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Proceedings of SPIE Volume 3748

Photomask and X-Ray Mask Technology VI
Editor(s): Hiroaki Morimoto
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Volume Details

Volume Number: 3748
Date Published: 25 August 1999
Softcover: 68 papers (642) pages
ISBN: 9780819432308

Table of Contents
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Semiconductor technology trend and requirements for masks
Author(s): Hiroyoshi Komiya
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Advanced high-resolution mask processes using optical proximity correction
Author(s): Y. David Chan
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Manufacturability of a 0.18-um OPC technology
Author(s): RenGuey Hsieh; Huitzu Lin; John C.H. Lin; Anthony Yen; Chue-San Yoo; Jia-Jing Wang
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Electron-beam lithography simulation for maskmaking: IV. Effect of resist contrast on isofocal dose
Author(s): Charles A. Sauer; Chris A. Mack
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Properties of our developing next-generation photomask substrate
Author(s): Masaki Takeuchi; Yukio Shibano; Shinichi Kusama
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Implementation of chemically amplified resist on mask technology below 0.6-um feature using high-acceleration voltage e-beam system
Author(s): Il-Ho Lee; Kyung-Han Nam; Kyeong-Mee Yeon; Keuntaek Park; Sang-Sool Koo; Youngmo Koo; Ki-Ho Baik
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Advanced Cr dry etching process
Author(s): Satoshi Aoyama; Shouichi Sakamoto; Tsutomu Koike; Nobuyuki Yoshioka; Noriyuki Harashima; Atsushi Hayashi; Takaei Sasaki
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Evaluation of NLD mask dry etching system
Author(s): Tatsuya Fujisawa; Takayuki Iwamatsu; Koji Hiruta; Hiroaki Morimoto; Takaei Sasaki; Kazuhide Yamashiro
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New Y2K problem for mask making (or, Surviving mask data problems after 2000)
Author(s): Roger Sturgeon
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Enhancement of hierarchical mask data design system (PROPHET)
Author(s): Takahiro Watanabe; Eiji Tsujimoto; Keiji Maeda; Hiroshi Fukuda
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Proposal of new layout data format for LSI patterns
Author(s): Isao Ashida; Yutaka Sato; Hiroichi Kawahira
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Auxiliary pattern generation to cancel unexpected images at sidelobe overlap regions in attenuated phase-shift masks
Author(s): Kyoji Nakajo; Junya Sakemi; Hiroshi Fukuda; Tsuneo Terasawa; Norio Hasegawa; Eiji Tsujimoto
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Development of a total CAD system for alternate-type PSMs with optical proximity correction
Author(s): Tamae Haruki; Ryo Tsujimura; Junji Tomida; Yasuhide Machida; Satoru Asai; Isamu Hanyu
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Interactive OPC simulator for memory devices
Author(s): Hirotomo Inui; Haruo Iwasaki; Toshiyuki Ohta; Hiroyoshi Tanabe
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Improvement of OPC data processing for photomask fabrication
Author(s): Nobuhito Toyama; Hiroyuki Miyashita; Kouji Ishida
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EB_PEC by using OPC software
Author(s): Kenny Yang
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New data processing of dummy pattern generation adaptive for CMP process
Author(s): Shinichi Ueki; Isao Ashida; Hiroichi Kawahira
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Improvement of post-exposure delay stability of chemically amplified positive resist
Author(s): Kohji Katoh; Kei Kasuya; Michiaki Hashimoto; Tadashi Arai; Toshio Sakamizu
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Comparative evaluation results of CMS replacement resist for e-beam reticle fabrication
Author(s): Hideo Kobayashi; Takao Higuchi; Keishi Asakawa; Yasunori Yokoya; Tetsuya Wada
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Fine pattern process with negative tone resist: II
Author(s): Eiichi Hoshino; Toshikatsu Minagawa; Akira Morishige; Keiji Watanabe
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Plasma etching of Cr: a multiparameter uniformity study utilizing patterns of various Cr loads
Author(s): Chris Constantine; Russell J. Westerman; Jason Plumhoff
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ICP (inductively coupled plasma) dry etch of DUV MoSi HTPSM
Author(s): Kyu-Yong Lee; Lee-Ju Kim; Kyung-Han Nam; Keuntaek Park; Y. M. Ku; S. S. Ku; I. B. Hur
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Comparison of mulitpass gray strategy and conventional writing method
Author(s): Ichiro Kagami; Masaaki Koyama; Hiroichi Kawahira
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Advantage in using the combination of HL-800M and CAR process
Author(s): Suyo Asai; Yasuhiro Kadowaki; Katsuhiro Kawasaki; Kazui Mizuno; Hidetoshi Satoh; Morihisa Hoga; Kazunori Ikeda; Eri Iguchi
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Enhanced pattern fidelity experiment for subquarter-micron design rule mask making
Author(s): Do Yun Kim; Cheol Shin; H. S. Jung; Junsik S. Cho
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Primary evaluation of proximity and resist heating effects observed in high-acceleration voltage e-beam writing for 180-nm-and-beyond rule reticle fabrication
Author(s): Naoko Kuwahara; H. Nakagawa; Masa-aki Kurihara; Naoya Hayashi; Hisatake Sano; E. Maruta; T. Takikawa; Shigeru Noguchi
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Resist heating effect on 50-KeV EB mask writing
Author(s): Hideaki Sakurai; Takayuki Abe; Masamitsu Itoh; Akitoshi Kumagae; Hirohito Anze; Iwao Higashikawa
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Development of pellicle for ArF excimer laser
Author(s): Shigeto Shigematsu; Masahiro Kondo; Hiroaki Nakagawa
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Pellicle for ArF excimer laser photolithography
Author(s): Ikuo Sakurai; Toru Shirasaki; Meguru Kashida; Yoshihiro Kubota
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Attenuated phase-shifting mask in ArF lithography
Author(s): Junji Miyazaki; Masaya Uematsu; Keisuke Nakazawa; Takahiro Matsuo; Toshio Onodera; Tohru Ogawa
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Evaluation of the attenuated PSM performance as the shifter transmittance and illumination systems
Author(s): Yong-Hoon Kim; JoHyun Park; Jin-Hong Park; Kyung Hee Lee; Seong-Woon Choi; Hee-Sun Yoon; Jung-Min Sohn
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Development of Cr-based attenuated phase-shift mask process for 0.18-um device generation
Author(s): Ichiro Kagami; Kiichi Ishikawa; Daichi Kakuta; Hiroichi Kawahira
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Fabrication of MoSiON halftone masks using ZEP7000 for MEBES 4500
Author(s): Kazuyuki Maetoko; Koji Tange; Hitoshi Fukuma; Nobuyuki Yoshioka; Susumu Kawada; Masahiko Ishizuka; Takaei Sasaki; Charles A. Sauer
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Cost-effective DUV PSM process
Author(s): San-De Tzu; Ching Siun Chiu; Chue-San Yoo; Jia-Jing Wang
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Pattern dependence of mask topography effect in alternating phase-shifting masks
Author(s): Tadao Yasuzato; Shinji Ishida; Hiroyoshi Tanabe
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Advanced electron-beam writing system EX-11 for next-generation mask fabrication
Author(s): Toru Tojo; Ryoji Yoshikawa; Yoji Ogawa; Shuichi Tamamushi; Yoshiaki Hattori; Souji Koikari; Hideo Kusakabe; Takayuki Abe; Munehiro Ogasawara; Kiminobu Akeno; Hirohito Anze; Kiyoshi Hattori; Ryoichi Hirano; Shusuke Yoshitake; Tomohiro Iijima; Kenji Ohtoshi; Kazuto Matsuki; Naoharu Shimomura; Noboru Yamada; Hitoshi Higurashi; Noriaki Nakayamada; Yuuji Fukudome; Shigehiro Hara; Eiji Murakami; Takashi Kamikubo; Yasuo Suzuki; Susumu Oogi; Mitsuko Shimizu; Shinsuke Nishimura; Hideyuki Tsurumaki; Satoshi Yasuda; Kenji Ooki; Kiyomi Koyama; Susumu Watanabe; Mitsuhiro Yano; Hiroaki Suzuki; Hiroshi Hoshino; Masaki Toriumi; Osamu Watanabe; Kazuo Tsuji; Mitsunobu Katayama; Seiichi Tsuchiya; Kimio Suzuki; Shiro Kurasawa; Kazuyuki Okuzono; Hirokazu Yamada; Koji Handa; Yoshio Suzuki; Tetsu Akiyama; Yoshiaki Tada; Akira Noma; Tadahiro Takigawa
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Evaluation of an advanced mask-writing system
Author(s): Shinji Kubo; Koji Hiruta; Masao Sugiyama; Takayuki Iwamatsu; Tatsuya Fujisawa; Hiroaki Morimoto
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New mask blank handling system for the advanced electron-beam writer EX-11
Author(s): Shusuke Yoshitake; Kenji Ooki; Yoji Ogawa; Katsuhito Ogura; Teruaki Yamamoto; Ryoichi Hirano; Masaki Toriumi; Toru Tojo
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Shipping, handling, and storage of reticles
Author(s): Sheng-Bai Zhu; Ray Martin
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X-ray phase-shift mask for proximity x-ray lithography with synchrotron radiation
Author(s): Mizunori Ezaki; Ken-ichi Murooka
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Properties of sputtered TaGe as an x-ray absorber material
Author(s): Takuya Yoshihara; S. Kotsuji; Katsumi Suzuki
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Printability of programmed x-ray mask defects
Author(s): Hiroshi Watanabe; H. Yabe; Yukiko Kikuchi; K. Marumoto; Yasuji Matsui
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Three x-ray mask-making methods applied for LIGA process
Author(s): Hsiharng Yang; Shung-Wen Kang; Min-Chieh Chou
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Novel inspection system with design rule check for high-accuracy reticles
Author(s): Takayoshi Matsuyama; Kenichi Kobayashi; Daikichi Awamura; Katsuyoshi Nakashima; Yasunori Hada
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Inspection and printability of programmed defects on reticles for 0.200- and 0.175-um rule devices
Author(s): Shinji Yamaguchi; Hideki Kanai; Haruki Komano; Hideaki Sakurai; Takehiro Kondo; Masamitsu Itoh; Ichiro Mori; Iwao Higashikawa
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Evaluation method of 0.15- to 0.25-um advanced reticle inspection system
Author(s): Andre Wang
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Advancements in focused ion beam repair of MoSiON phase-shifting masks
Author(s): Joshua Lessing; David C. Ferranti; Ganesh Sundaram; Ludwig Nagal; Martin Verbeek
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Line-width verification for 0.18- and 0.25-um design rule wafers and reticles
Author(s): Shen Chung Kuo; Clare Wu; Nathan Schumann; Wolfgang Staud
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New UV-capable photomask CD metrology tool
Author(s): Gerhard W.B. Schlueter; Hans-Juergen Brueck; Sebastian Birkenmayer; Guenther Falk; Gerd Scheuring; Lars Walden; Sigrid Lehnigk
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New approach for realizing k1=0.3 optical lithography
Author(s): Masanobu Hasegawa; Akiyoshi Suzuki; Kenji Saito; Minoru Yoshii
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Resolution enhancement with high-transmission attenuating phase-shift masks
Author(s): Robert John Socha; Will Conley; Xuelong Shi; Mircea V. Dusa; John S. Petersen; J. Fung Chen; Kurt E. Wampler; Thomas L. Laidig; Roger F. Caldwell
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Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems
Author(s): Kent H. Nakagawa; J. Fung Chen; Robert John Socha; Thomas L. Laidig; Kurt E. Wampler; Douglas J. Van Den Broeke; Mircea V. Dusa; Roger F. Caldwell
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Electron-beam lithography simulation for mask making: III. Effect of spot size, address grid, and raster writing strategies on lithography performance with PBS and ZEP-7000
Author(s): Chris A. Mack
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Design considerations for an electron-beam pattern generator for the 130-nm generation of masks
Author(s): Frank E. Abboud; Sergey V. Babin; Varoujan Chakarian; Abe Ghanbari; Robert Innes; Frederick Raymond; Allan L. Sagle; Charles A. Sauer
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Mask-writing system architecture and toolkit approach for 1G DRAM and beyond
Author(s): Christian Ehrlich; Juergen Gramss; Hans-Joachim Doering
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Reduction of fogging effect caused by scattered electrons in an electron beam system
Author(s): Naoharu Shimomura; Munehiro Ogasawara; Jun Takamatsu; Shusuke Yoshitake; Kenji Ooki; Noriaki Nakayamada; Fumiyuki Okabe; Toru Tojo
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Progress in SiC membrane for x-ray mask
Author(s): Tsutomu Shoki; Akinori Kurikawa; Takamitsu Kawahara; Tadashi Sakurai
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Stencil mask fabrication for cell projection e-beam lithography with silicon wafer
Author(s): Jaeseung Choi; Seung-Ho Yi; Yongkyoo Choi; Hoon Huh; Jaejeong Kim
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High-resolution UV wavelength reticle contamination inspection
Author(s): Franklin D. Kalk; William Waters Volk; James N. Wiley; Ed Hou; Sterling G. Watson
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Evaluation of the impact of pattern fidelity on photomask inspectability
Author(s): Kevin S. Woolverton; Gang Liu; Peter Zwigl; Wayne E. Ruch
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Aerial image analysis based on UV reticle inspection
Author(s): Wolfgang Staud; Yair Eran; Gidon Gottlib; A. Chereshnya
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Reticle OPC defect printability and detectability for 180-nm technology
Author(s): Maciej W. Rudzinski; Larry S. Zurbrick; Donald W. Pettibone; Mohan Ananth
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Impact of mask CD error on wafer CD error at low-k1 photolithography
Author(s): Byung Guk Kim; Seong-Woon Choi; Ji-Hyun Choi; Chan-Uk Chun; Hee-Sun Yoon; Jung-Min Sohn
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Defect detectability and printability of contact hole pattern of KrF halftone reticle
Author(s): Kanji Takeuchi; Yutaka Miyahara
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CD-SEM suitability for CD metrology of modern photomasks
Author(s): Waiman Ng; Geoffrey T. Anderson; Hugo A. Villa; Franklin D. Kalk
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Development of focused ion-beam repair for opaque defects on MoSi-based attenuated phase-shift mask
Author(s): Naoki Nishida; Yasuyuki Nishio; Hiroshi Kinoshita; Osamu Takaoka; Tomokazu Kozakai; Kazuo Aita
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Implementation issues for production OPC
Author(s): Franklin M. Schellenberg; Pat LaCour
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Mask manufacturability issues for subwavelength lithography
Author(s): Linard Karklin; Kenneth E. Rachlin
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