Share Email Print
cover

Proceedings of SPIE Volume 2880

Microlithography and Metrology in Micromachining II
Editor(s): Michael T. Postek; Craig R. Friedrich
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.


Volume Details

Volume Number: 2880
Date Published: 13 September 1996
Softcover: 31 papers (306) pages
ISBN: 9780819422781

Table of Contents
show all abstracts | hide all abstracts
Review on the importance of measurement technique in micromachine technology
Author(s): Akira Umeda
Show Abstract
Material property measurements of micromechanical polysilicon beams
Author(s): Raj K. Gupta; Peter M. Osterberg; Stephen D. Senturia
Show Abstract
Analysis of fixed-fixed beam test structures
Author(s): Janet C. Marshall; David T. Read; Michael Gaitan
Show Abstract
Measurements of fracture strength and Young's modulus of surface-micromachined polysilicon
Author(s): David T. Read; Janet C. Marshall
Show Abstract
uS-THERMANAL: an efficient thermal simulation tool for microsystem elements and MCM's
Author(s): Vladimir Szekely; A. Csendes; Marta Rencz
Show Abstract
New test structures and techniques for measurement of mechanical properties of MEMS materials
Author(s): William N. Sharpe; Bin Yuan; Ranji Vaidyanathan; Richard L. Edwards
Show Abstract
Investigation on the frequency response characteristics of an instrument for laser vibrometry and laser displacementmetry
Author(s): Akira Umeda; Kazunaga Ueda
Show Abstract
Microstructures designed for shock robustness
Author(s): Shawn J. Cunningham; David McIntyre; Judd Carper; Paul Jaramillo; William C. Tang
Show Abstract
Mechanical characterization of shape memory micromaterials
Author(s): Manfred Kohl; K. D. Skrobanek; C. M. Goh; David M. Allen
Show Abstract
Davies bar as the reference for impact acceleration metrology
Author(s): Akira Umeda; Kazunaga Ueda
Show Abstract
Fabrication of composite x-ray masks by micromilling
Author(s): Philip J. Coane; Craig R. Friedrich
Show Abstract
New certified length scale for microfabrication metrology
Author(s): James E. Potzick
Show Abstract
Critical dimension metrology for MEMS processes using electrical techniques
Author(s): Richard A. Allen; Janet C. Marshall
Show Abstract
Multiexposure capability development for deep x-ray lithography for MEMS
Author(s): Chantal G. Khan Malek; Robert L. Wood; Bruce W. Dudley; Zhong Geng Ling; Volker Saile
Show Abstract
Beamline and exposure station for deep x-ray lithography at the advanced photon source
Author(s): Barry P. Lai; Derrick C. Mancini; Wenbing Yun; Efim S. Gluskin
Show Abstract
Cyanoacrylate bonding of thick resists for LIGA
Author(s): James G. Rogers; Christophe Marques; Kevin W. Kelly; Venkat Sangishetty; Chantal G. Khan Malek
Show Abstract
Temperature rise in thick PMMA resists during x-ray exposure
Author(s): Harish M. Manohara; Gina M. Calderon; J. Michael Klopf; Kevin J. Morris; Olga Vladimirsky; Yuli Vladimirsky
Show Abstract
LIGA-based family of tips for scanning probe applications
Author(s): Sandeep Akkaraju; Yohannes M. Desta; BenQiang Li; Michael C. Murphy; Olga Vladimirsky; Yuli Vladimirsky
Show Abstract
Dimensional variation and roughness of LIGA fabricated microstructures
Author(s): Charles M. Egert; Robert L. Wood; Chantal G. Khan Malek
Show Abstract
Design, fabrication, and testing of polysilicon microheaters in silicon
Author(s): Naveen George; Ashok Srivastava
Show Abstract
Multilevel 3D patterning of stacked PMMA sheets for x-ray microlithography
Author(s): Gina M. Calderon; Kevin J. Morris; Olga Vladimirsky; Yuli Vladimirsky
Show Abstract
Microsystem design framework based on tool adaptations and library developments
Author(s): Jean Michel Karam; Bernard Courtois; Marta Rencz; Andras Poppe; Vladimir Szekely
Show Abstract
Fabrication of microstructures by ion beam micromachining
Author(s): Sam T. Davies; D. A. Hayton; Kazuyoshi Tsuchiya
Show Abstract
Lateral force microscopy using cantilevers with integrated Wheatstone bridge piezoresistive deflection sensor
Author(s): Teodor Gotszalk; Ivo W. Rangelow; Piotr Dumania; Piotr B. Grabiec
Show Abstract
Cantilever with integrated Wheatstone bridge piezoresistive deflection sensor: analysis of force interaction measurement sensitivity
Author(s): Teodor Gotszalk; Ivo W. Rangelow; Piotr Dumania; Piotr B. Grabiec
Show Abstract
Measurements of stress-strain diagrams of thin films by a developed tensile machine
Author(s): Hirofumi Ogawa; Yuichi Ishikawa; Tokio Kitahara; Shinji Kaneko
Show Abstract
Transient thermal analysis of micromachined silicon bridge
Author(s): Hiroyasu Yuasa; Seishiro Ohya; Shiro Karasawa; Setsuo Kodato; Kenji Akimoto
Show Abstract
Fabrication of mm-wave undulator/linear accelerator cavities using deep x-ray lithography
Author(s): Joshua J. Song; Y. W. Kang; Robert L. Kustom; Barry P. Lai; Derrick C. Mancini; A. Nassiri; V. White
Show Abstract
New array lens optical system for large-area micromachining lithography
Author(s): Lawrence C. Wang; David A. Markle; Raymond J. Ellis; Hwan J. Jeong
Show Abstract
Application of micromachining technology to optical devices and systems
Author(s): H. Fujita
Show Abstract
Commercializing MEMS--too fast or too slow?
Author(s): S. Walsh; W. N. Carr; H. Mados; D. S. Narang
Show Abstract

© SPIE. Terms of Use
Back to Top