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Proceedings of SPIE Volume 3997

Emerging Lithographic Technologies IV
Editor(s): Elizabeth A. Dobisz
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Volume Details

Volume Number: 3997
Date Published: 21 July 2000
Softcover: 95 papers (920) pages
ISBN: 9780819436153

Table of Contents
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Overview of ASET PXL and EUVL programs in Japan
Author(s): Yoshio Gomei
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Overview and status of the Next Generation Lithography Mask Center of Competency
Author(s): Lucien Bouchard
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Overview of the ion projection lithography European MEDEA and international program
Author(s): Rainer Kaesmaier; Hans Loeschner
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EUCLIDES: first phase completed!
Author(s): Jos P.H. Benschop; Udo Dinger; David C. Ockwell
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EUV engineering test stand
Author(s): Daniel A. Tichenor; Glenn D. Kubiak; William C. Replogle; Leonard E. Klebanoff; John B. Wronosky; Layton C. Hale; Henry N. Chapman; John S. Taylor; James A. Folta; Claude Montcalm; Russell M. Hudyma; Kenneth A. Goldberg; Patrick P. Naulleau
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Recent advances of three-aspherical-mirror system for EUVL
Author(s): Hiroo Kinoshita; Takeo Watanabe; Yanqiu Li; Atsushi Miyafuji; Tetsuya Oshino; Katsumi Sugisaki; Katsuhiko Murakami; Shigeo Irie; Shigeru Shirayone; Shinji Okazaki
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EUV mask fabrication with Cr absorber
Author(s): Pawitter J. S. Mangat; Scott Daniel Hector; Stewart Rose; Gregory Frank Cardinale; Edita Tejnil; Alan R. Stivers
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High-precision reflectometry of multilayer coatings for extreme ultraviolet lithography
Author(s): Marco Wedowski; James H. Underwood; Eric M. Gullikson; Sasa Bajt; James A. Folta; Patrick A. Kearney; Claude Montcalm; Eberhard Adolf Spiller
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Printing characteristics of proximity x-ray lithography and comparison with optical lithography for 100-nm node and below
Author(s): Masaki Hasegawa; Yoshinori Nakayama; K. Yamaguchi; Tsuneo Terasawa; Yasuji Matsui
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Delineation performances of advanced 100-kV EB writer on x-ray membrane mask
Author(s): Yoshinori Nakayama; Hajime Aoyama; Shinji Tsuboi; Hiroshi Watanabe; Yukiko Kikuchi; Mizunori Ezaki; Yasuji Matsui; Tetsuo Morosawa; Kenichi Saito; Shigehisa Ohki; Tadahito Matsuda
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Stress relaxation of EB resist for x-ray mask fabrication
Author(s): Atsuko Sasahara; Teruhiko Kumada; Koji Kise; Hiroaki Sumitani
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Development of an electric capillary discharge source
Author(s): Neal R. Fornaciari; Jim J. Chang; Daniel R. Folk; Steven E. Gianoulakis; John E. M. Goldsmith; Glenn D. Kubiak; Bruce C. Long; Donna J. O'Connell; Gregory M. Shimkaveg; William T. Silfvast; Kenneth D. Stewart
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Relationship between an EUV source and the performance of an EUV lithographic system
Author(s): Vadim Banine; Jos P.H. Benschop; Martyn Leenders; Roel Moors
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Xenon liquid-jet laser plasma source for EUV lithography
Author(s): Bjoern A. M. Hansson; Magnus Berglund; Oscar E. Hemberg; Hans M. Hertz
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Characterization of a novel double-gas-jet laser plasma EUV source
Author(s): Rene de Bruijn; Andrzej Bartnik; H. F. Fledderus; Henryk Fiedorowicz; Petra Hegeman; Raluca C. Constantinescu; Fred Bijkerk
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Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts
Author(s): Guido Schriever; Manfred Rahe; Willi Neff; Klaus Bergmann; Rainer Lebert; Hans Lauth; Dirk Basting
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Comprehensive analysis of electron optical design of SCALPEL-HT/Alpha
Author(s): Xieqing Zhu; Eric Munro; John A. Rouse; Warren K. Waskiewicz
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Etching 200-mm diameter SCALPEL masks with the ASE process
Author(s): Ian R. Johnston; Huma Ashraf; Jy K. Bhardwaj; Janet Hopkins; Alan M. Hynes; Glenn Nicholls; Serrita A. McAuley; Stephen Hall; Lilian Atabo; Gregory R. Bogart; Avi Kornblit; Anthony E. Novembre
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Optimization of DUV chemically amplified resist platforms for SCALPEL e-beam exposure
Author(s): Leonidas E. Ocola; Myrtle I. Blakey; Paul A. Orphanos; Wai-Yi Li; Anthony E. Novembre; Robert L. Brainard; Joseph F. Mackevich; Gary N. Taylor
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PREVAIL: IBM's e-beam technology for next generation lithography
Author(s): Hans C. Pfeiffer
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Nikon EB stepper: its system concept and countermeasures for critical issues
Author(s): Kazuaki Suzuki; Tomoharu Fujiwara; Kazunari Hada; Noriyuki Hirayanagi; Shintaro Kawata; Kenji Morita; Kazuya Okamoto; Teruaki Okino; Sumito Shimizu; Takehisa Yahiro
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Resolution limit in character projection e-beam system
Author(s): Yoichi Tomo; Koji Matsuoka; Yoshinori Kojima; Akira Yoshida; Isao Shimizu; Masaki Yamabe
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Investigation of proximity effect correction in electron projection lithography (EPL)
Author(s): Teruaki Okino; Kazuaki Suzuki; Kazuya Okamoto; Shintaro Kawata; Kiyoshi Uchikawa; Syouhei Suzuki; Sumito Shimizu; Tomoharu Fujiwara; Atsushi Yamada; Koichi Kamijo
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Modeling of projection electron lithography
Author(s): Chris A. Mack
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Control of resist heating effect
Author(s): Hirohito Anze; Takayuki Abe; Hideaki Sakurai; Tomohiro Iijima; Yoshiaki Hattori; Noriaki Nakayamada; Takashi Kamikubo
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Image size control in next generation lithography masks
Author(s): Michael J. Lercel; Christopher Magg
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Chemically amplified resists for electron-beam projection lithography mask fabrication
Author(s): Christopher Magg; Michael J. Lercel
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Initial benchmarking of a new electron-beam raster pattern generator for 130-100 nm maskmaking
Author(s): Charles A. Sauer; Frank E. Abboud; Sergey V. Babin; Varoujan Chakarian; Abe Ghanbari; Robert Innes; David Trost; Frederick Raymond
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Edge roughness evaluation method for quantifying at-size beam blur in electron-beam lithography
Author(s): Masaki Yoshizawa; Shigeru Moriya
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Evaluation of a high-dose extended multipass gray writing system for 130-nm pattern generation
Author(s): Jan M. Chabala; Suzanne Weaver; David W. Alexander; Henry Thomas Pearce-Percy; Maiying Lu; Damon M. Cole; Frank E. Abboud
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Manufacturability of the ultrathin resist process
Author(s): Christopher Pike; Scott Bell; Marina V. Plat; Paul King; Khanh B. Nguyen; Christopher F. Lyons; Harry J. Levinson; Khoi A. Phan; Uzodinma Okoroanyanwu
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Patterning of highly conducting polyaniline films
Author(s): Teresita O. Graham; Ali Afzali-Kushaa; Marie Angelopoulos; Jeffrey D. Gelorme; Jane M. Shaw
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Optimization of PHS-based chemically amplified negative resist for 100-kV electron-beam projection lithography (EPL)
Author(s): Mami Miyasaka; Kenichi Tokunaga; Fumihiro Koba; Hiroshi Yamashita; Ken Nakajima; Hiroshi Nozue
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CA resist with high sensitivity and sub-100-nm resolution for advanced mask and device making
Author(s): Ranee W. Kwong; Wu-Song Huang; John G. Hartley; Wayne M. Moreau; Christopher F. Robinson; Marie Angelopoulos; Christopher Magg; Mark Lawliss
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Resist technologies for ion projection lithography (IPL) stencil maskmaking
Author(s): Mathias Irmscher; Joerg Butschke; Klaus Elian; Bernd Hoefflinger; Karl Kragler; Florian Letzkus; Joerg Ochsenhirt; Christian Reuter; Reinhard Springer
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Stencil mask key parameter measurement and control
Author(s): Albrecht Ehrmann; Annika Elsner; Roman Liebe; Thomas Struck; Joerg Butschke; Florian Letzkus; Mathias Irmscher; Reinhard Springer; Ernst Haugeneder; Hans Loeschner
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IPL stencil mask distortions: experimental and theoretical analysis
Author(s): Albrecht Ehrmann; Thomas Struck; Ernst Haugeneder; Hans Loeschner; Joerg Butschke; Florian Letzkus; Mathias Irmscher; Reinhard Springer
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Stress engineering of SOI silicon stencil masks by boron doping concentration
Author(s): Artur Degen; Jens Voigt; Martin Kratzenberg; Feng Shi; Joerg Butschke; Hans Loeschner; Rainer Kaesmaier; Albrecht Ehrmann; Ivo W. Rangelow
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Progress in Mo/Si multilayer coating technology for EUVL optics
Author(s): Eric Louis; Andrey E. Yakshin; Peter C. Goerts; Sebastian Oestreich; R. Stuik; Edward L. G. Maas; M. J. H. Kessels; Fred Bijkerk; Markus Haidl; Stefan Muellender; Michael Mertin; Detlef Schmitz; Frank Scholze; Gerhard Ulm
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Improved theoretical reflectivities of extreme ultraviolet mirrors
Author(s): Mandeep Singh; Joseph J. M. Braat
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Magnetron sputtered EUV mirrors with high-thermal stability
Author(s): Torsten Feigl; Sergey A. Yulin; Norbert Kaiser; Roland Thielsch
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Actinic defect counting statistics over 1-cm2 area of EUVL mask blank
Author(s): Seongtae Jeong; Chih-wei Lai; Senajith Rekawa; Christopher C. Walton; Jeffrey Bokor
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Large-area nanoimprint fabrication of sub-100-nm interdigitated metal arrays
Author(s): Lars Montelius; Babak Heidari; Mariusz Graczyk; Torbjoern Ling; Ivan Maximov; Eva-Lena Sarwe
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Step and flash imprint lithography for sub-100-nm patterning
Author(s): Matthew Colburn; Annette Grot; Marie N. Amistoso; Byung Jin Choi; Todd C. Bailey; John G. Ekerdt; S. V. Sreenivasan; James Hollenhorst; C. Grant Willson
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Sub-10-nm electron-beam lithography with sub-10-nm overlay accuracy
Author(s): Kenji Yamazaki; Mohammad S.M. Saifullah; Hideo Namatsu; Kenji Kurihara
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Lossless layout compression for maskless lithography systems
Author(s): Vito Dai; Avideh Zakhor
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Next generation lithography (NGL) concept application in x-ray lithography
Author(s): Yuli Vladimirsky
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Smooth low-stress sputtered tantalum and tantalum alloy films for the absorber material of reflective-type EUVL
Author(s): Masashi Takahashi; Taro Ogawa; Hiromasa Hoko; Eiichi Hoshino; Hiromasa Yamanashi; Naoya Hirano; Akira Chiba; Shinji Okazaki
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Extreme ultraviolet lithography: reflective mask technology
Author(s): Christopher C. Walton; Patrick A. Kearney; Paul B. Mirkarimi; Joel M. Bowers; Charles J. Cerjan; Abbie L. Warrick; Karl Child Wilhelmsen; Eric R. Fought; Craig E. Moore; Cindy C. Larson; Sherry L. Baker; Scott C. Burkhart; Scott Daniel Hector
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Film stress changes during anodic bonding of NGL masks
Author(s): Eric P. Cotte; Michael P. Schlax; Roxann L. Engelstad; Edward G. Lovell; Cameron J. Brooks
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Evaluation of negative DUV resist UVN30 for electron-beam exposure of NGL masks
Author(s): Zorian S. Masnyj; Pawitter J. S. Mangat; Eric S. Ainley; Kevin J. Nordquist; Douglas J. Resnick
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Processing latitude study on x-ray phase-shifting masks
Author(s): Lei Yang; Mumit Khan; James Welch Taylor; Yuli Vladimirsky; Niru V. Dandekar
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Comparison of substrate curvature and resonant frequency thin film stress mapping techniques
Author(s): Michael P. Schlax; Roxann L. Engelstad; Edward G. Lovell; Cameron J. Brooks; Christopher Magg
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Thermomechanical modeling of the SCALPEL mask during exposure
Author(s): Carl J. Martin; Roxann L. Engelstad; Edward G. Lovell; James Alexander Liddle
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Repair method on silicon stencil reticles for EB projection lithography
Author(s): Sumito Shimizu; Shintaro Kawata; Takashi Kaito
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Pattern transfer distortions in IPL and EPL masks with pattern density gradients
Author(s): Gary A. Frisque; Edward G. Lovell; Roxann L. Engelstad
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Thermomechanical simulations for microbeam reduction lithography
Author(s): Gary A. Frisque; Po-Tung Lee; Edward G. Lovell; Roxann L. Engelstad; Ka-Ngo Leung; Vinh V. Ngo; Karen L. Scott
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Photoresist film thickness for extreme ultraviolet lithography
Author(s): Paul M. Dentinger; Gregory Frank Cardinale; Craig C. Henderson; Aaron Fisher; Avijit K. Ray-Chaudhuri
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Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithography
Author(s): Takeo Watanabe; Hiroo Kinoshita; Atsushi Miyafuji; Shigeo Irie; Shigeru Shirayone; Shigeyasu Mori; Ei Yano; Hideo Hada; Katsumi Ohmori; Hiroshi Komano
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Nikon stepper process program parameter optimization and overlay improvement
Author(s): LuJia Chen; Lim Hui Kow; Wenzhan Zhou; Graham C. Ruck; Li Zheng
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Stress reduction of molybdenum/silicon multilayers deposited by ion-beam sputtering
Author(s): Masayuki Shiraishi; Wakana Ishiyama; Tetsuya Oshino; Katsuhiko Murakami
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Carbon fiber composite photomask stage component
Author(s): Brian E. Catanzaro; Jack E. Dyer; David Trost
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Evaluation of fine pattern definition with electron-beam direct writing lithography
Author(s): Tsann-Bim Chiou; Peter Hahmann; Ming-Chi Liaw; Tiao-Yuan Huang; Simon M. Sze
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Beam-monitoring system using microapertures for electron-beam lithography
Author(s): Jun Takamatsu; Naoharu Shimomura; Hitoshi Sunaoshi; Kiyoshi Hattori; Munehiro Ogasawara; Tetsuro Nakasugi
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Double-shielded objective lens system for electron-beam lithography system
Author(s): Hiroya Ohta; Yasuhiro Someda; Yasunari Sohda; Norio Saitou; Shin-ichi Katoh; Hiroyuki Itoh
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New detection method for the 2-dimensional beam shape
Author(s): Yasuhiro Someda; Yasunari Sohda; Hidetoshi Satoh; Norio Saitou
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Coulomb image distortion in charge particle projection systems: scattering function of arbitrary image point
Author(s): Boris G. Freinkman
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Coulomb interactions and the effect of compensating lens aberration in projection electron-beam systems
Author(s): Bo Wu; Andrew R. Neureuther
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Data of scattered electron characteristics in 100-kV EB stepper
Author(s): Kenji Morita; Takehisa Yahiro; Sumito Shimizu; Hajime Yamamoto; Noriyuki Hirayanagi; Tomoharu Fujiwara; Syouhei Suzuki; Hiroyasu Shimizu; Shintaro Kawata; Teruaki Okino; Kazuaki Suzuki
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Shearing interferometer to characterize EUV optics with a laser plasma source
Author(s): Matthieu Visser; Raluca C. Constantinescu; Petra Hegeman; Jeroen Jonkers; Martijn K. Dekker; Eric Louis; Dirk Hambach
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Vacuum spark for soft x-rays and the spherical pinch for EUV as point sources for microlithography
Author(s): Frank F. Wu; Wen-Chieh Tang; Kazimierz W. Wirpszo; Xiaoming Guo; Meisheng Xu; Oleg G. Semyonov; C. Huang; Lev Klibanov; Emilio Panarella
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Assembly and alignment of three-aspherical-mirror optics for extreme ultraviolet projection lithography
Author(s): Katsumi Sugisaki; Tetsuya Oshino; Katsuhiko Murakami; Takeo Watanabe; Hiroo Kinoshita; Atsushi Miyafuji; Shigeo Irie; Shigeru Shirayone
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Design of EUVL camera with large numerical aperture
Author(s): Yanqiu Li; Takeo Watanabe; Hiroo Kinoshita
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Novel illumination system for EUVL
Author(s): Hideki Komatsuda
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Diagnostic technique of gas jet for debris-free laser plasma EUV source
Author(s): Sergei V. Bobashev; Rene de Bruijn; Tatyana G. Kopytova; Yurii A. Kurakin; Alexander A. Schmidt; Zinaida A. Stepanova; Gennadii K. Tumakaev
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Novel interferometer to measure the figure of ashperical mirrors as used in EUV lithography
Author(s): Rene G. Klaver; Joseph J. M. Braat
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EUV nanolithography: sub-50-nm L/S
Author(s): Wai-Kin Li; Harun H. Solak; Franco Cerrina
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Simulation of EUV multilayer mirror buried defects
Author(s): Matthew J. Brukman; Yunfei Deng; Andrew R. Neureuther
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Development for the alignment procedure of three-aspherical mirror optics
Author(s): Shigeo Irie; Takeo Watanabe; Hiroo Kinoshita; Atsushi Miyafuji; Katsumi Sugisaki; Tetsuya Oshino; Katsuhiko Murakami
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EUV mask fabrication using Be-based multilayer mirrors
Author(s): Pawitter J. S. Mangat; James R. Wasson; Scott Daniel Hector; Gregory Frank Cardinale; Sasa Bajt
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Laser-produced plasma-based reflectometer for EUV metrology
Author(s): Stanley Mrowka; James H. Underwood; Eric M. Gullikson; Phillip J. Batson
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EUV holographic aerial image recording
Author(s): Sang Hun Lee; Patrick P. Naulleau; Kenneth A. Goldberg; Chang Hyun Cho; Jeffrey Bokor
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Wafer and reticle positioning system for the extreme ultraviolet lithography engineering test stand
Author(s): John B. Wronosky; Tony G. Smith; Marcus J. Craig; Beverly R. Sturgis; Joel R. Darnold; David K. Werling; Mark A. Kincy; Daniel A. Tichenor; Mark E. Williams; Paul M. Bischoff
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Predicting pattern transfer distortions during EUV mask fabrication
Author(s): Phillip L. Reu; Richard O. Tejeda; Roxann L. Engelstad; Edward G. Lovell; Avijit K. Ray-Chaudhuri
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Experimental validation of a thermal model used to predict the image placement error of a scanned EUVL reticle
Author(s): Steven E. Gianoulakis; Marcus J. Craig; Avijit K. Ray-Chaudhuri
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Step and stamp imprint lithography using a commercial flip chip bonder
Author(s): Tomi Haatainen; Jouni Ahopelto; Gabi Gruetzner; Marion Finck; Karl Pfeiffer
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Direct creation of microstuctures in fluorine-containing polymers
Author(s): Vladimir Nazmov; Valery F. Pindyurin; Lubov A. Mezentseva; B. V. Mchedlishvili; Alexander I. Vilensky; V. V. Shirkova; V. E. Istomin
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EUVL printing results of a low-thermal expansion material (LTEM) mask
Author(s): William M. Tong; John S. Taylor; Scott Daniel Hector; Melissa K. Shell; Guojing Zhang; Patrick A. Kearney; Christopher C. Walton; Cindy C. Larson; James R. Wasson; Pawitter J. S. Mangat; Donna J. O'Connell; Daniel R. Folk
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EUV mask contact layer defect printability and requirement
Author(s): Pei-yang Yan; Chih-wei Lai; Gregory Frank Cardinale
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Maskless 3D micromachining with focused ion beam of high-resolution diffractive optics
Author(s): Chantal G. Khan Malek; Frank T. Hartley; Jayant Neogi
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Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor
Author(s): William N. Partlo; Igor V. Fomenkov; Ian Roger Oliver; Daniel L. Birx
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High-throughput NGL electron-beam direct-write lithography system
Author(s): N. William Parker; Alan D. Brodie; John H. McCoy
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Power scaling of a Z-pinch extreme ultraviolet source
Author(s): Malcolm W. McGeoch
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Demagnification by bias in proximity x-ray lithography
Author(s): Kong Jong Ren; Quinn J. Leonard; Yuli Vladimirsky; Antony J. Bourdillon
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EUV interferometry of a four-mirror ring-field EUV optical system
Author(s): Kenneth A. Goldberg; Patrick P. Naulleau; Phillip J. Batson; Paul Denham; Erik H. Anderson; Jeffrey Bokor; Henry N. Chapman
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