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PROCEEDINGS VOLUME 5037

Emerging Lithographic Technologies VII
Editor(s): Roxann L. Engelstad
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Volume Details

Volume Number: 5037
Date Published: 16 June 2003
Softcover: 118 papers (1184) pages
ISBN: 9780819448422

Table of Contents
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Imprint lithography: lab curiosity or the real NGL
Author(s): Douglas J. Resnick; William J. Dauksher; David P. Mancini; Kevin J. Nordquist; Todd C. Bailey; Stephen C. Johnson; Nicholas A. Stacey; John G. Ekerdt; C. Grant Willson; S. V. Sreenivasan; Norman E. Schumaker
Show Abstract
The EUV program at ASML: an update
Author(s): Hans Meiling; Vadim Banine; Peter Kuerz; Brian D. Blum; Gert Jan Heerens; Noreen Harned
Show Abstract
Static EUV micro-exposures using the ETS Set-2 optics
Author(s): Patrick P. Naulleau; Kenneth A. Goldberg; Erik H. Anderson; Jeffrey Bokor; Bruce D. Harteneck; Keith H. Jackson; Deirdre L. Olynick; Farhad Salmassi; Sherry L. Baker; Paul B. Mirkarimi; Eberhard Adolf Spiller; Christopher C. Walton; Donna J. O'Connell; Pei-Yang Yan; Guojing Zhang
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System and process learning in a full-field high-power EUVL alpha tool
Author(s): William P. Ballard; Daniel A. Tichenor; Donna J. O'Connell; Luis J. Bernardez; Robert E. Lafon; Richard J. M. Anderson; Alvin H. Leung; Kenneth A. Williams; Steven J. Haney; Yon E. Perras; Karen L. Jefferson; Therese L. Porter; Daniel Knight; Pamela K. Barr; James L. Van de Vreugde; Richard H. Campiotti; Mark D. Zimmerman; Terry A. Johnson; Leonard E. Klebanoff; Philip A. Grunow; Samuel Graham; Dean A. Buchenauer; William C. Replogle; Tony G. Smith; John B. Wronosky; Joel R. Darnold; Kenneth L. Blaedel; Henry N. Chapman; John S. Taylor; Layton C. Hale; Gary E. Sommargren; Eric M. Gullikson; Patrick P. Naulleau; Kenneth A. Goldberg; Sang Hun Lee; Harry Shields; Randall J. St. Pierre; Samuel Ponti
Show Abstract
Implementing flare compensation for EUV masks through localized mask CD resizing
Author(s): Christof G. Krautschik; Manish Chandhok; Guojing Zhang; Sang Hun Lee; Michael Goldstein; Eric M. Panning; Bryan J. Rice; Robert L. Bristol; Vivek Singh
Show Abstract
EUV interferometry of the 0.3-NA MET optic
Author(s): Kenneth A. Goldberg; Patrick P. Naulleau; Paul Denham; Senajith B. Rekawa; Keith H. Jackson; Erik H. Anderson; J. Alexander Liddle; Jeffrey Bokor
Show Abstract
Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)
Author(s): Tetsuya Oshino; Masayuki Shiraishi; Noriaki Kandaka; Katsumi Sugisaki; Hiroyuki Kondo; Kazuya Ota; K. Mashima; Katsuhiko Murakami; Hiroaki Oizumi; Iwao Nishiyama; Shinji Okazaki
Show Abstract
Lithographic characterization of improved projection optics in the EUVL engineering test stand
Author(s): Donna J. O'Connell; Sang Hun Lee; William P. Ballard; Daniel A. Tichenor; Louis J. Bernardez; Steven J. Haney; Terry A. Johnson; Pamela K. Barr; Alvin H. Leung; Karen L. Jefferson; William C. Replogle; John E. M. Goldsmith; Henry N. Chapman; Patrick P. Naulleau; Stefan Wurm; Eric M. Panning
Show Abstract
Lithographic flare measurements of EUV full-field projection optics
Author(s): Sang Hun Lee; Patrick Naulleau; Christof Krautschik; Manish Chandhok; Henry Chapman; Donna J. O'Connell; Michael Goldstein
Show Abstract
Physical properties of the HCT EUV source
Author(s): Joseph Pankert; Klaus Bergmann; Juergen Klein; Willi Neff; Oliver Rosier; Stefan Seiwert; Christopher Smith; Sven Probst; Dominik Vaudrevange; Guido Siemons; Rolf Apetz; Jeroen Jonkers; Michael Loeken; Eric Bosch; Guenther H. Derra; Thomas Kruecken; Peter Zink
Show Abstract
High-power EUV lithography sources based on gas discharges and laser-produced plasmas
Author(s): Uwe Stamm; Imtiaz Ahmad; Istvan Balogh; H. Birner; D. Bolshukhin; J. Brudermann; S. Enke; Frank Flohrer; Kai Gäbel; S. Götze; G. Hergenhan; Jürgen Kleinschmidt; Diethard Klöpfel; Vladimir Korobotchko; Jens Ringling; Guido Schriever; C. D. Tran; C. Ziener
Show Abstract
Development of radiation-magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography
Author(s): Bruno S. Bauer; Andrey Esaulov; Volodymyr Makhin; Roberto C. Mancini; Ioana Paraschiv; Radu Presura; Irvin R. Lindemuth; Peter T. Sheehey; Bryan J. Rice
Show Abstract
Star pinch scalable EUV source
Author(s): Malcolm W. McGeoch; Charles T. Pike
Show Abstract
Use of tin as a plasma source material for high conversion efficiency
Author(s): Toshihisa Tomie; Tatsuya Aota; Yoshifumi Ueno; Gohta Niimi; Hidehiko Yashiro; Jingqian Lin; Isao Matsushima; Kazumasa Komiyama; Dong-Hoon Lee; Kentaro Nishigori; Hiroshi Yokota
Show Abstract
Masked ion beam lithography and direct structuring on curved surfaces
Author(s): Hans Loeschner; Herbert Buschbeck; Martin Ecker; Christoph Horner; Elmar Platzgummer; Gerhard Stengl; Michaela Zeininger; Paul Ruchhoeft; John Charles Wolfe
Show Abstract
Scanning probe lithography
Author(s): Dorjderem Nyamjav; Albena Ivanisevic
Show Abstract
Electron-beam lithography method for sub-50-nm isolated trench with high aspect ratio
Author(s): XiaoMin Yang; Andrew R. Eckert; Keith Mountfield; Harold Gentile; Carl Seiler; Stanko Brankovic; Robert Harris; Earl Johns
Show Abstract
Design and performance of a step and repeat imprinting machine
Author(s): Ian McMackin; Philip Schumaker; Daniel Babbs; Jin Choi; Wenli Collison; S. V. Sreenivasan; Norman E. Schumaker; Michael P. C. Watts; Ronald D. Voisin
Show Abstract
Analysis of critical dimension uniformity for Step and Flash imprint lithography
Author(s): David P. Mancini; Kathleen A. Gehoski; William J. Dauksher; Kevin J. Nordquist; Douglas J. Resnick; Philip Schumaker; Ian McMackin
Show Abstract
Advances in Step and Flash imprint lithography
Author(s): Stephen C. Johnson; Todd C. Bailey; Michael D. Dickey; Britain J. Smith; Eunha K. Kim; Andrew Thomas Jamieson; Nicholas A. Stacey; John G. Ekerdt; C. Grant Willson; David P. Mancini; William J. Dauksher; Kevin J. Nordquist; Douglas J. Resnick
Show Abstract
Reactive polymers: a route to nanoimprint lithography at low temperatures
Author(s): Karl Pfeiffer; Freimut Reuther; Patrick Carlberg; Marion Fink; Gabi Gruetzner; Lars Montelius
Show Abstract
Impact of vacuum environment on the hot embossing process
Author(s): Nils Roos; Matthias Wissen; Thomas Glinsner; Hella-Christin Scheer
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Improved materials meeting the demands for EUV substrates
Author(s): Ina Mitra; Jochen Alkemper; Uwe Nolte; Axel Engel; Rolf Mueller; Simone Ritter; Hrabanus Hack; Klaus Megges; Heiko Kohlmann; Wolfgang Pannhorst; Mark J. Davis; Lutz Aschke; Konrad Knapp
Show Abstract
Measuring and tailoring CTE within ULE glass
Author(s): Kenneth E. Hrdina; Bradford G. Ackerman; Andrew W. Fanning; Christine E. Heckle; David C. Jenne; W. David Navan
Show Abstract
Design and performance of capping layers for EUV multilayer mirrors
Author(s): Sasa Bajt; Henry N Chapman; Nhan Nguyen; Jennifer B. Alameda; Jeffrey C. Robinson; Michael E. Malinowski; Eric Gullikson; Andy Aquila; Charles Tarrio; Steven Grantham
Show Abstract
Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for extreme-ultraviolet lithography
Author(s): Masayuki Shiraishi; Noriaki Kandaka; Katsuhiko Murakami
Show Abstract
Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes
Author(s): Katsuhiko Murakami; Jun Saito; Kazuya Ota; Hiroyuki Kondo; Mikihiko Ishii; Jun Kawakami; Tetsuya Oshino; Katsumi Sugisaki; Yucong Zhu; Masanobu Hasegawa; Yoshiyuki Sekine; Seiji Takeuchi; Chidane Ouchi; Osamu Kakuchi; Yutaka Watanabe; Takayuki Hasegawa; Shinichi Hara; Akiyoshi Suzuki
Show Abstract
Characterization of the PTB EUV reflectometry facility for large EUVL optical components
Author(s): Johannes Tummler; Heike Blume; Guido Brandt; Jens Eden; Bernd Meyer; Hartmut Scherr; Frank Scholz; Frank Scholze; Gerhard Ulm
Show Abstract
Multi component EUV multilayer mirrors
Author(s): Stefan Braun; Thomas Foltyn; Ludwig van Loyen; Matthew Moss; Andreas Leson
Show Abstract
Spectral reflectance tuning of EUV mirrors for metrology applications
Author(s): Sergiy A. Yulin; Thomas Kuhlmann; Torsten Feigl; Norbert Kaiser
Show Abstract
Development of an ultra high-precision x-ray telescope with an adaptive optics system
Author(s): Shunji Kitamoto; Haruko Takano; Harue Saitoh; Norimasa Yamamoto; Takayoshi Kohmura; Kazuharu Suga; Hiroyuki Sekiguchi
Show Abstract
Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging
Author(s): Yunfei Deng; Bruno M. La Fontaine; Harry J. Levinson; Andrew R. Neureuther
Show Abstract
Design and method of fabricating phase-shift masks for extreme-ultraviolet lithography by partial etching into the EUV multilayer mirror
Author(s): Sang-In Han; Eric Weisbrod; Qianghua Xie; Pawitter J. S. Mangat; Scott Daniel Hector; William J. Dauksher
Show Abstract
Defect repair for extreme-ultraviolet lithography (EUVL) mask blanks
Author(s): Stefan P. Hau-Riege; Anton Barty; Paul B. Mirkarimi; Daniel Gorman Stearns; Henry N. Chapman; Donald W. Sweeney; W. Miles Clift; Eric Gullikson; Moon-Suk Yi
Show Abstract
Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks
Author(s): Carey Thiel; Kenneth C. Racette; Emily Fisch; Mark Lawliss; Louis Kindt; Chester Huang; Robin Ackel; Max Levy
Show Abstract
Asymmetry and thickness effects in reflective EUV masks
Author(s): Frederick T. Chen
Show Abstract
Candidate plasma-facing materials for EUV lithography source components
Author(s): Ahmed Hassanein; Tatiana Burtseva; Jeff N. Brooks; Isak K. Konkashbaev; Bryan J. Rice
Show Abstract
Experimental evaluation of stopping power of high-energy ions from laser-produced plasma by a magnetic field
Author(s): Gohta Niimi; Yoshifumi Ueno; Kentaro Nishigori; Tatsuya Aota; Hidehiko Yashiro; Toshihisa Tomie
Show Abstract
Metrology tools for EUVL-source characterization and optimization
Author(s): Max Christian Schuermann; Thomas Missalla; Klaus R. Mann; Sebastian Kranzusch; Roman Markus Klein; Frank Scholze; Gerhard Ulm; Rainer Lebert; Larissa Juschkin
Show Abstract
Compact laser plasma EUV source based on a gas puff target for metrology
Author(s): Henryk Fiedorowicz; Andrzej Bartnik; Roman Jarocki; Jerzy Kostecki; Janusz Mikolajczyk; Rafal Rakowski; Miroslaw Szczurek
Show Abstract
Estimated impact of shot noise in extreme-ultraviolet lithography
Author(s): Jonathan L. Cobb; Frances A. Houle; Gregg M. Gallatin
Show Abstract
Effect of polymer molecular weight on AFM polymer aggregate size and LER of EUV resists
Author(s): Charlotte A. Cutler; Joseph F. Mackevich; Jieming Li; Donna J. O'Connell; Gregory Frank Cardinale; Robert L. Brainard
Show Abstract
Rates and mechanisms of optic contamination in the EUV engineering test stand
Author(s): Philip A. Grunow; Leonard E. Klebanoff; Samuel Graham; Steven J. Haney; W. Miles Clift
Show Abstract
Relation between electron- and photon-caused oxidation in EUVL optics
Author(s): Michael E. Malinowski; Charles A. Steinhaus; Donald E. Meeker; W. Miles Clift; Leonard E. Klebanoff; Sasa Bajt
Show Abstract
Effects of radiation-induced carbon contamination on the performance of an EUV lithographic optic
Author(s): Anton Barty; Kenneth A. Goldberg
Show Abstract
Atomic hydrogen cleaning of EUV multilayer optics
Author(s): Samuel Graham; Charles A. Steinhaus; W. Miles Clift; Leonard E. Klebanoff; Sasa Bajt
Show Abstract
Understanding particle defect transport in an ultra clean sputter coating process
Author(s): Christopher C. Walton; Patrick A. Kearney; James A. Folta; Donald W. Sweeney; Paul B. Mirkarimi
Show Abstract
Efficient simulation of light diffraction from three-dimensional EUV masks using field decomposition techniques
Author(s): Andreas Erdmann; Christian K. Kalus; Thomas Schmoeller; Andreas Wolter
Show Abstract
Rigorous EUV mask simulator using 2D and 3D waveguide methods
Author(s): Zhengrong Zhu; Kevin Lucas; Jonathan L. Cobb; Scott Daniel Hector; Andrzej J. Strojwas
Show Abstract
Nikon EB stepper: its system design and preliminary performance
Author(s): Noriyuki Hirayanagi; Tomoharu Fujiwara; Kazunari Hada; Toshimasa Shimoda; Kazuaki Suzuki
Show Abstract
Novel electron optics for large subfield electron-beam projection lithography (EPL)
Author(s): Saori Fukui; Hiroyasu Shimizu; Weiming Ren; Shohei Suzuki; Kazuya Okamoto
Show Abstract
Reduction of image placement errors in EPL masks
Author(s): Obert R. Wood; Phillip L. Reu; Roxann L. Engelstad; Edward G. Lovell; Michael J. Lercel; Carey W. Thiel; Mark S. Lawliss; R. Scott Mackay
Show Abstract
EPL stencil mask defect inspection system using a transmission electron beam
Author(s): Jiro Yamamoto; Teruo Iwasaki; Masaki Yamabe; Norimichi Anazawa; Satoru Maruyama; Kiyoaki Tsuta
Show Abstract
MxL: pseudo-maskless high-throughput nanolithography
Author(s): Charles D. Schaper
Show Abstract
Optical analysis of mirror-based pattern generation
Author(s): Yashesh A. Shroff; Yijian Chen; William G. Oldham
Show Abstract
Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction
Author(s): Laurent Pain; Murielle Charpin; Yves Laplanche; David Herisson; J. Todeschini; Ramiro Palla; A. Beverina; H. Leininger; S. Tourniol; M. Broekaart; Emmanuelle Luce; F. Judong; K. Brosselin; Y. Le Friec; F. Leverd; S. Del Medico; V. De Jonghe; Daniel Henry; M. P. Woo; F. Arnaud
Show Abstract
Mix and match capability of e-beam direct-write for the 65-nm technology
Author(s): Yves Laplanche; Murielle Charpin; Laurent Pain; J. Todeschini; Daniel Henry; Pierre-Olivier Sassoulas; S. Gough; Ulf Weidenmueller; Peter Hahmann
Show Abstract
Design strategies for future lithography technologies (or: OPC will never die)
Author(s): Franklin M. Schellenberg
Show Abstract
Performance of the beta tool for low-energy electron-beam proximity-projection lithography (LEEPL)
Author(s): Akira Yoshida; Haruo Kasahara; Akira Higuchi; Hiroshi Nozue; Akihiro Endo; Nobuo Shimazu
Show Abstract
Imaging capability of low-energy electron-beam proximity-projection lithography toward the 65/45-nm node
Author(s): Hiroyuki Nakano; Shinichiro Nohdo; Kumiko Oguni; Tomonori Motohashi; Masaki Yoshizawa; Tetsuya Kitagawa; Shigeru Moriya
Show Abstract
22-nm lithography using near-field x rays
Author(s): Antony J. Bourdillon; Gwyn P. Williams; Yuli Vladimirsky; Chris B. Boothroyd
Show Abstract
Development of a 10-kHz capillary discharge EUV lamp
Author(s): Ouassima Sarroukh; Eric Robert; Thierry Gonthiez; Raymond Viladrosa; Moulay M. Idrissi; Claude Fleurier; Jean-Michel Pouvesle; Christophe Cachoncille
Show Abstract
Front-to-back alignment metrology
Author(s): Frans G. C. Bijnen; Willy van Buel; Cheng Qun Gui; Joeri Lof
Show Abstract
LPP-based reflectometer for characterization of EUV lithography systems
Author(s): Akira Miyake; Takeshi Miyachi; Mitsuaki Amemiya; Takayuki Hasegawa; Nobuaki Ogushi; Takeshi Yamamoto; Fumitaro Masaki; Yutaka Watanabe
Show Abstract
Spatial emission characteristics of EUV plasma sources
Author(s): Klaus R. Mann; Sebastian Kranzusch; Christian Peth; Max Christian Schurmann; Thomas Missalla
Show Abstract
Characterization of a laser-produced plasma source for a laboratory EUV reflectometer
Author(s): Frank Scholze; Frank Scholz; Johannes Tuemmler; Gerhard Ulm; Herbert Legall; Peter-Viktor Nickles; Wolfgang Sandner; Holger Stiel; Ludwig van Loyen
Show Abstract
Extending a GTD-based image formation technique to EUV lithography
Author(s): Andrew Khoh; Donis G. Flagello; Thomas D. Milster; Byoung-Il Choi; Ganesh S. Samudra; Yihong Wu
Show Abstract
Comparison of EUV and optical device wafer heating
Author(s): Jaehyuk Chang; Roxann L. Engelstad; Edward G. Lovell
Show Abstract
HEIGHTS initial simulation of discharge-produced plamsa hydrodynamics and radiation transport for EUV lithography
Author(s): Ahmed Hassanein; Valeryi Sizyuk; Vladimir Tolkach; Vitali Morozov; Bryan J. Rice
Show Abstract
Collection efficiency of EUV sources
Author(s): Guenther H. Derra; Wolfgang Singer
Show Abstract
Strong narrowband peak at 13.5-nm generated in a cavity-confined tin plasma
Author(s): Tatsuya Aota; Hidehiko Yashiro; Yoshifumi Ueno; Toshihisa Tomie
Show Abstract
Debris-free EUV source using a through-hole tin target
Author(s): Yoshifumi Ueno; Tatsuya Aota; Gohta Niimi; Dong-Hoon Lee; Kentaro Nishigori; Hidehiko Yashiro; Toshihisa Tomie
Show Abstract
Ultra fast ion shutter employing a laser-produced plasma
Author(s): Hidehiko Yashiro; Tatsuya Aota; Kentaro Nishigori; Yoshifumi Ueno; Toshihisa Tomie
Show Abstract
Development of Xe-filled capillary discharge extreme-ultraviolet radiation source for semiconductor lithography
Author(s): Yusuke Teramoto; Hiroto Sato; Kazunori Bessho; Koji Miyauchi; Mitsuru Ikeuchi; Keisuke Okubo; Masaki Yoshioka; Koichi Toyoda
Show Abstract
Development of a liquid-jet laser-produced plasma light source for EUV lithography
Author(s): Tamotsu Abe; Takashi Suganuma; Yousuke Imai; Yukihiko Sugimoto; Hiroshi Someya; Hideo Hoshino; Georg Soumagne; Hiroshi Komori; Hakaru Mizoguchi; Akira Endo; Koichi Toyoda
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Compact electron-based extreme-ultraviolet source at 13.5 nm
Author(s): Andre Egbert; Bjoern Mader; Boris Tkachenko; Andreas Ostendorf; Boris N. Chichkov; Thomas Missalla; Max Christian Schuermann; Kai Gaebel; Guido Schriever; Uwe Stamm
Show Abstract
The Rayleigh method applied to EUV lithography simulation
Author(s): Maxime Besacier; Patrick Schiavone; Gerard Granet; Vincent Farys
Show Abstract
Printability of opaque and clear phase defects using the finite-difference time-domain (FDTD) method
Author(s): Christof G. Krautschik; Iwao Nishiyama
Show Abstract
Estimation-EUV mask flatness for allowable pattern shift
Author(s): Akira Chiba; Minoru Sugawara; Iwao Nishiyama
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Phase-shift mask in EUV lithography
Author(s): Minoru Sugawara; Akira Chiba; Iwao Nishiyama
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EUV mask blank: defect detection at 100 nm
Author(s): Jean Hue; Etienne Quesnel; Catherine Pelle; Viviane Muffato; G Carini; Sylvie Favier; Pascal Besson
Show Abstract
Stress mitigation in Mo/Si multilayers for EUV lithography
Author(s): Erwin Zoethout; G. Sipos; R. W.E. van de Kruijs; Andrey E. Yakshin; Eric Louis; Stefan Muellender; Fred Bijkerk
Show Abstract
EUV mask stress mapping by an experimental and hybrid finite element technique
Author(s): Zhaohua Feng; Edward G. Lovell; Roxann L. Engelstad; Andrew R. Mikkelson; Phillip L. Reu; Jaewoong Sohn; Kenneth L. Blaedel; Andre A. Claudet
Show Abstract
Shot noise effect on printing small contacts in EUVL
Author(s): Sang Hun Lee; Robert L. Bristol; John E. Bjorkholm
Show Abstract
Calibration of EUV 2D photoresist simulation parameters for accurate predictive modeling
Author(s): Stewart A. Robertson; Patrick P. Naulleau; Donna J. O'Connell; Kevin McDonald; Todd M. Delano; Kenneth A. Goldberg; Steven G. Hansen; Kirk W. Brown; Robert L. Brainard
Show Abstract
Resist evaluation at 50 nm in the EUV using interferometric spatial-frequency-doubled imaging
Author(s): Michael D. Shumway; Patrick P. Naulleau; Kenneth A. Goldberg; Eric L. Snow; Jeffrey Bokor
Show Abstract
Supercritical resist dry technique for electron-beam projection lithography (EPL)
Author(s): George Petricich; Kohei Suzuki; Jun Munemasa; Tetsuya Yoshikawa; Nobuyuki Kawakami; Sumito Shimizu; Manabu Watanabe
Show Abstract
Improvement of resist pattern collapse
Author(s): Manabu Watanabe; Yoichi Tomo; Masaki Yamabe; Yukio Kiba; Keiichi Tanaka; Ryoichiro Naito
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Subfield scheduling for throughput maximization in electron-beam photomask fabrication
Author(s): Sergey V. Babin; Andrew B. Kahng; Ion I. Mandoiu; Swamy Muddu
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Cationic graft polymerization lithography
Author(s): Heather F. Johnson; Sahban N Ozair; Andrew T. Jamieson; Brian C. Trinque; Colin C. Brodsky; C. Grant Willson
Show Abstract
Subfield distortion of an EPL stencil mask
Author(s): Hiroshi Takenaka; Hiroshi Yamashita; Kaoru Koike; Masaki Yamabe
Show Abstract
Defect printability of hole pattern in electron projection lithography
Author(s): Jiro Yamamoto; Yoichi Tomo; Sumito Shimizu; Teruo Iwasaki; Masaki Yamabe
Show Abstract
CD controllability of proximity effect correction in EPL
Author(s): Sumito Shimizu; Kazuaki Suzuki
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Distortion management strategy for EPL reticle
Author(s): Hajime Yamamoto; Takashi Aoyama; Noriyuki Hirayanagi; Kazuaki Suzuki
Show Abstract
Optical inspection of EPL stencil masks
Author(s): James Welsh; Martin McCallum; Masashi Okada
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Fabrication of Step and Flash imprint lithography templates using commercial mask processes
Author(s): Ecron Thompson; Peter D. Rhyins; Ronald D. Voisin; S. V. Sreenivasan; Patrick M. Martin
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Employing Step and Flash imprint lithography for gate-level patterning of a MOSFET device
Author(s): Britain J. Smith; Nicholas A. Stacey; J. P. Donnelly; David M. Onsongo; Todd C. Bailey; Chris J. Mackay; Douglas J. Resnick; William J. Dauksher; David P. Mancini; Kevin J. Nordquist; S. V. Sreenivasan; Sanjay K. Banerjee; John G. Ekerdt; Grant C. Willson
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Proximity effect correction on multilevel interconnect metal for high-energy electron-beam lithography
Author(s): Shunko Magoshi; Shinji Sato; Kazuo Tawarayama; Yasuhiro Makino; Hiromi Niiyama
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Maskless lithography: estimation of the number of shots for each layer in a logic device with character-projection-type low-energy electron-beam direct writing system
Author(s): Ryoichi Inanami; Shunko Magoshi; Shouhei Kousai; Atsushi Ando; Tetsuro Nakasugi; Ichiro Mori; Kazuyoshi Sugihara; Akira Miura
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Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture, and recent progress
Author(s): Tetsuro Nakasugi; Atsushi Ando; Ryoichi Inanami; Noriaki Sasaki; Takumi Ota; Osamu Nagano; Yuuichiro Yamazaki; Kazuyoshi Sugihara; Ichiro Mori; Motosuke Miyoshi; Katsuya Okumura; Akira Miura
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Thick resist alignment technology for MEMS and advanced packaging
Author(s): Chad Brubaker; Bernhard Wieder; Paul Lindner
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Electron-beam-assisted critical dimension reduction
Author(s): Jei-Wei Chang; Chao-Peng Chen; Robert Yang
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Three-dimensional imaging of isolated lines of negative e-beam resist
Author(s): Andrew R. Eckert; Harold Gentile; Keith Mountfield; Carl Seiler; XiaoMin Yang; Earl Johns
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High-repetition-rate compact excimer laser: UV light source for metrology, inspection, direct writing, and material testing
Author(s): Heinz P. Huber; Tobias Pflanz; Andreas Goertler; Helmut Schillinger
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Wafer alignment with backscatter electron detection
Author(s): Hans Gijsbertsen; David Nijkerk; Giljam Derksen; Patrick W.H. de Jager; Stefan Keij; Maurits van der Schaar
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Advances in CPL, collimated plasma source, and full-field exposure for sub-100-nm lithography
Author(s): Brent E. Boerger; Scott McLeod; Richard Alan Forber; I. C. Edmond Turcu; Celestino J. Gaeta; Donald K. Bailey; Jacob Ben-Jacob
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Illumination optimization via multifunction approximation
Author(s): Thomas G. Kuper
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EUV time-resolved studies on carbon growth and cleaning
Author(s): Bas Mertens; Bas Wolschrijn; Rik Jansen; Norbert B. Koster; Markus Weiss; Marco Wedowski; Roman Markus Klein; Thomas Bock; Reiner Thornagel
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Evaluation of a high-performance chemically amplified resist for EUVL mask fabrication
Author(s): Bing Lu; Eric Weisbrod; Pawitter J. S. Mangat; Kevin J. Nordquist; Eric S. Ainley
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High-resolution x-ray masks for the application of high-aspect-ratio microelectromechanical systems (HARMS)
Author(s): Lin Wang; Yohannes M. Desta; Jost Goettert; F. Xian
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The French R&D program on EUV lithography: PREUVE
Author(s): Valerie Paret; Pierre Boher; Jean-Yves Robic; Remy Marmoret; Martin Schmidt; Christophe Cachoncille; Roland Geyl; Jean Jacques Ferme; Bernard Vidal; Jean Marie Barbiche
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Software tool for advanced Monte Carlo simulation of electron scattering in EBL and SEM: CHARIOT
Author(s): Sergey V. Babin; S. Borisov; E. Cheremukhin; Eugene Grachev; V. Korol; L. E. Ocola
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Repeller field debris mitigation approach for EUV sources
Author(s): K. Takenoshita; Chiew-Seng Koay; Martin C. Richardson; I. C. Edmond Turcu
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High-conversion-efficiency tin material laser-plasma source for EUVL
Author(s): Chiew-Seng Koay; Christian K. Keyser; K. Takenoshita; Etsuo Fujiwara; Moza M. Al-Rabban; Martin C. Richardson; I. C. Edmond Turcu; Harry Rieger; A. Stone; James H. Morris
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New approach to measurement of photoactive deep-UV optics contaminants at sub parts-per-trillion levels
Author(s): Chris Atkinson; Jeff Hanson; Oleg P. Kishkovich; Michael Paul Alexander; Anatoly Grayfer
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Performance and scaling of a dense plasma focus light source for EUV lithography
Author(s): Igor V. Fomenkov; Richard M. Ness; Ian Roger Oliver; Stephan T. Melnychuk; Oleh V. Khodykin; Norbert R. Bowering; Curtis L. Rettig; Jerzy R. Hoffman
Show Abstract
The end of the semiconductor industry as we know it
Author(s): Chris A. Mack
Show Abstract

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