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PROCEEDINGS VOLUME 2884

16th Annual BACUS Symposium on Photomask Technology and Management
Editor(s): Gilbert V. Shelden; James A. Reynolds

*This item is only available on the SPIE Digital Library.


Volume Details

Volume Number: 2884
Date Published: 27 December 1996

Table of Contents
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History and future of mask making
Author(s): Ken L. Levy
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Investigation of multiphase printing writing modes on mask performance in MEBES 4500
Author(s): Mahesh Chandramouli; Jim DeWitt; Gary Meyers; J. Millino; David H. Hwang
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Benchmark study of mask writer lithography systems
Author(s): Lawrence Weins; Wayne Smith
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Evaluation criteria for e-beam mask writing systems
Author(s): Sheldon M. Kugelmass; John T. Poreda; Carl M. Rose
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On-product metrology results from MEBES 4-TFE System
Author(s): Christopher P. Braun; Frederick R. Peiffer
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Improved PBS process for e-beam photomask lithography
Author(s): Wayne P. Shen; James W. Marra; Douglas J. Van Den Broeke
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Process optimization for thin resists for advanced e-beam reticle fabrication
Author(s): Hideo Kobayashi; Takao Higuchi; Kazuhide Yamashiro; Keishi Asakawa
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Chemically amplified resist process for 0.25-um-generation photomasks
Author(s): Mikio Katsumata; Hiroichi Kawahira; Minoru Sugawara; Satoru Nozawa
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Plasma etching of Cr films in the fabrication of photomasks: II. a comparison of etch technologies and a first look at defects
Author(s): Thomas P. Coleman; Peter D. Buck; David J. Johnson
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Pinhole defect detection and printability prediction
Author(s): Franklin D. Kalk; Anthony Vacca; Peter Radcliff
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Contamination removal from photomasks using a dry laser-assisted cleaning technology
Author(s): Audrey C. Engelsberg
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Performance of gas-assisted FIB repair for opaque defects
Author(s): Yasushi Satoh; Hiroshi Nakamura; Junji Fujikawa; Katsuhide Tsuchiya; Shigeru Noguchi; Kazuo Aita; Anto Yasaka
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Mask inspection and real-time linewidth measurements
Author(s): Yair Eran; Gad Greenberg; Amnon Joseph
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Subhalf-micron mask defect detectability and printability at 1X reticle magnification
Author(s): Dan L. Schurz; Warren W. Flack; Gary Newman
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1996 mask industry quality assessment
Author(s): Timothy Eichenseer; Chris Bishop
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Through pellicle coordinate metrology
Author(s): Hiroaki Okamoto; David E. Kettering
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Evaluation of a new photomask CD metrology tool
Author(s): Leonard F. Dubuque; Nicholas G. Doe; Patrick St. Cin
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Critical dimension photomask metrology tool requirements for 0.25 um and future microlithography
Author(s): Michael R. Schmidt; An Tran
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Phase measurement using Hg-Xe lamp and KrF excimer laser
Author(s): Katsuki Oohashi; Takeshi Fujiwara; Takehiko Nomura; Akira Ono
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Application of alternating phase-shifting masks to 200-nm contact holes
Author(s): Sung-Chul Lim; Sang-Gyun Woo; Chun-Geun Park; Young-Bum Koh
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Materials screening for attenuating embedded phase-shift photoblanks for DUV and 193-nm photolithography
Author(s): Peter F. Carcia; Roger H. French; Kenneth G. Sharp; Jeff S. Meth; Bruce W. Smith
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Patterning of membrane masks for projection e-beam lithography
Author(s): Linus A. Fetter; Christopher J. Biddick; Myrtle I. Blakey; James Alexander Liddle; Milton L. Peabody Jr.; Anthony E. Novembre; Donald M. Tennant
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4X reticles with 3% linewidth control for the development of 0.18-um lithography
Author(s): Rik M. Jonckheere; Jozef Moonens; Goedele Potoms; Inga Bovie; Luc Van den Hove
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Optimization of lithography and CD control using GHOST proximity correction with a MEBES 4500 system
Author(s): Robert L. Dean
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Lithography tricks and tribulations
Author(s): Joseph G. Garofalo; Pat G. Watson; Lee E. Trimble; Raymond A. Cirelli; Albert Colina; Ilya M. Grodnensky; B. Herrero; A. Dunbar; Frederick R. Peiffer; R. Takahashi; Regine G. Tarascon-Auriol; Willie J. Yarbrough; Ludwik J. Zych
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Mask fabrication rules for proximity-corrected patterns
Author(s): Michael L. Rieger; John P. Stirniman
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Application of direct-write electron-beam lithography for deep-submicron fabrication
Author(s): Shyi-Long Shy; Jen Yu Yew; Kazumitsu Nakamura; Chun-Yen Chang
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Improved pattern placement in membrane mask making
Author(s): F. Keith Perkins; Christie R. Marrian; Martin C. Peckerar
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Data-processing improvements for photomask pattern generators
Author(s): James L. Speidell; Steven A. Cordes; A. Ferry
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Performance data obtained on a new mask metrology tool
Author(s): Klaus-Dieter Roeth; Carola Blaesing-Bangert; John M. Whittey
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Comparison of reticle placement performance using two-point and multipoint fitting algorithms
Author(s): Henry Chris Hamaker; Jerry Martyniuk; Robert M. Sills; Jeffrey K. Varner; Keith P. Standiford
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Overlay can be improved by self-calibrated XY measuring instrument: a lattice perspective
Author(s): Michael R. Raugh; Syed A. Rizvi
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Application of deep-UV attenuated PSM to 0.2-um contact hole patterning technology
Author(s): Il-Ho Lee; Seo-Min Kim; Chang-Nam Ahn; Ki-Ho Baik
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Low-cost mask for excimer laser projection ablation
Author(s): James L. Speidell; Rajesh S. Patel; Steven A. Cordes
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Development of deep-UV MoSi-based embedded phase-shifting mask (EPSM) blanks
Author(s): Masao Ushida; Masaru Mitsui; Kimihiri Okada; Yasushi Okubo; Hideki Suda; Hideo Kobayashi; Keishi Asakawa
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Evaluation of a fast and flexible OPC package: OPTISSIMO
Author(s): Wilhelm Maurer; Thomas Waas; Hans Eisenmann
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Efficiency analysis of mask fabrication with 1-Gb-DRAM storage node layer
Author(s): Oscar Han; Byeong-Chan Kim; Hong-Bae Park; In-Seok Lee
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Advances in process matching for rules-based optical proximity correction
Author(s): Oberdan W. Otto; Richard C. Henderson
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SELID: a new 3D simulator for e-beam lithography
Author(s): Anja Rosenbusch; Nikos Glezos; Magdalena Kalus; Ioannis Raptis
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FIB repair of opaque defects for 64-Mb-DRAM-level binary masks
Author(s): Kyung Hee Lee; Hanku Cho; Jin-Hong Park; Yonghoon Kim; Hee-Sun Yoon; Jung-Min Sohn
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Conducting poly(aniline-co-N-propanesulfonic acid aniline) (PAPSAH) as charge dissipation layer for e-beam lithography
Author(s): Shyi-Long Shy; T. S. Chao; Tan Fu Lei; Shaw-An Chen; Wen-An Loong; Chun-Yen Chang
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Correction method for radial effect caused by spin process
Author(s): Jin-Min Kim; Seong-Woon Choi; Byung-Cheol Cha; Hee-Sun Yun; Jung-Min Sohn
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Improvement of CD uniformity with PBS by optimizing the crossover development step
Author(s): Robert L. Dean; Charles A. Sauer
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Development of the halftone phase-shift mask for DUV exposure
Author(s): Koichi Mikami; Hiroshi Mohri; Norihito Itoh; Hiroyuki Miyashita; Naoya Hayashi; Hisatake Sano
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Digital interface to photomask vendors
Author(s): Jane L. Wachinski; William R. Tennis
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Soft-defect inspection equipment based on DIC technique
Author(s): Tsuneyuki Hagiwara
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Photolithography challenges for the micromachining industry
Author(s): David Craven
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Review of defect round table at Photomask Japan '96
Author(s): Hiroichi Kawahira; James N. Wiley
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Detectability and printability of programmed defects in the contact layer for 256-Mb-DRAM grade reticle
Author(s): Yonghoon Kim; Jin-Hong Park; Kyung Hee Lee; Hanku Cho; Hee-Sun Yoon
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Mask specifications for 193-nm lithography
Author(s): Wilhelm Maurer
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Reticle cleanliness and handling issues in submicron wafer fabrication
Author(s): Michael E. Kling
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Alternating phase-shift generation for complex circuit designs
Author(s): Gerald Galan; Frederic P. Lalanne; Michel Tissier; Marc Belleville
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Advanced model for resist heating effect simulation in electron-beam lithography
Author(s): Sergey V. Babin; V. V. Kozunov; Igor Yu. Kuzmin
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Exposure of the OCG895i resist at the visible 413-nm Kr-ion line in a laser maskwriter
Author(s): Torbjoern Sandstrom; Peter Henriksson
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