Share Email Print
cover

Proceedings of SPIE Volume 3096

Photomask and X-Ray Mask Technology IV
Editor(s): Naoaki Aizaki
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.


Volume Details

Volume Number: 3096
Date Published: 28 July 1997
Softcover: 53 papers (518) pages
ISBN: 9780819425164

Table of Contents
show all abstracts | hide all abstracts
Lithography strategies for 180-nm CMOS device fabrication
Author(s): William H. Arnold
Show Abstract
Plasma etching of Cr photomasks: parametric comparisons of plasma sources and process conditions
Author(s): Chris Constantine; David J. Johnson; Russell J. Westerman; Thomas P. Coleman; Thomas B. Faure
Show Abstract
Thin resist performance comparison for advanced e-beam reticle fabrication
Author(s): Hideo Kobayashi; Takao Higuchi; Keishi Asakawa; Yasunori Yokoya; Kazuhide Yamashiro
Show Abstract
Development of an in-situ cleaning system for an e-beam reticle writer
Author(s): Kenji Ohtoshi; Satoshi Yamasaki; Shuichi Tamamushi; Toru Tojo; Ryoichi Hirano; Yuuji Fukudome; Naoharu Shimomura; Shinsuke Nishimura; Shusuke Yoshitake; Munehiro Ogasawara
Show Abstract
Performance improvement in e-beam reticle writer HL-800M
Author(s): Hidetoshi Satoh; Yasuhiro Someda; Norio Saitou; Katsuhiro Kawasaki; Kazui Mizuno; Yasuhiro Kadowaki; Morihisa Hoga; Takashi Soga
Show Abstract
Cleaning technology of PSM for sub-quarter-micron devices
Author(s): Hitoshi Handa; Masumi Takahashi; Yutaka Miyahara
Show Abstract
Development of a pellicle for use with an ArF excimer laser
Author(s): Shigeto Shigematsu; Hitomi Matsuzaki; Norio Nakayama; H. Mase
Show Abstract
Automated OPC for application in advanced lithography
Author(s): Kurt G. Ronse; Alexander V. Tritchkov; John Randall; Rik M. Jonckheere; Kouros Ghandehari; Luc Van den Hove
Show Abstract
Fast chip-level OPC system on mask database
Author(s): Hidetoshi Ohnuma; Keisuke Tsudaka; Hiroichi Kawahira
Show Abstract
Hierarchical mask data design system (PROPHET) for aerial image simulation, automatic phase-shifter placement, and subpeak overlap checking
Author(s): Eiji Tsujimoto; Takahiro Watanabe; Yoshio Sato; Akemi Moniwa; Yoshinobu Igarashi; Kyoji Nakajo
Show Abstract
Prospects and challenges of ArF excimer laser lithography
Author(s): Masaru Sasago
Show Abstract
Evaluating next-generation reticle demands on lithography equipment
Author(s): Morihisa Hoga; Masahiro Nei; Ryuichi Ebinuma
Show Abstract
Photomask fabrication feasibility for next-generation reticle format
Author(s): Mikio Katsumata; Hiroichi Kawahira; Satoru Nozawa
Show Abstract
Dry etching with consideration to thicker reticle size
Author(s): Eiichi Hoshino; Hideaki Hasegawa; Kunio Shishido; Nobuyuki Yoshioka; Satoshi Aoyama; Atsushi Hayashi; Takaei Sasaki; Michael Hiroyuki Iso; Yasuo Tokoro
Show Abstract
Development of a new pellicle for use with the new generation reticle
Author(s): Masahiro Kondou; T. Tsumoto; Tadaaki Hayashi; Osamu Nagarekawa
Show Abstract
Current status of the SR stepper development
Author(s): Nobutoshi Mizusawa; Yutaka Watanabe; Shinichi Hara; Kenji Saitoh; Hiroshi Maehara; Mitsuaki Amemiya; Shunichi Uzawa
Show Abstract
Antireflection and opaque coating film materials for Ta/SiC x-ray masks
Author(s): Yoshihisa Iba; Fumiaki Kumasaka; Hajime Aoyama; Takao Taguchi; Masaki Yamabe
Show Abstract
Improving stress stability of Ta film for x-ray mask absorbers
Author(s): Masatoshi Oda; Miho Sakatani; Shingo Uchiyama; Tadahito Matsuda
Show Abstract
Silicon projection mask-making technology for e-beam lithography
Author(s): Isao Amemiya; Kazuhiro Ohhashi; S. Yasumatsu; Shigekazu Matsui; Osamu Nagarekawa
Show Abstract
ArF excimer-laser exposure durability of chromium-fluoride-attenuated phase-shift masks
Author(s): Yuko Seki; Jun Ushioda; Takashi Saito; Katsumi Maeda; Kaichiro Nakano; Shigeyuki Iwasa; Takeshi Ohfuji; Hiroshi Tanabe
Show Abstract
Stability of CrFx films for phase-shifting mask
Author(s): Eunah Kim; Seungbum Hong; Zhong-Tao Jiang; Sung-Chul Lim; Sang-Gyun Woo; Young-Bum Koh; Kwangsoo No
Show Abstract
Effect of lens aberration on hole pattern fabrication using halftone phase-shifting masks
Author(s): Akihiro Otaka; Yoshio Kawai; Yutaka Sakakibara
Show Abstract
Development of focused-ion-beam repair for quartz defects on alternating phase-shift masks
Author(s): Masami Matsumoto; Tsukasa Abe; Toshifumi Yokoyama; Hiroyuki Miyashita; Naoya Hayashi; Hisatake Sano
Show Abstract
Chemically enhanced focused-ion-beam (FIB) repair of opaque defects on chrome photomasks
Author(s): J. David Casey; Andrew F. Doyle; Diane K. Stewart; David C. Ferranti
Show Abstract
Performance of cell-shift defect inspection technique
Author(s): Yasutaka Morikawa; Takashi Ogawa; Katsuhide Tsuchiya; Shigeru Noguchi; Katsuyoshi Nakashima
Show Abstract
New die-to-database mask inspection system with i-line optics for 256-Mbit and 1-Gbit DRAMs
Author(s): Mitsuo Tabata; Kyoji Yamashita; Hideo Tsuchiya; Takehiko Nomura; Hiromu Inoue; Tomohide Watanabe; Toru Tojo; Hisakazu Yoshino
Show Abstract
Application of image-processing software to characterize the photomask key parameters for future technologies
Author(s): An Tran; Michael R. Schmidt; Jeff N. Farnsworth; Pei-yang Yan
Show Abstract
Advanced mask metrology system for up to 4-Gbit DRAM
Author(s): Taro Ototake; Eiji Matsubara; Keiichi Hosoi
Show Abstract
Application of charge-dispersing layer to reticle fabrication
Author(s): Kotaro Shirabe; Eiichi Hoshino; Keiji Watanabe
Show Abstract
CD variation sources of photomask
Author(s): Byung Guk Kim; Seong-Woon Choi; Yong Hun Yu; Hee-Sun Yoon; Jung-Min Sohn
Show Abstract
Improvement of ZEN 4100
Author(s): Noriyuki Mitao; Nobunori Abe; Atsushi Kawata; Kiyoshi Tanaka; Yuhichi Yamamoto; Toshikatsu Minagawa; Masahiro Uraguchi; Michio Ogawa
Show Abstract
Post apply bake optimization for 6025 masks
Author(s): Peter D. Buck; Robert A. Holmstrom
Show Abstract
Analysis of x-ray mask distortion
Author(s): Yuusuke Tanaka; Takuya Yoshihara; Shinji Tsuboi; Kiyoshi Fujii; Katsumi Suzuki
Show Abstract
Repairing Ta absorber x-ray masks with gas-assisted focused-ion-beam etching
Author(s): Ikuo Okada; Yasunao Saitoh; Makoto Hamashima; Misao Sekimoto; Tadahito Matsuda
Show Abstract
Mask bias effects in e-beam cell projection lithography
Author(s): Takahiro Ema; Hiroshi Yamashita; Ken Nakajima; Hiroshi Nozue
Show Abstract
Large assist feature phase-shift mask for sub-quarter-micrometer window pattern formation
Author(s): Shinji Ishida; Tadao Yasuzato; Hiroyoshi Tanabe; Kunihiko Kasama
Show Abstract
Leaking light through embedded shifter-type opaque ring for attenuated phase-shift mask
Author(s): Shoichi Hirooka; Shigeru Hasebe; Tomohiro Tsutsui; Shigeki Nojima; Hisako Aoyama; Hidehiro Watanabe
Show Abstract
Zr-based films for attenuated phase-shift mask
Author(s): Tadashi Matsuo; Kinji Ohkubo; Takashi Haraguchi; Kohsuke Ueyama
Show Abstract
Proposal for pattern layout rule in application of alternating phase-shift mask
Author(s): Akihiro Nakae; Shuji Nakao; Yasuji Matsui
Show Abstract
Effect of phase error on 180-nm and 250-nm grouped-line KrF lithography using an alternating phase-shift mask
Author(s): John S. Petersen; Alvina M. Williams; Georgia K. Rich; Daniel A. Miller; Arturo M. Martinez
Show Abstract
0.35-um i-line attenuated phase-shift mask (PSM) repair by focused-ion-beam technology
Author(s): Mark L. Raphaelian; M. F. Ellis; David C. Ferranti; Diane K. Stewart
Show Abstract
Focused-ion-beam (FIB) etching of quartz and carbon for Levenson mask repair
Author(s): Hiroko Nakamura; Haruki Komano; Iwao Higashikawa
Show Abstract
Characterization of an advanced performance reticle defect inspection algorithm
Author(s): James N. Wiley; Christopher M. Aquino; Douglas V. Burnham; Anthony Vacca
Show Abstract
Image sensing method and defect detection algorithm for a 256-Mbit and 1-Gbit DRAM mask inspection system
Author(s): Hiromu Inoue; Kentaro Okuda; Takehiko Nomura; Hideo Tsuchiya; Mitsuo Tabata
Show Abstract
Database inspection capability for the high-grade device
Author(s): NamKyu Park; Hwa-Sup Bae; Jong-woon Chang; Seung-Woo Yoo
Show Abstract
Real-time line-width measurements: a new feature for reticle inspection systems
Author(s): Yair Eran; Gad Greenberg; Amnon Joseph; Cornel Lustig; Eyal Mizrahi
Show Abstract
Evaluation results of the novel reticle pattern defect inspection system for 1-Gbit device
Author(s): Daikichi Awamura; Katsuyoshi Nakashima; Yasunori Hada; Takayoshi Matsuyama; Kenichi Kobayashi
Show Abstract
Proximity effect correction for reticle fabrication
Author(s): Takashi Kamikubo; Takayuki Abe; Susumu Oogi; Hirohito Anze; Mitsuko Shimizu; Masamitsu Itoh; Tetsuro Nakasugi; Tomohiro Iijima; Yoshiaki Hattori
Show Abstract
Automated method to check sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks
Author(s): Kyoji Nakajo; Junya Sakemi; Akemi Moniwa; Tsuneo Terasawa; Norio Hasegawa; Eiji Tsujimoto
Show Abstract
New mask data processing system for ULSI fabrication
Author(s): Ryuji Takenouchi; Hidetoshi Ohnuma; Isao Ashida; Satoru Nozawa
Show Abstract
Correcting method for mechanical vibration in electron-beam lithography system
Author(s): Hiroshi Tsuji; Hiroya Ohta; Hidetoshi Satoh; Koji Nagata; Norio Saitou
Show Abstract
Multipass gray printing for the new MEBES 4500S mask lithography system
Author(s): Frank E. Abboud; Robert L. Dean; Janine J. Doering; W. Eckes; Mark A. Gesley; Ulrich Hofmann; Terry Mulera; Robert J. Naber; M. Pastor; Wayne Phillips; John Raphael; Frederick Raymond; Charles A. Sauer
Show Abstract
Development of an electron-beam optical column for the mask lithography system
Author(s): Tadashi Komagata; Yasutoshi Nakagawa; Hitoshi Takemura; Nobuo Gotoh
Show Abstract

© SPIE. Terms of Use
Back to Top