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PROCEEDINGS VOLUME 3412

Photomask and X-Ray Mask Technology V
Editor(s): Naoaki Aizaki
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Volume Details

Volume Number: 3412
Date Published: 1 September 1998
Softcover: 69 papers (630) pages
ISBN: 9780819428646

Table of Contents
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Logic device trend: impact on mask technology
Author(s): Chiang Y. Yang
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Impact on mask technology from the viewpoint of DRAM trend
Author(s): Kuniaki Koyama
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Further advances in electron-beam pattern generation technology for 180-nm masks
Author(s): Frank E. Abboud; Charles A. Sauer; Matthew Vernon; Thomas P. Coleman; Robert L. Dean; William Wang; Richard Prior; Maiying Lu; Suzanne Weaver
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Development of a next-generation e-beam lithography system for 1-Gb DRAM masks
Author(s): Yasutoshi Nakagawa; Tadashi Komagata; Hitoshi Takemura; Nobuo Gotoh; Kazumitsu Tanaka
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Present status of x-ray lithography
Author(s): Masaki Yamabe
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Status of x-ray mask development at the IBM Advanced Mask Facility
Author(s): Kenneth C. Racette
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Etching characteristics of a chromium-nitride hardmask for x-ray mask fabrication
Author(s): Shinji Tsuboi; Miyoshi Seki; Katsumi Suzuki
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Revised SIA road map for mask technology
Author(s): John Canning
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Application of dry etching to 1-Gb DRAM mask fabrication
Author(s): Takashi Inoue; Yoshiki Matsuda; Yoshiyuki Tanaka
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Plasma etch of AZ5206/Cr and ZEP7000/Cr for 0.18- to 0.25-um-generation advanced mask fabrication
Author(s): Wilman Tsai; Frederick T. Chen; Marilyn Kamna; Scott Chegwidden; Steven M. Labovitz; Jeff N. Farnsworth; Giang T. Dao
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Comparison of etching methods for subquarter-micron-rule mask fabrication
Author(s): Tsukasa Abe; Toshifumi Yokoyama; Sato Kyoko; Hiroyuki Miyashita; Naoya Hayashi
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Enhanced lithography CoO model: considerations for advanced mask
Author(s): Yoshihiro Todokoro; Yoshihiro Oda
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Process optimization for mask fabrication
Author(s): Hideaki Sakurai; Masamitsu Itoh; Akitoshi Kumagae; Hirohito Anze; Takayuki Abe; Iwao Higashikawa
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Chemical-amplification positive-resist design for 0.18-um reticle fabrication using the 50-kV HL-800M electron-beam system
Author(s): Tadashi Arai; Toshio Sakamizu; Takashi Soga; Hidetoshi Satoh; Kohji Katoh; Hiroshi Shiraishi; Morihisa Hoga
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Possibility of a spin cup method
Author(s): Terumasa Tokimitsu
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Automatic alternative phase-shift mask CAD layout tool for gate shrinkage of embedded DRAM in logic below 0.18 um
Author(s): Hidetoshi Ohnuma; Hiroichi Kawahira
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New flatness measurement instrument for 230-mm lapped and polished photomasks
Author(s): Paul G. Dewa; Andrew W. Kulawiec; Stephen K. Mack; John J. Nemechek
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Large-glass reticle writer: exposure strategy and mask handling
Author(s): Christian Ehrlich; Juergen Gramss
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High-performance and stability reticle writing system HL-800M
Author(s): Yasuhiro Kadowaki; Katsuhiro Kawasaki; Kazui Mizuno; Hidetoshi Satoh; Morihisa Hoga; Ken Uryu
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Performance of the ALTA 3500 scanned-laser mask lithography system
Author(s): Peter D. Buck; Alex H. Buxbaum; Thomas P. Coleman; Long Tran
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Development of a fast beam-blanking system
Author(s): Munehiro Ogasawara; Hitoshi Sunaoshi; Ryoji Yoshikawa
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Improving the measurement accuracy of pattern width and position of x-ray masks
Author(s): Shingo Uchiyama; Masatoshi Oda; Miho Sakatani; Tadahito Matsuda
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High-density plasma dry etch for DUV attenuated phase-shifting masks
Author(s): Song Peng; William J. Adair
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Two-step etching process for small-size pattern
Author(s): Kenny Yang
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Development of a high-performance e-beam resist suitable for advanced mask fabrication
Author(s): Kazutaka Tamura; H. Niwa; S. Kanetsuki; M. Asano; S. Mitamura; Daichi Okuno; Masa-aki Kurihara; Naoya Hayashi
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Application of dry etching process on high-end Cr photomasks
Author(s): Keuntaek Park; Kyu-Yong Lee
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Development of a multi-FPGA netlist partitioner and a general-purpose graph partitioning system
Author(s): Preeti Gowaikar; Millind Sohoni; M. Chandramouri; Sachin Patkar
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Formal specification and verification of hardware designs
Author(s): S. Ramesh; S.S.S.P Rao; G. Sivakumar; Purandar Bhaduri
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Development methods for chemical amplification resist
Author(s): Hidetaka Saitoh; Takashi Soga; Shinji Kubo; Syuichi Sanki; Morihisa Hoga
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Performance of a chemically amplified positive resist for next-generation photomask fabrication
Author(s): Masa-aki Kurihara; Toshikazu Segawa; Daichi Okuno; Naoya Hayashi; Hisatake Sano
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Fine-pattern process with negative tone resist
Author(s): Eiichi Hoshino; Masahiro Uraguchi; Yuhichi Yamamoto; Y. Sato; Toshikatsu Minagawa; Kojiro Suzuki; Keiji Watanabe
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Optimization of ZEN4100(2)
Author(s): Noriyuki Mitao; Nobunori Abe; Masahiko Sugimura
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Deflection error due to charge-up effect of reticle substrate
Author(s): Junji Hirumi; Tetsuya Hayashimoto; Toshiaki Kawabata; Kouji Hosono; Eiichi Hoshino; Junichi Kai
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Subresolution assist feature masks for 0.2-um window pattern formation
Author(s): Tadao Yasuzato; Shinji Ishida; Hiroyoshi Tanabe; Akihiko Andou; Tatuya Kamata; Yoji Tonooka; Hiroyuki Shigemura
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Mask CD quality assurance specifications for 0.25-um devices with a practical lithography window
Author(s): Takehiko Gunji; Tetuya Kitagawa; Kunihiko Tsuboi
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New detailed CD measurement method by scanning confocal laser microscope
Author(s): Takeshi Yamane; Takashi Hirano
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New distortion metrology using reticle coordinate error
Author(s): Izumi Tsukamoto; Hirohiko Shinonaga
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Pellicle-induced distortions on photomasks
Author(s): Klaus-Dieter Roeth; Thomas Struck
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Ultrafine mask cleaning technology using ultraviolet irradiation
Author(s): Kenji Masui; Akio Kosaka; Hiroishi Fujita; Hidehiro Watanabe
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Detection of CD error caused by multipass writing method
Author(s): Andrew Wang
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Defect data analysis for reticle inspection
Author(s): Ming-Huei Lin; Shen Chung Kuo
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Evaluation results of a new inspection algorithm
Author(s): Kanji Takeuchi; Yutaka Miyahara
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Gray map reference pattern generator of a die-to-database mask inspection system for 256-Mb and 1-Gb DRAMs
Author(s): Hideo Tsuchiya; Ikunao Isomura; Tomohide Watanabe; Kyoji Yamashita
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Use of line-width error detection for quality control in reticle fabrication
Author(s): Yair Eran; Gidon Gottlib; Gad Greenberg; Jeremy Zelenko
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Toward 150-nm defect detection capability
Author(s): Yair Eran; Gad Greenberg; Michael M. Har-Zvi
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High-resolution UV wavelength reticle inspection
Author(s): Mark Andrew Merrill; Hector I. Garcia; Steven J. Schuda; Wilbert Odisho; James N. Wiley
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Printability of backside reticle defects
Author(s): William Waters Volk; James N. Wiley; James A. Reynolds
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Modified particle detection method for reticle/mask particle detection system
Author(s): Yoshinori Nagai; Toyoki Kanzaki
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Current focused-ion-beam repair strategies for opaque defects and clear defects on advanced phase-shifting masks
Author(s): Mark L. Raphaelian; J. David Casey; Andrew F. Doyle; David C. Ferranti; John C. Morgan
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High-transmittance rim-type attenuated phase-shift masks for sub-0.2-um hole patterns
Author(s): Haruo Iwasaki; Keiichi Hoshi; Hiroyoshi Tanabe
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Optimization of Zr-Si compound films for attenuated PSM
Author(s): Takashi Haraguchi; Tadashi Matsuo; Susumu Takeuchi
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Present status of ArF lithography development and mask technology
Author(s): Hiroaki Morimoto; Hiroshi Ohtsuka
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Present status and technical issues of x-ray lithography
Author(s): Kimiyoshi Deguchi; Jiro Nakamura; Kazuya Nakanishi; Tadahito Matsuda
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Fabrication and commercialization of scalpel masks
Author(s): Anthony E. Novembre; Milton L. Peabody; Myrtle I. Blakey; Reginald C. Farrow; Richard J. Kasica; James Alexander Liddle; Thomas E. Saunders; Donald M. Tennant
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Mask technology of extreme-ultraviolet lithography
Author(s): Hiroo Kinoshita; Takeo Watanabe; Akira Ozawa; Masahito Niibe
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Ion projection lithography
Author(s): John Melngailis; Hans Loschner; Gerhard Stengl; Ivan L. Berry; Alfred A. Mondelli; Gerhard Gross
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Mask fabrication in the USA
Author(s): Franklin D. Kalk
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Current activities in mask metrology at the PTB
Author(s): Wolfgang Hassler-Grohne; Harald Bosse
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Parameters affecting megasonic power transmittance in the megasonic cleaning process
Author(s): Yong-Hoon Kim; Jin-Hong Park; Keumhee H. Lee; Seong-Woon Choi; Hee-Sun Yoon; Jung-Min Sohn
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High-performance photomask cleaning process using electrolyzed water
Author(s): Yoshikazu Nagamura; Hozumi Usui; Nobuyuki Yoshioka; H. Morimoto
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Development of pellicle for ArF excimer laser
Author(s): Shigeto Shigematsu; A. Eda; Hiroaki Nakagawa
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Foundry mask shop in Taiwan
Author(s): Chue-San Yoo; Jia-Jing Wang
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100-nm defect detection using an existing image acquistion system
Author(s): Anthony Vacca; Benjamin George Eynon; Steve Yeomans
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Reticle defects on optical proximity correction features
Author(s): Larry S. Zurbrick
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Detection of 60-deg phase defects on alternating PSMs
Author(s): Chris A. Spence; David Emery; Larry S. Zurbrick; Durai P. Prakash; X. Chang; Steve Khanna; Brent D. Leback; Eiji Tsujimoto; Greg P. Hughes; Baorui Yang
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Requirements of attenuated PSM for 0.18-um gate patterns
Author(s): Hideaki Hasegawa; Toru Higashi; Naoyuki Ishiwata; Satoru Asai; Isamu Hanyu
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Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography
Author(s): John S. Petersen; Robert John Socha; Alex R. Naderi; Catherine A. Baker; Syed A. Rizvi; Douglas J. Van Den Broeke; Nishrin Kachwala; J. Fung Chen; Thomas L. Laidig; Kurt E. Wampler; Roger F. Caldwell; Susumu Takeuchi; Yoshiro Yamada; Takashi Senoh; Martin McCallum
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