### PROCEEDINGS VOLUME 3155

Charged Particle Optics IIIFormat | Member Price | Non-Member Price |
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Softcover | $105.00 * | $105.00 * |

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.

Volume Details

Volume Number: 3155

Date Published: 25 September 1997

Softcover: 25 papers (274) pages

ISBN: 9780819425775

Date Published: 25 September 1997

Softcover: 25 papers (274) pages

ISBN: 9780819425775

Table of Contents

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Design of a low-brightness highly uniform source for projection electron-beam lithography (SCALPEL)

Author(s): Warren K. Waskiewicz; James Alexander Liddle

Author(s): Warren K. Waskiewicz; James Alexander Liddle

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Design of a magnification and rotation unit with predesign tool POCAD

Author(s): Michael Andrianus Johannes van der Stam; Bas Mertens; Pieter Kruit

Author(s): Michael Andrianus Johannes van der Stam; Bas Mertens; Pieter Kruit

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In-lens deflectors for an LVSEM magnetic immersion objective lens

Author(s): Yan Zhao; Anjam Khursheed

Author(s): Yan Zhao; Anjam Khursheed

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Analysis of off-axis-shaped beam systems for high-throughput electron-beam lithography

Author(s): Xieqing Zhu; Haoning Liu; Eric Munro; John A. Rouse

Author(s): Xieqing Zhu; Haoning Liu; Eric Munro; John A. Rouse

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Mesh refinement for finite-element field computations in electron optics

Author(s): Anjam Khursheed

Author(s): Anjam Khursheed

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Improved 3D boundary charge method for high-accuracy electric field calculation

Author(s): Hidekazu Murata; Toshimi Ohye; Hiroshi Shimoyama

Author(s): Hidekazu Murata; Toshimi Ohye; Hiroshi Shimoyama

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Matrizant method for an optimal synthesis of nonlinear magnetic and electrostatic focusing systems for a given beam current

Author(s): Alexander D. Dymnikov; Genoveva Martinez

Author(s): Alexander D. Dymnikov; Genoveva Martinez

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Compact electrostatic lithography column for nanoscale exposure

Author(s): Tom Chisholm; Haoning Liu; Eric Munro; John A. Rouse; Xieqing Zhu

Author(s): Tom Chisholm; Haoning Liu; Eric Munro; John A. Rouse; Xieqing Zhu

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Novel resist and exposure strategy for high-resolution electron-beam lithography

Author(s): Walter Daumann; Ralf M. Bertenburg; Christophe van den Berg; Franz-Josef Tegude

Author(s): Walter Daumann; Ralf M. Bertenburg; Christophe van den Berg; Franz-Josef Tegude

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Testing printed circuit boards and MCMs with electron beams

Author(s): Auguste B. El-Kareh

Author(s): Auguste B. El-Kareh

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Miniature scanning electron microscope design based upon the use of permanent magnets

Author(s): Anjam Khursheed; John T. L. Thong; J. C. H. Phang; I. P. Ong

Author(s): Anjam Khursheed; John T. L. Thong; J. C. H. Phang; I. P. Ong

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Arbitrary order maps, remainder terms, and long-term stability in particle accelerators

Author(s): Martin Berz; Kyoko Makino

Author(s): Martin Berz; Kyoko Makino

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Computer analysis of imaging energy filters

Author(s): John A. Rouse; Eric Munro; Katsushige Tsuno

Author(s): John A. Rouse; Eric Munro; Katsushige Tsuno

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Influence of the rod diameter of electrostatic quadrupole lenses on the axial field and on the minimum spot size in nonlinear microprobes

Author(s): A. H. Azbaid; Alexander D. Dymnikov; Genoveva Martinez

Author(s): A. H. Azbaid; Alexander D. Dymnikov; Genoveva Martinez

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Spherical aberration correction of a focused ion beam with space charge

Author(s): Jon Orloff

Author(s): Jon Orloff

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Arbitrary order aberrations for elements characterized by measured fields

Author(s): Kyoko Makino; Martin Berz

Author(s): Kyoko Makino; Martin Berz

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Influence of perturbations at distortion and tolerances with regard for their corrections in ion-projection systems

Author(s): Stanislav N. Jatchmenev; Alexander A. Chinenov

Author(s): Stanislav N. Jatchmenev; Alexander A. Chinenov

Some models and codes in imaging and high-current electron optics

Author(s): Valentin Ya. Ivanov

Author(s): Valentin Ya. Ivanov

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Discretization of partial differential equations in irregular meshes

Author(s): Erwin K. Kasper

Author(s): Erwin K. Kasper

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Optimization of electrostatic lens systems: fast approximate calculation of the imaging properites of einzel lenses

Author(s): Ralf Degenhardt

Author(s): Ralf Degenhardt

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Nature of distortions of the surface pattern produced by precise electron-beam processing of insulators

Author(s): Anatoly M. Filachev; Boris I. Fouks; Dmitrii E. Greenfeld

Author(s): Anatoly M. Filachev; Boris I. Fouks; Dmitrii E. Greenfeld

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Electrostatic deflection aberrations studied with ray tracing: a surprising and simple solution proposed

Author(s): Michael W. Retsky

Author(s): Michael W. Retsky

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Modern numerical techniques and software for photo- and thermoemission electron optical systems computer-aided design

Author(s): Mikhail A. Monastyrski; Sergei V. Andreev; Inna S. Gaidukova; Victor A. Tarasov; Anatoly M. Filachev

Author(s): Mikhail A. Monastyrski; Sergei V. Andreev; Inna S. Gaidukova; Victor A. Tarasov; Anatoly M. Filachev

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