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Proceedings of SPIE Volume 4779

Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components
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Volume Details

Volume Number: 4779
Date Published: 11 November 2002
Softcover: 20 papers (200) pages
ISBN: 9780819445469

Table of Contents
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Sub-nm topography measurement by deflectometry: flatness standard and wafer nanotopography
Author(s): Ralf D. Geckeler; Ingolf Weingaertner
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Novel concept for the ultraprecise and fast measurement of the nanotopography of large wafers
Author(s): Ingolf Weingaertner; Matthias Wurm; Ralf D. Geckeler; Clemens Elster; Michael Schulz; Eugen Dumitrescu; Stefan Krey; Josef Heinisch
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Investigation of optical properties of injection-moulded subwavelength gratings
Author(s): Jacob Jonsson; Fredrik K. Nikolajeff
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Optical metrology in the VUV and EUV spectral range
Author(s): Klaus R. Mann; Sebastian Kranzusch; G. Eckert; Christian Gorling; Uwe Leinhos; Christian Peth; Bernd Schafer
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Surface damage metrology: precision at low cost
Author(s): Lionel R. Baker
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Large AFM scans with a nanometer coordinate measuring machine (NCMM)
Author(s): Ralph Petersen; Hendrik Rothe; Dorothee Huser
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Measurement of the 100-nm NIST SRM 1963 by lase surface light scattering
Author(s): Thomas A. Germer; George W. Mulholland; Jung Hyeun Kim; Sheryl H. Ehrman
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Performance limits of ARS sensor based on CMOS photodiode array
Author(s): Thomas Rinder; Hendrik Rothe
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Theoretical investigation for improvement of scanning a near-field optical microscope
Author(s): Anatoly S. Lapchuk; Andrey A. Kryuchin
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Design and Implementation of a rotationally symmetric ellipsometer
Author(s): Qiwen Zhan; James R. Leger
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Far-infrared magneto-optic generalized ellipsometry determination of free-carrier parameters in semiconductor thin film structures
Author(s): Tino Hofmann; Mathias Schubert; Craig M. Herzinger
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Reflectometry-based approaches for in-situ monitoring of etch depths in plasma etching processes
Author(s): Vijayakumar C. Venugopal; Andrew J. Perry
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Simultaneous measurement of bulk absorption and fluorescence in fused silica upon ArF laser irradiation
Author(s): Christian Muhlig; Siegfried Kufert; Wolfgang Triebel; Frank Coriand
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Advanced industrial metrology used for qualification of high-quality optical materials
Author(s): Axel Engel; Gerhard Westenberger; L. Bartelmess; Oliver Sohr; Rainer Haspel; Ewald Morsen
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Channel structures observed in natural diamonds, synthetic moissanite, and synthetic quartz
Author(s): Taijin Lu; James E. Shigley; John I. Koivula
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Multidomain genetic algorithm (MDGA) and its applications to thin film metrology
Author(s): JingMin Leng; John J. Sidorowich; Jon L. Opsal
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Ag-Sb-Te system for phase change optical data storage
Author(s): Yagya Deva Sharma; Promod K. Bhatnagar
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Shack-Hartmann wavefront sensor precision and accuracy
Author(s): Daniel R. Neal; James Copland; David A. Neal
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Application of Shack-Hartmann wavefront sensing technology to transmissive optic metrology
Author(s): Ron R. Rammage; Daniel R. Neal; Richard J. Copland
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Research on quasi-digitizing interferometer for optical measurement
Author(s): Mengchao Li; Gang Zheng; Baoxue Chen; Songlin Zhuang
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