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PROCEEDINGS VOLUME 3676

Emerging Lithographic Technologies III
Editor(s): Yuli Vladimirsky
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Volume Details

Volume Number: 3676
Date Published: 25 June 1999
Softcover: 92 papers (898) pages
ISBN: 9780819431509

Table of Contents
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Cost analysis on the next-generation lithography technology
Author(s): Yoshio Gomei
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Advanced refractory-metal and process technology for the fabrication of x-ray masks
Author(s): Cameron J. Brooks; Kenneth C. Racette; Michael J. Lercel; Lynn A. Powers; Douglas E. Benoit
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Imaging capabilities of proximity x-ray lithography at 70-nm ground rules
Author(s): Azalia A. Krasnoperova; Robert P. Rippstein; Alex L. Flamholz; Ernst Kratschmer; Shalom Wind; Cameron J. Brooks; Michael J. Lercel
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Characteristics of sputtered TaX absorbers for x-ray mask
Author(s): Jeng Tzong Sheu; A. Chu; J. H. Ding; Shyang Su
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UVN2-negative chemically amplified resist optimization for x-ray mask fabrication
Author(s): Janet M. Rocque; Michael J. Lercel; Cameron J. Brooks; Richard W. Henry; Douglas E. Benoit
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X-ray mask fabrication at CXrL
Author(s): Quinn J. Leonard; Jaz Bansel; Lei Yang; Olga Vladimirsky; Srinivas B. Bollepalli; Mumit Khan; Yuli Vladimirsky; Franco Cerrina; James Welch Taylor; Klaus Simon; Lynn Charles Rathbun; Richard C. Tiberio
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Novel fiducial grid for x-ray masks
Author(s): Choi Pheng Soo; Shobhna Chandra; Kong Jong Ren; Antony J. Bourdillon; Bing Lu
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Sub-40-nm pattern replication with +/- 20% process latitude by soft-contact x-ray lithography
Author(s): David J. D. Carter; Henry I. Smith; Kee Woo Rhee; Christie R. Marrian
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Lithographic analysis of multipass gray writing strategy for electron-beam pattern generation
Author(s): Jan M. Chabala; Frank E. Abboud; Robert L. Dean; Suzanne Weaver; Damon M. Cole; Charles A. Sauer; Frederick Raymond; Ulrich Hofmann
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Geometrical correction of the e-beam proximity effect for raster scan systems
Author(s): Nikola Belic; Hans Eisenmann; Hans Hartmann; Thomas Waas
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Heating of x-ray masks during e-beam writing
Author(s): Nikolai L. Krasnoperov; Jaz Bansel; Olga Vladimirsky; John P. Wallace; Yuli Vladimirsky; Franco Cerrina
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Low-energy e-beam proximity projection lithography
Author(s): Takao Utsumi
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Finite element modeling of SCALPEL masks
Author(s): Roxann L. Engelstad; Edward G. Lovell; Gerald A. Dicks; Carl J. Martin; Michael P. Schlax; William H. Semke; James Alexander Liddle; Anthony E. Novembre
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Commercial manufacturing of SCALPEL mask blanks
Author(s): Mark D. Walters
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Stress mapping techniques for the SCALPEL mask membrane system
Author(s): Michael P. Schlax; Roxann L. Engelstad; Edward G. Lovell; James Alexander Liddle; Anthony E. Novembre
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Production of SCALPEL masks in a commercial mask facility
Author(s): Chris L. Newport; Jeffrey Parker; K. Michael Smith; Albert Benveniste; Nam-Wook Kim; David Reyland; Reginald C. Farrow; Anthony E. Novembre; Richard J. Kasica; Chester S. Knurek; Milton L. Peabody; Len Rutberg
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200-mm SCALPEL mask development
Author(s): Gregory R. Bogart; Anthony E. Novembre; Avi Kornblit; Milton L. Peabody; Reginald C. Farrow; Myrtle I. Blakey; Richard J. Kasica; James Alexander Liddle; Thomas E. Saunders; Chester S. Knurek; Ian R. Johnston
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Space-charge results from the SCALPEL proof-of-concept system
Author(s): James Alexander Liddle; Myrtle I. Blakey; Gregg M. Gallatin; Chester S. Knurek; Masis M. Mkrtchyan; Anthony E. Novembre; Warren K. Waskiewicz
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Writing strategy for a high-throughput SCALPEL system
Author(s): Stuart T. Stanton; James Alexander Liddle; Joseph A. Felker; Warren K. Waskiewicz; Lloyd R. Harriott
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Electron optical analysis of SCALPEL writing strategy
Author(s): Xieqing Zhu; Eric Munro; Haoning Liu; John A. Rouse; Warren K. Waskiewicz
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Alignment mark detection in CMOS materials with SCALPEL e-beam lithography
Author(s): Reginald C. Farrow; Warren K. Waskiewicz; Isik C. Kizilyalli; Gregg M. Gallatin; James Alexander Liddle; Masis M. Mkrtchyan; Avi Kornblit; Leonidas E. Ocola; Fred P. Klemens; Joseph A. Felker; Christopher J. Biddick; Joseph S. Kraus; Myrtle I. Blakey; Paul A. Orphanos; Nace Layadi; Sailesh M. Merchant
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Resist characteristics with direct-write electron beam and SCALPEL exposure system
Author(s): Mitsuru Sato; Katsumi Omori; Kiyoshi Ishikawa; Toshimasa Nakayama; Anthony E. Novembre; Leonidas E. Ocola
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EUV lithography research program at ASET
Author(s): Shinji Okazaki
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Extended-source interferometry for at-wavelength testing of EUV optics
Author(s): Matthieu Visser; Martijn K. Dekker; Petra Hegeman; Joseph J. M. Braat
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Sub-100-nm lithographic imaging with an EUV 10X microstepper
Author(s): John E. M. Goldsmith; Kurt W. Berger; Dan R. Bozman; Gregory Frank Cardinale; Daniel R. Folk; Craig C. Henderson; Donna J. O'Connell; Avijit K. Ray-Chaudhuri; Kenneth D. Stewart; Daniel A. Tichenor; Henry N. Chapman; Richard J. Gaughan; Russell M. Hudyma; Claude Montcalm; Eberhard Adolf Spiller; John S. Taylor; Jeffrey D. Williams; Kenneth A. Goldberg; Eric M. Gullikson; Patrick P. Naulleau; Jonathan L. Cobb
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High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography
Author(s): William T. Silfvast; M. Klosner; Gregory M. Shimkaveg; Howard Bender; Glenn D. Kubiak; Neal R. Fornaciari
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EUV interferometric lithography for resist characterization
Author(s): Harun H. Solak; Dongxing He; Wai-Kin Li; Franco Cerrina; B. H. Sohn; Xiao Min Yang; Paul F. Nealey
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Mask topography simulation for EUV lithography
Author(s): Ronald L. Gordon; Chris A. Mack
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Actinic EUVL mask blank defect inspection system
Author(s): Seongtae Jeong; Lewis E. Johnson; Yun Lin; Senajith Rekawa; Pei-yang Yan; Patrick A. Kearney; Edita Tejnil; James H. Underwood; Jeffrey Bokor
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EUV mask patterning approaches
Author(s): Pei-yang Yan; Guojing Zhang; Patrick Kofron; Jenn Chow; Alan R. Stivers; Edita Tejnil; Gregory Frank Cardinale; Patrick A. Kearney
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Hot electron emission lithography
Author(s): Marcus Poppeller; Eduard Cartier; R. M. Tromp
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Zone-plate array lithography (ZPAL): a new maskless approach
Author(s): David J. D. Carter; Dario Gil; Rajesh Menon; Ihsan J. Djomehri; Henry I. Smith
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Sub-100-nm pattern fabrication using LB resist and e-beam or synchrotron radiation excited plasma
Author(s): Girish J. Phatak; Shinji Ogawa; Mohd Zalid Bin Harun; Shinzo Morita
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Optical materials and coatings at 157 nm
Author(s): Theodore M. Bloomstein; Vladimir Liberman; Mordechai Rothschild; D. E. Hardy; Russell B. Goodman
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Design and development of thin film materials for 157-nm and VUV wavelengths: APSM, binary masking, and optical coatings applications
Author(s): Bruce W. Smith; Anatoly Bourov; Lena Zavyalova; Michael J. Cangemi
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Numerical analysis of high-resolution microlithography with thermoresist
Author(s): Kenji Amaya
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Nonlinear processes to extend interferometric lithography
Author(s): Saleem H. Zaidi; Steven R. J. Brueck
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Development of a 0.1 micron linewidth fabrication process for x-ray lithography with a laser plasma source
Author(s): Romuald Bobkowski; Robert Fedosejevs; James N. Broughton
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Emission from a gas puff target irradiated with a Nd:YAG laser for EUV and x-ray lithography
Author(s): Henryk Fiedorowicz; Hiroyuki Daido; Andrzej Bartnik; Noriyuki Sakaya; Masayuki Suzuki; Viliam Kmetik; Miroslaw Szczurek; Thomas Wilhein
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Vacuum spark and spherical pinch x-ray/EUV point sources
Author(s): Frank F. Wu; Wen-Chieh Tang; Kazimierz W. Wirpszo; Emilio Panarella
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X-ray and EUV laser-plasma sources based on cryogenic liquid-jet target
Author(s): Lars Rymell; Magnus Berglund; Bjoern A. M. Hansson; Hans M. Hertz
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Self-supporting tantalum masks for deep x-ray lithography with synchrotron radiation
Author(s): Sergey V. Litvin; Vasily G. Kanaev; Elena G. Larionova; Nina V. Glazunova; Ludmila P. Gromova; Vasily I. Yurchenko; Nikolai A. Timchenko; Lubov A. Mezentseva; Vladimir Nazmov; Valery F. Pindyurin
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Predicting mechanical distortions in x-ray masks
Author(s): Eric P. Cotte; Roxann L. Engelstad; Edward G. Lovell; Cameron J. Brooks
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Advanced negative i-line resist development on metal surfaces for next-generation lithography mask fabrication
Author(s): Craig L. Ghelli; David P. Mancini; Douglas J. Resnick; Pawitter J. S. Mangat; William J. Dauksher
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X-ray mask defect repair optimization
Author(s): Zheng Chen; Steven C. Nash; Azalia A. Krasnoperova; Chet Wasik
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Application of two-wavelength optical heterodyne alignment system in XS-1
Author(s): Soichiro Mitsui; Takao Taguchi; Yukiko Kikuchi; Hajime Aoyama; Yasuji Matsui; Masanori Suzuki; Tsuneyuki Haga; Makoto Fukuda; Hirofumi Morita; Akinori Shibayama
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Evaluation of photoacid generators in chemically amplified resists for x-ray lithography using an on-wafer photoacid determination technique
Author(s): Bing Lu; Paul M. Dentinger; James Welch Taylor; Gilbert D. Feke; Dan Hessman; Qiang Wu; Robert D. Grober
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MOSCASEL: a total solution to electron-beam lithography simulation
Author(s): Zheng Cui
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Proximity effects correction in real time
Author(s): Piotr Jedrasik
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Production data from a Leica ZBA31H+ shaped e-beam mask writer located at the Photronics facility, Manchester, England
Author(s): Stephen Johnson; Dominic Loughran; Peter Osborne; Pierre Sixt; Hans-Joachim Doering
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Optimization of alignment key in electron-beam lithography
Author(s): Cheol-Kyun Kim; Cheol Hur; YoungSik Kim; Ki-Ho Baik
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Simulation of resist heating using TEMPTATION software with different models of electron-beam energy deposition
Author(s): Igor Yu. Kuzmin
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Overlay error budgets for a high-throughput SCALPEL system
Author(s): Stuart T. Stanton; Reginald C. Farrow; Gregg M. Gallatin; James Alexander Liddle; Warren K. Waskiewicz
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Modal analysis of the SCALPEL mask using experimental and numerical methods
Author(s): William H. Semke; Michael P. Schlax; Roxann L. Engelstad; Edward G. Lovell; James Alexander Liddle
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Low-defect reflective mask blanks for extreme ultraviolet lithography
Author(s): Scott C. Burkhart; Charles J. Cerjan; Patrick A. Kearney; Paul B. Mirkarimi; Christopher C. Walton; Avijit K. Ray-Chaudhuri
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Simulation on a new reflection type attenuated phase-shifting mask for extreme ultraviolet lithography
Author(s): Hsuen-Li Chen; Lon A. Wang
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Computation of reflected images from extreme ultraviolet masks
Author(s): Srinivas B. Bollepalli; Franco Cerrina
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Thermal management of EUV lithography masks using low-expansion glass substrates
Author(s): Steven E. Gianoulakis; Avijit K. Ray-Chaudhuri; Scott Daniel Hector
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Development of a technique for rapid at-wavelength inspection of EUV mask blanks
Author(s): Steven J. Spector; Ping Luo; Anthony E. Novembre; Leonidas E. Ocola; Donald L. White; Donald M. Tennant; Obert R. Wood
Show Abstract
Ultrathin photoresists for EUV lithography
Author(s): Veena Rao; Jonathan L. Cobb; Craig C. Henderson; Uzodinma Okoroanyanwu; Dan R. Bozman; Pawitter J. S. Mangat; Robert L. Brainard; Joseph F. Mackevich
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Picosecond ultrasonic characterization of Mo/Si multilayers for extreme ultraviolet lithography
Author(s): Nen-Wen Pu; Seongtae Jeong; Rian Zhao; Jeffrey Bokor
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Direct comparison of EUV and visible-light interferometries
Author(s): Kenneth A. Goldberg; Patrick P. Naulleau; Sang Hun Lee; Chang-Hasnain C. Chang; Cynthia J. Bresloff; Richard J. Gaughan; Henry N. Chapman; John E. M. Goldsmith; Jeffrey Bokor
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Optical vernier interferometry for aspheric metrology
Author(s): Paul E. Murphy; Thomas G. Brown; Duncan T. Moore
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Effects of mask roughness and condenser scattering in EUVL systems
Author(s): Neil A. Beaudry; Tomas D. Milster
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EUVL projection-camera alignment methods
Author(s): Michael R. Descour; Mark R. Willer; Dana S. Clarke; Jose M. Sasian
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Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography
Author(s): Glenn D. Kubiak; Luis J. Bernardez; Kevin D. Krenz; William C. Sweatt
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Mechanical distortions in advanced optical reticles
Author(s): Andrew R. Mikkelson; Roxann L. Engelstad; Edward G. Lovell; Theodore M. Bloomstein; Mark E. Mason
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Thermomechanical distortions of advanced optical reticles during exposure
Author(s): Jaehyuk Chang; Amr Y. Abdo; Byung-Kyu Kim; Theodore M. Bloomstein; Roxann L. Engelstad; Edward G. Lovell; William A. Beckman; John W. Mitchell
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Finite element modeling of ion-beam lithography masks for pattern transfer distortions
Author(s): Gary A. Frisque; Richard O. Tejeda; Edward G. Lovell; Roxann L. Engelstad
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Thermomechanical distortions of ion-beam stencil masks during exposure
Author(s): Po-Tung Lee; Byung-Kyu Kim; Gary A. Frisque; Richard O. Tejeda; Roxann L. Engelstad; Edward G. Lovell; William A. Beckman; John W. Mitchell
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UV thermoresists: sub-100-nm imaging without proximity effects
Author(s): Dan Gelbart; Valentin A. Karasyuk
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In-line holography using a point source
Author(s): Bernhard G. Frost; David C. Joy
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Two-layer resist etchback planarization process coupled to chemical mechanical polishing for sub-0.18-um shallow trench isolation technology
Author(s): Andre Schiltz; Laetitia Palatini; Maryse Paoli; Maurice Rivoire; Alain Prola
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Regular microfilters based on PTFE
Author(s): Vladimir Nazmov; Valery F. Pindyurin; Lubov A. Mezentseva; B. V. Mchedlishvili; Alexander I. Vilensky
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Excimer laser for 157-nm lithography
Author(s): Uwe Stamm; Igor Bragin; Sergei V. Govorkov; Juergen Kleinschmidt; Rainer Paetzel; Evgueni V. Slobodtchikov; Klaus Vogler; Frank Vofl; Dirk Basting
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Calculating aerial images from EUV masks
Author(s): Thomas V. Pistor; Andrew R. Neureuther
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High-power extreme ultraviolet source based on a Z-pinch
Author(s): Malcolm W. McGeoch
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Step and flash imprint lithography: a new approach to high-resolution patterning
Author(s): Matthew Colburn; Stephen C. Johnson; Michael D. Stewart; S. Damle; Todd C. Bailey; Bernard Choi; M. Wedlake; Timothy B. Michaelson; S. V. Sreenivasan; John G. Ekerdt; C. Grant Willson
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Advances in multilayer reflective coatings for extreme ultraviolet lithography
Author(s): James A. Folta; Sasa Bajt; Troy W. Barbee; R. Fred Grabner; Paul B. Mirkarimi; Tai D. Nguyen; Mark A. Schmidt; Eberhard Adolf Spiller; Christopher C. Walton; Marco Wedowski; Claude Montcalm
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Multilayer coating of 10X projection optics for extreme ultraviolet lithography
Author(s): Claude Montcalm; Eberhard Adolf Spiller; Marco Wedowski; Eric M. Gullikson; James A. Folta
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Local thermal analysis of reaction and the glass transition in exposed resist
Author(s): David S. Fryer; Juan J. de Pablo; Paul F. Nealey
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New silica glass for 157-nm lithography
Author(s): Yoshiaki Ikuta; Shinya Kikugawa; Akio Masui; Noriaki Shimodaira; Shuhei Yoshizawa; Masahiro Hirano
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Sub-100-nm imaging in x-ray lithography
Author(s): Olga Vladimirsky; Niru V. Dandekar; Wenlong Jiang; Quinn J. Leonard; Klaus Simon; Srinivas B. Bollepalli; Yuli Vladimirsky; James Welch Taylor
Show Abstract
EUV scattering and flare of 10X projection cameras
Author(s): Eric M. Gullikson; Sherry L. Baker; John E. Bjorkholm; Jeffrey Bokor; Kenneth A. Goldberg; John E. M. Goldsmith; Claude Montcalm; Patrick P. Naulleau; Eberhard Adolf Spiller; Daniel Gorman Stearns; John S. Taylor; James H. Underwood
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Fused silica for 157-nm transmittance
Author(s): Charlene M. Smith; Lisa A. Moore
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X-ray lithography: a system integration effort
Author(s): Robert A. Selzer; John Heaton; Yuli Vladimirsky; Klaus Simon
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Film-stress-induced deformation of EUV reflective optics
Author(s): Paul A. Spence; Michael P. Kanouff; Avijit K. Ray-Chaudhuri
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Gas curtain for mitigating hydrocarbon contamination of EUV lithographic optical components
Author(s): Michael P. Kanouff; Avijit K. Ray-Chaudhuri
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Nanometer patterning using ma-N 2400 series DUV negative photoresist and electron beam lithography
Author(s): Anya Voigt; Harald Elsner; H. G. Meyer; Gabi Gruetzner
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Reflectivity of Mo/Si multilayer systems for EUVL
Author(s): Eric Louis; Andrey E. Yakshin; Peter C. Goerts; Salim Abdali; Edward L. G. Maas; R. Stuik; Fred Bijkerk; Detlef Schmitz; Frank Scholze; Gerhard Ulm; Markus Haidl
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EUV (13.5-nm) light generation using a dense plasma focus device
Author(s): William N. Partlo; Igor V. Fomenkov; Daniel L. Birx
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