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19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
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Softcover $105.00 * $105.00 *

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Volume Details

Volume Number: 5148
Date Published: 28 May 2003
Softcover: 30 papers (316) pages
ISBN: 9780819450180

Table of Contents
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Development and characterization of new CD mask standards: a status report
Author(s): Thomas Schatz; Bertram Hauffe; Stefan Dobereiner; Hans-Jurgen Bruck; Bernd Brendel; Lutz Bettin; Klaus-Dieter Roth; Walter Steinberg; Peter Speckbacher; Wolfgang Sedlmeier; Thomas Engel; Wolfgang Hassler-Grohne; Werner Mirande; Harald Bosse
New methods for CD measurements on photomasks using dark field optical microscopy
Author(s): Bernd Bodermann; Winfried Michaelis; Alexander Diener; Werner Mirande
Mask CD characterization with EUV reflectometry at the electron storage ring BESSY II
Author(s): Albrecht Ehrmann; Jenspeter Rau; Andreas Wolter; Frank-Michael Kamm; Josef Mathuni; Frank Scholze; Johannes Tummler; Gerhard Ulm
Ultrathin-membrane EPL masks
Author(s): J. Greschner; T. Bayer; S. Kalt; H. Weiss; Phillip L. Reu; Roxann L. Engelstad; Obert R. Wood; Carey M. Thiel; Michael S. Gordon; Rajinder S. Dhaliwal; Christopher F. Robinson; Hans C. Pfeiffer
Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec <M5k> DUV tool
Author(s): Gerd Scheuring; Alexander Petrashenko; Stefan Doebereiner; Frank Hillmann; Hans-Jurgen Bruck; Andrew C. Hourd; Anthony Grimshaw; Gordon Hughes; Shiuh-Bin Chen; Parkson W. Chen; Thomas Schatz; Thomas Struck; Paul J. M. van Adrichem; Herman Boerland; Sigrid Lehnigk
Implementation of 248-nm-based CD metrology for advanced reticle production
Author(s): Andrew C. Hourd; Anthony Grimshaw; Gerd Scheuring; Christian Gittinger; Stefan Dobereiner; Frank Hillmann; Hans-Jurgen Bruck; Hans Hartmann; Volodymyr Ordynskyy; Kai Peter; Shiuh-Bin Chen; Parkson W. Chen; Rik M. Jonckheere; Vicky Philipsen; Thomas Schatz; Karl Sommer
Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment
Author(s): Rik M. Jonckheere; Vicky Philipsen; Gerd Scheuring; Frank Hillmann; Hans-Jurgen Brueck; Volodymyr Ordynskyy; Kai Peter; Andrew C. Hourd; Thomas Schaetz; Shiuh-Bin Chen; Parkson W. Chen; Karl Sommer
Contact hole litho correlation with shape analysis
Author(s): Maurice Janssen; Khalid Elbattay; Carsten Kohler

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