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Proceedings of SPIE Volume 4066

Photomask and Next-Generation Lithography Mask Technology VII
Editor(s): Hiroaki Morimoto
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Volume Details

Volume Number: 4066
Date Published: 19 July 2000
Softcover: 81 papers (766) pages
ISBN: 9780819437020

Table of Contents
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Requirements for lithography and mask technology from the standpoint of system LSI business
Author(s): Keiichi Kawate; Tadahiro Takigawa; Hidemi Ishiuchi; Mineo Goto
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Comparative study on MEEF and dose latitude between attenuated PSM and Cr binary masks
Author(s): Hyun Joon Cho; Yong-Hoon Kim; Seong-Woon Choi; Woo-Sung Han; Jung-Min Sohn
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Impact of MEF on 0.15-um KrF lithography
Author(s): Haruo Iwasaki; Hiroyoshi Tanabe
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Novel methodology for 130-nm DRAM cell mask size optimization
Author(s): Hideyuki Kanemitsu; Kouichi Nagai; Masafumi Asano; T. Sutani
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Analysis of reticle deformation, reduction ratio, and MEEF of future optical lithography
Author(s): Kenichi Kotoku; Koichi Mikami; Ryuichi Ebinuma; Yuichi Yamada; Yuan Zhang
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Mask cost of ownership for advanced lithography
Author(s): Edward G. Muzio; Philip K. Seidel
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Cluster tool solution for fabrication and qualification of advanced photomasks
Author(s): Thomas Schaetz; Hans Hartmann; Kai Peter; Frederic P. Lalanne; Olivier Maurin; Emanuele Baracchi; Corinne Miramond; Hans-Juergen Brueck; Gerd Scheuring; Thomas Engel; Yair Eran; Karl Sommer
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Current status of NGL masks
Author(s): David M. Walker
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EUV mask absorber characterization and selection
Author(s): Pei-yang Yan; Guojing Zhang; Patrick Kofron; Jeffrey E. Powers; Mark Tran; Ted Liang; Alan R. Stivers; Fu-Chang Lo
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CA resist with high sensitivity and sub-100-nm resolution for advanced mask making
Author(s): Wu-Song Huang; Ranee W. Kwong; John G. Hartley; Wayne M. Moreau; Marie Angelopoulos; Christopher Magg; Mark Lawliss
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Magnetic neutral loop discharge etching for 130-nm generation photomask fabrication
Author(s): Mikio Katsumata; Hiroichi Kawahira
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Applications of MICP source for next-generation photomask process
Author(s): Hyuk-Joo Kwon; Byung-Soo Chang; Boo-Yeon Choi; Kyung Ho Park; Soo-Hong Jeong
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Quality assurance and yield improvement in photomask fabrication
Author(s): Takashi Yamauchi
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Development of photomask process with precise CD control, and an approach for DFM (defect-free manufacturing) using a cluster tool
Author(s): Shiho Sasaki; Toshifumi Yokoyama; Masa-aki Kurihara; Hiroyuki Miyashita; Naoya Hayashi; Hisatake Sano
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Fabrication process of alternating phase-shift mask for practical use
Author(s): Naoyuki Ishiwata; Takema Kobayashi; Tadahiro Yamamoto; Hideaki Hasegawa; Satoru Asai
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Universal inspection standard for evaluation of inspection system and algorithm sensitivity and runability
Author(s): Jerry Xiaoming Chen; Charles H. Howard; Kong Son; Franklin D. Kalk; Il-Ho Lee
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Investigation of fast and accurate reticle defect assessment methods using STARlight for chrome-on-glass reticle defects
Author(s): Ingrid B. Peterson; Kaustuve Bhattacharyya; Enio L. Carpi; Darius Brown; Martin Verbeek; Douglas A. Bernard
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In-line verification of linewidth uniformity for 0.18 and below: design rule reticles
Author(s): TaiSheng Tan; Shen Chung Kuo; Clare Wu; Reuven Falah; Shirley Hemar; Amikam Sade; Gidon Gottlib
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Pattern shape analysis tool for defect judgement of photomask
Author(s): Fuyuhiko Matsuo; Masao Otaki; Norihito Fukugami; Isao Yonekura; Yuhichi Fukushima
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Reticle defect sizing of optical proximity correction defects using SEM imaging and image analysis techniques
Author(s): Larry S. Zurbrick; Lantian Wang; Paul Konicek; Ellen R. Laird
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Evaluation of printability and inspection of phase defects on hidden-shifter alternating phase-shift masks
Author(s): Edita Tejnil; Alan R. Stivers; Richard E. Schenker; Larry S. Zurbrick
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Improvement of defect density for DUV halftone PSM
Author(s): Kyu-Yong Lee; Lee-Ju Kim; Kyeong-Mee Yeon; Sang Woon Lee; Hong-Seok Kim
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Practical phase control technique for alternating phase-shift mask fabrication
Author(s): Masahiko Takahashi; Akihiro Miyake; Hidetaka Saitou; Hiroyuki Miyashita; Shiaki M. Murai
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Improving reticle quality through reticle blank inspection
Author(s): William B. Howard; Kevin A. Krause
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Knack for reticle cleaning
Author(s): Masumi Takahashi; Hitoshi Handa; Hisatsugu Shirai
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ArF halftone PSM cleaning process optimization for next-generation lithography
Author(s): Yong-Seok Son; Seong-Ho Jeong; Jeong-Bae Kim; Hong-Seok Kim
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Mask cleaner innovation
Author(s): Hidehiro Watanabe; Kenji Masui; Akio Kosaka; Naoya Hayamizu; Akinori Iso; Hachiro Hiratsuka; Yoshiaki Minegishi; Fumiaki Shigemitsu
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Surface preparation of EUVL mask substrate for multilayer coating by supersonic hydrocleaning technique
Author(s): Naoya Hirano; Hiromasa Hoko; Eiichi Hoshino; Taro Ogawa; Akira Chiba; Hiromasa Yamanashi; Masashi Takahashi; Shinji Okazaki
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Mask critical dimension error on optical lithography
Author(s): Tae-Seung Eom; Sang-Sool Koo; Seung-Weon Paek; Hee-Bom Kim; Chang-Nam Ahn; Ki-Ho Baik
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Another look at stepper lens reduction and field size
Author(s): Harry J. Levinson; Paul W. Ackmann; Lori Peters; John Arnaud
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Next-generation lithography mask development at the NGL-MCOC
Author(s): Michael J. Lercel; Kenneth C. Racette; Christopher Magg; Mark Lawliss; Kevin W. Collins; Monica Barrett; Michael J. Trybendis; Lucien Bouchard
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Process scheme for removing buffer layer on multilayer for EUVL mask
Author(s): Eiichi Hoshino; Taro Ogawa; Masashi Takahashi; Hiromasa Hoko; Hiromasa Yamanashi; Naoya Hirano; Akira Chiba; Masaaki Ito; Shinji Okazaki
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Critical defects in x-ray masks for 100-nm patterns
Author(s): Hiroshi Watanabe; Yasuji Matsui
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Graphite membrane applied for high-aspect-ratio microstructure fabrication
Author(s): Hsiharng Yang; Min-Chieh Chou; Horng-Jey Wang; Chengtang Pan; Jiang Long Lin
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Lithography performance of contact holes: I. Optimization of pattern fidelity using MPG and MPG-II
Author(s): Suzanne Weaver; Maiying Lu; Jan M. Chabala; Dinh Ton; Charles A. Sauer; Chris A. Mack
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Lithography performance of contact holes: II. Simulation of the effects of reticle corner rounding on wafer print performance
Author(s): Chris A. Mack; Charles A. Sauer; Suzanne Weaver; Jan M. Chabala
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Proximity effect correction for reticle fabrication
Author(s): Masao Sugiyama; Shinji Kubo; Koji Hiruta; Takayuki Iwamatsu; Tatsuya Fujisawa; Hiroaki Morimoto
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Fogging effect compensation technique for photomask making
Author(s): Yuji Nozaki; Toshiyuki Tanaka; Katsuhiro Takushima; Seki Suzuki; Akihiro Endo; Kohei Sogo; Yasuki Kimura
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Dose latitude dependency on resist contrast in e-beam mask lithography
Author(s): Byung-Cheol Cha; Seong-Yong Moon; Won-Tai Ki; Seung-Hune Yang; Seong-Woon Choi; Woo-Sung Han; Hee-Sun Yoon; Jung-Min Sohn
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Improvement of Cr dry etching characteristics with the MERIE system
Author(s): Hitoshi Handa; Satoshi Yamauchi; Hisatsugu Shirai
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Evaluation of loading effect of NLD dry etching
Author(s): Takayuki Iwamatsu; Tatsuya Fujisawa; Koji Hiruta; Hiroaki Morimoto; Noriyuki Harashima; Takaei Sasaki; Mutsumi Hara; Kazuhide Yamashiro; Yasushi Okubo; Yoichi Takehana
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150-nm mask fabrication using thin ZEP 7000 resist, GHOST, and dry etch for the MEBES 5000 pattern generator
Author(s): Myung Yong Kim; Jong-Hwa Lee; Young Jin Yoon; Boo-Yeon Choi
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Spray developer for ZEP 7000
Author(s): Atsushi Kawata; Kakuei Ozawa; Nobunori Abe; Kazuhide Yamashiro; Takeshi Aizawa
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Improvement of ZEP process for advanced mask fabrication
Author(s): Yasuyuki Kushida; Youichi Usui; Hisatsugu Shirai
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CAR blanks feasibility study results
Author(s): Yasunori Yokoya; Hideo Kobayashi; Masahiro Hashimoto; Fumiko Ota; Keishi Asakawa
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Improvement of the resolution and accuracy of chemical-amplification positive resist for 0.13-um reticle fabrication
Author(s): Tadashi Arai; Toshio Sakamizu; Kei Kasuya; Kohji Katoh; Takashi Soga; Hidetaka Saitoh; Hiroshi Shiraishi; Morihisa Hoga
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High-contrast i-line positive photoresist for laser reticle writer
Author(s): Yoshihito Kobayashi; Y. Oppata; Y. Ezoe; Fumiaki Shigemitsu; K. Urayama; K. Doi
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Pellicle degradation and its effect on surrounding environment in ArF lithography
Author(s): Junji Miyazaki; Takashi Okagawa; Keisuke Nakazawa; Toshiro Itani; Shigeto Shigematsu; Hiroaki Nakagawa
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Structural and thickness distribution evaluation of a multilayer photomask blank with x-ray reflectivity method
Author(s): Teruyoshi Hirano; Hiroshi Wada; Masao Otaki; Ryuji Matsuo
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Halftone PSM inspection sensitivity of OPC line/space pattern for 150-nm generation
Author(s): Chun-Hung Wu; Jackie Cheng; David Wang; Clare Wu; Yair Eran; Reuven Falah; Wolfgang Staud
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Impact of pattern proximity correction on die-to-database mask inspection
Author(s): Anja Rosenbusch; Vicky Bailey; Yair Eran; Reuven Falah; Shirley Hamar; Neil J. Holmes; Andrew C. Hourd; Hartmut Kirsch; Andrew McArthur
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150-nm DR contact holes die-to-database inspection
Author(s): Shen Chung Kuo; Clare Wu; Yair Eran; Wolfgang Staud; Shirley Hemar; Ofer Lindman
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New approach to mask and wafer performance optimization for system-on-a-chip (SOC) devices
Author(s): Gidon Gottlib; Yair Eran; Shirley Hemar; Amikam Sade; Wolfgang Staud; Mircea V. Dusa; Steve Warila
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Characteristics of CD measurement equipment
Author(s): Takeshi Yamane; Takashi Hirano
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End of thresholds: subwavelength optical linewidth measurement using the flux-area technique
Author(s): Peter Fiekowsky
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Optical column of the mask-scan EB mask writer test stand
Author(s): Naoharu Shimomura; Munehiro Ogasawara; Jun Takamatsu; Hitoshi Sunaoshi; Kiyoshi Hattori; Shusuke Yoshitake; Yuuji Fukudome; Kiminobu Akeno
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New-concept i-line stepper for mask fabrication
Author(s): Nobuyuki Irie; Koji Muramatsu; Yuuki Ishii; Nobutaka Magome; Toshikazu Umatate; Suigen Kyoh; Satoshi Tanaka; Soichi Inoue; Iwao Higashikawa; Ichiro Mori; Katsuya Okumura
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ALTA 3700: extending the application space of the ALTA 3500 laser reticle writer
Author(s): Cris G. Morgante; Henry Chris Hamaker
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Results from a new laser pattern generator for 180-nm photomasks
Author(s): Tomas Vikholm; Lars Kjellberg; Per Askebjer; Steven Haddleton; Johan Larsson; Mans Bjuggren
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Development of a fast linewidth correction system
Author(s): Ryuji Takenouchi; Isao Ashida; Hiroichi Kawahira
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Mask pattern correction for an advanced device
Author(s): Yoshimasa Watanabe; Masahiko Minemura; Kazuhiko Takahashi; Tomoyuki Okada; Kojiro Suzuki
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Effective OPC pattern generation using chemically amplified resist for 0.13-um design rule masks
Author(s): Il-Ho Lee; Kyung-Han Nam; Hong-Seok Kim
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Foundry maskshop operation strategy and management
Author(s): Chue-San Yoo; John C.H. Lin; Jia-Jing Wang
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Assessing polylayer performance of UV defect detection systems
Author(s): James A. Reynolds
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Newly developed mask inspection system with DUV laser illumination
Author(s): Katsuki Oohashi; Hiromu Inoue; Takehiko Nomura; Akira Ono; Mitsuo Tabata; Hitoshi Suzuki
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Reticle inspection system using DUV wavelength and new alogorithm platform for advanced reticle inspection for 0.13-um technology node
Author(s): David S. Alles; Paul Terbeek; Shauh-Teh Juang; James N. Wiley; Kangmin Hsia
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Advanced FIB mask repair technology in ArF lithography
Author(s): Koji Hiruta; Shinji Kubo; Hiroaki Morimoto; Anto Yasaka; Ryoji Hagiwara; Tatsuya Adachi; Yasutaka Morikawa; Kazuya Iwase; Naoya Hayashi
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Mask roadmap, mask technology trend, critical issues, and activities of International SEMATECH
Author(s): Wallace R. Carpenter
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Current status of 157-nm mask technology development
Author(s): Giang T. Dao; Ronald Kuse; Kevin J. Orvek; Eric M. Panning; Roswitha Remling; Jun-Fei Zheng; Munehiko Tsubosaki; Fu-Chang Lo
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New modified silica glass for 157-nm lithography
Author(s): Yoshiaki Ikuta; Shinya Kikugawa; T. Kawahara; H. Mishiro; Kaname Okada; Katsuhiro Ochiai; Keigo Hino; T. Nakajima; M. Kawata; Shuhei Yoshizawa
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Pellicle for F2 laser lithography
Author(s): Toru Shirasaki; Meguru Kashida
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Elements of an advanced pattern generator for 130- to 100-nm maskmaking
Author(s): Varoujan Chakarian; Charles A. Sauer; Bassam Shamoun; Frank Chilese; David Trost; Marek Zywno; Ulrich Hofmann; Robin Teitzel; Richard Prior; Frederick Raymond; Abe Ghanbari; Frank E. Abboud
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Advanced e-beam reticle writing system for next-generation reticle fabrication
Author(s): Tetsuji Nakahara; Kazui Mizuno; Suyo Asai; Yasuhiro Kadowaki; Katsuhiro Kawasaki; Hidetoshi Satoh
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New photomask pattern generation method based on i-line stepper
Author(s): Suigen Kyoh; Shun-Ichiro Tanaka; Soichi Inoue; Iwao Higashikawa; Ichiro Mori; Katsuya Okumura; Nobuyuki Irie; Koji Muramatsu; Yuuki Ishii; Nobutaka Magome; Toshikazu Umatate
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Phase defects on DUV alternating PSMs
Author(s): Ikuo Yoneda; Hideki Kanai; Shinji Yamaguchi; Iwao Higashikawa
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Development of halftone phase-shift blank and mask fabrication for ArF lithography
Author(s): Hideki Suda; Hideaki Mitsui; Osamu Nozawa; Hitoshi Ohtsuka; Megumi Takeuchi; Naoki Nishida; Yasushi Okubo; Masao Ushida
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CrOxFy as a material for attenuated phase-shift masks in ArF lithography
Author(s): Keisuke Nakazawa; Takahiro Matsuo; Toshio Onodera; Hiroaki Morimoto; Hiroshi Mohri; Chiaki Hatsuta; Naoya Hayashi
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Gate CD control for full chip using total-process-proximity-based correction method
Author(s): Byung-Ho Nam; Jong O Park; Dai Jong Lee; Jong Ho Cheong; Young Ju Hwang; Young Jin Song
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Integration of optical proximity correction strategies in strong phase-shifter design for polygate layers
Author(s): Chris A. Spence; Marina V. Plat; Emile Y. Sahouria; Nicolas B. Cobb; Franklin M. Schellenberg
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Resolution enhancement techniques and mask manufacturability for subwavelength lithography
Author(s): Linard Karklin; Burn Jeng Lin
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Next-generation lithography mask inspection
Author(s): Noah Bareket; Steve Biellak; Donald W. Pettibone; Stanley E. Stokowski
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