Share Email Print
cover

PROCEEDINGS VOLUME 2793

Photomask and X-Ray Mask Technology III
Editor(s): Hideo Yoshihara

*This item is only available on the SPIE Digital Library.


Volume Details

Volume Number: 2793
Date Published: 24 July 1996

Table of Contents
show all abstracts | hide all abstracts
Bilevel resist process for 1-Gb DRAM reticles
Author(s): Kotaro Shirabe; Eiichi Hoshino; Keiji Watanabe
Show Abstract
Manufacturing feasibility of OPC masks for 0.25-um rule devices
Author(s): Hiroichi Kawahira; Mikio Katsumata; Keisuke Tsudaka; Akihiro Ogura; Manabu Tomita; Satoru Nozawa
Show Abstract
Fabrication of dense contact patterns using halftone phase-shifting mask with off-axis illumination
Author(s): Hyoungjoon Kim; Jongwook Kye; Dae-Yup Lee; Sang-Gyun Woo; Hoyoung Kang; Young-Bum Koh
Show Abstract
Mask technology for 0.18-um device generation
Author(s): Jung-Min Sohn; Seong-Woon Choi; Byung Guk Kim; Hanku Cho; Hee-Sun Yoon
Show Abstract
Development of advanced process for halftone phase-shift mask fabrication with electron-beam exposure systems
Author(s): Minoru Komada; Masa-aki Kurihara; Shiho Sasaki; Takamitsu Makabe; Naoya Hayashi
Show Abstract
Evaluation of phase and transmittance error on deep-UV halftone phase-shift mask
Author(s): Suigen Kyoh; Hideaki Sakurai; Takayuki Iwamatsu; Akiko Yamada; Iwao Higashikawa
Show Abstract
Chemically amplified resist process for 0.25-um generation photomasks
Author(s): Mikio Katsumata; Hiroichi Kawahira; Minoru Sugawara; Satoru Nozawa
Show Abstract
Current status of x-ray mask manufacturing at the Microlithographic Mask Development Center
Author(s): Kurt R. Kimmel; Patrick J. Hughes
Show Abstract
Highly stiff x-ray mask blank with heat resistance and inertness to chemicals
Author(s): Kenji Marumoto; Hideki Yabe; Sunao Aya; Koji Kise; Seiichi Tanji; Nobuyuki Minami
Show Abstract
Cleaning process for x-ray masks
Author(s): Yasunao Saitoh; Takashi Ohkubo; Ikuo Okada; Misao Sekimoto; Tadahito Matsuda
Show Abstract
Study on x-ray irradiation stability of absorber materials for x-ray masks by stress measurement
Author(s): Kinya Ashikaga; Shinji Tsuboi; Yoshio Yamashita; Shinji Sugihara; Yoshio Gomei; Tsutomu Shoki; Yoichi Yamaguchi; Tsuneaki Ohta
Show Abstract
Defect printability analysis in electron-beam cell projection lithography
Author(s): Katsuyuki Itoh; Hiroshi Yamashita; Takahiro Ema; Hiroshi Nozue
Show Abstract
DOF enhancement effect of attenuated assist feature
Author(s): Shinji Ishida; Shuichi Hashimoto; Tadao Yasuzato; Kunihiko Kasama
Show Abstract
Pattern shift error induced by coating and developing
Author(s): Shusuke Yoshitake; Kazuto Matsuki; Ryoichi Hirano; Toru Tojo
Show Abstract
Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure
Author(s): Seungbum Hong; Eunah Kim; Zhong-Tao Jiang; Byeong-Soo Bae; Kwangsoo No; Woosuck Shin; Sung-Chul Lim; Sang-Gyun Woo; Young-Bum Koh
Show Abstract
Resolution enhancement with thin Cr for chrome mask making
Author(s): Byung-Cheol Cha; Seong-Woon Choi; Jin-Min Kim; Hanku Cho; Jung-Min Sohn
Show Abstract
PBS process optimization for bow-wake phenomena
Author(s): Do Yon Kim; Y. I. Lee; W. S. Kim
Show Abstract
New concept for negative-tone electron-beam resist
Author(s): Yasumasa Wada; Motofuni Kashiwagi; H. Tanaka; Atsushi Kawata; Kiyoto Tanaka; Yuhichi Yamamoto
Show Abstract
Photomask blanks enhancement by optimizing resist baking and coating for advanced e-beam reticle fabrication
Author(s): Takao Higuchi; Hideo Kobayashi; Kazuhide Yamashiro; Keishi Asakawa; Yasunori Yokoya
Show Abstract
Evaluation of performance of attenuated phase-shift mask using simulation
Author(s): Yuhichi Fukushima; Nobuhiko Fukuhara; Kohsuke Ueyama
Show Abstract
(LaNiO3)x(Ta2O5)1-x oxide thin films for attenuated phase-shifting mask blank
Author(s): C. C. Cheng; T. B. Wu; J. Y. Gan; Laurent C. Tuo; Jia-Jing Wang
Show Abstract
Ta-Si-O absorptive shifter for the attenuated phase-shifting mask
Author(s): Y. S. Yan; C. C. Cheng; C. L. Lin; J. Y. Gan; T. B. Wu; Laurent C. Tuo; Jia-Jing Wang
Show Abstract
Subquarter-micron lithography with dual-trench-type alternating PSM
Author(s): Hideki Kanai; Kenji Kawano; Satoshi Tanaka; Eishi Shiobara; Masami Aoki; Ikuo Yoneda; Shinichi Ito
Show Abstract
Simulation of x-ray mask displacement by absorber and membrane stress
Author(s): Tsuneaki Ohta; Shuichi Noda; Masanori Kasai; Hiroshi Hoga
Show Abstract
Characteristics of Ta4B/SiC x-ray mask blanks
Author(s): Ryo Ohkubo; Tsutomu Shoki; Hideaki Mitsui; Noromichi Annaka; Yoichi Yamaguchi
Show Abstract
Diamond membrane for x-ray lithography
Author(s): Hitoshi Noguchi; Meguru Kashida; Yoshihiro Kubota; Takayuki Takarada
Show Abstract
Pattern-data preparation method to enchance high-throughput mask fabrication in variable-shaped e-beam writing system
Author(s): Shigehiro Hara; Eiji Murakami; Shunko Magoshi; Kiyomi Koyama; Hirohito Anze; Yoji Ogawa; A. Kabeya; S. Ooki; Tamaki Saito; T. Fujii; S. Sakamoto; Hiromi Suzuki; Mitsuhiro Yano; Sadakazu Watanabe
Show Abstract
Geometrical library recognition for mask data compression
Author(s): Robert Veltman; Isao Ashida
Show Abstract
Parallel photomask pattern data conversion and verification system
Author(s): Yasunori Kanai; Toshiji Shimada; Kazunari Sekigawa; Makoto Nishi; Yasufumi Ishihara; Jun-ichi Mori; Satoshi Akutagawa; Kazuhiko Takahashi; Touru Miyauchi
Show Abstract
Recent progress in repair accuracy of the focused ion-beam mask repair system
Author(s): Kazuo Aita; Anto Yasaka; Tadashi Kitamura; Hiroshi Matsumura; Yasushi Satoh; Hiroshi Nakamura; Junji Fujikawa; Katsuhide Tsuchiya; Shigeru Noguchi
Show Abstract
Focused ion-beam imaging of defects on deep-UV single-layer halftone masks
Author(s): Hiroko Nakamura; Haruki Komano; Kazuyoshi Sugihara; T. Koike; Iwao Higashikawa
Show Abstract
Detectability and printability of programmed defect reticle for 256-Mb DRAM
Author(s): Jin-Hong Park; Hanku Cho; Yonghoon Kim; Kyung Hee Lee; Hee-Sun Yoon
Show Abstract
DUV printability of laser repairs on binary and attenuated phase-shift masks
Author(s): James A. Reynolds; Franklin M. Schellenberg; Michael S. Hibbs; Dennis Hayden
Show Abstract
Transmittance measurement with interferometer system
Author(s): Hideo Takizawa; Haruhiko Kusunose; Naoki Awamura; Kouji Miyazaki; Takahiro Ode; Daikichi Awamura
Show Abstract
Performance of i- and g-line phase-shift measurement system MPM-100
Author(s): Hiroshi Fujita; Hisatake Sano; Haruhiko Kusunose; Hideo Takizawa; Kouji Miyazaki; Naoki Awamura; Takahiro Ode; Daikichi Awamura
Show Abstract
CD metrology microscope SiSCAN 7325TQ for back-side measurement
Author(s): Masaru Morita; Shigeru Tachikawa; Mikio Iida
Show Abstract
Improvement of pattern position accuracy with the LMS2020
Author(s): Takehiko Okada; H. Yamazaki; Yoji Tono-oka; Haruo Kinoshita
Show Abstract
New figure-fracturing algorithm for high-quality variable-shaped e-beam exposure data generation
Author(s): Hiroomi Nakao; Koichi Moriizumi; Kinya Kamiyama; Masayuki Terai; Hisaharu Miwa
Show Abstract
Development of deep-UV and excimer pellicle (membrane longevity)
Author(s): Motofuni Kashiwagi; Hitomi Matsuzaki; Norio Nakayama
Show Abstract
Evaluation of light resistance of pellicle membrane in the environment with solvent
Author(s): Toru Shirasaki; Meguru Kashida; Yoshihiro Kubota
Show Abstract
Evaluation of the MEBES 4500 reticle writer to commercial requirements of 250-nm design rule IC devices
Author(s): Frank E. Abboud; David W. Alexander; Thomas P. Coleman; Allen Cook; Leonard Gasiorek; Robert J. Naber; Frederick Raymond; Charles A. Sauer
Show Abstract
Electron-beam mask writing system for 0.25-um device generation
Author(s): Kazui Mizuno; Katsuhiro Kawasaki; Hiroyuki Itoh; Hidetoshi Satoh; Yasuhiro Someda; Norio Saitou
Show Abstract
Exposure of 895i resist using a vector scan Gaussian electron-beam lithography system
Author(s): Sheldon M. Kugelmass; Joseph Mitchell; John T. Poreda
Show Abstract
Laser mask repair technology for 256-Mb DRAM reticle
Author(s): Tsutoma Haneda; Tetsuya Shimanaka; Koji Wakabayashi; Yoichi Yoshino
Show Abstract
High-resolution deep-UV laser mask repair based on near-field optical technology
Author(s): Klony S. Lieberman; Hanan Terkel; Michael Rudman; A. Ignatov; Aaron Lewis
Show Abstract
Reticle consideration for 0.30-um design rules: between aspiration and actuality
Author(s): Mircea V. Dusa
Show Abstract
New approach to phase metrology for manufacturing 248-nm lithography-based embedded attenuated phase-shifting mask
Author(s): Giang T. Dao; Gang Liu; Alan Snyder; Jeff N. Farnsworth
Show Abstract
Investigation of phase-shift mask shifter defect printability and inspection techniques
Author(s): Yasuhiro Koizumi; Daniel L. Lopez
Show Abstract
Direct phase-shift measurement with transmitted deep-UV illumination
Author(s): Haruhiko Kusunose; Naoki Awamura; Hideo Takizawa; Kouji Miyazaki; Takahiro Ode; Daikichi Awamura
Show Abstract
Die-to-database inspection of 256-Mb DRAM reticles
Author(s): Yair Eran; Nissim Elmaliach; Yonatan Lehaman; Eyal Mizrahi; Gideon Rossman
Show Abstract
Detection and printability of random and programmed pinholes on Cr photomasks
Author(s): Franklin D. Kalk; Anthony Vacca; Charles H. Howard; Linard Karklin
Show Abstract
Automatic photomask defect classification method
Author(s): Kyoji Yamashita; Kazuto Matsuki; Kiminobu Akeno
Show Abstract
Application of phase-sensitive optical system for soft defect detection
Author(s): Tsuneyuki Hagiwara; Kouichirou Komatsu
Show Abstract

© SPIE. Terms of Use
Back to Top