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Proceedings of SPIE Volume 5044

Advanced Process Control and Automation
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Volume Details

Volume Number: 5044
Date Published: 1 July 2003
Softcover: 18 papers (188) pages
ISBN: 9780819448491

Table of Contents
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Industrial strength lithography APC
Author(s): Christopher P. Ausschnitt; Brian Barker; William A. Muth; Marc Postiglione; Thomas Walentosky
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Optimal model-predictive control of overlay lithography implemented in an ASIC fab
Author(s): Scott A. Middlebrooks
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Improving overlay control through proper use of multilevel query APC
Author(s): Timothy H. Conway; Alan Carlson; David A. Crow
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Knowledge-based APC methodology for overlay control
Author(s): David W. Laidler; Philippe Leray; David A. Crow; Keith E. Roberts
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Stepper registration feedback control in 300-mm manufacturing
Author(s): Joel Fenner; Joel G. Roberts; Steven L. Carson
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Adaptive on-line estimation and control of overlay tool bias
Author(s): Victor M. Martinez; Karen Finn; Thomas F. Edgar
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Improving overlay manufacturing metrics through application of feedforward mask-bias
Author(s): Etienne Joubert; Joseph C. Pellegrini; Manish Misra; John L. Sturtevant; John M. Bernhard; Phu Ong; Nathan K. Crawshaw; Vern Puchalski
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Multiloop photolithography control using hierarchical context information for APC models
Author(s): John D. Stuber
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Exposure-focus critical dimension feedback control in 300-mm manufacturing technologies
Author(s): Anju Narendra; Steven L. Carson; Cynthia Morrison
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Advanced process control for polysilicon gate etching using integrated optical CD metrology
Author(s): Gowri P. Kota; Jorge Luque; Vahid Vahedi; Ashok Khathuria; Thaddeus G. Dziura; Ady Levy
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Computationally efficient modeling of wafer temperatures in an LPCVD furnace
Author(s): Qinghua He; S. Joe Qin; Anthony J. Toprac
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Recursive least squares estimation and its application to shallow trench isolation
Author(s): Jin Wang; S. Joe Qin; Christopher A. Bode; Matthew A. Purdy
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Process control systems integrated for future process technologies
Author(s): Youssry Botros; Hazem M. Hajj
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Cost and revenue impact of advanced process control (APC) with an emphasis on run-to-run control (R2R)
Author(s): Timothy D. Stanley; Richard J. Markle; Brad Van Eck; Brian K. Cusson; Matthew A. Purdy; K. J. Stanley
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Knowledge-based process control for fault detection and classification
Author(s): John Scanlan; Kevin O'Leary
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Neural-network-based run-to-run controller using exposure and resist thickness adjustment
Author(s): Shane Geary; Ronan Barry
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APC system health indicators, or why Cpks aren't good enough
Author(s): Margaret Cromley
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Parallel abstraction of software architecture and statistical principles for tighter process control
Author(s): Rob Firmin
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