Share Email Print
cover

PROCEEDINGS VOLUME 4186

20th Annual BACUS Symposium on Photomask Technology
Editor(s): Brian J. Grenon; Giang T. Dao
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.


Volume Details

Volume Number: 4186
Date Published: 22 January 2001
Softcover: 102 papers (960) pages
ISBN: 9780819438492

Table of Contents
show all abstracts | hide all abstracts
Lithographic performance results for a new 50-kV electron-beam mask writer
Author(s): Varoujan Chakarian; Stephen R. Bylciw; Charles A. Sauer; David Trost; Marek Zywno; Robin Teitzel; Frederick Raymond; Frank E. Abboud
Show Abstract
Performance of JBX-9000MV with negative-tone resist for 130-nm reticle
Author(s): Naoki Takahashi; Masayoshi Tsuzuki; Jun Kotani; Jun Yoshida; Yuji Kodaira; Yuko Oi; Yoshiro Yamada; Yuichi Matsuzawa
New concept photomask repeater with stitching exposure technique
Author(s): Nobuyuki Irie; Koji Muramatsu; Yuuki Ishii; Nobutaka Magome; Toshikazu Umatate; Suigen Kyoh; Shun-Ichiro Tanaka; Soichi Inoue; Iwao Higashikawa; Ichiro Mori; Katsuya Okumura
Show Abstract
Improved throughput in 0.6-NA laser reticle writers
Author(s): Gregory E. Valentin; Henry Chris Hamaker; Jay P. Daniel; Vishal Garg; Daniel R. Sprenkel
Process development for 257-nm photomask fabrication using environmentally stable chemically amplified photoresists
Author(s): Jeff A. Albelo; Benjamen M. Rathsack; Peter Y. Pirogovsky
Show Abstract
Chrome dry etch process characterization using surface nanoprofiling
Author(s): Guenther G. Ruhl; Ralf Dietrich; Ralf Ludwig; Norbert Falk; Troy B. Morrison; Brigitte C. Stoehr
Show Abstract
Experimental study on the possibility of chemically amplified resists for mask production for device generations < 180 nm
Author(s): Chang-Hwan Kim; Chan-Uk Jeon; Seong-Woon Choi; Woo-Sung Han; Jung-Min Sohn
Show Abstract
Mask manufacturing rule check: how to save money in your mask shop
Author(s): Martin C. Keck; Wolfram Ziegler; Roman Liebe; Torsten Franke; Gerd Ballhorn; Matthias Koefferlein; Joerg Thiele
Show Abstract
Using manufacturing rule check to prescreen reticle inspection databases
Author(s): Charles H. Howard; Paul DePesa; Curt J. Linder
Show Abstract
Methods used to streamline data preparation for memory products
Author(s): Paul DePesa; Wolfgang Leitermann
Show Abstract
ASIC data preparation management for OPC
Author(s): Timothy G. Dunham; William C. Leipold
Show Abstract
Efficient automated tapeout system
Author(s): William A. Krieger; Chana Nasamran
FIB-based local deposition of dielectrics for phase-shift mask modification
Author(s): Heinz D. Wanzenboeck; Martin Verbeek; Wilhelm Maurer; Emmerich Bertagnolli
Show Abstract
Multibeam high-resolution UV wavelength reticle inspection
Author(s): Chih-Chien Hung; Chue-San Yoo; Chia-Hui Lin; William Waters Volk; James N. Wiley; Steve Khanna; Steve Biellak; D. Wang
Show Abstract
In-process defect inspection and characterization study for dry etching chrome-on-quartz binary masks
Author(s): Weidong Cai; Henry H. Kamberian; Douglas G. Mattis; Kraig Morris; Van Tu
Show Abstract
Pellicle-induced distortions in advanced optical reticles
Author(s): William H. Semke; Lowell K. Siewert; Andrew R. Mikkelson; Eric A. Risius; Ning Tang; Roxann L. Engelstad; Edward G. Lovell; Jun-Fei Zheng; Giang T. Dao
Reticle error correction for lithography tool qualification benefits and limitations
Author(s): Ton Kiers; Melchior Mulder; Jan B.P. van Schoot; Jacques A.C. Waelpoel; Robert Uitz
Show Abstract
Analysis of photomask distortion caused by blank materials and open ratios
Author(s): Seong-Yong Moon; Won-Tai Ki; Seung-Hune Yang; Tae Moon Jeong; Seong-Woon Choi; Woo-Sung Han; Jung-Min Sohn
Show Abstract
Materials for an attenuated phase-shifting mask in 157-nm lithography
Author(s): Takahiro Matsuo; Toshio Onodera; Toshiro Itani; Hiroaki Morimoto; Takashi Haraguchi; Koichiro Kanayama; Tadashi Matsuo; Masao Otaki
Show Abstract
Realization of mass production for 130-nm node and future applicatiton for high transmission using ZrSi-based attenuated phase-shift mask in ArF lithography
Author(s): Toshihiro Ii; Tadashi Saga; Yusuke Hattori; Takashi Ohshima; Masao Otaki; Masahide Iwakata; Takashi Haraguchi; Koichiro Kanayama; Tsukasa Yamazaki; Nobuhiko Fukuhara; Tadashi Matsuo
Effect of mask reduction ratio in alternating phase-shift masks
Author(s): In-Gyun Shin; Sung-Ho Lee; Yong-Hoon Kim; Seong-Woon Choi; Woo-Sung Han; Jung-Min Sohn; Tong-Kun Lim
Proximity effects in alternating aperture phase-shifting masks
Author(s): Christophe Pierrat
Show Abstract
Fabricating 0.10-um line patterns using attenuated phase-shift masks
Author(s): Haruo Iwasaki
Show Abstract
Balancing of alternating phase-shifting masks for practical application: modeling and experimental verification
Author(s): Uwe A. Griesinger; Leonhard Mader; Armin Semmler; Wolfgang Dettmann; Christoph Noelscher; Rainer Pforr
Show Abstract
Technological challenges in implementation of alternating phase-shift mask
Author(s): Wilman Tsai; Qi-De Qian; Ken Mr. Buckmann; Wen-Hao Cheng; Long He; Brian Irvine; Marilyn Kamna; Yulia O. Korobko; Michael Kovalchick; Steven M. Labovitz; R. Talevi; Jeff N. Farnsworth
Evaluation of molybdenum silicide for use as a 193-nm phase-shifting absorber in photomask manufacturing
Author(s): Michael S. Hibbs; Masao Ushida; Katherina Babich; Hideaki Mitsui; Anatoly Bourov
Show Abstract
Emergence of assist feature OPC era in sub-130-nm DRAM devices
Author(s): Byeongsoo Kim; Insung Kim; Gisung Yeo; Junghyun Lee; Ji-Hyeon Choi; Hanku Cho; Joo-Tae Moon
Eddy current evaluation for a high-resolution EB system
Author(s): Naoharu Shimomura; Munehiro Ogasawara; Kiyoshi Hattori; Jun Takamatsu; Hitoshi Sunaoshi; Shusuke Yoshitake; Yuuji Fukudome; Kiminobu Akeno
Effect of beam blur in mask fabrication
Author(s): Seung-Hune Yang; Won-Tai Ki; Seong-Yong Moon; Tae Moon Jeong; Seong-Woon Choi; Woo-Sung Han; Jung-Min Sohn
Show Abstract
Integration of the Micronic Omega6500 into the mask manufacturing environment
Author(s): Peter D. Buck; Mans Bjuggren; Hartmut Buenning; Vishal Garg; Johan Larsson; Tomas Vikholm
Show Abstract
Comprehensive simulation of e-beam lithography processes using PROLITH/3D and TEMPTATION software tools
Author(s): Igor Yu. Kuzmin; Chris A. Mack
Show Abstract
Improved process control of photomask fabrication in e-beam lithography
Author(s): Byung-Cheol Cha; Jin-Hong Park; Yo-Han Choi; Jin-Min Kim; Woo-Sung Han; Hee-Sun Yoon; Jung-Min Sohn
Show Abstract
Investigations of CD variation in Cr dry etching process
Author(s): Hitoshi Handa; Satoshi Yamauchi; Kouji Hosono; Hisatsugu Shirai
Show Abstract
Evaluation of photomask blank layer parameters with an x-ray reflection method and photomask property distribution
Author(s): Teruyoshi Hirano; Atsushi Hayashi; Yoshihiro Hino; Hiroshi Wada; Masao Otaki; Ryuji Matsuo
Dry etching technology of Cr and MoSi layers using high-density plasma source
Author(s): Hyuk-Joo Kwon; Kwang-Sik Oh; Byung-Soo Chang; Boo-Yeon Choi; Kyung-Ho Park; Soo-Hong Jeong
Evaluation of loading effect of NLD dry etching: II
Author(s): Tatsuya Fujisawa; Takayuki Iwamatsu; Koji Hiruta; Hiroaki Morimoto; Noriyuki Harashima; Takaei Sasaki; Mutsumi Hara; Kazuhide Yamashiro; Yasushi Okubo; Yoichi Takehana
Laser resist screening for iP3500/3600 replacement for advanced reticle fabrication
Author(s): Fumiko Ota; Hideo Kobayashi; Takao Higuchi; Keishi Asakawa
Show Abstract
CARs blanks feasibility study results for advanced EB reticle fabrication
Author(s): Masahiro Hashimoto; Hideo Kobayashi; Yasunori Yokoya
Show Abstract
Effective data compaction algorithm for vector scan EB writing system
Author(s): Shinichi Ueki; Isao Ashida; Hiroichi Kawahira
Show Abstract
Pushing SRAM densities beyond 0.13-um technology in the year 2000
Author(s): Orest Bula; Rebecca D. Mih; Eric Jasinski; Dennis Hoyniak; Andrew Lu; Jay Harrington; Anne E. McGuire
Improvement of the efficiency of OPC data handling
Author(s): Nobuhito Toyama; Takayuki Ikemoto; Kouji Ishida; Hiroyuki Miyashita
Show Abstract
Soft defect printability: correlation to optical flux-area measurements
Author(s): Darren Taylor; Peter Fiekowsky
Show Abstract
Neolithography Consortium: a progress report
Author(s): James E. Potzick
Show Abstract
SCALPEL mask parametric study
Author(s): Gerald A. Dicks; Roxann L. Engelstad; Edward G. Lovell; James Alexander Liddle
Fabrication process and transmission characteristics of SCALPEL mask blanks with thin SiNx membranes
Author(s): Sang-In Han; Pawitter J. S. Mangat; William J. Dauksher; Michael Chor; James Alexander Liddle; Anthony E. Novembre
Show Abstract
Dry etching of Ta absorber for EUVL masks
Author(s): Eiichi Hoshino; Taro Ogawa; Naoya Hirano; Hiromasa Hoko; Masashi Takahashi; Hiromasa Yamanashi; Akira Chiba; Masaaki Ito; Shinji Okazaki
Show Abstract
Double-step process for manufacturing reticle to reduce gate CD variation
Author(s): Makoto Kozuma; Masaya Komatsu; Rieko Arakawa; Seiji Kubo; Tatsuya Takahashi; John Jensen; Hyun-Suk Bang; Il-Ho Lee; Cheol Shin; Hong-Seok Kim; Keun-Won Park
Show Abstract
Comparison study between stepper (5x) and scanner (4x) for gate CD control using total process-proximity-based correction
Author(s): Byung-Ho Nam; Dong-Seok Kim; Byung-Jin Cho; Nam-Ki Seok; Jae Kwan Jeong; Sang-Pye Kim; Sang-Woo Kang; Young Ju Hwang; Young Jin Song
Tritone inspection for embedded phase-shift mask
Author(s): Wen-Hao Cheng; Jeff N. Farnsworth; Edita Tejnil
Show Abstract
Effects of shifter edge topography on through focus performance
Author(s): Shoji Hotta; Thomas V. Pistor; Konstantinos Adam; Andrew R. Neureuther
Show Abstract
Development of photomask fabrication for 100-nm design rule
Author(s): Takashi Inoue; Takuro Horibe; Akihiro Maeda; Yoshiyuki Tanaka
Development of a MoSi-based bilayer HT-PSM blank for ArF lithography
Author(s): Shuichiro Kanai; Susumu Kawada; Akihiko Isao; Takaei Sasaki; Kazuyuki Maetoko; Nobuyuki Yoshioka
Show Abstract
High-optical-density photomasks for large exposure applications
Author(s): Dan L. Schurz; Warren W. Flack; Makoto Nakamura
Show Abstract
Defect dispositioning using mask printability on attenuated phase-shift production photomasks
Author(s): Justin W. Novak; Benjamin George Eynon; Eric Poortinga; Anja Rosenbusch; Yair Eran
Show Abstract
Establishment of production process and assurance method for alternating phase-shift masks
Author(s): Shiaki M. Murai; Yasuhiro Koizumi; Tatsuhiko Kamibayashi; Hidetaka Saitou; Morihisa Hoga; Yasutaka Morikawa; Hiroyuki Miyashita
Show Abstract
New approach to improve CD uniformity based on mask quality
Author(s): Roman Liebe; Carmen Jaehnert; Gidon Gottlib; Yair Eran; Shirley Hemar; Amikam Sade; Anja Rosenbusch
Show Abstract
Investigating inspectability and printability of contamination deposited during SEM analysis
Author(s): Bryan S. Kasprowicz; Mohan Ananth; Chih-Yu Wang
Show Abstract
Defect printability modeling of smoothed substrate defects for EUV lithography
Author(s): Avijit K. Ray-Chaudhuri; Aaron Fisher; Eric M. Gullikson
Show Abstract
Mask manufacturing contribution on 248-nm and 193-nm lithography performances
Author(s): Alexandra Barberet; Gilles L. Fanget; Jean-Charles Richoilley; Michel Tissier; Yves Quere
Show Abstract
Minimization of mask transmission asymmetry effect for chromeless phase-shift masks
Author(s): David Y. Chan; Justin W. Novak; Michael Fritze
Show Abstract
High-accuracy laser mask repair system LM700A
Author(s): Yoichi Yoshino; Yukio Morishige; Shuichi Watanabe; Yukio Kyusho; Atsushi Ueda; Tutomu Haneda; Makoto Ohmiya
Subtractive defect repair via nanomachining
Author(s): Mark R. Laurance
Show Abstract

© SPIE. Terms of Use
Back to Top