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Proceedings of SPIE Volume 3331

Emerging Lithographic Technologies II
Editor(s): Yuli Vladimirsky
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Volume Details

Volume Number: 3331
Date Published: 5 June 1998
Softcover: 76 papers (716) pages
ISBN: 9780819427762

Table of Contents
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Recent advances in the Sandia EUV 10x microstepper
Author(s): John E. M. Goldsmith; Pamela K. Barr; Kurt W. Berger; Luis J. Bernardez; Gregory Frank Cardinale; Joel R. Darnold; Daniel R. Folk; Steven J. Haney; Craig C. Henderson; Karen J. Jefferson; Kevin D. Krenz; Glenn D. Kubiak; Rodney P. Nissen; Donna J. O'Connell; Yon E. Perras; Avijit K. Ray-Chaudhuri; Tony G. Smith; Richard H. Stulen; Daniel A. Tichenor; Alfred A. Ver Berkmoes; John B. Wronosky
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Three-aspherical-mirror system for EUV lithography
Author(s): Hiroo Kinoshita; Takeo Watanabe; Masahito Niibe; Masaaki Ito; H. Oizumi; Hiromasa Yamanashi; Katsuhiko Murakami; Tetsuya Oshino; Yuriy Ya. Platonov; Nicola Grupido
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Top-surface imaging resists for EUV lithography
Author(s): Craig C. Henderson; David R. Wheeler; Tim P. Pollagi; Donna J. O'Connell; John E. M. Goldsmith; Aaron Fisher; Gregory Frank Cardinale; John M. Hutchinson; Veena Rao
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Multilayer reflective coatings for extreme-ultraviolet lithography
Author(s): Claude Montcalm; Sasa Bajt; Paul B. Mirkarimi; Eberhard Adolf Spiller; Frank J. Weber; James A. Folta
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Beamline for measurement and characterization of multilayer optics for EUV lithography
Author(s): James H. Underwood; Eric M. Gullikson
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Multilayer coating and tests of a 10x extreme-ultraviolet lithographic camera
Author(s): Eberhard Adolf Spiller; Frank J. Weber; Claude Montcalm; Sherry L. Baker; Eric M. Gullikson; James H. Underwood
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Scattering from normal-incidence EUV optics
Author(s): Eric M. Gullikson
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Control of defects in EUV multilayers and demonstration of at-wavelength defect characterization by EUV microscopy
Author(s): Eric Louis; Mark J. H. den Hartog; Edward L. G. Maas; Fred Bijkerk
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High-power extreme-ultraviolet source based on gas jets
Author(s): Glenn D. Kubiak; Luis J. Bernardez; Kevin D. Krenz
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Minimizing mapping-induced OPD errors when testing aspheric mirrors
Author(s): Russell M. Hudyma; Gary E. Sommargren
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Rigorous method for compensation selection and alignment of microlithographic optical systems
Author(s): Henry N. Chapman; Donald W. Sweeney
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Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
Author(s): Patrick P. Naulleau; Kenneth A. Goldberg; Sang Hun Lee; Chang-Hasnain C. Chang; Cynthia J. Bresloff; Phillip J. Batson; David T. Attwood; Jeffrey Bokor
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Impact of thermal and structural effects on EUV lithographic performance
Author(s): Avijit K. Ray-Chaudhuri; Steven E. Gianoulakis; Paul A. Spence; Michael P. Kanouff; Christopher D. Moen
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Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme-ultraviolet lithography
Author(s): Paul B. Mirkarimi; Claude Montcalm
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X ray fills the gap
Author(s): Chet Wasik; G. P. Murphy; Alek C. Chen; Azalia A. Krasnoperova; Alex L. Flamholz; Daniel J. DeMay; Jeffrey A. Leavey; Steve Loh; Sue Chaloux; Alan C. Thomas; Sang Lee; Kenneth J. Giewont; Paul D. Agnello
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Analysis and identification of factors contributing to the overlay budget
Author(s): Klaus Simon; R. Macklin; Robert A. Selzer; Olga Vladimirsky; Yuli Vladimirsky; Franco Cerrina
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ACLV control in x-ray lithography
Author(s): Azalia A. Krasnoperova; Robert P. Rippstein; Denise M. Puisto; Janet M. Rocque
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Modeling study of image formation with point sources
Author(s): Srinivas B. Bollepalli; Mumit Khan; Franco Cerrina
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Mask and wafer inspection and cleaning for proximity x-ray lithography
Author(s): Jeffrey A. Leavey; Pawitter J. S. Mangat
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National technology roadmap for semiconductors: an analysis and perspective
Author(s): Syed A. Rizvi
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Large-area high-throughput high-resolution lithography systems for flat-panel displays and microelectronic modules
Author(s): Kanti Jain; Thomas J. Dunn; Nestor Farmiga; Mark Zemel; Carl Weisbecker
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Lithography on flexible substrates: a roll-to-roll high-throughput high-resolution system for low-cost production of microelectronics
Author(s): Kanti Jain; Thomas J. Dunn; Nestor Farmiga; Mark Zemel; Carl Weisbecker; Teik-Meng Lee
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Mix-and-match interferometric and optical lithographies for nanoscale structures
Author(s): Saleem H. Zaidi; Steven R. J. Brueck; Thomas A. Hill; Richard N. Shagam
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Mask requirements for advanced lithography
Author(s): Walter J. Trybula; Roxann L. Engelstad
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Pattern generation requirements for mask making beyond 130 nm
Author(s): Frank E. Abboud; Mark A. Gesley; Juan R. Maldonado
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Characterization of oxynitride hard mask removal processes for refractory x-ray mask fabrication
Author(s): Cameron J. Brooks; Douglas E. Benoit; Kenneth C. Racette; Denise M. Puisto; Renu Whig; William J. Dauksher; Kevin D. Cummings
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Transient thermal distortions of x-ray mask membranes during exposure scanning
Author(s): Zhaohua Feng; Roxann L. Engelstad; Edward G. Lovell; Franco Cerrina
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Photomask in-plane distortion induced during e-beam patterning
Author(s): Bassam Shamoun; Michael A. Sprague; Roxann L. Engelstad; Franco Cerrina
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Mixed-proximity holographic mask technology for 50-nm VLSI by x-ray lithography
Author(s): Ronald E. Burge; Joachim N. Knauer; XiaoCong Yuan; Keith Powell
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Performance limitations from Coulomb interaction in maskless parallel electron-beam lithography systems
Author(s): Liqun Han; Mark A. McCord; Gil Israel Winograd; Roger Fabian W. Pease
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Critical dimension and write time performance: a next-generation vector electron-beam mask patterning system
Author(s): Carl M. Rose; Lawrence C. Wang; Manny Ferreira
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Development of a next-generation e-beam lithography system for 1-Gb DRAM masks
Author(s): Tadashi Komagata; Yasutoshi Nakagawa; Hitoshi Takemura; Nobuo Gotoh; Kazumitsu Tanaka
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Electron-beam direct writing technology for fine gate patterning
Author(s): Kazuhiko Sato; Seiichiro Shirai; Hajime Hayakawa; Shinji Okazaki
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Proximity effect correction by a supplementary-exposure method in high-throughput block-exposure electron-beam direct writing
Author(s): Takeo Nagata; Yasuo Manabe; Yasuo Nara; Nobuo Sasaki; Yasuhide Machida
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Synchrotron radiation process and in-situ observation technique: infrared reflection absorption spectroscopy
Author(s): Tsuneo Urisu
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New family of non-chemically amplified resists
Author(s): Ari Aviram; Marie Angelopoulos; Edward D. Babich; Inna V. Babich; Karen E. Petrillo; David E. Seeger
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Development of SiO2/c-Si bilayer e-beam resist process and its application for 10-nm-scale MIM junctions
Author(s): Sucheta Gorwadkar; Toshimi Wada; Jun-ichi Shirakashi; Hiroshi Hiroshima; Kenichi Ishii; Masanori Komuro
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Conducting electron-beam resists based on polyaniline
Author(s): Maggie A. Z. Hupcey; Marie Angelopoulos; Jeffrey D. Gelorme; Christopher Kemper Ober
100-nm CMOS gates patterned with 3 sigma below 10 nm
Author(s): Hua-Yu Liu; Carlos H. Diaz; Chiu Chi; R. Kavari; Peng Cheng; Min Cao; Robert E. Gleason; Brian S. Doyle; Wayne M. Greene; G. Ray
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Application of fullerene C60 thin films as an electron-beam resist for micro- and nanolithography
Author(s): Michael E. Gaevski; Lolita G. Rotkina; Tatjana L. Makarova; Alexander V. Lunev; Ilja P. Soshnikov
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Determining photoresist coat sensitivities of 300-mm wafers
Author(s): Robert M. Crowell
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TEMP: a software package for simulation of resist heating in electron-beam lithography
Author(s): Zheng Cui
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Electron-beam lithography on multilayer substrates: experimental and theoretical study
Author(s): Ioannis Raptis; Giancarlo Meneghini; Anja Rosenbusch; Nikos Glezos; Rafaelle Palumbo; Marco Ardito; Leonardo Scopa; George P. Patsis; Evangelos Valamontes; Panagiotis Argitis
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Linewidth controllability depending on electron-beam blur and resist thickness
Author(s): Masamitsu Itoh; Atsushi Ando; Shunko Magoshi; Kiyoshi Hattori
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Compact recycled beam source for XRL and EUVL exposure tools
Author(s): Melvin A. Piestrup; Michael W. Powell; J. Theodore Cremer; Louis W. Lombardo; V. V. Kaplin; A. A. Mihal'chuk; S. R. Uglov; V. N. Zabaev; D. M. Skopik; R. M. Silzer; G. A. Retzlaff
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Optimization of pattern shape in electron-beam cell projection lithography
Author(s): Takahiro Ema; Hiroshi Yamashita; Ken Nakajima; Hideo Kobinata; Hiroshi Nozue
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Highly accurate stitching method between cell projection and variably shaped e-beam shots
Author(s): Yoshikatsu Kojima; Naka Onoda; Kenichi Tokunaga; Ken Nakajima; Hiroshi Nozue
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Application of development-free vapor photolithography in etching silicon nitride
Author(s): Xiaoyin Hong; Shengquan Duan; Jianping Lu; Peiqing Wang; Yongqi Chen
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UVIII-positive chemically amplified resist optimization
Author(s): Janet M. Rocque; Cameron J. Brooks; Richard W. Henry; Douglas E. Benoit; Pawitter J. S. Mangat
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Interferometric lithography pattern delimited by a mask image
Author(s): Xiaolan Chen; Andrew Frauenglass; Steven R. J. Brueck
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Koehler-illumination-based method to improve beam size controllability
Author(s): Kiyoshi Hattori; Hitoshi Sunaoshi; Atsushi Ando
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Novel x-ray mask structure with low out-of-plane distortion
Author(s): Young Jin Jeon; Sang-Soo Choi; Il Yong Kim; Hai Bin Chung; Bo Woo Kim
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400- and 750-MHz one- and two-dimensional nuclear magnetic resonance spectra of x-ray-degraded poly(methyl methacrylate): comparison with UV-degraded material
Author(s): Edward E. Waali; John D. Scott; Olga Vladimirsky; Yuli Vladimirsky; K. M. Hayataka; J. Michael Klopf
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Surface chemistry of GaAs wafers and reaction with chemically amplified resists during resist processing
Author(s): Bing Lu; Olga Vladimirsky; James Welch Taylor; Niru V. Dandekar
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Pellicles for x-ray lithography masks
Author(s): Juan R. Maldonado; Steven A. Cordes; Jeffrey A. Leavey; Raul E. Acosta; Fuad Doany; Marie Angelopoulos; C. Waskiewicz
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Shot-noise impact on resist roughness in EUV lithography
Author(s): John M. Hutchinson
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Scattering and coherence in EUVL
Author(s): Tomas D. Milster; Neil A. Beaudry
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Materials for reflective multilayer coatings for EUV wavelengths
Author(s): Bruce W. Smith; Parthasarathy Venkataraman; Santosh K. Kurinec; R. Scott Mackay
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X-ray exposures of electrodeposited photoresist for conformal lithography on corrugated surfaces
Author(s): Frank T. Hartley; Chantal G. Khan Malek; Steven Nguyen
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Pattern-specific emulation (PSE) for ion-beam projection lithography masks using finite element analysis
Author(s): Adam H. Fisher; Roxann L. Engelstad; Edward G. Lovell
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Photoacid generator study for chemically amplified negative resists for high-resolution lithography
Author(s): Paul M. Dentinger; Kurtis G. Knapp; Geoffrey W. Reynolds; James Welch Taylor; Theodore H. Fedynyshyn; Todd A. Richardson
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Fabrication and testing of optics for EUV projection lithography
Author(s): John S. Taylor; Gary E. Sommargren; Donald W. Sweeney; Russell M. Hudyma
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0.1-um high-aspect-ratio pattern replication and linewidth control
Author(s): Zheng Chen; Yuli Vladimirsky; Franco Cerrina; Barry P. Lai; Wenbing Yun; Efim S. Gluskin
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Imaging interferometric lithography for arbitrary patterns
Author(s): Xiaolan Chen; Steven R. J. Brueck
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Mechanical distortions in advanced optical reticles
Author(s): Andrew R. Mikkelson; Michael A. Sprague; Roxann L. Engelstad; Edward G. Lovell; David Trost
Show Abstract
Equivalent modeling of SCALPEL mask membrane distortions
Author(s): Gerald A. Dicks; Roxann L. Engelstad; Edward G. Lovell; James Alexander Liddle
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Analysis, design, and optimization of ion-beam lithography masks
Author(s): Richard O. Tejeda; Roxann L. Engelstad; Edward G. Lovell; Ivan L. Berry
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Dynamic characterization of step-induced vibrations of x-ray mask membranes
Author(s): Michael P. Schlax; Roxann L. Engelstad; Edward G. Lovell
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EUV mask absorber defect size requirement at 100-nm design rules
Author(s): Pei-yang Yan; Guojing Zhang; Jenn Chow; Patrick Kofron; Joseph C. Langston; Harun H. Solak; Patrick A. Kearney; Gregory Frank Cardinale; Kurt W. Berger; Craig C. Henderson
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Extension of the traditional optical model for investigation into EUV projection lithography capabilities
Author(s): Vladimir V. Ivin; Kevin D. Lucas; Tariel M. Makhviladze; Vadim V. Manuylov; Marina G. Medvedeva
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Comparative study of resist heating and proximity effect influence on CD variation in 30-kV EBL
Author(s): Sergey V. Babin; Peter Hudek; Ivan Kostic; Igor Yu. Kuzmin
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Scaling behavior in interference lithography
Author(s): Rodney R. Agayan; William C. Banyai; Andres J. Fernandez
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Critical issues for developing a high-throughput SCALPEL system for sub-0.18-um lithography generations
Author(s): Stuart T. Stanton; James Alexander Liddle; Warren K. Waskiewicz; Masis M. Mkrtchyan; Anthony E. Novembre; Lloyd R. Harriott
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X-ray stepper development for volume production at Canon
Author(s): Kouji Uda; Nobutoshi Mizusawa; Yutaka Tanaka; Yutaka Watanabe; Hideki Ina; Shunichi Uzawa
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Demonstration of a foil trap technique to eliminate laser plasma atomic debris and small particulates
Author(s): L. A. Shmaenok; C. C. de Bruijn; H. F. Fledderus; R. Stuik; Alexander A. Schmidt; Dmitrii M. Simanovski; Anatoley V. Sorokin; T. A. Andreeva; Fred Bijkerk
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