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Proceedings of SPIE Volume 2992

Excimer Lasers, Optics, and Applications
Editor(s): Harry Shields; Peter E. Dyer
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Volume Details

Volume Number: 2992
Date Published: 31 March 1997
Softcover: 19 papers (168) pages
ISBN: 9780819424037

Table of Contents
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Excimer lasers for material ablation cross the 1.5 kHz mark
Author(s): Rainer Paetzel; Uwe Stamm; Igor Bragin; Frank Voss; Bernard K. Nikolaus; Heinrich Endert; Dirk Basting
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Small excimers opening up new industrial applications
Author(s): Glenn Ogura; Rod Andrew
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Performance characteristics of a high-energy, high-pulse repetition frequency krypton fluoride laser
Author(s): Tom A. Watson; Richard Ujazdowski; Palash P. Das
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Coaxial, cylindrical, and planar UV excilamps pumped by glow or barrier discharge
Author(s): Victor F. Tarasenko; Mikhail I. Lomaev; Alexei N. Panchenko; Edward A. Sosnin
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Optimization of 200-W excimer laser for TFT annealing
Author(s): V. Pfeufer; Frank Voss; Bruno Becker-de Mos; Uwe Stamm; Heinrich Endert; Dirk Basting
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High-average-power picosecond-pulse excimer laser system for x-ray generation
Author(s): Michael F. Powers; Harry Shields
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UV and gas interactions in an enclosed 193-nm excimer laser beamline
Author(s): David J. Elliot; Jonathan C. Camp; Warren C. Harlow; Victor J. Dosoretz; Daniel Behr; Glen P. Callahan; Scott Flint
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Improved off-axis pulsed laser deposition method
Author(s): Narumi Inoue; Tatsuya Ozaki; Toshiaki Monnaka; Shigeru Kashiwabara; Ryozo Fujimoto
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Optical characterization of binary, tertiary, and quaternary II-VI semiconductor thin films prepared by pulsed excimer laser deposition
Author(s): Lowell R. Matthews; Robert L. Parkhill; Edward T. Knobbe
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Surface texturing of aluminum alloy 2024 via excimer laser irradiation
Author(s): Robert L. Parkhill; Edward T. Knobbe
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Processing applications with the 157-nm fluorine excimer laser
Author(s): Peter R. Herman; Keith R. Beckley; Brian C. Jackson; Kou Kurosawa; David Moore; Takayuki Yamanishi; Jianhao Yang
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Excimer ablation lithography (EAL) for TFT-LCD
Author(s): Kenkichi Suzuki; Masaaki Matsuda; Toshio Ogino; Nobuaki Hayashi; Takao Terabayashi; Kyouko Amemiya
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Excimer laser machining of advanced materials
Author(s): Hans Kurt Toenshoff; Ferdinand von Alvensleben; Peter B. Heekenjann; Guido Willmann
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Morphological surface change of elastomers by excimer laser ablation
Author(s): Akira Yabe; Hiroyuki Niino; Shigeyuki Ono; Yoshinori Sato
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Polyurethane resins as resist materials for excimer ablation lithography (EAL)
Author(s): Nobuaki Hayashi; Kenkichi Suzuki; Masaaki Matsuda; Toshio Ogino; Yoshifumi Tomita
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Photopolymers designed for high-resolution laser ablation at a specific irradiation wavelength
Author(s): Thomas K. Lippert; L. S. Bennett; Thilo Kunz; Christina Hahn; Alexander J. Wokaun; H. Furutani; H. Fukumura; Hiroshi M. Masuhara; T. Nakamura; Akira Yabe
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Excimer-laser-irradiated phase masks for grating formation
Author(s): Robert J. Farley; Peter E. Dyer; Roswitha Giedl
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General machining concept for producing micro-optics with high-power UV lasers
Author(s): Hans Kurt Toenshoff; Ludger Overmeyer; Andreas Ostendorf; Johannes Wais
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