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Proceedings of SPIE Volume 4343

Emerging Lithographic Technologies V
Editor(s): Elizabeth A. Dobisz
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Volume Details

Volume Number: 4343
Date Published: 20 August 2001
Softcover: 88 papers (834) pages
ISBN: 9780819440297

Table of Contents
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Insertion of EUVL into high-volume manufacturing
Author(s): Peter J. Silverman
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System integration and performance of the EUV engineering test stand
Author(s): Daniel A. Tichenor; Avijit K. Ray-Chaudhuri; William C. Replogle; Richard H. Stulen; Glenn D. Kubiak; Paul D. Rockett; Leonard E. Klebanoff; Karen J. Jefferson; Alvin H. Leung; John B. Wronosky; Layton C. Hale; Henry N. Chapman; John S. Taylor; James A. Folta; Claude Montcalm; Regina Soufli; Eberhard Adolf Spiller; Kenneth L. Blaedel; Gary E. Sommargren; Donald W. Sweeney; Patrick P. Naulleau; Kenneth A. Goldberg; Eric M. Gullikson; Jeffrey Bokor; Phillip J. Batson; David T. Attwood; Keith H. Jackson; Scott Daniel Hector; Charles W. Gwyn; Pei-yang Yan
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Progress of the EUVL alpha tool
Author(s): Hans Meiling; Jos P.H. Benschop; Udo Dinger; Peter Kuerz
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Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution
Author(s): Regina Soufli; Eberhard Adolf Spiller; Mark A. Schmidt; Courtney Davidson; R. Fred Grabner; Eric M. Gullikson; Benjamin B Kaufmann; Stanley Mrowka; Sherry L. Baker; Henry N. Chapman; Russell M. Hudyma; John S. Taylor; Christopher C. Walton; Claude Montcalm; James A. Folta
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Feasibility study of EUV scanners
Author(s): Kazuya Ota; Katsuhiko Murakami; Hiroyuki Kondo; Tetsuya Oshino; Katsumi Sugisaki; Hideki Komatsuda
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PREVAIL-EPL alpha tool electron optics subsystem
Author(s): Hans C. Pfeiffer; Rajinder S. Dhaliwal; Steven D. Golladay; Samuel K. Doran; Michael S. Gordon; Rodney A. Kendall; Jon E. Lieberman; David J. Pinckney; Robert J. Quickle; Christopher F. Robinson; James D. Rockrohr; Werner Stickel; Eileen V. Tressler
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Nikon EB Stepper: the latest development status
Author(s): Kazuaki Suzuki; Tomoharu Fujiwara; Kazunari Hada; Noriyuki Hirayanagi; Shintaro Kawata; Kenji Morita; Kazuya Okamoto; Teruaki Okino; Sumito Shimizu; Takehisa Yahiro; Hajime Yamamoto
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New data postprocessing for e-beam projection lithography
Author(s): Kazuya Okamoto; Koichi Kamijo; Shinichi Kojima; Hideyuki Minami; Teruaki Okino
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Bremsstrahlung emission and absorption in electron projection lithography
Author(s): Scott Daniel Hector; Jonathan L. Cobb; Vladimir Ivin; Mikhail V. Silakov; George Babushkin
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Impact of positive ions and effect of lens aberrations in projection electron-beam systems
Author(s): Bo Wu; Andrew R. Neureuther
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Progress on the realization of the electron column modules for SCALPEL high-throughput/alpha electron projection lithography tools
Author(s): Dirk Stenkamp; O. Kienzle; Alexander Orchowski; Wigbert D. Rau; A. Weickenmeier; G. Benner; M. Wetzke; Warren K. Waskiewicz; Victor Katsap; Xieqing Zhu; Haoning Liu; Eric Munro; John A. Rouse
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CD control analysis of the SCALPEL-HT/alpha optics
Author(s): Stuart T. Stanton; Warren K. Waskiewicz; Eric Munro; John A. Rouse; Xieqing Zhu
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Simulations of a SCALPEL wafer-heating correction using an adaptive Kalman filter
Author(s): Stuart T. Stanton
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Overlay and critical dimension control in 100-nm ULSI processes using TaBN x-ray masks and the XRA x-ray stepper
Author(s): Kiyoshi Fujii; Yuusuke Tanaka; Toshiyuki Iwamoto; Shinji Tsuboi; Hiroaki Sumitani; Takao Taguchi; Katsumi Suzuki; Yasuji Matsui
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Production x-ray lithography stepper for 100-nm device fabrication
Author(s): Xuan Li; Tsutomu Miyatake; Sayumi Hirose; Masaoki Hirose; Kiyoshi Fujii; Katsumi Suzuki
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Deep x-ray lithography with the SU-8 resist
Author(s): Laurence Singleton; Alexei L. Bogdanov; Serguei Peredkov; Oliver Wilhelmi; Andreas Schneider; Carsten Cremers; Stephan Megtert; Andreas Schmidt
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Vacuum spark point source for x-ray/EUV lithography
Author(s): Xioming Guo; Meisheng Xu; Rubin Ye; Chaofeng Huang; Kazimierz W. Wirpszo; Emilio Panarella
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Comparison of different source concepts for EUVL
Author(s): Rainer Lebert; Klaus Bergmann; Larissa Juschkin; Oliver Rosier; Willi Neff
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Extreme-ultraviolet sources for lithography applications
Author(s): Vadim Banine; Johannes Moors
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Development of a high-average-power extreme-ultraviolet electric capillary discharge source
Author(s): Neal R. Fornaciari; Howard Bender; Dean Buchenauer; Michael P. Kanouff; Steve Karim; Glenn D. Kubiak; Christopher D. Moen; Gregory M. Shimkaveg; William T. Silfvast; Kenneth D. Stewart
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Progress toward use of a dense plamsa focus as a light source for production EUV lithography
Author(s): William N. Partlo; Igor V. Fomenkov; Richard M. Ness; Ian Roger Oliver; Stephan T. Melnychuk; John E. Rauch
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Laser-produced plasma (LPP) scale-up and commercialization
Author(s): Richard H. Moyer; Harry Shields; Armando Martos; Steven W. Fornaca; Randall J. St. Pierre; Michael B. Petach
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Multiple-anion nonvolatile acetal (MANA) resists
Author(s): Jeffrey M. Guevremont; Robert L. Brainard; Scott D. Reeves; Xin Zhou; Thinh B. Nguyen; Joseph F. Mackevich; Erik H. Anderson; Gary N. Taylor
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High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making
Author(s): Wu-Song Huang; Ranee W. Kwong; Wayne M. Moreau; Robert Lang; Christopher F. Robinson; David R. Medeiros; Karen E. Petrillo; Ari Aviram; Arpan P. Mahorowala; Marie Angelopoulos; Christopher Magg; Mark Lawliss; Thomas B. Faure
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Theoretical calculations of photoabsorption of polymers in the EUV (extreme ultraviolet) region
Author(s): Nobuyuki N. Matsuzawa; Shigeo Irie; Ei Yano; Shinji Okazaki; Akihiko Ishitani
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Vacuum delay effect of CAR in mask fabrication
Author(s): Chang-Hwan Kim; Chan-Uk Jeon; Sung-Jae Han; Won-Il Cho; Seong-Woon Choi; Woo-Sung Han; Jung-Min Sohn
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Fabrication of patterned-surface reactivity templates using physisorption of reactive species in solvent-imprinted nanocavities
Author(s): Walter J. Dressick; Paul F. Nealey; Susan L. Brandow
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Advances in graft polymerization lithography
Author(s): Colin J. Brodsky; Brian C. Trinque; Heather F. Johnson; C. Grant Willson
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Nanoimprint lithography with a commercial 4-in. bond system for hot embossing
Author(s): Nils Roos; Thomas Luxbacher; Thomas Glinsner; Karl Pfeiffer; Hubert Schulz; Hella-Christin Scheer
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Layer-to-layer alignment for step and flash imprint lithography
Author(s): Byung Jin Choi; Mario J. Meissl; Matthew Colburn; Todd C. Bailey; Paul Ruchhoeft; S. V. Sreenivasan; F. Prins; Sanjay K. Banerjee; John G. Ekerdt; C. Grant Willson
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High-resolution proximity printing by wave-optically designed masks
Author(s): Ton J.M. Nellissen; Lingli Wang; Maarten Dirkzwager; Frank Wyrowski; Ernst-Bernhard Kley; Harald Aagendahl; Sven Buehling
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Evaluation and comparison of the pattern-transfer-induced image placement distortions on e-beam projection lithography masks
Author(s): Christopher Magg; Michael J. Lercel; Mark Lawliss; Robin Ackel; Neal Caldwell; Louis Kindt; Kenneth C. Racette; Carey T. Williams; Phillip L. Reu
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Impact of the EUV mask phase response on the asymmetry of Bossung curves as predicted by rigorous EUV mask simulations
Author(s): Christof G. Krautschik; Masaaki Ito; Iwao Nishiyama; Katsura Otaki
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Infinitely selective repair buffer for EUVL reticles
Author(s): James R. Wasson; Ken H. Smith; Pawitter J. S. Mangat; Scott Daniel Hector
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TaN EUVL mask fabrication and characterization
Author(s): Pei-yang Yan; Guojing Zhang; Andy Ma; Ted Liang
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Essential reduction of stitching errors in electron-beam lithography using a multiple-exposure technique
Author(s): Ralf Steingrueber; Herbert Engel; Werner Lessle
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Application of advanced 100-kV EB writer EB-X3 for 100-nm node x-ray mask fabrication
Author(s): Hiroshi Watanabe; Yoshinori Nakayama; Shinji Tsuboi; Mizunori Ezaki; Hajime Aoyama; Yasuji Matsui; Tetsuo Morosawa; Masatoshi Oda
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New registration technique using voltage-contrast images for low-energy electron-beam lithography
Author(s): Tetsuro Nakasugi; Atsushi Ando; Kazuyoshi Sugihara; Motosuke Miyoshi; Katsuya Okumura
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Ion projection lithography: advances with integrated tool and resist processes
Author(s): Andreas Wolter; Rainer Kaesmaier; Hans Loeschner
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Progress in placement control for ion beam stencil mask technology
Author(s): Frank-Michael Kamm; Albrecht Ehrmann; Thomas Struck; Karl Kragler; Joerg Butschke; Florian Letzkus; Reinhard Springer; Ernst Haugeneder
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Micromachining using a focused MeV proton beam for the production of high-precision 3D microstructures with vertical sidewalls of high orthogonality
Author(s): Jeroen Anton van Kan; Andrew A. Bettiol; K. Ansari; Frank Watt
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First environmental data from the EUV engineering test stand
Author(s): Leonard E. Klebanoff; Michael E. Malinowski; Philip A. Grunow; W. Miles Clift; Chip Steinhaus; Alvin H. Leung; Steven J. Haney
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Use of molecular oxygen to reduce EUV-induced carbon contamination of optics
Author(s): Michael E. Malinowski; Philip A. Grunow; Chip Steinhaus; W. Miles Clift; Leonard E. Klebanoff
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Development of data conversion system for electron-beam projection lithography (EPL) mask
Author(s): Yasuhisa Yamada; Hideo Kobinata; Takao Tamura; Mami Miyasaka; Tatsuya Sakamoto; Yuzo Ogawa; Kenichi Takada; Hiroshi Yamashita; Hiroshi Nozue
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High-accuracy aerial image measurement for electron-beam projection lithography
Author(s): Takehisa Yahiro; Noriyuki Hirayanagi; Kenji Morita; Takeshi Irita; Hajime Yamamoto; Shohei Suzuki; Hiroyasu Shimizu; Shintaro Kawata; Teruaki Okino; Kazuaki Suzuki
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Characterization of a laser-produced x-ray source with a double-stream gas puff target for x-ray and EUV lithography
Author(s): Henryk Fiedorowicz; Andrzej Bartnik; Hiroyuki Daido; Roman Jarocki; Rafal Rakowski; Masayuki Suzuki; Miroslaw Szczurek; Susumu Yamagami
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Thick silicon membranes as mask blank for SU-8 x-ray deep lithography
Author(s): Izaque Alves Maia; Luis Otavio S. Ferreira; Maria Helena O. Piazzetta; Graziele C. Natal
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EUV absorption in a laser-produced plasma source
Author(s): Michael P. Kanouff; Harry Shields; Luis J. Bernardez; Glenn D. Kubiak
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Thermomechanical modeling of the EUV reticle during exposure
Author(s): Carl J. Martin; Roxann L. Engelstad; Edward G. Lovell
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Quantifying EUV imaging tolerances for the 70-, 50-, 35-nm modes through rigorous aerial image simulations
Author(s): Christof G. Krautschik; Masaaki Ito; Iwao Nishiyama; Takashi Mori
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Scaling-up a liquid water jet laser plasma source to high average power for extreme-ultraviolet lithography
Author(s): Ulrich Vogt; Holger Stiel; Ingo Will; Marek Wieland; Thomas Wilhein; Peter Viktor Nickles; Wolfgang Sandner
Show Abstract
Advanced point diffraction interferometer for EUV aspherical mirrors
Author(s): Kazuya Ota; Takahiro Yamamoto; Yusuke Fukuda; Katsura Otaki; Iwao Nishiyama; Shinji Okazaki
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Models for characterizing the printability of buried EUV defects
Author(s): Yunfei Deng; Thomas V. Pistor; Andrew R. Neureuther
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Laser-induced EUV source for optics characterization
Author(s): Sebastian Kranzusch; Klaus R. Mann
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Spectroscopic and energetic investigation of capillary discharges devoted to EUV production for new lithography generation
Author(s): Eric Robert; Branimir M. Blagojevic; Remi Dussart; Smruti R. Mohanty; Moulay M. Idrissi; Dunpin Hong; Raymond Viladrosa; Jean-Michel Pouvesle; Claude Fleurier; Christophe Cachoncinlle
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Extremely fine-pitch printing with a 10X Schwarzschild optic at extreme-ultraviolet wavelengths
Author(s): Michael D. Shumway; Sang Hun Lee; Chang Hyun Cho; Patrick P. Naulleau; Kenneth A. Goldberg; Jeffrey Bokor
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Improvement of beam-adjustment accuracy by beam-intensity distribution measurement on a second shaping aperture in electron-beam writing systems
Author(s): Shinsuke Nishimura; Munehiro Ogasawara; Toru Tojo
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High-resolution and high-stability electromagnetic-deflection control system for EB lithography system
Author(s): Koji Nagata; Masahide Okumura; Kenji Maio; Akira Fujii; Hisashi Andoh; Toshiyuki Morimura; Hajime Hayakawa
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Stitching accuracy measurement system for EB direct writing and electron-beam projection lithography (EPL)
Author(s): Takao Tamura; Takahiro Ema; Hiroshi Nozue; Tamoya Sugahara; Akio Sugano; Jun Nitta
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Shot number analysis on character projection e-beam lithography for random logic device fabrication at 70-nm node
Author(s): Yoichi Tomo; Isao Shimizu; Yoshinori Kojima; Akira Yoshida; Hiroshi Takenaka; Masaki Yamabe
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Highly accurate CD control at stitching region for electron-beam projection lithography
Author(s): Tomoharu Fujiwara; Takeshi Irita; Sumito Shimizu; Hajime Yamamoto; Kazuaki Suzuki
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Performance of the improved JBX-9000MV e-beam lithography system
Author(s): Tadashi Komagata; Yasutoshi Nakagawa; Nobuo Gotoh; Kazumitsu Tanaka
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Vibrational analysis of 200-mm EPL masks
Author(s): Andrew R. Mikkelson; Cheng-Fu Chen; Roxann L. Engelstad; Edward G. Lovell
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Characteristics of the Ru buffer layer for EUVL mask patterning
Author(s): Byoung Taek Lee; Eiichi Hoshino; Masashi Takahashi; Takashi Yoneda; Hiromasa Yamanashi; Hiromasa Hoko; Akira Chiba; Masaaki Ito; Manhyoung Ryoo; Taro Ogawa; Shinji Okazaki
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Fabrication of a fly-eye mirror for an extreme-ultraviolet lithography illumination system
Author(s): Hideo Takino; Teruki Kobayashi; Norio Shibata; Masaaki Kuki; Akinori Itoh; Hideki Komatsuda
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Substrate defect smoothing of EUVL mask blanks using TaSiN films
Author(s): James R. Wasson; Theresa Hopson; Pawitter J. S. Mangat; Scott Daniel Hector
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Tantalum nitride films for the absorber material of refractive-type EUVL mask
Author(s): Masashi Takahashi; Taro Ogawa; Eiichi Hoshino; Hiromasa Hoko; Byoung Taek Lee; Akira Chiba; Hiromasa Yamanashi; Shinji Okazaki
Show Abstract
Evaluation of Shipley XP2040D positive chemically amplified resist for SCALPEL mask fabrication
Author(s): Bing Lu; Zorian S. Masnyj; Pawitter J. S. Mangat; Kevin J. Nordquist; Eric S. Ainley; Douglas J. Resnick
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Chemically amplified deep UV resists for electron-beam lithography applications
Author(s): Hsuen-Li Chen; Chien-Kui Hsu; Ben-Chang Chen; Fu-Hsiang Ko; Jung-Yen Yang; Tiao-Yuan Huang; Tien-Chi Chu
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Optimal lithium targets for laser-plasma lithography
Author(s): Alexander A. Andreev; T. Ueda; Jiri Limpouch
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Optical lithography at a 126-nm wavelength
Author(s): Hoyoung Kang; Anatoly Bourov; Bruce W. Smith
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Mix and match of nanoimprint and UV lithography
Author(s): Freimut Reuther; Karl Pfeiffer; Marion Fink; Gabi Gruetzner; Hubert Schulz; Hella-Christin Scheer; Freddy Gaboriau; Christophe Cardinaud
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Filter windows for EUV lithography
Author(s): Forbes R. Powell; Terry A. Johnson
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Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing
Author(s): Arpan P. Mahorowala; Katherina Babich; Karen E. Petrillo; John P. Simons; Marie Angelopoulos; Vishnubhai Patel; Alfred Grill; Scott Halle; Richard Conti; ChungHsi J. Wu; Richard Wise; Linda Chen; Alan C. Thomas; B. Lee; Oliver Genz
Show Abstract
Recent developments in EUV reflectometry at the Advanced Light Source
Author(s): Eric M. Gullikson; Stanley Mrowka; Benjamin B Kaufmann
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In-situ stress measurement of molybdenum/silicon multilayers and low-stress multilayers for extreme-ultraviolet lithography
Author(s): Masayuki Shiraishi; Wakana Ishiyama; Noriaki Kandaka; Tetsuya Oshino; Katsuhiko Murakami
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Development of an EUV reflectometer using a single line emission from a laser-plasma x-ray source
Author(s): Noriaki Kandaka; Hiroyuki Kondo; Katsumi Sugisaki; Tetsuya Oshino; Masayuki Shiraishi; Wakana Ishiyama; Katsuhiko Murakami
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Damage-resistant and low stress EUV multilayer mirrors
Author(s): Sergey A. Yulin; Thomas Kuhlmann; Torsten Feigl; Norbert Kaiser
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Compact Z-pinch EUV source for photolithography
Author(s): Guido Schriever; Manfred Rahe; Uwe Stamm; Dirk Basting; Oleg B. Khristoforov; Aleksandr Yu. Vinokhodov; Vladimir M. Borisov
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Reflecting-surface distortion when mirrors are cut to shape
Author(s): Gautam Meda
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Automated set-up for extreme-ultraviolet mask lithography: the first step to count and clean in one
Author(s): Jean Hue; Viviane Muffato; Catherine Pelle; Etienne Quesnel; Pierre Garrec; Francoise Baume
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Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer
Author(s): Patrick P. Naulleau; Kenneth A. Goldberg; Erik H. Anderson; Phillip J. Batson; Paul Denham; Keith H. Jackson; Senajith Rekawa; Jeffrey Bokor
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Flatness correction of NZTE mask blank substrates
Author(s): Lutz Aschke; Fredi Schubert; Joerg Kegeler; Axel Schindler; Thomas Haensel; Konrad Knapp
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Combined metrology including VUV spectroscopic ellipsometry and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm
Author(s): Pierre Boher; Patrick Evrard; Jean-Philippe Piel; Sylvie Janicot; Jean-Louis P. Stehle
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Luminescent materials for EUV detection purposes
Author(s): Mark Kroon; R. Stuik
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Equivalent multilayer bandwidth and comparison between 13.4 nm and 14.4 nm for EUV throughput calculation
Author(s): Weilun Chao; Eric M. Gullikson; David T. Attwood
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New results in high-energy proximity x-ray lithography
Author(s): Mumit Khan; Geng Han; Juan R. Maldonado; Franco Cerrina
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Technology in the Internet era
Author(s): Dennis D. Buss
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