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Metrology-based Control for Micro-Manufacturing
Editor(s): Kenneth W. Tobin; Fred Lakhani
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Softcover $105.00 * $105.00 *

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Volume Details

Volume Number: 4275
Date Published: 5 June 2001
Softcover: 16 papers (164) pages
ISBN: 9780819439536

Table of Contents
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Challenges facing 3D information extraction by CD-SEM and scatterometry
Author(s): Alain C. Diebold
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Metrology-based control and profitability in the semiconductor industry
Author(s): Charles Weber
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Realizing optimum yields on IC products fabricated in current and future process technologies
Author(s): Fred Lakhani
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Integrated applications of inspection data in the semiconductor manufacturing environment
Author(s): Kenneth W. Tobin; Thomas P. Karnowski; Fred Lakhani
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Field-test results of an image retrieval system for semiconductor yield learning
Author(s): Thomas P. Karnowski; Kenneth W. Tobin; Lloyd F. Arrowood; Regina K. Ferrell; James S. Goddard; Fred Lakhani
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Characterization of microstructures with in-line digital micro-holo-interferometry
Author(s): Lei Xu; Xiaoyuan Peng; Jianmin Miao; Anand Krishna Asundi
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3D modeling from AFM measurements
Author(s): Timothee Jost; Heinz Huegli
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Absolute shape control of microcomponents using digital holography and multiwavelength contouring
Author(s): Wolfgang Osten; Soenke Seebacher; Torsten Baumbach; Werner P. O. Jueptner
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High-precision interferometric shape measurement of objects with areas of different reflectance
Author(s): Joanna Schmit; Akiko Harasaki
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SEM defect review and classification for semiconductor device manufacturing
Author(s): Zamir Abraham
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Advanced defect-detection methods for CMP process modules in semiconductor manufacturing
Author(s): J. Scott Steckenrider; Rick Foster; Sumit Guha; Younsoo Ra; Hawk Kim; Anantha Sethuraman
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High-resolution noncontact thermal characterization of semiconductor devices
Author(s): James Christofferson; Daryoosh Vashaee; Ali Shakouri; Philip Melese
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High-resolution IC inspection technique
Author(s): Stephen Bradley Ippolito; Anna K. Swan; Bennett B. Goldberg; M. Selim Unlu
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Analytical first-order model of light scattering from submicron pyramidal pits
Author(s): Michael Jordan; Rodolfo E. Diaz; E. Dan Hirleman
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Desktop x-ray microtomography
Author(s): Alexander Sasov; Tom Ceulemans; Dirk Van Dyck
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Depth-image-based surface measurement sensor
Author(s): Xiaoyang Yu; Zhenhua Wei; Guijiang Yu; Fujun Zhang; Liying Wu
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