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Proceedings of SPIE Volume 4688

Emerging Lithographic Technologies VI
Editor(s): Roxann L. Engelstad
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Volume Details

Volume Number: 4688
Date Published: 1 July 2002
Softcover: 97 papers (982) pages
ISBN: 9780819444349

Table of Contents
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Worldwide technologies and the ITRS in the current economic climate
Author(s): Paolo A. Gargini
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NGL process and the role of International SEMATECH
Author(s): Giang T. Dao; R. Scott Mackay; Philip K. Seidel
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Fabrication challenges for next-generation devices: MEMS for rf wireless communications
Author(s): David E. Seeger; Jennifer Lund; Christopher Jahnes; Lili Deligianni; Paivikki Buchwalter; Panayotis C. Andricacos; Raul E. Acosta; Inna V. Babich; Arpan P. Mahorowala; Joanna Rosner; John Cotte
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EXTATIC: ASML's alpha-tool development for EUVL
Author(s): Hans Meiling; Jos P.H. Benschop; Robert A. Hartman; Peter Kuerz; Peter Hoghoj; Roland Geyl; Noreen Harned
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Static microfield printing at the advanced light source with the ETS Set-2 optic
Author(s): Patrick P. Naulleau; Kenneth A. Goldberg; Erik H. Anderson; David T. Attwood; Phillip J. Batson; Jeffrey Bokor; Paul Denham; Eric M. Gullikson; Bruce D. Harteneck; Brian Hoef; Keith H. Jackson; Deirdre L. Olynick; Senajith Rekawa; Farhad Salmassi; Kenneth L. Blaedel; Henry N. Chapman; Layton C. Hale; Regina Soufli; Eberhard Adolf Spiller; Donald W. Sweeney; John R. Taylor; Christopher C. Walton; Avijit K. Ray-Chaudhuri; Donna J. O'Connell; Richard H. Stulen; Daniel A. Tichenor; Charles W. Gwyn; Pei-yang Yan; Guojing Zhang
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Performance upgrades in the EUV engineering test stand
Author(s): Daniel A. Tichenor; William C. Replogle; Sang Hun Lee; William P. Ballard; Alvin H. Leung; Glenn D. Kubiak; Leonard E. Klebanoff; Samual Graham; John E. M. Goldsmith; Karen L. Jefferson; John B. Wronosky; Tony G. Smith; Terry A. Johnson; Harry Shields; Layton C. Hale; Henry N. Chapman; John S. Taylor; Donald W. Sweeney; James A. Folta; Gary E. Sommargren; Kenneth A. Goldberg; Patrick P. Naulleau; David T. Attwood; Eric M. Gullikson
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Xenon target performance characteristics for laser-produced plasma EUV sources
Author(s): Harry Shields; Steven W. Fornaca; Michael B. Petach; Mark Michaelian; R. Daniel McGregor; Richard H. Moyer; Randall J. St. Pierre
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Status of the liquid-xenon-jet laser-plasma source for EUV lithography
Author(s): Bjoern A. M. Hansson; Lars Rymell; Magnus Berglund; Oscar E. Hemberg; Emmanuelle Janin; Jalmar Thoresen; Sofia Mosesson; Johan Wallin; Hans M. Hertz
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Power scale-up of the extreme-ultraviolet electric capillary discharge source
Author(s): Neal R. Fornaciari; Howard Bender; Dean Buchenauer; Jason L. Dimkoff; Michael P. Kanouff; Steve Karim; Carmelo Romeo; Gregory M. Shimkaveg; William T. Silfvast; Kenneth D. Stewart
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High-power EUV sources for lithography: a comparison of laser-produced plasma and gas-discharge-produced plasma
Author(s): Uwe Stamm; Imtiaz Ahmad; Vladimir M. Borisov; Frank Flohrer; Kai Gaebel; S. Goetze; Alexander S. Ivanov; Oleg B. Khristoforov; Diethard Kloepfel; Peter Koehler; Juergen Kleinschmidt; Vladimir Korobotchko; Jens Ringling; Guido Schriever; Aleksandr Yu. Vinokhodov
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EUVL masks: requirements and potential solutions
Author(s): Scott Daniel Hector
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Impact of EUVL mask buffer and absorber material properties on mask quality and performance
Author(s): Pei-yang Yan
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Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC
Author(s): Kenneth C. Racette; Carey T. Williams; Emily Fisch; Louis Kindt; Mark Lawliss; Robin Ackel; Michael J. Lercel
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Advances in low-defect multilayers for EUVL mask blanks
Author(s): James A. Folta; J. Courtney Davidson; Cindy C. Larson; Christopher C. Walton; Patrick A. Kearney
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Verification studies of thermophoretic protection for EUV masks
Author(s): Daniel J. Rader; Daniel E. Dedrick; Eric W. Beyer; Alvin H. Leung; Leonard E. Klebanoff
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Mechanical modeling of the reticle and chuck for EUV lithography
Author(s): Carl J. Martin; Andrew R. Mikkelson; Richard O. Tejeda; Roxann L. Engelstad; Edward G. Lovell; Kenneth L. Blaedel; Andre A. Claudet
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High-resolution templates for step and flash imprint lithography
Author(s): Douglas J. Resnick; William J. Dauksher; David P. Mancini; Kevin J. Nordquist; Eric S. Ainley; Kathleen A. Gehoski; Jeff H. Baker; Todd C. Bailey; Byung Jin Choi; Stephen C. Johnson; S. V. Sreenivasan; John G. Ekerdt; C. Grant Willson
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Complete system of nanoimprint lithography for IC production
Author(s): Donald L. White; Obert R. Wood; Cheng-Fu Chen; Edward G. Lovell; Roxann L. Engelstad
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Low-temperature wafer-scale warm embossing for mix and match with UV lithography
Author(s): Hubert Schulz; Matthias Wissen; Nils Roos; Hella-Christin Scheer; Karl Pfeiffer; Gabi Gruetzner
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Performance of 4-in. wafer-scale thermoset working stamps in hot embossing lithography
Author(s): Nils Roos; Hubert Schulz; Marion Fink; Karl Pfeiffer; Frank Osenberg; Hella-Christin Scheer
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Roll-to-roll manufacturing of thin film electronics
Author(s): James R. Sheats
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Three-dimensional metrology in MEMS applications
Author(s): Alexander Friz; Keith Frank Best; Satinderpall Pannu; Jocelyn T. Nee
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Lithographic evaluation of the EUV engineering test stand
Author(s): Sang Hun Lee; Daniel A. Tichenor; William P. Ballard; Luis J. Bernardez; John E. M. Goldsmith; Steven J. Haney; Karen L. Jefferson; Terry A. Johnson; Alvin H. Leung; Donna J. O'Connell; William C. Replogle; John B. Wronosky; Kenneth L. Blaedel; Patrick P. Naulleau; Kenneth A. Goldberg; Eric M. Gullikson; Henry N. Chapman; Stefan Wurm; Eric M. Panning; Pei-yang Yan; Guojing Zhang; John E. Bjorkholm; Glenn D. Kubiak; Donald W. Sweeney; David T. Attwood; Charles W. Gwyn
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Pattern printability for off-axis incident light in EUV lithography
Author(s): Minoru Sugawara; Masaaki Ito; Taro Ogawa; Eiichi Hoshino; Akira Chiba; Shinji Okazaki
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Impact of EUV light scatter on CD control as a result of mask density changes
Author(s): Christof G. Krautschik; Masaaki Ito; Iwao Nishiyama; Shinji Okazaki
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High-power laser-produced-plasma EUV source
Author(s): William P. Ballard; Luis J. Bernardez; Robert E. Lafon; Richard J. M. Anderson; Yon E. Perras; Alvin H. Leung; Harry Shields; Michael B. Petach; Randall J. St. Pierre; Robert L. Bristol
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Environmental data from the engineering test stand
Author(s): Leonard E. Klebanoff; Philip A. Grunow; Samual Graham; W. Miles Clift; Alvin H. Leung; Steven J. Haney
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100-picometer interferometry for EUVL
Author(s): Gary E. Sommargren; D. W. Phillion; Michael A. Johnson; Nhan Q. Nguyen; Anton Barty; Franklyn J. Snell; Daren R. Dillon; Lloyd S. Bradsher
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Honing the accuracy of extreme-ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic
Author(s): Kenneth A. Goldberg; Patrick P. Naulleau; Jeffrey Bokor; Henry N. Chapman
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New PTB reflectometer for the characterization of large optics for the extreme ultraviolet spectral region
Author(s): Johannes Tuemmler; Frank Scholze; Guido M.L. Brandt; Bernd Meyer; Frank Scholz; Katrin Vogel; Gerhard Ulm; Michael Poier; Udo Klein; Wolfgang Diete
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First results from the updated NIST/DARPA EUV reflectometry facility
Author(s): Steven Grantham; Charles Tarrio; Matthew B. Squires; Thomas B. Lucatorto
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Development of diagnostic tools for the EUV spectral range
Author(s): Klaus R. Mann; Sebastian Kranzusch; G. Eckert; Christian Peth; Bernd Schaefer
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Inspection of EUV reticles
Author(s): Donald W. Pettibone; Andrei Veldman; Ted Liang; Alan R. Stivers; Pawitter J. S. Mangat; Bing Lu; Scott Daniel Hector; James R. Wasson; Kenneth L. Blaedel; Emily Fisch; David M. Walker
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Damage-free mask repair using electron-beam-induced chemical reactions
Author(s): Ted Liang; Alan R. Stivers
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EUVL mask blank repair
Author(s): Anton Barty; Paul B. Mirkarimi; Daniel Gorman Stearns; Donald W. Sweeney; Henry N. Chapman; W. Miles Clift; Scott Daniel Hector; Moonsuk Yi
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At-wavelength inspection of defect smoothing in EUVL masks
Author(s): Moonsuk Yi; Min-Cheol Park; Paul B. Mirkarimi; Cindy C. Larson; Jeffrey Bokor
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REAP (raster e-beam advanced process) using 50-kV raster e-beam system for sub-100-nm node mask technology
Author(s): Ki-Ho Baik; Robert L. Dean; Mark Mueller; Maiying Lu; Homer Y. Lem; Stephen Osborne; Frank E. Abboud
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EUV photoresist performance results from the VNL and the EUV LLC
Author(s): Jonathan L. Cobb; Paul M. Dentinger; Luke L. Hunter; Donna J. O'Connell; Gregg M. Gallatin; William D. Hinsberg; Frances A. Houle; Martha I. Sanchez; Wolf-Dieter Domke; Stefan Wurm; Uzodinma Okoroanyanwu; Sang Hun Lee
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Direct photopatterning of metal oxide materials using photosensitive organometallic precursor films
Author(s): Sean Jeffrey Barstow; Augustin Jeyakumar; Clifford L. Henderson
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Studies of EUV contamination mitigation
Author(s): Samual Graham; Michael E. Malinowski; Chip Steinhaus; Philip A. Grunow; Leonard E. Klebanoff
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Controlling contamination in Mo/Si multilayer mirrors by Si surface capping modifications
Author(s): Michael E. Malinowski; Chip Steinhaus; W. Miles Clift; Leonard E. Klebanoff; Stanley Mrowka; Regina Soufli
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Characterization and characteristics of a ULE glass tailored for EUVL needs
Author(s): Kenneth E. Hrdina; Benjamin Z. Hanson; Philip M. Fenn; Robert Sabia
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Thermal expansion behavior of proposed EUVL substrate materials
Author(s): Ina Mitra; Mark J. Davis; Jochen Alkemper; Rolf Mueller; Heiko Kohlmann; Lutz Aschke; Ewald Moersen; Simone Ritter; Hrabanus Hack; Wolfgang Pannhorst
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Ultrahigh-accuracy measurement of the coefficient of thermal expansion for ultralow expansion materials
Author(s): Vivek G. Badami; Michael Linder
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Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection
Author(s): Sang-In Han; James R. Wasson; Pawitter J. S. Mangat; Jonathan L. Cobb; Kevin Lucas; Scott Daniel Hector
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EUV phase-shifting masks and aberration monitors
Author(s): Yunfei Deng; Andrew R. Neureuther
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Ion beam sputter deposition of low-defect EUV mask blanks on 6-in. LTEM substrates in a real production environment
Author(s): Hans Willy Becker; Lutz Aschke; Birgit Schubert; Juergen Krieger; Frank Lenzen; Sergey A. Yulin; Torsten Feigl; Thomas Kuhlmann; Norbert Kaiser
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Design and fabrication of broadband EUV multilayer mirrors
Author(s): Thomas Kuhlmann; Sergey A. Yulin; Torsten Feigl; Norbert Kaiser; Helmut Bernitzki; Hans Lauth
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Effect of argon and non-argon ion impingement on the stress reduction of multilayers for extreme-ultraviolet lithography
Author(s): Masayuki Shiraishi; Wakana Ishiyama; Noriaki Kandaka; Tetsuya Oshino; Katsuhiko Murakami
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Nikon EPL tool development summary
Author(s): Takaharu Miura; Tatsuo Sato; Masaya Miyazaki; Kazunari Hada; Yu Sato; Masateru Tokunaga
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PREVAIL: latest electron optics results
Author(s): Hans C. Pfeiffer; Steven D. Golladay; Michael S. Gordon; Rodney A. Kendall; Jon E. Lieberman; James D. Rockrohr; Werner Stickel; Takeshi Yamaguchi; Kazuya Okamoto; Takaaki Umemoto; Hiroyasu Shimizu; Shinichi Kojima; Muneki Hamashima
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Advanced deflector elements for high-throughput electron optical systems
Author(s): Oliver Kienzle; Rainer Knippelmeyer; Wilfried Claus; Marko Matijevic; Lars Ehrhardt; Wolf D. Rau; Alexander Orchowski
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Analysis of critical parameters for EPL mask fabrication
Author(s): Michael J. Lercel
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Lossless compression techniques for maskless lithography data
Author(s): Vito Dai; Avideh Zakhor
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Shaped e-beam lithography integration work for advanced ASIC manufacturing: progress report
Author(s): Laurent Pain; Murielle Charpin; Yves LaPlanche; Daniel Henry
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Large-field ion optics for projection and proximity printing and for maskless lithography (ML2)
Author(s): Hans Loeschner; Gerhard Stengl; Herbert Buschbeck; A. Chalupka; Gertraud Lammer; Elmar Platzgummer; Herbert Vonach; Patrick W.H. de Jager; Rainer Kaesmaier; Albrecht Ehrmann; Stefan Hirscher; Andreas Wolter; Andreas Dietzel; Ruediger Berger; Hubert Grimm; Bruce D. Terris; Wilhelm H. Bruenger; Dieter Adam; Michael Boehm; Hans Eichhorn; Reinhard Springer; Joerg Butschke; Florian Letzkus; Paul Ruchhoeft; John Charles Wolfe
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Laser plasma radiation sources based on a laser-irradiated gas puff target for x-ray and EUV lithography technologies
Author(s): Henryk Fiedorowicz; Andrzej Bartnik; Roman Jarocki; Jerzy Kostecki; Rafal Rakowski; Miroslaw Szczurek
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Development of high-power EUV sources for lithography
Author(s): Vladimir M. Borisov; Imtiaz Ahmad; S. Goetze; Alexander S. Ivanov; Oleg B. Khristoforov; Juergen Kleinschmidt; Vladimir Korobotchko; Jens Ringling; Guido Schriever; Uwe Stamm; Aleksandr Yu. Vinokhodov
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Optimization of a dense plasma focus device as a light source for EUV lithography
Author(s): Igor V. Fomenkov; William N. Partlo; Richard M. Ness; Ian Roger Oliver; Stephan T. Melnychuk; Oleh V. Khodykin; Norbert R. Boewering
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Fabrication of a fly-eye mirror for an extreme-ultraviolet lithography illumination system by arranging silicon mirror elements
Author(s): Hideo Takino; Teruki Kobayashi; Kazushi Nomura; Masaaki Kuki; Akinori Itoh; Junji Nakamura; Hideki Komatsuda; Norio Shibata
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Manufacture of fly-eye mirror in an extreme-ultraviolet lithography illumination system by means of ultraprecision diamond cutting
Author(s): Yoshinori Hashimoto; Yoshimi Takeuchi; Tomohiko Kawai; Kiyoshi Sawada; Hideo Takino; Norio Shibata
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High-accuracy detector calibration for EUV metrology at PTB
Author(s): Frank Scholze; Guido M.L. Brandt; Peter Mueller; Bernd Meyer; Frank Scholz; Johannes Tuemmler; Katrin Vogel; Gerhard Ulm
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Aspherical mirror measurement using a point diffraction interferometer
Author(s): Kazuya Ota; Takahiro Yamamoto; Yusuke Fukuda; Katsura Otaki; Iwao Nishiyama; Shinji Okazaki
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ASET development of at-wavelength phase-shifting point diffraction interferometer
Author(s): Katsumi Sugisaki; Yucong Zhu; Yoshio Gomei; Masahito Niibe
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Fabrication of Mo/Si multilayer for EUVL reticle blank using ion beam sputtering
Author(s): Hiromasa Yamanashi; Taro Ogawa; Hiromasa Hoko; Byoung Taek Lee; Eiichi Hoshino; Masashi Takahashi; Takashi Yoneda; Shinji Okazaki
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Simulation studies of roughness-smoothing effect of molybdenum/silicon multilayer coating based on resputtering model
Author(s): Taro Ogawa; Masaaki Ito; Hiromasa Yamanashi; Hiromasa Hoko; Eiichi Hoshino; Shinji Okazaki
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Numerical investigation of EUV mask contact layer defect printability at the 30-nm technology node
Author(s): Amr Y. Abdo; Pei-yang Yan
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Simulation model of in-plane distortion in EUVL mask during chucking
Author(s): Akira Chiba; Kazuya Ota; Eiichi Hoshino; Minoru Sugawara; Taro Ogawa; Shinji Okazaki
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Thermomechanical modeling of the pin-chucked EUV reticle during exposure
Author(s): Alexander C. Wei; Carl J. Martin; William A. Beckman; John W. Mitchell; Roxann L. Engelstad; Edward G. Lovell; Kenneth L. Blaedel
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Thermomechanical global response of the EUVL wafer during exposure
Author(s): Jaehyuk Chang; Carl J. Martin; Roxann L. Engelstad; Edward G. Lovell
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Defect printability analysis on electron projection lithography with diamond stencil reticle
Author(s): Yoichi Tomo; Yoshinori Kojima; Sumito Shimizu; Manabu Watanabe; Hiroshi Takenaka; Hiroshi Yamashita; Teruo Iwasaki; Kimitoshi Takahashi; Masaki Yamabe
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Pattern distortion of the stencil reticle caused by stress of silicon membrane and resist on the reticle
Author(s): Shin-ichi Takahashi; Masashi Okada; Norihiro Katakura; Takeshi Irita; Shintaro Kawata
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High-power laser-plasma x-ray source for lithography
Author(s): Celestino J. Gaeta; Harry Rieger; I. C. Edmond Turcu; Richard Alan Forber; Kelly L. Cassidy; S. M. Campeau; Michael F. Powers; J. R. Maldonado; James H. Morris; Richard M. Foster; Henry I. Smith; M. H. Lim
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New developments in ALFT soft x-ray point sources
Author(s): Dario F. Cintron; Xiaoming Guo; Meisheng Xu; Rubin Ye; Yuriy Antoshko; Steve Drew; Albert Philippe; Emilio Panarella
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Lithography: a historical perspective and shape of things to come
Author(s): Syed A. Rizvi
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Simulation of exposure and alignment for nano-imprint lithography
Author(s): Yunfei Deng; Andrew R. Neureuther
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Fabrication of microbowtie structures using electron-beam lithography for a new optical probe
Author(s): Ampere A. Tseng; Chii D. Chen; C. S. Wu; Rodolfo E. Diaz
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Collinearity and stitching performance on an ASML stepper
Author(s): Michael J.E. Van de Moosdijk; Ennos Van den Brink; Klaus Simon; Alexander Friz; Geoffrey N. Phillipps; Richard J. Travers; Erik Raaymakers
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Extended front-to-back alignment capability for MEMS/MOEMS applications
Author(s): Cheng-Qun Gui; Willy van Buel; Frans G. C. Bijnen; Joeri Lof
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V-grooves on LiNbO3 for passive fiber alignment
Author(s): Qihong Lou; Zhenhuan Ye; T. Li; Jinxing Dong
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Electron-beam lithography of isolated trenches with chemically amplified positive resist
Author(s): Andrew R. Eckert; Richard J. Bojko; Harold Gentile; Robert Harris; Jay Jayashankar; Earl Johns; Kevin Minor; Keith Mountfield; Carl Seiler; XiaoMin Yang
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New supercritical resist dryer
Author(s): Hideo Namatsu
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Preparation of high-aspect-ratio 70-nm patterns by supercritical drying technique in proximity x-ray lithography
Author(s): Yukiko Kikuchi; Takuya Fukuda; Seiichi Shishiguchi; Kaoru Masuda; Nobuyuki Kawakami
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Dynamic image placement accuracy of a stencil mask
Author(s): Hiroshi Takenaka; Hiroshi Yamashita; Kimitoshi Takahashi; Yoichi Tomo; Manabu Watanabe; Teruo Iwasaki; J. Yamamoto; Masaki Yamabe
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Experimental investigation of the Coulomb effect in electron projection lithography (EPL)
Author(s): Jiro Yamamoto; Fumio Murai; Akemi Moniwa
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Physical properties of the HCT EUV source
Author(s): Joseph Pankert; Klaus Bergmann; J. Klein; Willi Neff; Oliver Rosier; Stefan Seiwert; Christopher Smith; Rolf Apetz; Jeroen Jonkers; Michael Loeken; Guenther H. Derra
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Fine pattern replication on 10 x 10-mm exposure area using ETS-1 laboratory tool in HIT
Author(s): K. Hamamoto; Takeo Watanabe; Hideo Hada; Hiroshi Komano; Shinji Kishimura; Shinji Okazaki; Hiroo Kinoshita
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Vendor capability for low-thermal-expansion mask substrates for EUV lithography
Author(s): Kenneth L. Blaedel; John S. Taylor; Scott Daniel Hector; Pei-yang Yan; Arun Ramamoorthy; Peter D. Brooker
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Cost of ownership analysis for patterning using step and flash imprint lithography
Author(s): S. V. Sreenivasan; C. Grant Willson; Norman E. Schumaker; Douglas J. Resnick
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CAPELLA: a kHz and low-debris capillary discharge EUV source
Author(s): Eric Robert; Thierry Gonthiez; O. Sarroukh; A. L. Thomann; Raymond Viladrosa; Claude Fleurier; Jean-Michel Pouvesle; Christophe Cachoncinlle
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Fully automated interference lithography
Author(s): Bruce D. McLeod; Adam F. Kelsey; Mark A. Leclerc; Daniel P. Resler; Sergey Liberman; James P. Nole
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Manufacturing sub-50-nm gratings using E-beam lithography and electroplating
Author(s): Mark Kroon; Falco C.M.J.M. van Delft; Bas Ketelaars
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Radiation-induced carbon contamination of optics
Author(s): Ralph Kurt; Michiel van Beek; Co Crombeen; Peer Zalm; Yde Tamminga
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Predicting overlay performance for electron projection lithography masks
Author(s): Phillip L. Reu; Cheng-Fu Chen; Roxann L. Engelstad; Edward G. Lovell; Michael J. Lercel; Obert R. Wood; R. Scott Mackay
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Design of an electron projection system with slider lenses and multiple beams
Author(s): Daniel Moonen; Peter L. H. Albertino Leunissen; Patrick W.H. de Jager; Pieter Kruit; Arno J. Bleeker; Karel D. Van der Mast
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Nanotechnologies and nanolithography in Europe
Author(s): Jean Charles Guibert
Semiconductor foundry, lithography, and partners
Author(s): Burn Jeng Lin
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