Share Email Print
cover

Proceedings of SPIE Volume 2621

15th Annual BACUS Symposium on Photomask Technology and Management
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.


Volume Details

Volume Number: 2621
Date Published: 8 December 1995
Softcover: 58 papers (646) pages
ISBN: 9780819419859

Table of Contents
show all abstracts | hide all abstracts
Proximity correction for e-beam lithography
Author(s): Christie R. Marrian; Steven Chang; Martin C. Peckerar
Show Abstract
Manufacturing performance of the ALTA 3000 mask laser writer
Author(s): Brian J. Grenon; D. C. Defibaugh; Donna M. Sprout; C. J. Taft
Show Abstract
Investigation of MEBES 4500 system composite performance
Author(s): Jim DeWitt; Joe Watson; David W. Alexander; Allen Cook; Leonard Gasiorek; Mark Mayse; Robert J. Naber; Wayne Phillips; Charles A. Sauer
Show Abstract
Production performance of the EBES4 electron-beam lithography system
Author(s): David M. Walker; Sheldon M. Kugelmass; K. A. Murray; C. M. Rose
Show Abstract
Integration of an advanced laser writer into a manufacturing environment
Author(s): Gregg Inderhees; Robert M. Kiefer
Show Abstract
Evaluation of commercial and experimental resist materials for use in MEBES mask making
Author(s): Charles A. Sauer; Robert L. Dean; Etsuya Morita; Zoilo C. H. Tan; Bruce W. Smith; Dale E. Ewbank; Sid P. Duttagupta; Anne Rudack
Show Abstract
Plasma etching of chromium films in the fabrication of photomasks
Author(s): Thomas P. Coleman; Peter D. Buck
Show Abstract
Novel techniques on photomask blanks enhancement for the laser reticle writer
Author(s): Hideo Kobayashi; Keishi Asakawa; Yasunori Yokoya
Show Abstract
Contributions by blank vendors to critical dimension and defect errors
Author(s): James Unruh; Benjamin George Eynon
Show Abstract
Investigation of GMC for CD uniformity benefits
Author(s): Christopher P. Braun; Michael W. Stohl; Anthony E. Novembre; Frederick R. Peiffer
Show Abstract
Photomask production integration of KLA STARlight 300 system
Author(s): Franklin D. Kalk; David Mentzer; Anthony Vacca
Show Abstract
Current technological status of spatial-filtering method for soft defect detection
Author(s): Tsuneyuki Hagiwara
Show Abstract
Inspection system qualification and integration into the mask manufacturing environment
Author(s): Rosanne LaVoy; Ron Fujioka
Show Abstract
Printability of laser mask repairs at deep UV
Author(s): James A. Reynolds; Franklin M. Schellenberg
Show Abstract
Effect of laser mask repair-induced residue and quartz damage in sub-half-micrometer DUV wafer processes
Author(s): Pei-yang Yan; Qi-De Qian; Joan McCall; Joseph C. Langston; Yu S. Ger; Joe S. Cho; Robert F. Hainsey
Show Abstract
1995 mask industry quality assessment
Author(s): Chris Bishop; Al Strott
Show Abstract
Identifying the components of mask image-size variation
Author(s): Andrew D. Pond
Show Abstract
Repeatable mask metrology for next-generation lithography tools
Author(s): Steve L. Hentschel; Henry H. Kamberian; Julius Kovatch
Show Abstract
Improved estimates of the range of errors on photomasks using measured values of skewness and kurtosis
Author(s): Henry Chris Hamaker
Show Abstract
Method to produce a reference grid artifact for matching a MEBES 4500 system to an external reference
Author(s): Jim DeWitt; Joe Watson; Thomas P. Coleman; Leonard Gasiorek; Michael D. Lubin; Robert J. Naber; William Wang; Keith Wires
Show Abstract
Next-generation mask strategy: accuracy and mask-size survey and discussion results at PMJ '95 rump session
Author(s): Yoshihiro Todokoro; Hiroaki Morimoto
Show Abstract
Ergonomic risks in mask manufacturing and methods to combat them
Author(s): Larry Gardner; Al Strott
Show Abstract
Advances in stencil mask technology: control of distortion in ion-projection lithography masks
Author(s): John Charles Wolfe; Alex R. Shimkunas; John Melngailis; Hans Loeschner; Robert D. Mohondro; John N. Randall
Show Abstract
Fabrication processes for SCALPEL mask blanks
Author(s): Harold A. Huggins; Kevin J. Bolan; James Alexander Liddle; Milton L. Peabody; Regine G. Tarascon-Auriol; David L. Windt
Show Abstract
24"x 20" precision photomasks manufacture
Author(s): Graciela R. Guel; Martin Boothman; Daniel R. Rector; Susan M. Wilson
Show Abstract
Quality assurance of embedded attenuated phase-shift masks
Author(s): Hiroyuki Miyashita; Hiroshi Fujita; Toshifumi Yokoyama; Naoya Hayashi; Hisatake Sano
Show Abstract
Actual use of phase-shift mask
Author(s): Yoshiro Yamada; Hiromasa Unno; Kazuaki Chiba; Eisei Karikawa; Yasutaka Kikuchi; Yusuke Hattori; Katsuhiro Kinemura
Show Abstract
Embedded attenuating phase-shift mask: printability of defects
Author(s): Rajeev R. Singh; Alvina M. Williams; Chi-Min Yuan; Greg P. Hughes; G. Foss; Ronald M. Martino
Show Abstract
Side-lobe suppression in halftone PSM with optical proximity correction
Author(s): In-Gyun Shin; Sung-Chul Lim; Sang-Gyun Woo; Woo-Sung Han; Young-Bum Koh
Show Abstract
Deep-UV attenuated phase-shift mask for a quarter-micrometer photolithography
Author(s): Suigen Kyoh; Hideaki Sakurai; Takayuki Iwamatsu; Iwao Higashikawa; Rikiya Taniguchi; Hidehiro Watanabe; Takashi Tuchiya
Show Abstract
Large-area high-quality photomasks
Author(s): Torbjoern Sandstrom; Leif Odselius
Show Abstract
Optimizing the use of multipass printing to minimize printing errors in advanced laser reticle-writing systems
Author(s): Henry Chris Hamaker; Gary A. Burns; Peter D. Buck
Show Abstract
Evaluation of thin PBS resist films for improved feature linearity
Author(s): Larry C. Davis; Christopher J. Goetz; Larry J. Watson
Show Abstract
Shifter slope variation effect of embedded half-tone phase-shift masks
Author(s): Jongwook Kye; Seong-Yong Moon; Sang-Gyun Woo; Woo-Sung Han; Young-Bum Koh
Show Abstract
Printability of opaque repairs for DUV EPSM clear defects at sub-half-micrometer design rules
Author(s): Pei-yang Yan; Joan McCall; Robert F. Hainsey
Show Abstract
Masks for laser ablation technology: new requirements and challenges
Author(s): James L. Speidell; Doris Pulaski; Rajesh S. Patel
Show Abstract
Quality assurance of dielectric masks for laser ablation technology
Author(s): Doris Pulaski; Rajesh S. Patel; James L. Speidell
Show Abstract
Further work in optimizing PBS: is it capable of meeting specifications for 256 Mbit DRAM reticle manufacturing?
Author(s): Robert L. Dean; Charles A. Sauer
Show Abstract
X-ray mask fabrication techniques for micromachining
Author(s): Yuli Vladimirsky; Olga Vladimirsky; Volker Saile; Kevin J. Morris; J. Michael Klopf
Show Abstract
Mix-and-match lithography technology on 6-in. wafers for nanofabrication
Author(s): Shyi-Long Shy; Tien Sheng Chao; C. H. Chu; Tan Fu Lei; Kazumitsu Nakamura; Wen-An Loong; Chun-Yen Chang
Show Abstract
Powerful inspection and metrology tool for micro- and nanofabrication
Author(s): Shyi-Long Shy; Tan Fu Lei; Kazumitsu Nakamura; Wen-An Loong; Chun-Yen Chang
Show Abstract
Low-cost photomask inspection system
Author(s): Damayanti C. Gharpure; Sunil K. David
Show Abstract
Application of alternating PSM to sub-quarter-micrometer technology using i-line lithography
Author(s): Hung-Eil Kim; Chang-Nam Ahn; KeunYoung Kim; Ki-Ho Baik
Show Abstract
Attenuated phase-shifting mask specification with modified beam illumination
Author(s): Ichiro Kagami; Minoru Sugawara; Hiroichi Kawahira; Keisuke Tsudaka; Kiichi Ishikawa; Satoru Nozawa
Show Abstract
Defect printability study of attenuated phase-shifting masks for specifying inspection sensitivity
Author(s): Minoru Sugawara; Kiichi Ishikawa; Hiroichi Kawahira; Ichiro Kagami; Satoru Nozawa
Show Abstract
Predicting mask performance by numerical simulation
Author(s): Qi-De Qian; Giang T. Dao; Pei-yang Yan; Francisco A. Leon
Show Abstract
Initial evaluation result of DNQ-novolak resist system for advanced e-beam reticle fabrication
Author(s): Yasunori Yokoya; Hideo Kobayashi; Keishi Asakawa
Show Abstract
Comprehensive simulation study of the photomask defects printability
Author(s): Linard Karklin
Show Abstract
Chromium-based attenuated embedded phase-shift photomask blanks for use in 1X lithography
Author(s): Dan L. Schurz; Elizabeth Tai; Franklin D. Kalk
Show Abstract
Resist charging in electron-beam lithography
Author(s): Weidong Liu; Roger Fabian W. Pease
Show Abstract
How to improve MEBES-III Write times by improving your MEBES-III directory management discipline, enabled by high-speed networking software
Author(s): Greg Booi
Show Abstract
Fast sparse aerial-image calculation for OPC
Author(s): Nicolas B. Cobb; Avideh Zakhor
Show Abstract
Fast EB-PEC system for 0.25-um device reticle fabrication using a variable shaped beam machine
Author(s): Manabu Tomita; Hidetoshi Ohnuma; Masaaki Koyama; Hiroichi Kawahira
Show Abstract
Hierarchical proximity correction using CAPROX
Author(s): Ulrich Hofmann; Christian K. Kalus; Anja Rosenbusch; Hiroyuki Endo; Yasuki Kimura; Akihiro Endo
Show Abstract
Intelligent ground-rule-based inspection of OPC masks
Author(s): Robert P. Bishop
Show Abstract
Simplified rule generation for automated rules-based optical enhancement
Author(s): Oberdan W. Otto; Joseph G. Garofalo; Richard C. Henderson
Show Abstract
Good OPC, where will this drive mask CD tolerance and mask grid size
Author(s): Donald J. Samuels; Wilhelm Maurer; Timothy R. Farrell
Show Abstract
Manufacturing and inspection of OPC and PSM masks
Author(s): Wolfgang Staud; Karen Huang; Patricia D. Beard; Ofer Hebron; Yair Eran
Show Abstract

© SPIE. Terms of Use
Back to Top