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Proceedings of SPIE Volume 2862

Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays
Editor(s): John C. Stover
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Softcover $105.00 * $105.00 *

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Volume Details

Volume Number: 2862
Date Published: 4 November 1996
Softcover: 19 papers (196) pages
ISBN: 9780819422507

Table of Contents
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Silicon wafer specifications and characterization capabilities: another perspective
Author(s): Randal K. Goodall
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Proposed methodology for characterization of microroughness-induced optical scatter instrumentation
Author(s): Thomas A. Germer; Clara C. Asmail
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Morphology of silicon wafer surfaces: a comparative study with atomic force microscopy and other techniques
Author(s): Peter Wagner; H. A. Gerber; D. Graef; R. Schmolke; M. Suhren
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Fast and accurate roughness characterization techniques for wafers and hard disks
Author(s): Hendrik Rothe; Andre Kasper
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Method to improve the accuracy of super-smooth surface scatter data
Author(s): Yoshitate Takakura; Mohamed Tahar Sehili; Patrick Meyrueis
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Application of off-specular x-ray reflectivity for surface characterization
Author(s): Wen-li Wu
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Surface haze in the Stokes-Mueller representation
Author(s): Eugene L. Church; John C. Stover
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Requirements and suggestions for an industrial smooth surface microroughness standards
Author(s): John C. Stover
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Development of a physical haze and microroughness standard
Author(s): Bradley W. Scheer
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Confocal microscope 3D visualizing method for fine surface characterization of microstructures
Author(s): Yoshiharu Ichikawa; Jun-ichiro Toriwaki
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Selection of calibration particles for scanning surface inspection systems
Author(s): George W. Mulholland; Nelson Bryner; Walter Liggett; Bradley W. Scheer; Randal K. Goodall
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Utilization of near specular energy in the detection of surface defects
Author(s): Kevin Welch
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Comparison of experimentally measured differential scattering cross sections of PSL spheres on flat surfaces and patterned surfaces
Author(s): Greg W. Starr; E. Dan Hirleman
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Modeling of light scattering from structures with particle contaminants
Author(s): Brent Martin Nebeker; Greg W. Starr; E. Dan Hirleman
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Requirements of measurement equipment for silicon wafers
Author(s): Peter Wagner; H. A. Gerber; R. Schmolke; R. Velten
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Large flat panel profiler
Author(s): Klaus R. Freischlad
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Flatness measurement by reflection moire technique
Author(s): Hisatoshi Fujiwara; Yukitoshi Otani; Toru Yoshizawa
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New method of surface characterization with a single-mode fiber to thin film coupler
Author(s): Alok Kumar Das; Amar K. Ganguly; Anawar Hussain; Shila Ghosh; Bharat P. Choudhury

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