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PROCEEDINGS VOLUME 2512

Photomask and X-Ray Mask Technology II
Editor(s): Hideo Yoshihara
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Volume Details

Volume Number: 2512
Date Published: 3 July 1995
Softcover: 59 papers (566) pages
ISBN: 9780819418708

Table of Contents
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Photomasks today and tomorrow
Author(s): Geoffrey M. Akiki
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Delay time stable chemically amplified e-beam negative tone resist for optical mask application
Author(s): Seiya Masuda; Georg Pawlowski
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ZEP resist process for high-accuracy photomask with a dry-etching capability
Author(s): Hideki Tarumoto; Kazuyuki Maetoko; Sakae Yamashita; Satoshi Aoyama; Hiroaki Morimoto
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Photomask blanks enhancement for the laser reticle writer
Author(s): Hideo Kobayashi; Keishi Asakawa; Yasunori Yokoya
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Sizing the next generation of optical photomasks
Author(s): Gilbert V. Shelden; Anne Rudack; Rajeev R. Singh; Wayne Smith; Alvina M. Williams
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Photomask cleaning for high-density and embedded PSM
Author(s): Cheol Shin; Yung-Sung Son; Ki Jong Kim
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Pellicle vs. influence of clean-room environments
Author(s): Naofumi Inoue; Hiroaki Nakagawa; Masahiro Kondou; Masanari Kitajima
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Amorphous stuctured Ta4B absorber on SiC membrane for x-ray mask
Author(s): Tsutomu Shoki; Ryo Ohkubo; Gregory M. Wells; Yoichi Yamaguchi; Kuniaki Yamazaki; Franco Cerrina
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Consideration of chemical bond configurations for radiation-hard UHV ECR-CVD SiNx x-ray mask membrane
Author(s): Jinho Ahn; Katsumi Suzuki; Shinji Tsuboi; Yoshio Yamashita
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Reflection masks for soft x-ray projection lithography
Author(s): Masaaki Ito; Takashi Soga; Hiromasa Yamanashi; Taro Ogawa
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Mask metrology system XY-5i for 256-Mbit DRAM
Author(s): Eiji Matsubara; Yoshihisa Fujita; Taro Ototake
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Electrical characterization of across-field lithographic performance for 256-Mbit DRAM technologies
Author(s): Junichiro Iba; Kohji Hashimoto; Richard A. Ferguson; Toshiaki Yanagisawa; Donald J. Samuels
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Ultrahigh-precision metrology on masks for 0.25 um device generation
Author(s): Klaus-Dieter Roth; Carola Blaesing-Bangert
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Development of EB lithography system for next generation photomasks
Author(s): Tadashi Komagata; Hitoshi Takemura; Nobuo Gotoh; Kazumitsu Tanaka
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Performance improvement in electron-beam reticle writing system
Author(s): Hirohito Anze; Satoshi Yamasaki; Shuichi Tamamushi; Yoji Ogawa; Eiji Murakami; Ryoichi Hirano; Kazuto Matsuki
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Application of chemically amplified resists to photomask fabrication
Author(s): Masumi Arai; Hiroyuki Inomata; Toshiharu Nishimura; Masa-aki Kurihara; Naoya Hayashi
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Methods of error source identification and process optimization for photomask manufacturing
Author(s): Mark D. Cerio
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Pellicles designed for high-performance lithographic processes
Author(s): Joseph S. Gordon
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ZBA31: an advanced mask writer meeting the demands of the 1-gigabit DRAM generation
Author(s): Christian Ehrlich; Olaf K. Fortagne; Peter Hahmann
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Mask-holding mechanism for an e-beam x-ray mask writer
Author(s): Tatsuya Kunioka; Nobuo Shimazu; Akira Shimizu; Tomoaki Sakai; Youichi Kuriyama
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High-precision EB technology with thin EB resist and distortion-free mask holder for x-ray mask fabrication
Author(s): Shuichi Noda; Hiroshi Hoga
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One-point wafer bonding for highly accurate x-ray masks
Author(s): Masatoshi Oda; Takashi Ohkubo; Hideo Yoshihara
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Study of SiC x-ray mask distortion induced by backetching receding subtractive fabrication process
Author(s): Shinji Tsuboi; Tsutomu Shoki; Tsuneaki Ohta; Hiroshi Okuyama; Kinya Ashikaga; Yoshio Yamashita; Ryo Ohkubo; Yoichi Yamaguchi; Hiroshi Hoga
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X-ray mask fabrication process
Author(s): Gregory M. Wells; Michael T. Reilly; Frederick T. Moore; Franco Cerrina; Kuniaki Yamazaki
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Repairing x-ray masks with Ta absorbers using focused ion beams
Author(s): Ikuo Okada; Yasunao Saitoh; Takashi Ohkubo; Misao Sekimoto; Tadahito Matsuda
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Reticle flexure influence on pattern positioning accuracy for reticle writing
Author(s): Ryoichi Hirano; Kazuto Matsuki; Shusuke Yoshitake; Yoshihiko Takahashi; Shuichi Tamamushi; Yoji Ogawa; Toru Tojo
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Analysis of pattern shift error for mask clamping measured by Nikon XY-31
Author(s): Shusuke Yoshitake; Kazuto Matsuki; Satoshi Yamasaki; Ryoichi Hirano; Shuichi Tamamushi; Yoji Ogawa; Toru Tojo
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Comprehensive metrology-detection strategies for sub-0.5um lithography reticles
Author(s): Mircea V. Dusa; Linard Karklin
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Evaluation of CD metrology tools for photomasks for 0.25-um devices
Author(s): Hiroshi Fujita; Shiho Sasaki; Hiroyuki Miyashita; Naoya Hayashi; Hisatake Sano
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248-nm DUV MoSiON embedded phase-shifting mask for 0.25 micrometer lithography
Author(s): Giang T. Dao; Gang Liu; Robert F. Hainsey; Jeff N. Farnsworth; Yasuo Tokoro; Susumu Kawada; Tsuneo Yamamoto; Nobuyuki Yoshioka; Akira Chiba; Hiroaki Morimoto
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Development and evaluation of chromium-based attenuated phase-shift masks for DUV exposure
Author(s): Koichi Mikami; Hiroshi Mohri; Hiroyuki Miyashita; Naoya Hayashi; Hisatake Sano
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Development of a W/Si thin film for the single-layered attenuated phase-shifting mask for 248-nm lithography
Author(s): Hideaki Mitsui; Hiroyuki Sakai; Yoichi Yamaguchi
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Lithographic performance of SiNx single-layer halftone mask
Author(s): Kenji Kawano; Masafumi Asano; Satoshi Tanaka; Takayuki Iwamatsu; Hiroyuki Sato; Shinichi Ito
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Quality control of embedded-type phase-shift mask
Author(s): Yoshiro Yamada; Kazuaki Chiba; Eisei Karikawa; Hiromasa Unno; Yasutaka Kikuchi; Katsuhiro Kinemura; Masao Otaki
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Application of phase-shift mask to GaAs IC fabrication process
Author(s): Yoshiki Kojima; Mitsunori Nakatani; Hirofumi Nakano; Kazuya Kamon; Kazuhiko Sato
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Sub 0.1 um ArF excimer laser lithography with alternating phase-shifting masks
Author(s): Jun Ushioda; Yuko Seki; Hiroyoshi Tanabe; Yukio Ogura; Katsumi Maeda; Takeshi Ohfuji
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Dependency of side-lobe effect of half-tone phase-shift mask on substrate material and topology and its solutions
Author(s): Sung-Chul Lim; Sang-Gyun Woo; Woo-Sung Han; Young-Bum Koh; Moon-Yong Lee
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EB proximity effect correction system for 0.25-um device reticle fabrication
Author(s): Manabu Tomita; Hidetoshi Ohnuma; Masaaki Koyama; Hiroichi Kawahira
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High-speed mask EB graphical image browser
Author(s): Robert Veltman; Itsuji Ashida; Kunihiko Tsuboi
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Optical proximity correction for super-resolution technique
Author(s): Kazuya Kamon; Wataru Wakamiya; Hitoshi Nagata; Koichi Moriizumi; Teruo Miyamoto; Yasuhito Myoi; Masaaki Tanaka
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Investigation and improvement of patterning characteristics for annular illumination optical lithography at the periodical pattern ends
Author(s): Toshiyuki Horiuchi; Katsuhiro Harada; Yoshinobu Takeuchi; Yoshiaki Mimura; Emi Tamechika
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Printability of laser mask repairs at deep UV
Author(s): James A. Reynolds; Franklin M. Schellenberg
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Die-to-database defect detection for reticles of 64- and 256-Mbit DRAMs
Author(s): Yair Eran; Gad Greenberg; Gideon Rossman
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Current technological status of spatial filtering method for soft defect detection
Author(s): Tsuneyuki Hagiwara
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Mask-/reticle-making control system
Author(s): Satoshi Akutagawa; Satoshi Araihara; Itaru Sakai
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Advanced mask fabrication system
Author(s): Tadahiro Takigawa; Toru Tojo; Yoji Ogawa; Kiyomi Koyama; Akira Ono; Soichi Inoue; Shinichi Ito; Mineo Goto
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Recent advances in mask making technology at AT&T
Author(s): Regine G. Tarascon
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Phase-shifting masks for giga-scale ULSI
Author(s): Akira Imai; Tsuneo Terasawa; Norio Hasegawa; Naoko Asai; Toshihiko P. Tanaka; Shinji Okazaki
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Evaluation of shifter edge shape on attenuated phase-shifting mask
Author(s): Taro Saito; Hideyuki Jinbo; K. Yano; Seki Suzuki; Yoshio Tanaka
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New phase-shifting mask technology for quarter-micron photolithography
Author(s): Yoshihiko Okamoto; Kazuhiro Gyouda
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Fast-resist image estimation methodology using light-intensity distribution
Author(s): Keisuke Tsudaka; Manabu Tomita; Minoru Sugawara; Hiroichi Kawahira; Satoru Nozawa
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State of the art in focused ion-beam mask repair systems
Author(s): Diane K. Stewart; John A. Doherty; Andrew F. Doyle; John C. Morgan
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New technique for repairing opaque defects
Author(s): Kazuo Aita; Yoshihiro Koyama; Hiroshi Matsumura; Takashi Kaito; Yasushi Satoh; Katsuhide Tsuchiya; Shigeru Noguchi
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SEMI standards programmed defect masks and their applications for defect inspection
Author(s): Hiroichi Kawahira; Yoshiki Suzuki
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Effect of off-axis illumination on the printability of opaque and transparent reticle defects
Author(s): James N. Wiley; Linard Karklin
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Fully automated mask/reticle production factory
Author(s): Osamu Tsubakida; T. Ban; T. Kojima; Akira Morishige; T. Yoshizawa
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Preliminary methodology investigation of mask pattern fidelity for 250-nm design rules
Author(s): Thomas P. Coleman; Charles A. Sauer; Robert J. Naber; Henry Chris Hamaker
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Integrated reviewing system for defect inspection
Author(s): Ming-Huei Lin; Shen Chung Kuo
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Improved photomask metrology through exposure emulation
Author(s): James E. Potzick
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