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Proceedings of SPIE Volume 3183

Microlithographic Techniques in IC Fabrication
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Volume Details

Volume Number: 3183
Date Published: 14 August 1997
Softcover: 27 papers (272) pages
ISBN: 9780819426109

Table of Contents
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193-nm excimer laser microstepper system
Author(s): Nadeem Hasan Rizvi; Julian S. Cashmore; Chris M. Solomon; Phil T. Rumsby; Malcolm C. Gower
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Advanced lithographic methods for 300-nm contact patterning over severe topography with i-line stepper
Author(s): Ida Chui Shan Ho; Alex Cheng; Siuhua Zhu
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Effects of DUV resist sensitivities on lithographic process window
Author(s): Kevin G. Kemp; Daniel J. Williams; Joseph W. Cayton; Peter Steege; Steve D. Slonaker; Richard C. Elliott
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Direct patterning of electrodeposited polythiophene thin films by ultraviolet laser ablation
Author(s): Xiao Hu; Terence Kin Shun Wong; S. Gao; H. M. Liu; Yee Loy Lam; Yuen Chuen Chan; Feng-Lan Xu
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Comparison of different optical proximity correction models with three-dimensional photolithography simulation over planar substrates
Author(s): Juan C. Rey; Jiangwei Li; Victor V. Boksha; Douglas A. Bernard
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Broadband microlithography: process development using PROLITH simulator
Author(s): Eugene G. Barash; Satwinder S. Randhawa
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Optimization of BARC for nonplanar lithography by three-dimensional electromagnetic simulation
Author(s): Michael S. Yeung; Eytan Barouch
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Relationship between ruling quality and lithographic gap in proximity photolithography
Author(s): Yongqi Fu
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Compact plasma focus soft x-ray source with high repetition rate and high intensity
Author(s): Sing Lee; Paul Choon Keat Lee; Guan Zhang; X. Feng; Adrian Serban; Mahe Liu; Terence Kin Shun Wong; C. Selvam; A. Thang
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Preliminary results on x-ray lithography using a compact plasma focus
Author(s): Sing Lee; X. Feng; Guan Zhang; Paul Choon Keat Lee; Mahe Liu; Adrian Serban; Stuart Victor Springham; Terence Kin Shun Wong; K. Wira; C. Selvam; A. Thang
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Deep ion-beam lithography for micromachining applications
Author(s): Stuart Victor Springham; Thomas Osipowicz; J. L. Sanchez; Sing Lee; Frank Watt
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New process for nanometer-scale devices
Author(s): Yifang Chen; P. Hadley; C. J. P. M. Harmans; J. E. Mooij; Geok Ing Ng; Soon Fatt Yoon
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Direct-write electron-beam lithography for submicron integrated circuit fabrication
Author(s): Grahame C. Rosolen; Warren D. King
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Profile characteristics and simulation of chemically amplified resists in electron-beam lithography
Author(s): Young-Mog Ham; Changbuhm Lee; Soo-Hwan Kim; KukJin Chun
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Measurements and analysis of beam current and beam diameter of an electron-beam lithography system
Author(s): Wu Lu; Geok Ing Ng; Soon Fatt Yoon; Hao-Ying Shen
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Lithography using a compact plasma focus electron source
Author(s): Paul Choon Keat Lee; X. Feng; Guan Zhang; Mahe Liu; Sing Lee
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Footing reduction in the organic bottom antireflective coating implementation
Author(s): Tze-Man Ko; Alex Cheng
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Implementation of organic bottom antireflective coating in 0.35-um polycide fabrication
Author(s): Tze-Man Ko; Ming Hui Fan; Alex Cheng; Raymond Yu
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Novel technique for submicron separation between metal lines
Author(s): Arvind Raghavan; S. K. Lahiri; Amitava DasGupta
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Analyzing the tolerance and controls on critical dimensions and overlays as prescribed by the National Technology Roadmap for Semiconductors
Author(s): Syed A. Rizvi
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Best process focus and machine focus: adding focus offset to optimize photolithography process for VLSI manufacturing
Author(s): Yi-Chuan Lo; Chih-Hsiung Lee; Yang-Tung Fan; Chih-Kung Chang
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Resist profile and CD control improvement by using optimized resist thickness and substrate film stack ratio for 0.35-um logic process
Author(s): Ming Hui Fan; Raymond Yu; Ronfu Chu; Chet Ping Lim
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Transmission electron microscopy of defects in NMOS and PMOS structures
Author(s): Antony J. Bourdillon; Yew G. Koh; Shu L. Chiang; Chong Wee Lim; Jong Ren Kong; Cao Guobing
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Effect of argon or nitrogen preamorphized implant on SALICIDE formation for deep submicron CMOS technology
Author(s): Chaw Sing Ho; Kin Leong Pey; Harianto Wong; R. P. Gamani Karunasiri; Soo-Jin Chua; Kong Hean Lee; Ying Tang; Sang Min Wong; Lap Hung Chan
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Enhanced poly gate critical dimension control by using a SiOxNy ARC film
Author(s): Christopher Bencher; Tony Chu; Way Tat Tan; Gang Zou; Qunying Lin; Xu Yi; Wang Xu Dong; Ma Wei Wen
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X-ray holography for VLSI using synthetic bilevel holograms
Author(s): Ronald E. Burge; Joachim N. Knauer; XiaoCong Yuan; Keith Powell
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Resolution and depth of focus in optical lithography
Author(s): Chris A. Mack
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