Share Email Print

Proceedings of SPIE Volume 3996

16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.

Volume Details

Volume Number: 3996
Date Published: 3 February 2000
Softcover: 28 papers (264) pages
ISBN: 9780819436146

Table of Contents
show all abstracts | hide all abstracts
Mask error enhancement factor
Author(s): Wilhelm Maurer
Show Abstract
Defect printability and repair of alternating phase-shift masks
Author(s): Christoph M. Friedrich; Martin Verbeek; Leonhard Mader; Christian Crell; Rainer Pforr; Uwe A. Griesinger
Show Abstract
Advanced CD error detection with CD SEM disposition
Author(s): Darren Taylor; Barry Rockwell; Aihua Dong; Anthony Vacca; Waiman Ng; Geoffrey T. Anderson; William B. Howard
Show Abstract
Implementing reticle blank inspection in a production environment
Author(s): Kevin A. Krause; William B. Howard
Show Abstract
Improving reticle yields with after develop inspection (ADI)
Author(s): Franklin D. Kalk; Keith J. Brankner; Laurie Peters; Anthony Vacca; Scott Pomeroy; David Emery
Show Abstract
Formation and detection of subpellicle defects by exposure to DUV system illumination
Author(s): Brian J. Grenon; Charles R. Peters; Kaustuve Bhattacharyya; William Waters Volk
Show Abstract
Reticle programmed defect size measurement using low-voltage SEM and pattern recognition techniques
Author(s): Larry S. Zurbrick; Steve Khanna; Jay Lee; James J. Greed; Ellen R. Laird; Rene M. Blanquies
Show Abstract
Ion projection lithography: progress in mask and tool technology
Author(s): Albrecht Ehrmann; Rainer Kaesmaier; Thomas Struck
Show Abstract
Optimization of the e-beam sensitive bilayer CARL process for stencil mask making
Author(s): Joerg Ochsenhirt; Joerg Butschke; Florian Letzkus; Bernd Hoefflinger; Mathias Irmscher; Christian Reuter; Reinhard Springer; Klaus Elian
Show Abstract
Laser cleaning of silicon membrane stencil masks
Author(s): Werner Zapka; R. Lilischkis; Hans P. Zappe
Show Abstract
Improvements of the membrane bulging method for stress determination of silicon open stencil masks for ion projection lithography
Author(s): Artur Degen; Jens Voigt; Eva Sossna; Feng Shi; Ivo W. Rangelow; Ernst Haugeneder; Hans Loeschner
Show Abstract
Layout postprocessing in ion projection lithography (IPL)
Author(s): Hans Hartmann; Alex Petraschenko; Stefan Schunk; Richard Steinmetz; Ernst Haugeneder; Hans Loeschner
Development of embedded attenuated phase-shifting mask (EAPSM) blanks for ArF lithography
Author(s): Hideaki Mitsui; Osamu Nozawa; Hitoshi Ohtsuka; Megumi Takeuchi; Hideo Kobayashi; Masao Ushida
Show Abstract
CAR blanks feasibility study results
Author(s): Yasunori Yokoya; Hideo Kobayashi; Takao Higuchi; Keishi Asakawa; Akinori Kurikawa; Tadashi Sakurai; Masahiro Hashimoto; Fumiko Ota
Show Abstract
Cluster tool for photomask inspection and qualification at 150-nm design rules and beyond
Author(s): Kai Peter; Volodymyr Ordynskyy; Christoph Dolainsky; Hans Hartmann; Hans-Juergen Brueck
Show Abstract
Reticle imaging and metrology using a CD-SEM at IMEC
Author(s): A. James; F. Felten; M. Polli; Jonathan G. England; Thomas Marschner; Geert Vandenberghe
Show Abstract
Major improvements in mask CD metrology: enhanced performance on attenuated phase-shift masks, corner rounding measurements, and improved measurement automation
Author(s): Gerhard W.B. Schlueter; Gerd Scheuring; Guenther Falk; Hans-Juergen Brueck; Thomas Schaetz; Sigrid Lehnigk
Show Abstract
Optical proximity effects in submicron photomask CD metrology
Author(s): Nicholas G. Doe; Richard D. Eandi
Show Abstract
Optimization of ZEP7000 writing and development conditions
Author(s): Daniel Courboin; Philippe Gervot; Chantal Gayou; Patrick Montarou
Show Abstract
Advanced writing strategies for high-end mask making
Author(s): Melchior Lemke; Juergen Gramss; Hans-Joachim Doering; Hans Eichhorn; Gerhard Schubert
Show Abstract
Innovative approach for concurrent CD-uniformity monitoring and reticle inspection
Author(s): Amikam Sade; Juergen Fandrich; Shirley Hemar; Yair Eran
Show Abstract
Improvements to mask inspectability by use of pattern proximity correction
Author(s): Anja Rosenbusch; Vicky Bailey; Yair Eran; Reuven Falah; Neil J. Holmes; Andrew C. Hourd; Andrew McArthur; Wolfgang Staud
Show Abstract
Lithography and CD performance of advanced MEBES mask pattern generators
Author(s): Jan M. Chabala; Damon M. Cole; Henry Thomas Pearce-Percy; Wayne Phillips; Maiying Lu; Suzanne Weaver; David W. Alexander; T. Coleman; Charles A. Sauer; Frank E. Abboud
Show Abstract
Modified fused silica for 157-nm mask substrates
Author(s): Bruno Uebbing; Jan Vydra; Stephan Thomas; Ralf Takke
Show Abstract
Performance study on thin resist for advanced reticle fabrication
Author(s): Hideo Kobayashi; Takao Higuchi; Keishi Asakawa; Yasunori Yokoya
Show Abstract
High-precision mask fabrication for deep-x-ray lithography
Author(s): Andreas Schmidt; Gerhard Himmelsbach; Regina Luettge; Dieter Adam; Falk Hoke; Hartmut Schacke; Nikola Belic; Hans Hartmann; Frank Burkhard; Hermann Wolf
Show Abstract
Mask fabrication by nanoimprint lithography using antisticking layers
Author(s): Hubert Schulz; Frank Osenberg; J. Engemann; Hella-Christin Scheer
Show Abstract

© SPIE. Terms of Use
Back to Top