Share Email Print
cover

Proceedings of SPIE Volume 5193

Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.


Volume Details

Volume Number: 5193
Date Published: 13 January 2004
Softcover: 24 papers (232) pages
ISBN: 9780819450661

Table of Contents
show all abstracts | hide all abstracts
Fabrication and metrology of 10X Schwarzschild optics for EUV imaging
Author(s): Louis A. Marchetti
Show Abstract
Fabrication and metrology of diffraction-limited soft x-ray optics for the EUV microlithography
Author(s): Udo Dinger; Guenther Seitz; Stefan Schulte; Frank Eisert; Christian Muenster; Stefan Burkart; Siegfried Stacklies; Christian Bustaus; Hubert Hoefer; Maximilian Mayer; Bernhard Fellner; Oliver Hocky; Markus Rupp; Klaus Riedelsheimer; Peter Kuerz
Show Abstract
Fabrication of EUV components with MRF
Author(s): Paul E. Murphy; James T. Mooney; Thomas P. Courtney
Show Abstract
Smoothing of diamond-turned substrates for extreme-ultraviolet lithography illuminators
Author(s): Regina Soufli; Eberhard Spiller; Mark A. Schmidt; Jeffrey C. Robinson; Sherry L. Baker; Susan Ratti; Michael A. Johnson; Eric M. Gullikson
Show Abstract
EUV collectors: design, development, fabrication, and testing
Author(s): Wilhelm J. Egle; Wolfgang Hafner; Axel Matthes; Eral Erzin; Bernhard Gaenswein; Herbert Schwarz; Piotr Marczuk; Martin Antoni; Wolfgang Singer; Frank Melzer; Joachim Hainz
Show Abstract
Fabrication of meter-scale laser-resistant mirrors for the National Ignition Facility: a fusion laser
Author(s): Christopher J. Stolz; Carolyn L. Weinzapfel; Amy L. Rigatti; Jim B. Oliver; Jason Taniguchi; Ron P. Bevis; Jasbir S. Rajasansi
Show Abstract
Replicated multilayer x-ray mirrors
Author(s): Ladislav Pina; Adolf Inneman; Rene Hudec; Hana Ticha; Yuriy Ya Platonov
Show Abstract
EUV spectral purity filter: optical and mechanical design, grating fabrication, and testing
Author(s): Holger Kierey; Klaus F. Heidemann; Bernd H. Kleemann; Renate Winters; Wilhelm J. Egle; Wolfgang Singer; Frank Melzer; Rutger Wevers; Martin Antoni
Show Abstract
Equal optical path beam splitters by use of amplitude-splitting and wavefront-splitting methods for pencil beam interferometer
Author(s): Shinan Qian; Peter Z. Takacs
Show Abstract
High-performance multilayer coatings for EUV lithography
Author(s): Eberhard Spiller
Show Abstract
Deposition of multilayer mirrors with arbitrary period thickness distributions
Author(s): Thomas Foltyn; Stefan Braun; Matthew Moss; Andreas Leson
Show Abstract
Multilayer mirror design for different applications in the XUV using a versatile simulation program
Author(s): Thomas G. Graf; Alan G. Michette; A. Keith Powell
Show Abstract
Development of Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography
Author(s): Katsuhiko Murakami; Masayuki Shiraishi
Show Abstract
Enhanced reflectivity and stability of Sc/Si multilayers
Author(s): Sergiy A. Yulin; Franz Schaefers; Torsten Feigl; Norbert Kaiser
Show Abstract
Development of an extreme-ultraviolet imaging spectrometer for the Mercury mission
Author(s): Ichiro Yoshikawa; Tetsunori Murachi; Shingo Kameda; Atsushi Yamazaki; Shoichi Okano; Masato Nakamura
Show Abstract
High-performance Cr/Sc multilayers for the soft x-ray range
Author(s): Sergiy A. Yulin; Franz Schaefers; Torsten Feigl; Norbert Kaiser
Show Abstract
Recoating mirrors having a chromium underlayer
Author(s): Ali M. Khounsary; Peter J. Eng; Lahsen Assoufid; Albert T. Macrander; Jun Qian
Show Abstract
Rigorous wavefront analysis of the visible-light point diffraction interferometer for EUVL
Author(s): Katsura Otaki; Yucong Zhu; Mikihiko Ishii; Shigeru Nakayama; Katsuhiko Murakami; Takashi Gemma
Show Abstract
Fabrication technology of hard x-ray aspherical mirror optics and application to nanospectroscopy
Author(s): Yuzo Mori; Kazuto Yamauchi; Kazuya Yamamura; Hidekazu Mimura; Yasuhisa Sano; Akira Saito; Katsuyoshi Endo; Alexei Souvorov; Makina Yabashi; Kenji Tamasaku; Tetsuya Ishikawa; Mari Shimura; Yukihito Ishizaka
Show Abstract
Development of a figure correction method having spatial resolution close to 0.1 mm
Author(s): Yuzo Mori; Kazuto Yamauchi; Kazuya Yamamura; Hidekazu Mimura; Yasuhisa Sano; Akira Saito; Katsuyoshi Endo; Alexei Souvorov; Makina Yabashi; Kenji Tamasaku; Tetsuya Ishikawa
Show Abstract
Performance of an adaptive u-focusing Kirkpatrick-Baez system for high-pressure studies at the Advanced Photon Source
Author(s): Riccardo Signorato; Daniel Hausermann; Maddury Somayazulu; Jean-Francois Carre
Show Abstract
A comparison of uranium oxide and nickle as single-layer reflectors from 2.7 to 11.6 nm
Author(s): Richard L. Sandberg; David D. Allred; J. E. Johnson; R. Steven Turley
Show Abstract
Cooled mirror for a double-undulator beamline
Author(s): Yaming Li; Ali M. Khounsary; Jorg Maser; Sudhakar Nair
Show Abstract
Optimized performance of graded multilayer optics for x-ray single-crystal diffraction
Author(s): Carsten Michaelsen; Joerg Wiesmann; Christian Hoffmann; A. Oehr; A. B. Storm; L. J. Seijbel
Show Abstract

© SPIE. Terms of Use
Back to Top