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Proceedings of SPIE Volume 5130

Photomask and Next-Generation Lithography Mask Technology X
Editor(s): Hiroyoshi Tanabe
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Volume Details

Volume Number: 5130
Date Published: 28 August 2003
Softcover: 116 papers (1086) pages
ISBN: 9780819449962

Table of Contents
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Photomask and lithography technologies: past 10 years and what will come next
Author(s): Koichiro Hoh
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Development of attenuating PSM shifter for F<sub>2</sub> and high-transmission ArF lithography
Author(s): Osamu Nozawa; Yuki Shiota; Hideaki Mitsui; Toshiyuki Suzuki; Yasushi Ohkubo; Masao Ushida; Satoshi Yusa; Toshiharu Nishimura; Kenji Noguchi; Shiho Sasaki; Hiroshi Mohri; Naoya Hayashi
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UV light with oxygen treatment of phase shift photoblank for phase and transmission control: applicable to MxSi(1-x)OyN(y-1)
Author(s): Christian M. Chovino; Laurent Dieu
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Current developments of a high-performance CA resist for mask-making application
Author(s): Wu-Song Huang; Wei He; Wenjie Li; Wayne M. Moreau; Robert Lang; David R. Medeiros; Karen E. Petrillo; Arpan P. Mahorowala; Marie Angelopoulos; Christina Deverich; Chester Huang; Paul A. Rabidoux
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New development method eliminating the loading and microloading effect
Author(s): Kotaro Ooishi; Yukihiko Esaki; Kazuo Sakamoto; Hideaki Sakurai; Masamitsu Itoh; Mika Nakao; Toshiharu Nishimura; Hiroyuki Miyashita; Naoya Hayashi; Shinji Tanabe; Yoshihisa Oosaki; Yasuyoshi Sasagawa
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Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process
Author(s): Dong-Il Park; Eui-Sang Park; Jong-Hwa Lee; Woo-Gun Jeong; Sun-Kyu Seo; Hyuk-Joo Kwon; Jin-Min Kim; Sung-Mo Jung; Sang-Soo Choi
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Dry etch proximity modeling in mask fabrication
Author(s): Yuri Granik
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Effect of chamber seasoning on the chrome dry etch process
Author(s): Jason O. Clevenger; Melisa J. Buie; Nicole L. Sandlin
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Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process
Author(s): Sung-Yong Cho; Won-Suk Ahn; Won-Il Cho; Moon-Gyu Sung; Yong-Hoon Kim; Sung-Woon Choi; Hee-Sun Yoon; Jung-Min Sohn
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Inspection of aggressive OPC using aerial image-based mask inspection
Author(s): Luke T. H. Hsu; Johnson Chang-Cheng Hung; Hong-Chang Hsieh; Anja Rosenbusch; Reuven Falah; Yuval Blumberg
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New die-to-database inspection algorithm for inspection of 90-nm node reticles
Author(s): Hector I. Garcia; William Waters Volk; Sterling Watson; Carl Hess; Chris Aquino; Jim Wiley; Chris A. Mack
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Aerial-image based inspeciton of AAPSM for 193-nm lithography generation
Author(s): Anja Rosenbusch; Shirley Hemar; Reuven Falah
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Application of electron-beam induced processes to mask repair
Author(s): Klaus Edinger; Volker A. Boegli; Michael Budach; Ottmar Hoinkis; Bernd Weyrauch; Hans W. P. Koops; Johannes Bihr; Jens Greiser
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New chelation clean process for removing gallium from the focused-ion-beam repaired mask
Author(s): Same-Ting Chen; Tzy-Ying Lin; Chue-San Yoo
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Actinic aerial image measurement tool for 157-nm lithography
Author(s): Peter Kuschnerus; Thomas Engel; Axel M. Zibold; Claudia Hertfelder; Takashi Yasui; Iwao Higashikawa; Christof M. Schilz; Armin Semmler
Show Abstract
PSM quartz etch depth evaluation with an atomic force microscope
Author(s): Kenji Noguchi; Shiho Sasaki; Yuuichi Yoshida; Takashi Adachi; Tsukasa Abe; Hiroshi Mohri; Haruo Kokubo; Yasutaka Morikawa; Naoya Hayashi
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Recent lithographic results from LEEPL
Author(s): Shigeru Moriya
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Alignment accuracy of LEEPL: image placement error correction
Author(s): Shinichiro Nohdo; Tomonori Motohashi; Nobuo Shimazu; Hiroyuki Nakano; Shinji Omori; Tetsuya Kitagawa; Shigeru Moriya
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Low-stress stencil masks using SOI substrates for EPL and LEEPL
Author(s): Hideyuki Eguchi; Toshiaki Kurosu; Takashi Yoshii; Hiroshi Sugimura; Kojiro Itoh; Akira Tamura
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Proximity-effect correction for EPL by using multiple pattern-area-density maps and pattern classification
Author(s): Fumio Murai; Hiroshi Fukuda; Shigeki Mori; Akio Sato; Kyoji Nakajo
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Evaluation of a transmission CD-SEM for EB stencil masks
Author(s): Mikio Ishikawa; Hiroshi Fujita; Morihisa Hoga; Hisatake Sano
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EUVL: transition from research to commercialization
Author(s): Charles W. Gwyn; Peter J. Silverman
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Pattern inspection of EUV mask using an EUV microscope
Author(s): Takeo Watanabe; Tsuneyuki Haga; Tsutomu Shoki; Kazuhiro Hamamoto; Shintaro Takada; Naoki Kazui; Satoshi Kakunai; Harushige Tsubakino; Hiroo Kinoshita
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Development of a plasma etch process for TaN absorber patterning on EUV masks
Author(s): Guenther G. Ruhl; Josef Mathuni; Dirk Knobloch; Frank-Michael Kamm; Jenspeter Rau; Florian Letzkus; Reinhard Springer
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EPL data conversion system
Author(s): Masahiro Shoji; Nobuyasu Horiuchi
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EPL mask data conversion system EPLON
Author(s): Kokoro Kato; Kuninori Nishizawa; Tamae Haruki; Tadao Inoue
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200-mm EPL stencil mask fabrication by using SOI substrate
Author(s): Hiroshi Sugimura; Hideyuki Eguchi; Takashi Yoshii; Akira Tamura
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LEEPL data conversion system
Author(s): Masahiro Shoji; Nobuyasu Horiuchi
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LEEPL mask fabrication using SOI substrates
Author(s): Kenta Yotsui; Gaku Suzuki; Akira Tamura
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Development of LEEPL 6025 format mask blanks
Author(s): Yuuki Aritsuka; Yukio Iimura; Morihisa Hoga; Hisatake Sano
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On-site use of 1x stencil mask: control over image placement and dimension
Author(s): Shinji Omori; Kazuya Iwase; Yoko Watanabe; Keiko Amai; Takayuki Sasaki; Shoji Nohama; Isao Ashida; Shigeru Moriya; Tetuya Kitagawa
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State-of-the-art performance of stencil mask for LEEPL
Author(s): Shoji Nohama; Shinji Omori; Kazuya Iwase; Yoko Watanabe; Keiko Amai; Takayuki Sasaki; Shigeru Moriya; Tetuya Kitagawa
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Complementary splitting with stress emulation for stencil masks
Author(s): Kohichi Nakayama; Kazuharu Inoue; Isao Ashida; Shinji Omori; Hidetoshi Ohnuma
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Exposure contrast of an EUV mask
Author(s): Morio Hosoya; Tsutomu Shoki; Takeru Kinoshita; Noriyuki Sakaya; Osamu Nagarekawa
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Simulation of extreme ultraviolet masks with defective multilayers
Author(s): Peter Evanschitzky; Andreas Erdmann; Maxime Besacier; Patrick Schiavone
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Dependence of pattern printability on thicknesses of absorber and cap layers of Mo/Si mask blank for EUV lithography
Author(s): Minoru Sugawara; Akira Chiba; Hiromasa Yamanashi; Iwao Nishiyama
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Using OPC to optimize for image slope and improve process window
Author(s): Nicolas B. Cobb; Yuri Granik
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Controlling defocus impact on OPC performance
Author(s): Shinichi Takase; Qi-De Qian
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Single photoresist and double exposure (SPADE) for 0.18-um ROM and beyond
Author(s): W.-H. Sheu
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Alternating phase shift mask architecture scalability, implementations, and applications for 90-nm and 65-nm technology nodes and beyond
Author(s): Wen-Hao Cheng; Kishore K. Chakravorty; Jeff N. Farnsworth
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Practical approach for AAPSM image imbalance correction for sub-100-nm lithography
Author(s): Hung Lin Cho; Shu Yi Lin; Frank Hsieh; Armen Kroyan; Hua-Yu Liu; Jason H. Huang; Shu-Hao Hsu; I-Hsiung Huang; Benjamin Szu-Min Lin; Kuei-Chun Hung
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Low k1 lithography patterning option for the 90-nm and 65-nm nodes
Author(s): Stephen D. Hsu; Douglas J. Van Den Broeke; Xuelong Shi; Michael Hsu; Kurt E. Wampler; J. Fung Chen; Annie Yu; Samuel C. Yang; Frank Hsieh
Show Abstract
Phase defect printability analysis for chromeless phase lithography technology
Author(s): Sungmin Huh; JoHyung Park; Dong-Hoon Chung; Chang-Hwan Kim; In-Kyun Shin; Sung-Woon Choi; Jung-Min Sohn
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Investigation on micro-trench formation of alternating aperture phase shift masks
Author(s): Sung-Won Kwon; Heong-Sup Jeong; Lee-Ju Kim; Chang-Nam Ahn; Hong-Seok Kim
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Investigation of phase variation impact on CPL PSM for low k1 imaging
Author(s): Chun-hung Lin; Michael Hsu; Frank Hsieh; Shu Yi Lin; Stephen D. Hsu; Xuelong Shi; Douglas J. Van Den Broeke; J. Fung Chen; F. C. Tang; W. A. Hsieh; C. Y. Huang
Show Abstract
Mask pattern generator employing EPL technology
Author(s): Nobuyuki Yoshioka; Masaki Yamabe; Wataru Wakamiya; Nobuhiro Endo
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Photomask repeater strategy for high-quality and low-cost reticle fabrication
Author(s): Suigen Kyoh; Soichi Inoue; Osamu Ikenaga; Tomotaka Higaki; Fumiaki Shigemitsu; Ichiro Mori; Haruo Kokubo; Naoya Hayashi; Nobuyuki Irie; Yuki Ishii; Toshikazu Umatate
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Initial capability of new photomask-blank deposition tool
Author(s): Michael D. Kriese; James L. Wood; James R. Rodriguez; Gary Fournier; David L. Thompson; David Mercer; Jason A. Gass; Dale E. Mauldin
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Optical properties of a-Si films for 157-nm lithography
Author(s): SungKwan Kim; YangSoo Kim; Myung-Ah Kang; Jung-Min Sohn; Kwangsoo No
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The feasibility study of thin Cr film for low process bias
Author(s): Woong-Won Seo; Si-Yeul Yoon; Dong-Il Park; Eui-Sang Park; Jin-Min Kim; Sung-Mo Jeong; Sang-Soo Choi; Han-Sun Cha; K. S. Nam
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Improvement of critical dimension stability of chemically amplified resist by overcoat II
Author(s): Teruhiko Kumada; Koji Tange; Kazuyuki Maetoko; Kunihiro Hosono; Masayoshi Tsuzuki; Kyoichi Yonetani; Reiji Terada; Yukio Nakashiba; Shingo Anzai; Yasutaka Kikuchi
Show Abstract
CAR blanks performance for advanced reticle fabrication
Author(s): Masahiro Hashimoto; Yasunori Yokoya; Takao Higuchi; Fumiko Ohta; Shouichi Kawashima; Yasushi Ohkubo
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Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production
Author(s): Woo-Gun Jeong; Dong-Il Park; Eui-Sang Park; Sun-Kyu Seo; Hyuk-Joo Kwon; Jin-Min Kim; Sung-Mo Jung; Sang-Soo Choi
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Investigation of e-beam sensitive negative-tone chemically amplified resists for binary mask making
Author(s): Mathias Irmscher; Lothar Berger; Dirk Beyer; Joerg Butschke; Peter Dress; Thomas Hoffmann; Peter Hudek; Corinna Koepernik; Martin Tschinkl; Peter Voehringer
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Comparative study between REAP 200 and FEP171 CAR with 50 kV raster e-beam system for sub-100-nm technology
Author(s): Ki-Ho Baik; Homer Y. Lem; Robert L. Dean; Stephen Osborne; Mark Mueller; Frank E. Abboud
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A study of post-exposure baking effect for CAR process in photomask fabrication
Author(s): Dong-Il Park; Sun-Kyu Seo; Woo-Gun Jeong; Eui-Sang Park; Jong-Hwa Lee; Hyuk-Joo Kwon; Jin-Min Kim; Sung-Mo Jung; Sang-Soo Choi
Show Abstract
Negative chemically amplified resist in making mask for a logic device with high pattern density
Author(s): Kyung-Han Nam; Hyun-Joon Cho; Seung Hee Baek; Seong-Ho Jeong; Chang-Nam Ahn; Hong-Seok Kim
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Photomask defect tracing, analysis, and reduction with chemically amplified resist process
Author(s): Cheng-ming Lin; Rick Lai; W. H. Huang; B. C. Wang; C. Y. Chen; C. H. Kung; Chue-San Yoo; Jieh-Jang Chen; Sheng-Cha Lee
Show Abstract
Comparison of new film nozzle with standard nozzle for aqueous puddle developing of photomasks
Author(s): Christian Buergel; Werner Saule; M. Strobl; Peter Dress; Anatol Schwersenz; Martin Tschinkl
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Modified model of drying process of a polymer liquid film taking effects of latent heat and heat conductivity into account
Author(s): Hiroyuki Kagami
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Proximity effects for rinse, dry, and etch parameters
Author(s): Sang-Kon Kim; Hye-Keun Oh; Ho Seob Kim
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Study of loading effect on dry etching process
Author(s): Shih-Ming Chang; Chih-Cheng C. Chin; Wen-Chuan Wang; Chi-Lun Lu; Sheng-Chi J. Chin; Hong-Chang Hsieh
Show Abstract
High-resolution etching of MoSi using electron beam patterned chemically amplified resist
Author(s): Mark Mueller; Serguei Komarov; Ki-Ho Baik
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Developement of etch rate uniformity adjustment technology for photomask quartz etch in manufacturing the 100% attenuated PSM
Author(s): Il-Yong Jang; Jeong-Yoon Lee; Yong-Hoon Kim; Sung-Woon Choi; Jung-Min Sohn
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Evalution of 193-nm alternating-aperture phase-shift mask dry etch processes
Author(s): Jason Plumhoff; Chris Constantine; Jong Shin; B. Reelfs; Emmanuel Rausa; Jason M. Benz; Michael S. Hibbs; Timothy A. Brunner
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Improvement of chrome CDU by optimizing focus ring design
Author(s): Rex B. Anderson; Guenther G. Ruhl; Pavel Nesladek; Gerhard Prechtl; Winfried Sabisch; Alfred Kersch; Melisa J. Buie
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Advanced NLD mask dry etching system for 90-nm node technology
Author(s): Noriyuki Harashima; Takaei Sasaki; Kiyoshi Kuwahara; Toshio Hayashi; Yoshiyuki Tanaka; Nobuyuki Yoshioka; Mutsumi Hara; Yukio Ohkubo
Show Abstract
Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results
Author(s): Wolfgang Dettmann; Jan P. Heumann; Tanja Hagner; Roderick Koehle; Stephen Rahn; Martin Verbeek; Mardjan Zarrabian; Jens Weckesser; Mario Hennig; Nicolo Morgana
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Reticle inspection using an image filter method
Author(s): Tomoyuki Okada; Masahiko Minemura; Kazuhiko Takahashi; Mitsuo Sakurai; Satoshi Akutagawa
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Automatic inspection tool sensitivity with characterization of AAPSM defects
Author(s): Darren Taylor; Eric Poortinga; Bryan W. Reese; Blake C. Gibson
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Detection capability for chrome defect of tri-tone PSM
Author(s): Jung-Kwan Lee; Dae-Woo Kim; Kyong-Mun Shin; Dong-Heok Lee; Jin-Min Kim; Sang-Soo Choi
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Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography
Author(s): Motonari Tateno; Naohisa Takayama; Shingo Murakami; Keiichi Hatta; Shinji Akima; Fuyuhiko Matsuo; Masao Otaki; Byung-Gook Kim; Keishi Tanaka; Nobuyuki Yoshioka
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Defect printability and inspection capability for tri-tone PSM
Author(s): Yoshikazu Nagamura; Kazuyuki Maetoko; Kiyoshi Maeshima; Naohisa Tamada; Kunihiro Hosono; Masaya Fujimoto; Yutaka Kodera; Koji Goto; Tsuyoshi Narita; Fuyuhiko Matsuo; Shinji Akima; Mikio Ishijima; Hironobu Iwasaki; Yasutaka Kikuchi
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New repair of clear defects on half-tone PSM using Ga implantation
Author(s): Yoshikazu Nagamura; Itaru Kanai; Koji Tange; Kunihiro Hosono; Koki Hayashi; Hidehiro Ikeda; Susumu Nagashige; Mikio Ishijima; Hironobu Iwasaki; Yasutaka Kikuchi
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Photomask quality assessment strategy at 90-nm technology node with aerial image simulation
Author(s): Yoshikazu Nagamura; Kunihiro Hosono; Linyong Pang; Kevin K. Chan; Yoshio Tanaka
Show Abstract
Evaluation of EA-PSM opaque repair on 90-nm lithography
Author(s): Dae-Woo Kim; Jung-Kwan Lee; Sang-Hoi Koo; Dong-Heok Lee; Jin-Min Kim; Sang-Soo Choi
Show Abstract
New advancements in focused ion beam repair of alternating phase-shift masks
Author(s): Joshua Lessing; Tod Robinson; Rey A. Brannen; Troy B. Morrison; Theresa Holtermann
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Advanced FIB mask repair technology for 100-nm/ArF lithography: II
Author(s): Ryoji Hagiwara; Anto Yasaka; Kazuo Aita; Osamu Takaoka; Yoshihiro Koyama; Tomokazu Kozakai; Toshio Doi; Masashi Muramatsu; Katsumi Suzuki; Yasuhiko Sugiyama; Osamu Matsuda; Mamoru Okabe; Shoji Shinohara; Masakatsu Hasuda; Tatsuya Adachi; Yasutaka Morikawa; Masaharu Nishiguchi; Yasushi Sato; Naoya Hayashi; Toshiya Ozawa; Yoshihiro Tanaka; Nobuyuki Yoshioka
Show Abstract
Defect repair performance using the nanomachining repair technique
Author(s): Yasutaka Morikawa; Haruo Kokubo; Masaharu Nishiguchi; Naoya Hayashi; Roy White; Ron Bozak; Lee Terrill
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High-resolution tool for measuring photomask flatness
Author(s): Dag Lindquist; Andrew W. Kulawiec; Mark J. Tronolone; Jack Frankovich; Chris Lee; Simon Lee; Yoshihiro Nakamura; Takayuki Murakami
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Actinic aerial image measurement tool for 157-nm mask qualification
Author(s): Takashi Yasui; Iwao Higashikawa; Peter Kuschnerus; Thomas Engel; Axel M. Zibold; Claudia Hertfelder; Yuji Kobiyama; Jan-Peter Urbach; Christof M. Schilz; Armin Semmler
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Fourier analysis of AIMS images for mask characterization
Author(s): Roderick Koehle; Wolfgang Dettmann; Martin Verbeek
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Measurement of hard pellicles for 157-nm lithography using Fourier transform phase-shifting interferometry
Author(s): Leslie L. Deck; Chris Van Peski; Richard D. Eandi
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Unified mask data formats for EB writers
Author(s): Koki Kuriyama; Toshio Suzuki; Junji Hirumi; Nobuyuki Yoshioka; Yutaka Hojo; Yuichi Kawase; Shigehiro Hara; Morihisa Hoga; Satoshi W. Watanabe; Masa Inoue; Hidemuchi Kawase; Tomoko Kamimoto
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Application results achieved with LINUX cluster for data preparation
Author(s): Juergen Gramss; Melchior Lemke; Hans Eichhorn; Voler Neick; Michael Kramer; Erhard Stache
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Effective placement of chips on a shuttle mask
Author(s): Shih-Ying Chen; Eric C. Lynn
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Bridging nanometer design-to-manufacturing gap: automated design rules correction and silicon verification
Author(s): Linard N. Karklin; Micha Oren; Dragos Dudau; James D. Jordan
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Impact of OPC aggressiveness on mask manufacturability
Author(s): Satoshi Tanaka; Soichi Inoue; Toshiya Kotani; Kyoko Izuha; Ichiro Mori
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Improve accuracy of empirical models with multiple models
Author(s): Youping Zhang; Minghui Fan
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Reverse engineering of data simulation
Author(s): Hung-Liang Huang
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Shot number analysis at 65-nm node mask writing using VSB writer
Author(s): Junji Hirumi; Koki Kuriyama; Nobuyuki Yoshioka; Ryoichi Yoshikawa; Yutaka Hojo; Takashi Matuzaka; Kazumitsu Tanaka; Morihisa Hoga
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Laser pattern generator challenges in airborne molecular contamination protection
Author(s): Mats Ekberg; Per-Uno Skotte; Tomas Utterback; Swaraj Paul; Oleg P. Kishkovich; James S. Hudzik
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Development of a e-beam lithography system for 100- to 90-nm node reticles
Author(s): Tadashi Komagata; Yuichi Kawase; Yasutoshi Nakagawa; Nobuo Gotoh; Kazumitsu Tanaka
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Error propagation in calibration of e-beam lithography stages
Author(s): Seungbong Yoo; Seung-Woo Kim
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Arbitrary pattern fabrication with a LCD reticle-free exposure method
Author(s): Tatsuo Morimoto; Kazumitsu Nakamura; Hiroshi Kubota; Akira Nakada; Takayuki Akamichi; Tsuneo Inokuchi; Kouji Kosaka
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Semi-aqueous solvent applications for 193-nm EAPSM resist strip
Author(s): Julio R. Reyes; Curt Jackson; Laurent Dieu; William Bowers; Russell Stevens
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Development of pellicle for F2(157-nm) excimer laser
Author(s): Shigeto Shigematsu; Toshihiko Nakano; H. Shigemoto; Masahiro Kondo; Hiroaki Nakagawa; H. Sasaki; Iwao Higashikawa
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SMIF capability at Intel Mask Operation improves yield
Author(s): Thuc H. Dam; Matt Pekny; Jim Millino; Gibson Luu; Nitesh Melwani; Aparna Venkatramani; Malahat Tavassoli
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Enhanced flexible mask specifications
Author(s): Shigeru Hasebe; Shigeki Nojima; Shoji Mimotogi; Satoshi Tanaka; Osamu Ikenaga; Kohji Hashimoto; Soichi Inoue; Ichiro Mori
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Anticipating and controlling mask costs within EDA physical design
Author(s): Michael L. Rieger; Jeffrey P. Mayhew; Lawrence S. Melvin; Robert M. Lugg; Daniel F. Beale
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Efficient hybrid optical proximity correction method based on the flow of design for manufacturability (DfM)
Author(s): Toshiya Kotani; Hirotaka Ichikawa; Takanori Urakami; Shigeki Nojima; Sachiko Kobayashi; Yoko Oikawa; Satoshi Tanaka; Atsuhiko Ikeuchi; Kiminobu Suzuki; Soichi Inoue
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GDS2NEO: high-compression data processing system for a new EB handling format
Author(s): Hidemuchi Kawase; Tomoko Kamimoto; Hiroji Ogasawara; Koki Kuriyama; Junji Hirumi; Nobuyuki Yoshioka
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High-performance fracturing for variable shaped beam mask writing machines
Author(s): Steffen F. Schulze; Emile Y. Sahouria; Eugene A. Miloslavsky
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Technological capability and future enhanced performance of HL-7000M
Author(s): Masaomi Tanaka; Suyo Asai; H. Kawano; Ken Iizumi; Kazuyoshi Oonuki; Hiroyuki Takahashi; Hidetoshi Sato; Rikio Tomiyoshi; Kazui Mizuno; Genya Matsuoka; Hiroya Ohta
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Transparent corner enhancement scheme for a DUV pattern generator
Author(s): Hans Martinsson; Jonas Hellgren; Niklas Eriksson; Mans Bjuggren; Tor Sandstrom
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Study of characteristics and control of haze contamination induced by photochemical reaction
Author(s): Sung-Jae Han; Sang-Yong Yu; Moon-Gyu Sung; Yong-Hoon Kim; Hee-Sun Yoon; Jung-Min Sohn
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Implementation of SMIF in reticle production for front-end processes: impact on yield
Author(s): Renatus Sikorski; Annett Graeser
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Effects of local CD error on lithography performance
Author(s): Shoji Mimotogi; Shigeki Nojima; Shigeru Hasebe
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Extension of Cr-less PSM to sub-90-nm node DRAM and logic device
Author(s): Ju-Hyung Lee; Hyung-Do Kim; Dong-Hoon Chung; Sang-Gyun Woo; Han-Ku Cho; Woo-Sung Han
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Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography
Author(s): Kunio Watanabe; Eiji Kurose; Toshifumi Suganaga; Toshiro Itani
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Pattern-dependence optical phase effect on alternating phase shift mask
Author(s): Bin-Chang Chang; Jan-Wen You; Ming Lu; Chiu-Lien Lee; Li-Wei Kung; King-Chang Shu; Jaw-Jung Shin; Tsai-Sheng Gau; Burn-Jeng Lin
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Phase defect printability of alternating phase shift masks for ArF lithography
Author(s): Nobuyuki Ohba; Kiichi Ishikawa; Mikio Katsumata; Hidetoshi Ohnuma
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Identifying process window marginalities of reticle designs for 0.15/0.13-um technologies
Author(s): Shih Chieh Lo; L. K. Hsieh; J. B. Yeh; Y.-C. Pai; Will Tseng; Mahatma Lin; Ingrid B. Peterson
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Mask cost and cycle time reduction
Author(s): Hong-Chang Hsieh; Johnson Chang-Cheng Hung; Angus S. J. Chin; Sheng-Cha Lee; Jaw-Jung Shin; Ru-Gun Liu; Burn J. Lin
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Mask technologies for metastable atom lithography: photomask and physical mask
Author(s): Xin Ju; Mitsunori Kurahashi; Taku Suzuki; Yasushi Yamauchi
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Resist heating dependence on subfield scheduling in 50-kV electron beam maskmaking
Author(s): Sergey V. Babin; Andrew B. Kahng; Ion Mandoiu; Swamy V. Muddu
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