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Charged Particle Optics III
Editor(s): Eric Munro
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Softcover $105.00 * $105.00 *

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Volume Details

Volume Number: 3155
Date Published: 25 September 1997
Softcover: 25 papers (274) pages
ISBN: 9780819425775

Table of Contents
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Design of a low-brightness highly uniform source for projection electron-beam lithography (SCALPEL)
Author(s): Warren K. Waskiewicz; James Alexander Liddle
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Emission models for thermionic cathodes
Author(s): David C. Carpenter; John Simkin
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Design of a magnification and rotation unit with predesign tool POCAD
Author(s): Michael Andrianus Johannes van der Stam; Bas Mertens; Pieter Kruit
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In-lens deflectors for an LVSEM magnetic immersion objective lens
Author(s): Yan Zhao; Anjam Khursheed
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Analysis of off-axis-shaped beam systems for high-throughput electron-beam lithography
Author(s): Xieqing Zhu; Haoning Liu; Eric Munro; John A. Rouse
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Simulation of microstrip deflectors for field emission display
Author(s): Zheng Cui
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Mesh refinement for finite-element field computations in electron optics
Author(s): Anjam Khursheed
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Improved 3D boundary charge method for high-accuracy electric field calculation
Author(s): Hidekazu Murata; Toshimi Ohye; Hiroshi Shimoyama
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Matrizant method for an optimal synthesis of nonlinear magnetic and electrostatic focusing systems for a given beam current
Author(s): Alexander D. Dymnikov; Genoveva Martinez
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Compact electrostatic lithography column for nanoscale exposure
Author(s): Tom Chisholm; Haoning Liu; Eric Munro; John A. Rouse; Xieqing Zhu
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Novel resist and exposure strategy for high-resolution electron-beam lithography
Author(s): Walter Daumann; Ralf M. Bertenburg; Christophe van den Berg; Franz-Josef Tegude
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Testing printed circuit boards and MCMs with electron beams
Author(s): Auguste B. El-Kareh
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Miniature scanning electron microscope design based upon the use of permanent magnets
Author(s): Anjam Khursheed; John T. L. Thong; J. C. H. Phang; I. P. Ong
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Arbitrary order maps, remainder terms, and long-term stability in particle accelerators
Author(s): Martin Berz; Kyoko Makino
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Computer analysis of imaging energy filters
Author(s): John A. Rouse; Eric Munro; Katsushige Tsuno
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Influence of the rod diameter of electrostatic quadrupole lenses on the axial field and on the minimum spot size in nonlinear microprobes
Author(s): A. H. Azbaid; Alexander D. Dymnikov; Genoveva Martinez
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Spherical aberration correction of a focused ion beam with space charge
Author(s): Jon Orloff
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Arbitrary order aberrations for elements characterized by measured fields
Author(s): Kyoko Makino; Martin Berz
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Influence of perturbations at distortion and tolerances with regard for their corrections in ion-projection systems
Author(s): Stanislav N. Jatchmenev; Alexander A. Chinenov
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Some models and codes in imaging and high-current electron optics
Author(s): Valentin Ya. Ivanov
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Discretization of partial differential equations in irregular meshes
Author(s): Erwin K. Kasper
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Optimization of electrostatic lens systems: fast approximate calculation of the imaging properites of einzel lenses
Author(s): Ralf Degenhardt
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Nature of distortions of the surface pattern produced by precise electron-beam processing of insulators
Author(s): Anatoly M. Filachev; Boris I. Fouks; Dmitrii E. Greenfeld
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Electrostatic deflection aberrations studied with ray tracing: a surprising and simple solution proposed
Author(s): Michael W. Retsky
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Modern numerical techniques and software for photo- and thermoemission electron optical systems computer-aided design
Author(s): Mikhail A. Monastyrski; Sergei V. Andreev; Inna S. Gaidukova; Victor A. Tarasov; Anatoly M. Filachev
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