Share Email Print
cover

Proceedings of SPIE Volume 3665

15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.


Volume Details

Volume Number: 3665
Date Published: 23 April 1999
Softcover: 24 papers (190) pages
ISBN: 9780819431394

Table of Contents
show all abstracts | hide all abstracts
Future reticle demand and next-generation lithography technologies
Author(s): Uwe F. W. Behringer; Christian Ehrlich; Olaf Fortange
Show Abstract
HOYA deep-UV EAPSM blanks development status
Author(s): Masao Ushida; Hideo Kobayashi
Show Abstract
Overview of SCALPEL mask technology
Author(s): Gregory R. Bogart; Anthony E. Novembre; Avi Kornblit; Milton L. Peabody; Reginald C. Farrow; Myrtle I. Blakey; Richard J. Kasica; James Alexander Liddle; Thomas E. Saunders; Chester S. Knurek
Show Abstract
PN and SOI wafer flow process for stencil mask fabrication
Author(s): Joerg Butschke; Albrecht Ehrmann; Ernst Haugeneder; Mathias Irmscher; Rainer Kaesmaier; Karl Kragler; Florian Letzkus; Hans Loeschner; Josef Mathuni; Ivo W. Rangelow; Carsten Reuter; Feng Shi; Reinhard Springer
Show Abstract
Mask technology for EUV lithography
Author(s): M. Bujak; Scott C. Burkhart; Charles J. Cerjan; Patrick A. Kearney; Craig E. Moore; Shon T. Prisbrey; Donald W. Sweeney; William M. Tong; Stephen P. Vernon; Christopher C. Walton; Abbie L. Warrick; Frank J. Weber; Marco Wedowski; Karl Child Wilhelmsen; Jeffrey Bokor; Sungho Jeong; Gregory Frank Cardinale; Avijit K. Ray-Chaudhuri; Alan R. Stivers; Edita Tejnil; Pei-yang Yan; Scott Daniel Hector; Khanh B. Nguyen
Show Abstract
Use of KLA-Tencor STARlight SL 300 for in-process contamination inspection to control reticle defect densities
Author(s): Duane Dutton; Wayne P. Shen; Richard Yee; James A. Reynolds
Show Abstract
Development of a new defect sensitivity monitor for advanced OPC reticle technology
Author(s): Wolfgang Staud; Yair Eran; Patrick Reynolds; Craig B. Sager
Show Abstract
Inspecting the new generation of reticles using UV imaging
Author(s): Mark Andrew Merrill; James N. Wiley; Benjamin George Eynon
Show Abstract
Initial results from a Leica ZBA31H+ shaped E-beam mask writer located at the Photronics Advanced Mask Shop in Manchester, England
Author(s): Stephen Johnson; Paul Marshall; Peter Osborne; Hans-Joachim Doering; Christian Ehrlich
Show Abstract
Ion projection lithography for IC manufacturing
Author(s): Albrecht Ehrmann; Rainer Kaesmaier; Hans Loeschner
Show Abstract
Results from submicron CD metrology obtained with new I-line tools
Author(s): Hans-Juergen Brueck; Sebastian Birkenmayer; Guenther Falk; Gerd Scheuring; Lars Walden; Sigrid Lehnigk
Show Abstract
Pattern placement metrology tool matching within DPI's sites
Author(s): Norbert Talene; Klaus-Dieter Roeth
Show Abstract
Development of an algorithm for monitoring pattern fidelity on photomasks for 0.2-um technology and beyond based on light optical CD metrology tools
Author(s): Thomas Schaetz; Bernd Hay; Lars Walden; Wolfram Ziegler
Show Abstract
Effective multisite CD correlation to maximize high-end tool utilization
Author(s): John W. Duff; John Allsop
Show Abstract
Overlay mapping of microlithographic pattern generators by means of grouped structures
Author(s): Michael Arnz; Joachim Heppner; Werner Lessle
Show Abstract
Determination of residual stress and elastic constants of silicon open stencil masks for ion projection lithography
Author(s): Artur Degen; Feng Shi; Eva Sossna; R. Sunyk; Joachim Voigt; Burkhard E. Volland; B. Reinker; Ivo W. Rangelow
Show Abstract
Pellicle-induced reticle distortion: an experimental investigation
Author(s): Wen Chen; James A. Carroll; Glenn Storm; Ronald G. Ivancich; John P. Maloney; Olivier Maurin; Eric Souleillet
Show Abstract
Manufacturing an advanced process characterization reticle incorporating halftone biasing
Author(s): Kent H. Nakagawa; Douglas J. Van Den Broeke; J. Fung Chen; Thomas L. Laidig; Kurt E. Wampler; Roger F. Caldwell
Show Abstract
Hierarchical mask data preparation and special fracturing techniques in MGS
Author(s): B. Buerger; Uwe Baetz; Klaus-Dietmar Kunze; H. Wolf
Show Abstract
Geometrical E-beam proximity correction for raster scan systems
Author(s): Nikola Belic; Hans Eisenmann; Hans Hartmann; Thomas Waas
Show Abstract
Characterization of inspection sensitivity on advanced OPC reticles
Author(s): Larry S. Zurbrick; Joseph A. Straub; Anthony Vacca
Show Abstract
Development of an inductively coupled plasma etching system for 230-mm reticles
Author(s): David A. Klein; John Donohue
Show Abstract
Experience with EFQM assessment at Siemens Mask Shop
Author(s): Werner Reindl; Siegfried Steuber
Investigation of lithography performance using multipass gray (MPG) with MEBES 5000
Author(s): Robert L. Dean; David W. Alexander; Jan M. Chabala; Thomas P. Coleman; Caryn Hartglass; Maiying Lu; Charles A. Sauer; Suzanne Weaver
Show Abstract

© SPIE. Terms of Use
Back to Top