawa; Farhad Salmassi; Ron Tackaberry; Carl Chung; Layton Hale; Don Phillion; Gary Sommargren; John Taylor
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Short-term vacuum outgassing measurements with application to load-locks and photoresist
Author(s): Anthony M. Keen; Neil Condon
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Xenon recirculation systems for next-generation lithography tools
Author(s): Joanne R. Greenwood; Darren Mennie; Carolyn Hughes; Ron Lee
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EUVL defect printability at the 32-nm node
Author(s): Eric M. Gullikson; Edita Tejnil; Ted Liang; Alan R. Stivers
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Subatomic accuracy in EUVL multilayer coatings
Author(s): Erwin Zoethout; P. Suter; R. W.E. van de Kruijs; Andrey E. Yakshin; Eric Louis; Fred Bijkerk; H. Enkisch; Stefan Muellender
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Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics
Author(s): Tetsuya Oshino; Takahiro Yamamoto; Tatsuro Miyoshi; Masayuki Shiraishi; Takaharu Komiya; Noriaki Kandaka; Hiroyuki Kondo; Kiyoto Mashima; Kazushi Nomura; Katsuhiko Murakami; Hiroaki Oizumi; Isa Nishiyama; Shinji Okazaki
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