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Proceedings of SPIE Volume 5043

Cost and Performance in Integrated Circuit Creation
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Volume Details

Volume Number: 5043
Date Published: 2 July 2003
Softcover: 17 papers (194) pages
ISBN: 9780819448484

Table of Contents
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Silicon economics
Author(s): James Hogan; Ahmad R. Chatila; Bert Bruggeman; Victor V. Boksha
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Technology acceleration: the change in industry requirements
Author(s): Walter J. Trybula
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Technology acceleration: the suppliers' challenge
Author(s): Walter J. Trybula
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Microeconomics of yield learning in semiconductor manufacturing
Author(s): Kevin M. Monahan
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Microeconomics of process control in semiconductor manufacturing
Author(s): Kevin M. Monahan
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Value-based management of design reuse
Author(s): Juan Antonio Carballo; David L. Cohn; Wendy Belluomini; Robert K. Montoye
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Mask cost for sub-100-nm technologies: stopping a runaway?
Author(s): Artur P. Balasinski
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Does technology acceleration equate to mask cost acceleration?
Author(s): Walter J. Trybula; Brian J. Grenon
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Multiproject wafers: not just for million-dollar mask sets
Author(s): Richard D. Morse
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DIVAS: an integrated networked system for mask defect dispositioning and defect management
Author(s): Saghir Munir; Dan Bald; Vikram Tolani; Firoz Ghadiali
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Toward performance-driven reduction of the cost of RET-based lithography control
Author(s): Puneet Gupta; Andrew B. Kahng; Dennis Sylvester; Jie Yang
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Effects of grid-placed contacts on circuit performance
Author(s): Jun Wang; Alfred K. K. Wong
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Cost-effective strategies for ASIC masks
Author(s): Dipankar Pramanik; Henry H. Kamberian; Christopher J. Progler; Michael Sanie; David Pinto
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Electrical validation of resolution enhancement techniques
Author(s): Kunal N. Taravade; Neal P. Callan; Ebo H. Croffie; Aftab Ahmad
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Practical quality metrics for resolution enhancement software
Author(s): Robert E. Boone; Kevin Lucas; Raphael Wynd; Mike Boatright; Matthew A. Thompson; Alfred J. Reich
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Improving IC process efficiency with critical materials management
Author(s): Kathy L. Hanson; Robert E. Andrews
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Understanding the operating expense relationships of layouts on excimer photo tools
Author(s): Dennis B. Ames
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